CN219209131U

CN219209131U - Photoresist production recovery structure

Info

Publication number: CN219209131U
Application number: CN202223342089.9U
Authority: CN
Inventors: 孙俊鹏; 艾一格; 梁永慧; 姚丹
Original assignee: Shanghai Chenhexin Electronic Technology Co ltd
Current assignee: Shanghai Chenhexin Electronic Technology Co ltd
Priority date: 2022-12-13
Filing date: 2022-12-13
Publication date: 2023-06-20
Anticipated expiration: 2032-12-13

Abstract

The utility model relates to the technical field of photoresist and discloses a photoresist production and recovery structure which comprises a main body mechanism, a recovery mechanism and a cleaning mechanism, wherein the recovery mechanism is positioned in the main body mechanism, the cleaning mechanism is positioned above the recovery mechanism, the main body mechanism comprises a box body, a support column, a sealing cover, a handle and a control panel, the support column is fixedly arranged at the upper end of the box body, the sealing cover is movably arranged at the rear end of the upper end of the box body, the handle is fixedly arranged at the front end of the upper end of the sealing cover, the control panel is fixedly arranged in the middle of the front end of the box body, and the recovery mechanism comprises a filtering bin, a liquid storage bin, a liquid inlet, a filtering plate, a return type fixing block, a sink, a filtering long barrel, a concave type fixing block, a filtering screen, a liquid outlet and an adjusting valve. This photoresist production recovery structure is convenient for clear away the pollutant that will adhere to on the filter, solves the condition that the pollutant blockked up the filter, reduces the frequency of changing the filter.

Description

Photoresist production recovery structure

Technical Field

The utility model relates to the technical field of photoresist, in particular to a photoresist production and recovery structure.

Background

The photoresist is a photoresist, generally, the processing is completed by means of irradiation or radiation of ultraviolet light, electron beams and the like, and in the process of the photoetching technology, the photoresist is an anti-corrosion coating material, and when the surface of a semiconductor material is processed, a proper photoresist is selected, so that a required image can be obtained on the surface.

The existing photoresist production recovery structure, the filter board is in the process of filtering photoresist, the filtered pollutants are usually attached to the filter board, so that the filter board is blocked, and the filter board is detached in a relatively troublesome and complex process, so that the normal use of the filter board can be influenced.

The existing photoresist production recovery structure has the defects that after the photoresist is filtered, the photoresist stored in a liquid storage bin needs to be taken out again, the photoresist is taken out again in a troublesome and complicated process, and photoresist overflows in the process of taking out the photoresist, so that the photoresist is wasted.

Disclosure of Invention

(one) solving the technical problems

The utility model aims to provide a photoresist production and recovery structure, which aims to solve the problems that in the prior art, the existing photoresist production and recovery structure is provided, a filter plate is usually attached to a filter plate in the process of filtering photoresist, so that the filter plate is blocked, and the normal use of the filter plate is influenced due to the fact that the filter plate is detached in a troublesome and complicated process.

(II) technical scheme

In order to achieve the above purpose, the present utility model provides the following technical solutions: the utility model provides a photoresist production recovery structure, includes main part mechanism, recovery mechanism and cleaning mechanism, recovery mechanism is located main part mechanism's inside, cleaning mechanism is located recovery mechanism's top, main part mechanism includes box, support column, sealed lid, handle and control panel, support column fixed mounting is in the upper end of box, sealed lid movable mounting is in the rear end of box upper end, handle fixed mounting is in the front end of sealed lid upper end, control panel fixed mounting is in the middle part of box front end, recovery mechanism includes filtration storehouse, stock solution storehouse, inlet, filter, back type fixed block, heavy groove, filtration long bucket, concave type fixed block, filter screen, liquid outlet and governing valve, the fixed upper end that sets up in the box of filtration storehouse, the fixed lower extreme that sets up in the box of stock solution storehouse, the stock solution storehouse is located the lower extreme of filtration storehouse.

