CN219181741U

CN219181741U - Plasma generating device, purifying device and air conditioning system

Info

Publication number: CN219181741U
Application number: CN202221353366.3U
Authority: CN
Inventors: 王贤杰; 江宇; 肖晔; 陈雨; 夏童玲
Original assignee: Midea Group Co Ltd; GD Midea Air Conditioning Equipment Co Ltd; GD Midea Heating and Ventilating Equipment Co Ltd; Guangdong Midea White Goods Technology Innovation Center Co Ltd
Current assignee: Midea Group Co Ltd; GD Midea Air Conditioning Equipment Co Ltd; GD Midea Heating and Ventilating Equipment Co Ltd; Guangdong Midea White Goods Technology Innovation Center Co Ltd
Priority date: 2022-05-31
Filing date: 2022-05-31
Publication date: 2023-06-13
Anticipated expiration: 2032-05-31
Also published as: CN220586492U; CN220586491U

Abstract

The application discloses a plasma generating device, purifier and air conditioning system belongs to the technical field of plasma equipment to solve the technical problem that the discharge performance and the volume of current plasma generator can not be balanced. The plasma generating device comprises a first electrode, a dielectric layer and a second electrode, wherein the dielectric layer is wound on at least part of the first electrode, the second electrode is arranged on one side of the dielectric layer, which is opposite to the first electrode, and the second electrode is wound on at least part of the dielectric layer, so that the first electrode and the second electrode are oppositely arranged. The plasma layer winds at least part of the first electrode, and the second electrode winds at least part of the dielectric layer, so that the second electrode winds the first electrode, the discharge area between the first electrode and the second electrode can be increased, and more plasmas are generated between the first electrode and the second electrode. The dielectric layer is made of rigid materials, so that the plasma generating device has excellent structural strength and stability.

Description

Plasma generating device, purifying device and air conditioning system

Technical Field

The application belongs to the technical field of plasma equipment, and particularly relates to a plasma generation device, a purification device and an air conditioning system.

Background

The plasma oxidation technology utilizes energy and active components generated by discharge between two electrodes, can kill VOC (volatile organic compounds ) and virus and bacteria in air to generate water and carbon dioxide, and has the advantages different from other air purification technologies.

In the related art, the plasma generating apparatus discharges between two plate-like electrodes by arranging the electrodes in a manner that the two plate-like electrodes face each other, and in such a configuration, the plasma generating efficiency of the plasma generating apparatus is low.

Disclosure of Invention

The plasma generating device aims to at least solve the technical problem that the plasma generating efficiency of the existing plasma generating device is low to a certain extent. To this end, the present application provides a plasma generating device, a purifying device and an air conditioning system.

In a first aspect, an embodiment of the present application provides a plasma generating apparatus, including:

the first electrode is arranged to be electrically connected to the first electrode,

a dielectric layer wound around at least a portion of the first electrode, and

the second electrode is arranged on one side of the dielectric layer, which is opposite to the first electrode, and the second electrode is arranged around at least part of the dielectric layer so that the first electrode and the second electrode are arranged opposite to each other,

wherein, the dielectric layer is rigid material.

In the plasma generating device provided by the embodiment of the application, the dielectric layer is arranged between the first electrode and the second electrode, so that dielectric barrier discharge is formed between the first electrode and the second electrode after the first electrode and the second electrode are electrified. The dielectric layer surrounds at least a portion of the first electrode, and the second electrode surrounds at least a portion of the dielectric layer, such that the second electrode surrounds the first electrode, which increases the discharge area between the first electrode and the second electrode, such that more plasma is generated between the first electrode and the second electrode.

The dielectric layer of this application adopts the rigidity material for the dielectric layer has better structural strength, consequently when the dielectric layer around locating behind the first electrode, the dielectric layer fully protects first electrode, makes first electrode can not produce deformation because of the atress. The dielectric layer is prepared from a rigid material, so that the dielectric layer has good structural stability and reliability, and the dielectric layer can be prevented from being broken down and damaged due to discharge between the first electrode and the second electrode, so that the plasma generating device has excellent structural strength and stability.

In some embodiments, the dielectric layer has an outer diameter of 1mm to 3mm.

In some embodiments, the inner wall of the dielectric layer is spaced from the outer wall of the dielectric layer by no more than 0.8mm.