Preferably, the liquid inlet is fixedly arranged at the rear end of the left end of the box body, the liquid inlet is positioned at the left end of the filter screen, the filter plate is fixedly arranged in the box body, the filter plate is positioned in the filter bin, and the fixing block is fixedly arranged at the inner side of the filter plate so as to filter pollutants.

Preferably, the sinking groove is fixedly arranged on the inner side of the filter plate, the sinking groove is positioned at the right end of the inner part of the return-type fixed block, the filtering long barrel is fixedly arranged at the left end and the right end of the lower end of the filter plate, the filtering long barrel is positioned at the lower end of the sinking groove, and the concave-type fixed block is fixedly arranged at the left end of the inner part of the box body, so that filtered pollutants can be conveniently stored in a concentrated mode.

Preferably, the filter screen fixed mounting is at the right-hand member of concave type fixed block, the filter screen is located the inside lower extreme in filter house, the liquid outlet is fixed to be set up in the lower extreme of box, governing valve movable mounting is at the lower extreme of liquid outlet, the governing valve is located the below of box, is convenient for take out the photoresist.

Preferably, the cleaning mechanism comprises a driving motor, a threaded rod, a movable block, an electric push rod, a cleaning motor and a cleaning brush, wherein the driving motor is fixedly arranged at the upper end of the right end of the box body, the driving end of the driving motor extends to the right end of the inside of the box body, and the threaded rod is fixedly arranged at the driving end of the driving motor so as to clean pollutants on the filter plate conveniently.

Preferably, the movable block is movably arranged at the outer end of the threaded rod, the electric push rod is fixedly arranged at the lower end of the movable block, the cleaning motor is fixedly arranged at the lower end of the electric push rod, the cleaning brush is fixedly arranged at the lower end of the cleaning motor, and the cleaning brush is arranged above the filter plate, so that pollutants are conveniently cleaned into the filter long barrel for centralized management, and the filter plate is prevented from being blocked by the pollutants.

Compared with the prior art, the utility model has the beneficial effects that:

1. according to the photoresist production and recovery structure, by installing the control panel, operators can conveniently and respectively operate the driving motor, the electric push rod and the cleaning motor, so that the driving motor, the electric push rod and the cleaning motor can perform independent working processes, a series of driving starts are not required to be started, and the use frequency of the motor is saved;

2. according to the photoresist production and recovery structure, the sedimentation groove is formed in the filter plate, and the filtering long barrel is arranged at the lower end of the filter plate, so that cleaned pollutants are conveniently stored in a concentrated mode, the cleaned pollutants can be filtered again through the filtering long barrel, and the practicability of the photoresist production and recovery structure is improved;

3. this photoresist production recovery structure, through installing cleaning mechanism, be convenient for clear away the pollutant that will attach on the filter, solved the condition that the pollutant blockked up the filter, reduced the frequency of changing the filter, increased the practicality of photoresist production recovery structure.

Drawings

FIG. 1 is a schematic perspective view of the present utility model;

FIG. 2 is a schematic plan view of the present utility model;

FIG. 3 is a schematic view of a filter plate structure according to the present utility model;

fig. 4 is an enlarged schematic view of a part of the cleaning mechanism of the present utility model.

In the figure: 1. a main body mechanism; 101. a case; 102. a support column; 103. sealing cover; 104. a handle; 105. a control panel; 2. a recovery mechanism; 201. a filtering bin; 202. a liquid storage bin; 203. a liquid inlet; 204. a filter plate; 205. a loop-shaped fixed block; 206. sinking grooves; 207. filtering the long barrel; 208. a concave fixed block; 209. a filter screen; 210. a liquid outlet; 211. a regulating valve; 3. a cleaning mechanism; 301. a driving motor; 302. a threaded rod; 303. a movable block; 304. an electric push rod; 305. cleaning a motor; 306. and (5) cleaning the brush.

Detailed Description

The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.

Referring to fig. 1-4, the present utility model provides a technical solution: the utility model provides a photoresist production recovery structure, including main body mechanism 1, retrieve mechanism 2 and cleaning mechanism 3, retrieve the inside that mechanism 2 is located main body mechanism 1, cleaning mechanism 3 is located the top of retrieving mechanism 2, main body mechanism 1 includes box 101, support column 102, sealed lid 103, handle 104 and control panel 105, support column 102 fixed mounting is in the upper end of box 101, sealed lid 103 movable mounting is in the rear end of box 101 upper end, handle 104 fixed mounting is in the front end of sealed lid 103 upper end, control panel 105 fixed mounting is in the middle part of box 101 front end, retrieve mechanism 2 includes filter cartridge 201, stock solution storehouse 202, inlet 203, filter 204, back type fixed block 205, sink 206, filter long bucket 207, concave type fixed block 208, filter screen 209, outlet 210 and governing valve 211, the fixed upper end that sets up in box 101 is inside in filter cartridge 201 in stock solution storehouse 202, the rear end that the inlet 203 fixed setting is in box 101 left end, inlet 203 is located the inside filter screen 204, filter screen 204 is located the inside of filter cartridge 204 fixed mounting in filter cartridge 204.

Sink 206 fixed setting is in the inboard of filter 204, sink 206 is located the inside right-hand member of back type fixed block 205, filter long bucket 207 fixed mounting is in the left and right sides of filter 204 lower extreme, filter long bucket 207 is located the lower extreme of sink 206, concave fixed block 208 fixed mounting is in the inside left end of box 101, filter screen 209 fixed mounting is in the right-hand member of concave fixed block 208, filter screen 209 is located the inside lower extreme of filter house 201, the fixed lower extreme that sets up at box 101 of liquid outlet 210, governing valve 211 movable mounting is in the lower extreme of liquid outlet 210, governing valve 211 is located the below of box 101, filter again through filter long bucket 207 the photoresist that the pollutant that will clean the inside contained, flow into stock solution storehouse 202 through filter screen 209, when needing to take out the photolithography liquid, the staff will external pipe is connected the lower extreme of liquid outlet 210, open governing valve 211 again, take out photolithography liquid that will retrieve through liquid outlet 210.

The cleaning mechanism 3 comprises a driving motor 301, a threaded rod 302, a movable block 303, an electric push rod 304, a cleaning motor 305 and a cleaning brush 306, wherein the driving motor 301 is fixedly installed at the upper end of the right end of the box body 101, the transmission end of the driving motor 301 extends to the right end of the inside of the box body 101, the threaded rod 302 is fixedly installed at the transmission end of the driving motor 301, the movable block 303 is movably installed at the outer end of the threaded rod 302, the electric push rod 304 is fixedly installed at the lower end of the movable block 303, the cleaning motor 305 is fixedly installed at the lower end of the electric push rod 304, the cleaning brush 306 is fixedly installed at the lower end of the cleaning motor 305, the cleaning brush 306 is located above the filter plate 204, the driving motor 301 is started to drive the threaded rod 302 to rotate through the control panel 105, the movable block 303 slides on the threaded rod 302, the electric push rod 304 is started to push the cleaning motor 305 downwards, the cleaning motor 305 is driven to work, and the cleaning motor 305 is driven to clean pollutants on the filter plate 204.

Working principle: when the photoetching machine is used, firstly, a worker flows the photoresist to be recovered into the filtering bin 201 through the liquid inlet 203, some larger pollutants are filtered out through the filtering plate 204, the thinner photoresist filtered out through the filtering screen 209 flows into the liquid storage bin 202 for storage, in the filtering process, the driving motor 301 is started through the control panel 105 to drive the threaded rod 302 to rotate, the movable block 303 slides on the threaded rod 302, the electric push rod 304 is started to push the cleaning motor 305 downwards to drive the cleaning motor 305 to work, the cleaning motor 305 is driven to drive the cleaning brush 306 to clean the pollutants on the filtering plate 204, the driving motor 301 is used for driving the threaded rod 302 to rotate, the movable block 303 slides on the threaded rod 302 to clean the pollutants on the filtering plate 204 into the filtering long barrel 207 for concentrated storage, the photoresist contained in the cleaned pollutants flows into the liquid storage bin 202 through the filtering screen 209, when the photoresist is required to be taken out, the worker connects an external pipe into the lower end of the liquid outlet 210, and then the regulating valve 211 is opened to take the photoresist out through the liquid outlet 210.