In some embodiments, an inner wall of a side of the dielectric layer facing the first electrode is attached to the first electrode.

In some embodiments, the second electrode is wound around a portion of the dielectric layer and is attached to the dielectric layer.

In some embodiments, the second electrode is spaced from the first electrode by a uniform distance in a direction of the second electrode around the dielectric layer.

In some embodiments, the dielectric layer has a uniform thickness dimension in a direction of the second electrode around the dielectric layer.

In some embodiments, the current input to the first electrode or the second electrode is alternating current or pulsed electricity having a frequency greater than 20 Khz.

In some embodiments, the dielectric layer is made of quartz.

In some embodiments, the first electrode is made of a rigid material.

In some embodiments, the material of the first electrode is tungsten.

In a second aspect, based on the above plasma generating device, embodiments of the present application propose a cleaning device comprising the above plasma generating device.

In some embodiments, the purification device further comprises a base and a mesh enclosure, the plasma generation device is arranged on the base, the mesh enclosure is covered on the plasma generation device, and the mesh enclosure is provided with an air inlet.

In some embodiments, the purification device further comprises a catalyst layer applied to the mesh enclosure.

In some embodiments, the purification device further comprises an air flow channel, the mesh enclosure is arranged in the air flow channel, and the air flow direction in the air flow channel faces the mesh enclosure.

In some embodiments, the number of the plasma generating devices is plural, and the plural plasma generating devices are connected to the base and distributed around the base, and the airflow direction in the airflow channel intersects with the axis of the plasma generating device.

In a third aspect, based on the above purification device, an embodiment of the present application further proposes an air conditioning system, including the above purification device.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are needed in the description of the embodiments will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present application, and other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.

Fig. 1 shows a schematic structural view of a plasma generating apparatus disclosed in an embodiment of the present application;

FIG. 2 shows a schematic cross-sectional view of the dielectric layer of FIG. 1 in its axial direction;

FIG. 3 shows a schematic structural view of a purification apparatus disclosed in an embodiment of the present application;

fig. 4 shows a schematic view of a purification device comprising a plurality of plasma generating devices as disclosed in an embodiment of the present application.

Reference numerals:

100-the first electrode, 110-the joint,

200-a dielectric layer, wherein the dielectric layer is formed on the substrate,

300-a second electrode, the second electrode,

400-a base, wherein the base is provided with a plurality of grooves,

500-mesh enclosure, 510-air inlet.

Detailed Description

The following description of the embodiments of the present utility model will be made clearly and fully with reference to the accompanying drawings, in which it is evident that the embodiments described are only some, but not all embodiments of the utility model. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.

It should be noted that all the directional indicators in the embodiments of the present utility model are only used to explain the relative positional relationship, movement conditions, etc. between the components in a specific posture, and if the specific posture is changed, the directional indicators are correspondingly changed.

In the present utility model, unless specifically stated and limited otherwise, the terms "connected," "affixed," and the like are to be construed broadly, and for example, "affixed" may be a fixed connection, a removable connection, or an integral body; can be mechanically or electrically connected; either directly or indirectly, through intermediaries, or both, may be in communication with each other or in interaction with each other, unless expressly defined otherwise. The specific meaning of the above terms in the present utility model can be understood by those of ordinary skill in the art according to the specific circumstances.

Furthermore, descriptions such as those referred to as "first," "second," and the like, are provided for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implying an order of magnitude of the indicated technical features in the present disclosure. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include at least one such feature. In addition, the technical solutions of the embodiments may be combined with each other, but it is necessary to base that the technical solutions can be realized by those skilled in the art, and when the technical solutions are contradictory or cannot be realized, the combination of the technical solutions should be considered to be absent and not within the scope of protection claimed in the present utility model.

The present application is described below with reference to specific embodiments in conjunction with the accompanying drawings:

example 1

Referring to fig. 1 to 4, a plasma generating apparatus is disclosed in an embodiment of the present application, which includes a first electrode 100, a dielectric layer 200, and a second electrode 300. The plasma generating device can be used for generating plasma and generating related products which can be used for purifying air, and therefore, the plasma generating device can be used in air purifying equipment.

It should be understood that the plasma generating device operates on the principle of forming a positive or negative voltage between two electrodes, and ionizing air using the voltage to generate energy and active products, thereby achieving the purpose of purifying the air.

The dielectric layer 200 is a basic component of the plasma generating device, the dielectric layer 200 can provide a mounting base for other at least partial components of the plasma generating device, and the dielectric layer 200 is disposed around at least partial first electrode 100. Specifically, the dielectric layer 200 has a cavity or a groove therein for accommodating the first electrode 100, and the first electrode 100 may be disposed in the cavity or the groove of the dielectric layer 200, so as to achieve the purpose of mounting the first electrode 100. Specifically, in the case where the dielectric layer 200 completely surrounds the first electrode 100, the dielectric layer 200 is hollow and tubular, so that the dielectric layer 200 has a cavity, and the first electrode 100 is disposed in the cavity of the dielectric layer 200, it should be understood, of course, that the dielectric layer 200 may be a circular tube, a rectangular tube, or another polygonal tube, which is not limited in this application. In the case that the dielectric layer 200 winds a portion of the first electrode 100, the dielectric layer 200 may have a tubular structure with a notch on a sidewall, so that the dielectric layer 200 has a receiving groove therein to at least partially encapsulate the first electrode 200. The second electrode 300 is disposed on a side of the substrate layer facing away from the first electrode 100, and the second electrode 300 is disposed around the dielectric layer 200, such that the first electrode 100 and the second electrode 300 are disposed opposite to each other, and the dielectric layer 200 is disposed between the first electrode 100 and the second electrode 300, and when the first electrode 100 and the second electrode 300 are electrically connected, an electric field is formed between the first electrode 100 and the second electrode 300, and a dielectric barrier discharge is formed between the first electrode 100 and the second electrode 300 by the dielectric layer 200.

Specifically, any one of the first electrode 100 and the second electrode 300 in the present application may be connected to a power supply, the power supply may input a voltage to the electrode connected thereto, and the other electrode may be grounded or connected to a voltage lower than an output voltage of the power supply, so that a voltage difference may be formed between the first electrode 100 and the second electrode 300, such that the dielectric layer 200 is disposed between the first electrode 100 and the second electrode 300 to form a dielectric barrier discharge, and high energy and active products may be generated between the first electrode 100 and the second electrode 300 to remove contaminants near the first electrode 100, the second electrode 300, and the dielectric layer 200. In the embodiment of the present application, the first electrode 100 may be connected to a power source, and the second electrode 300 may be grounded or connected to a voltage lower than an output voltage of the power source, and in particular, the first electrode 100 is provided with a connector 110, and the connector 110 may be used for connection to the power source.

In this application, the dielectric layer 200 is disposed around at least a portion of the first electrode 100, such that the dielectric layer 200 may surround at least a portion of the first electrode 100, and at least a portion of an outer surface of the first electrode 100 is disposed opposite the dielectric layer 200. The second electrode 300 is disposed around at least a portion of the dielectric layer 200, so that the second electrode 300 can surround at least a portion of the second electrode 300, and further, the second electrode 300 can surround at least a portion of the first electrode 100, so that the second electrode 300 can surround at least a portion of the first electrode 100, the area between the second electrode 300 and the first electrode 100 is a discharge area, and when the first electrode 100 and the second electrode 300 are energized, an electric field can be generated in the area, and corresponding products such as plasma can be generated, so that a larger amount of plasma can be generated.

Specifically, when the first electrode 100 of the present application has a wire-like structure, and the cross section in the axial direction thereof is any shape such as a circle, an ellipse, a rectangle, a triangle, or other polygons, the second electrode 300 is disposed around at least a portion of the first electrode 100, so that in the case that the volume of the first electrode 100 is constant, the surface area of the first electrode 100 can be fully utilized, so that the discharge area between the first electrode 100 and the second electrode 300 is relatively larger. Or, in the case that the area of the discharge area between the first electrode 100 and the second electrode 300 is fixed, the surface area of the first electrode 100 is fully utilized, so that the volume of the first electrode 100 is relatively smaller, and further, the volumes of the dielectric layer 200 and the second electrode 300 are relatively smaller, and finally, the volume size is more compact under the condition that the plasma generating device of the present application has better plasma generating performance.