Finally, it should be noted that the above description is only for illustrating the technical solution of the present utility model, and not for limiting the scope of the present utility model, and that the simple modification and equivalent substitution of the technical solution of the present utility model can be made by those skilled in the art without departing from the spirit and scope of the technical solution of the present utility model.

Claims

1. The utility model provides a photoresist production recovery structure, includes main part mechanism (1), recovery mechanism (2) and cleans mechanism (3), its characterized in that: the utility model provides a clean mechanism (3) is located the inside of main part mechanism (1), clean mechanism (3) are located the top of retrieving mechanism (2), main part mechanism (1) include box (101), support column (102), sealed lid (103), handle (104) and control panel (105), support column (102) fixed mounting is in the upper end of box (101), sealed lid (103) movable mounting is in the rear end of box (101) upper end, handle (104) fixed mounting is in the front end of sealed lid (103) upper end, control panel (105) fixed mounting is in the middle part of box (101) front end, retrieve mechanism (2) include filtration storehouse (201), liquid storage storehouse (202), inlet (203), filter (204), back formula fixed block (205), sink (206), filtration long bucket (207), concave fixed block (208), filter screen (209), liquid outlet (210) and governing valve (211), filtration storehouse (201) are fixed to be set up in the upper end of box (101), liquid storage storehouse (202) are fixed in the inside of box (101), and are located under the filter storehouse (201).

2. A photoresist production recovery structure according to claim 1, wherein: the utility model discloses a filter, including box (101) and filter, feed liquor mouth (203) are fixed to be set up in the rear end of box (101) left end, feed liquor mouth (203) are located the left end of filter screen (209), inside filter (204) fixed mounting in box (101), inside filter cartridge (201) is located to filter (204), return type fixed block (205) fixed mounting is in the inboard of filter (204).

3. A photoresist production recovery structure according to claim 2, wherein: the heavy groove (206) is fixed to be set up in the inboard of filter (204), heavy groove (206) is located the inside right-hand member of back fixed block (205), filter long bucket (207) fixed mounting is at the left and right sides of filter (204) lower extreme both ends, filter long bucket (207) are located the lower extreme of heavy groove (206), concave fixed block (208) fixed mounting is at the inside left end of box (101).

4. A photoresist production recovery structure according to claim 3, wherein: the filter screen (209) fixed mounting is at the right-hand member of concave fixed block (208), filter screen (209) are located the inside lower extreme of filter house (201), liquid outlet (210) are fixed to be set up in the lower extreme of box (101), governing valve (211) movable mounting is at the lower extreme of liquid outlet (210), governing valve (211) are located the below of box (101).

5. A photoresist production recovery structure according to claim 4, wherein: the cleaning mechanism (3) comprises a driving motor (301), a threaded rod (302), a movable block (303), an electric push rod (304), a cleaning motor (305) and a cleaning brush (306), wherein the driving motor (301) is fixedly arranged at the upper end of the right end of the box body (101), the transmission end of the driving motor (301) extends to the right end of the inside of the box body (101), and the threaded rod (302) is fixedly arranged at the transmission end of the driving motor (301).

6. A photoresist production recovery structure according to claim 5, wherein: the movable block (303) is movably arranged at the outer end of the threaded rod (302), the electric push rod (304) is fixedly arranged at the lower end of the movable block (303), the cleaning motor (305) is fixedly arranged at the lower end of the electric push rod (304), the cleaning brush (306) is fixedly arranged at the lower end of the cleaning motor (305), and the cleaning brush (306) is arranged above the filter plate (204).