In this application, the dielectric layer 200 is disposed around at least a portion of the first electrode 100, so that the dielectric layer 200 may function to protect the first electrode 100 and to provide a mounting base for the first electrode 100 and the second electrode 300. The dielectric layer 200 is made of a rigid material, so that the dielectric layer 200 has better structural strength, and the dielectric layer 200 can protect the first electrode 100 because the dielectric layer 200 winds the first electrode 100 inside, and the dielectric layer 200 has better protection effect on the first electrode 100 when the dielectric layer 200 is made of a rigid material. Specifically, when the plasma generating device of the present application is impacted by an external force, the dielectric layer 200 can absorb the external force, so that the external force does not directly act on the first electrode 100, and the first electrode 100 can always maintain stable structure, so that the plasma generating device of the present application can still maintain stable structure under the action of the external force, and the plasma generating device has a good plasma generating effect. In addition, after the dielectric layer 200 adopts the rigid material, since the dielectric layer 200 is wound on the first electrode 100 and supported on the second electrode 300, no matter what material the first electrode 100 and the second electrode 300 are, the plasma generating device of the present application has a rigid structure, and further the stability and reliability of the plasma generating device of the present application are better.

It should be further understood that, in the plasma generating device, the dielectric layer 200 should be made of an insulating material, so when the dielectric layer 200 is made of a rigid material, the dielectric layer 200 has a rigid insulating property, and such material also has a characteristic of high temperature resistance and stable internal structure, so that the dielectric layer 200 of the present application can not be easily broken down by the discharge action between the first electrode 100 and the second electrode 300 after being made of the rigid material, so that the plasma generating device of the present application can stably operate under a larger input voltage, and further generate more sufficient amount of plasma and other additional products, and finally, the plasma generating efficiency of the plasma generating device of the present application is higher.

In the plasma generating device according to the embodiment of the present application, the dielectric layer 200 is disposed between the first electrode 100 and the second electrode 300, so that dielectric barrier discharge is formed between the first electrode 100 and the second electrode 300 after the first electrode is powered on. The dielectric layer 200 surrounds at least a portion of the first electrode 100, and the second electrode 300 surrounds at least a portion of the dielectric layer 200, such that the second electrode 300 surrounds the first electrode 100, which increases the discharge area between the first electrode 100 and the second electrode 300, such that more plasma is generated between the first electrode 100 and the second electrode 300. The dielectric layer 200 is made of a rigid material, so that the plasma generating device has excellent structural strength and stability.

In some embodiments, the dielectric layer 200 provided between the first electrode 100 and the second electrode 300 may function as a dielectric barrier discharge, and it should be further understood that the space between the first electrode 100 and the second electrode 300 may affect the discharge efficiency of the plasma generating device, and when the space between the first electrode 100 and the second electrode 300 is too large, the voltage applied to the first electrode 100 or the second electrode 300 may be larger, so that the plasma can be generated by discharge. Therefore, in order to make the interval between the first electrode 100 and the second electrode 300 of the present application relatively small, the interval between the outer wall and the inner wall of the dielectric layer 200 of the present application may be set to be not more than 0.8mm, that is, the thickness dimension of the dielectric layer 200 is not more than 0.8mm, and in this dimension range, the dielectric layer 200 may play a role of dielectric barrier discharge, and at the same time, the interval between the first electrode 100 and the second electrode 300 located at opposite sides of the dielectric layer 200 may not be too large, so that a sufficient amount of plasma may be generated without having to pass through a large voltage to the first electrode 100 or the second electrode 300.

In some embodiments, in order to make the structure of the plasma generating device of the present application more compact, it may be achieved by reducing the overall size of the dielectric layer 200. Specifically, the interval between the opposite sides of the outer peripheral surface of the dielectric layer 200 of the present application may be set to 1mm to 3mm, and in this size range, the overall size of the dielectric layer 200 is not excessively large on the premise of playing a role in dielectric barrier discharge.

Specifically, when the cross section of the dielectric layer 200 in the axial direction of the dielectric layer 200 is circular, the outer diameter of the dielectric layer 200 is between 1mm and 3mm, and when the cross section of the dielectric layer 200 in the axial direction of the dielectric layer is rectangular, the distance between the opposite sides is between 1mm and 3mm.

In some embodiments, in order to further make the plasma generating apparatus of the present application compact, it may be achieved by reducing the distance between the first electrode 100 and the dielectric layer 200. The dielectric layer 200 is disposed around at least a portion of the first electrode 100, so that the dielectric layer 200 has an inner wall facing the first electrode 100, and the inner wall of the first electrode 100 can be disposed to be in contact with the first electrode 100, so that the space between the first electrode 100 and the dielectric layer 200 is relatively minimum, and thus, regardless of the space between the second electrode 300 and the dielectric layer 200, the space between the first electrode 100 and the second electrode 300 can be reduced when the space between the first electrode 100 and the dielectric layer 200 is reduced, and after the space between the first electrode 100 and the second electrode 300 is reduced, the voltage of the current flowing into the first electrode 100 or the second electrode 300 can be relatively smaller, so that sufficient plasma can be generated, and the structure of the plasma generating device of the application is more compact and the power consumption is lower.

Specifically, when the dielectric layer 200 is disposed completely around the first electrode 100, the dielectric layer 200 has a cavity therein for accommodating the first electrode 100, the first electrode 100 may be disposed in the cavity of the dielectric layer 200, and the first electrode 100 is tightly adhered to an inner wall of the cavity of the dielectric layer 200, so that the first electrode 100 is tightly adhered to the dielectric layer 200. Therefore, the cavity shape of the cavity of the dielectric layer 200 for accommodating the first electrode 100 is configured corresponding to the shape of the first electrode 100, so that the outer surface of the first electrode 100 can be closely attached to the dielectric layer 200.

In addition, it should be understood that the dielectric layer 200 of the present application has a rigid structure, so that the structural stability of the dielectric layer 200 is better, when the dielectric layer 200 is wound on the first electrode 100 and is attached to the first electrode 100, the structural dielectric layer 200 can keep the cavity shape of the cavity or the groove shape of the accommodating groove of the dielectric layer 200 for accommodating the first electrode 100 stable, so that the attaching effect of the first electrode 200 and the dielectric layer 200 is better, and further, the plasma generating device of the present application can keep the structure compact all the time.

In some embodiments, in order to further reduce the space between the first electrode 100 and the second electrode 300, the space between the second electrode 300 and the dielectric layer 200 may be reduced, specifically, the second electrode 300 may be disposed to be attached to the dielectric layer 200, and the space between the second electrode 300 and the dielectric layer 200 may be reduced, so that the space between the second electrode 300 and the first electrode 100 may be reduced in case the space between the second electrode 300 and the dielectric layer 200 is reduced, regardless of the space between the first electrode 100 and the dielectric layer 200. When the distance between the first electrode 100 and the second electrode 300 is reduced, the voltage of the current flowing into the first electrode 100 or the second electrode 300 can be relatively smaller, so that a sufficient amount of plasma can be generated, and the plasma generating device has a more compact structure and lower power consumption.

When the first electrode 100 and the second electrode 300 are simultaneously attached to the dielectric layer 200, the space between the first electrode 100 and the second electrode 300 can be relatively minimized.

In addition, when the second electrode 300 is attached to the dielectric layer 200, the second electrode 300 may be disposed around a portion of the dielectric layer 200, so that at least a portion of the dielectric layer 200 is not disposed on a side of the dielectric layer 200 facing away from the first electrode 100, and the dielectric layer 200 is wound around the dielectric layer. When the first electrode 100 or the second electrode 300 is powered on, the plasma generated between the first electrode 100 and the second electrode 300 may be located on the portion of the dielectric layer 200 not wound by the second electrode 300, so as to avoid the plasma being blocked between the second electrode 300 and the dielectric layer 200 when the second electrode 300 completely winds and adheres to the dielectric layer 200.

Specifically, the second electrode 300 of the present application may be an integrally formed metal mesh structure, a porous metal plate structure, a metal wire wound around the first electrode 100, or a plurality of metal wires spaced around the first electrode 100.

When the second electrode 300 adopts a metal mesh structure, the metal mesh structure has a plurality of meshes on the surface thereof, and the mesh portion of the metal mesh structure is not wound around and attached to the dielectric layer 200, so that a portion of the dielectric layer 200 may be exposed, and thus plasma generated between the first electrode 100 and the second electrode 300 may occur at the mesh portion of the metal mesh structure.

When the second electrode 300 adopts a porous metal plate structure, a plurality of through holes are formed on the surface of the porous metal plate, and when the porous metal plate is wound on the second electrode 300, the through holes of the porous metal plate are not wound on and attached to the dielectric layer 200, so that the dielectric layer 200 can be partially exposed, and therefore, the plasma generated between the first electrode 100 and the second electrode 300 can appear at the through holes of the porous metal plate.

When the second electrode 300 employs a metal wire wound around the dielectric layer 200, the metal wire is wound around a portion of the dielectric layer 200 and is attached to the dielectric layer 200, and thus, plasma generated between the first electrode 100 and the second electrode 300 may occur at a portion of the dielectric layer 200 that is not attached to the metal wire. When the second electrode 300 is wound around the metal lines provided in the dielectric layer 200 at a plurality of intervals, plasma generated between the first electrode 100 and the second electrode 300 may occur in a region between the plurality of metal lines.

In some embodiments, in order to make the discharge area of the plasma generating device of the present application larger, and the generated plasma distribution more uniform. The second electrode 300 may be disposed at a uniform distance from the first electrode 100 in a direction in which the second electrode 300 is disposed around the dielectric layer 200.

Specifically, in the direction in which the second electrode 300 is disposed around the dielectric layer 200, the second electrode 300 has a side facing the first electrode 100, and accordingly, the first electrode 100 also has a side facing the second electrode 300, and the pitches of the respective portions of the facing sides of the first electrode 100 and the second electrode 300 are uniform. Since the second electrode 300 is disposed around the first electrode 100, when the respective portions of the first electrode 100 and the second electrode 300 are spaced apart from each other uniformly, and the voltage of the current supplied to the first electrode 100 or the second electrode 300 is stabilized, the intensity of the electric field generated in the region of the second electrode 300 around the first electrode 100 is uniform, thereby making the amount of generated plasma uniform.

Furthermore, it should be further understood that since the distance between the first electrode 100 and the second electrode 300 determines the difficulty of generating plasma, it is relatively more difficult to generate plasma if the distance between the first electrode 100 and the second electrode 300 is relatively large and it is relatively easier to generate plasma if the distance between the first electrode 100 and the second electrode 300 is relatively small, in the case that the voltage of the current supplied to the first electrode 100 or the second electrode 300 is not changed. If the distance between the second electrode 300 and the first electrode 100 is unequal or the difference is more significant in the direction in which the second electrode 300 surrounds the first electrode 100, the current inputted to the first electrode 100 or the second electrode 300 flows more easily to the portion having the relatively smaller distance between the first electrode 100 and the second electrode 300, so that the portion having the relatively smaller distance between the first electrode 100 and the second electrode 300 is more likely to generate plasma, and more difficult to flow to the portion having the larger distance between the first electrode 100 and the second electrode 300, which may result in more uneven plasma generated between the first electrode 100 and the second electrode 300.

Therefore, when the distance between the first electrode 100 and the second electrode 300 is consistent in the direction that the second electrode 300 winds the first electrode 100, the electric field distribution between the first electrode 100 and the second electrode 300 can be more uniform, so that the plasma generated between the first electrode 100 and the second electrode 300 can be more uniform, and finally, the plasma generated by the plasma generating device can be uniformly distributed.

In some embodiments, in order to further uniformly distribute the plasma generated between the first electrode 100 and the second electrode 300, the inner wall-to-outer wall spacing of the thickness of the dielectric layer 200 is uniform, that is, the thickness dimension of the dielectric layer 200 is uniform, in the direction in which the second electrode 300 surrounds the dielectric layer 200, that is, the second electrode 300 surrounds the first electrode 100, such that the inner wall-to-outer wall dimension of the dielectric layer 200 between the second electrode 300 and the first electrode 100 is uniform. Since the dielectric layer 200 plays a role of dielectric barrier discharge, the thickness of the dielectric layer 200 affects the efficiency and performance of the dielectric discharge, and the thickness of the dielectric layer 200 is sized such that the electric field distribution formed between the first electrode 100 and the second electrode 300 is more uniform.

In the direction of the first electrode 100 around the second electrode 300, the distance between the first electrode 100 and the second electrode 300 is consistent, and the size from the inner wall to the outer wall of the dielectric layer 200 is consistent, the electric field distribution generated between the first electrode 100 and the second electrode 300 can be more uniform, and the generated plasma distribution can be more uniform.

In some embodiments, since the dielectric layer 200 is made of a rigid material, the dielectric layer 200 may be made of quartz, and the quartz material has good insulating properties, so that the dielectric layer has an excellent dielectric barrier discharge effect. In addition, quartz also has good high temperature resistance, so that under the condition that the first electrode 100 or the second electrode 300 is electrified with higher voltage to generate high temperature, the performance and the structural stability of the dielectric layer 200 can not be affected, and the stability of the plasma generating device is better. In addition, dielectric layer 200 may also be made of high boric acid glass.

By using a quartz glass material for the dielectric layer 200, the dielectric layer 200 can satisfy the characteristics of a rigid insulating material.

In some embodiments, in order to make the structural strength of the plasma generating device of the present application better, the first electrode 100 of the present application may also be made of a rigid material, so that the first electrode 100 itself has better structural strength and stability, and the structural strength of the plasma generating device of the present application is better when the first electrode 100 is matched with the dielectric layer 200 made of the rigid material around the first electrode 100. In addition, the first electrode 100 is made of a rigid material, and after the first electrode 100 is wound by the dielectric layer 200, the first electrode 100 and the dielectric layer 200 may support each other.

Specifically, the first electrode 100 of the present application may be a tungsten wire, which has the characteristics of high temperature resistance and high structural strength.

Example two

Based on the above plasma generating device, the embodiment of the application also provides a purifying device, which comprises the plasma generating device.

Specifically, the cleaning device includes a base 400 and a mesh enclosure 500, wherein the base 400 is a base member of the cleaning device of the present application, the base 400 may provide a mounting base for at least some other parts of the cleaning device, and the plasma generating device may be disposed on the base 400. Specifically, the base 400 may be provided with a power line connected to the first electrode 100 or the second electrode 300 of the plasma generating device to supply current to the plasma generating device. The screen 500 is disposed on the base 400, and the screen 500 covers the plasma generator, the surface of the screen 500 is provided with an air inlet 510, and air outside the screen 500 can enter the screen 500 through the air inlet of the screen 500 to contact with the plasma generator disposed in the screen 500, so that pollutants in the air are decomposed and purified.

Specifically, the surface of the mesh enclosure 500 is a mesh structure, so that the surface of the mesh enclosure 500 can be shaped to form a plurality of air inlets 510, and the interior of the mesh enclosure 200 is provided with a cavity, when the mesh enclosure 500 is covered with the plasma generating device, the plasma generating device is located in the cavity of the mesh enclosure 500, and the mesh enclosure 500 can surround the plasma generating device in the cavity of the mesh enclosure 500, so that the mesh enclosure 500 can also play a role in protecting the plasma generating device.

After the plasma generating device is electrified, the electric field between the first electrode 100 and the second electrode 300 can generate high energy and active components, the high energy and the active components are mainly distributed on the surface of the dielectric layer 200, the energy and the active components can eliminate pollutants in air, and the air outside the screen 500 enters the screen 500 and then contacts with the plasma generating device, so that the pollutants in the air are removed.

It should be understood that, after the plasma generating device is charged with current, high energy and active components can be generated, and electromagnetic radiation can also be generated, after the plasma generating device is covered in the mesh enclosure 500, air outside the mesh enclosure 500 can enter the mesh enclosure 500 to be in contact with the plasma generating device through the air inlet 510 of the mesh enclosure 500, and the mesh enclosure 500 can play a role in shielding electromagnetic radiation generated by the plasma generating device, so that the electromagnetic radiation generated by the plasma generating device is prevented from affecting other electrical equipment and human bodies.

In some embodiments, the purification device of the present application may further be provided with an air flow channel, the air flow channel has an air flow, the mesh enclosure 500 is disposed in the air flow channel, the flow direction of the air flow may be set towards the mesh enclosure 500, the air flow may make the air outside the mesh enclosure 500 enter into the mesh enclosure 500 more efficiently to contact with the plasma generating device, and since the air flow may only enter into the mesh enclosure 500 through the air inlet 510 of the mesh enclosure 500, the part of the mesh enclosure 500 surface except the air inlet 510 may play a role of blocking the air flow, after the air flow contacts with the mesh enclosure 500 surface, the air flow may flow along the mesh enclosure 500 surface to the air inlet 510 of the mesh enclosure 500, and then enter into the mesh enclosure 500 through the air inlet 510 of the mesh enclosure 500, so that the flow velocity of the air flow may be reduced, and accordingly, the time for the air flow with relatively lower flow velocity to enter into the mesh enclosure 500 is longer to contact with the plasma generating device in the mesh enclosure 500, so that the plasma generating device may purify the air more sufficiently.

It should be understood that the above air flow channel refers to a space having an air flow, and specifically, the air flow channel may be an air inlet side, an air outlet side, or an area between the air inlet side and the air outlet side of the wind generating and guiding device, where the air inlet side and the air outlet side of the wind generating and guiding device may generate flowing air flow, and thus, the purifying device of the present application may be disposed on the air inlet side, the air outlet side, or the area between the air inlet side or the air outlet side of the wind generating and guiding device.

In addition, it should be understood that the above air flow channel may be an air flow space formed by natural wind, so that the purifying device of the present application may be further placed in an area with good natural ventilation effect, so that the purpose of purifying and filtering the air flow in the air flow channel may be achieved.

In addition, because the dielectric layer 200 to the plasma generating device is rigid, the plasma generating device is a rigid structural member, and thus when the plasma generating device is arranged in the net cover 500, after the air flow flows into the net cover 500 to be contacted with the plasma generating device, the plasma generating device cannot be disturbed by the air flow, so that the arrangement position of the plasma generating device in the net cover 500 can be kept stable, and finally the purifying effect of the purifying device is consistent.

In some embodiments, the purification device of the present application may further be provided with a catalyst layer, and the mesh enclosure 500 may be used as a load of the catalyst layer, so that the catalyst layer may be disposed on the mesh enclosure 500, and thus, after the air contacts with the mesh enclosure 500, the air may be catalyzed and oxidized by the catalyst layer disposed on the mesh enclosure 500, so as to purify and decompose part of pollutants in the air, thereby making the purification effect of the purification device of the present application better.

In some embodiments, the number of plasma generating devices of the present application may be plural, and the plurality of plasma generating devices may be disposed on the base 400, and the power line of the base 400 may be connected in parallel with the plurality of plasma generating devices, so that the voltages input to the respective plasma generating devices are consistent, and further the purifying effects of the respective plasma generating devices are consistent.

Specifically, a plurality of plasma generating devices may be disposed around the susceptor 400, and the flow direction of the air flow in the air flow passage may be set to intersect with the axial direction of the plasma generating devices, so that the contact area of the air flow in the air flow passage and the plasma generating devices may be larger, thereby making the air purification more sufficient.

Of course, in other embodiments, when the number of plasma generating devices is plural, the number of mesh enclosure 500 may be plural, and the plurality of mesh enclosure 500 may be respectively covered by the plurality of plasma generating devices. The number of the net covers 500 may also be set to one, and one net cover 500 may cover a plurality of plasma generating devices, and the specific number of the net covers 500 is not limited in this application.

Example III

Based on the purification device, the embodiment of the application also provides an air conditioning system, which comprises the purification device. Specifically, the purification device can be arranged at an air inlet or an air outlet of the air conditioning system, and air flows are arranged at the air inlet and the air outlet of the air conditioner, so that the air entering the air conditioner or pollutants in the air discharged by the air conditioner can be purified and decomposed by the purification device.

In the description of the present specification, a description referring to terms "one embodiment," "some embodiments," "examples," "specific examples," or "some examples," etc., means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present utility model. In this specification, schematic representations of the above terms are not necessarily directed to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Further, one skilled in the art can engage and combine the different embodiments or examples described in this specification.

Claims

1. A plasma generating apparatus, comprising:

a first electrode (100),

a dielectric layer (200) wound around at least part of the first electrode (100), and

a second electrode (300) disposed around at least a portion of the dielectric layer (200), the first electrode (100) being disposed opposite the second electrode (300),

the dielectric layer (200) is made of a rigid material, and the inner wall of one side of the dielectric layer (200) facing the first electrode (100) is attached to the first electrode (100), so that plasma generated by the plasma generating device is located on one side of the dielectric layer (200) facing away from the first electrode (100).

2. The plasma-generating device as recited in claim 1, characterized in that the medium layer (200) has an outer diameter of 1mm-3mm.

3. The plasma-generating device according to claim 1 or 2, characterized in that the distance from the inner wall of the dielectric layer (200) to the outer wall of the dielectric layer (200) is not more than 0.8mm.

4. The plasma generator according to claim 1, wherein the second electrode (300) is wound around a portion of the dielectric layer (200) and is attached to the dielectric layer (200).

5. The plasma-generating device according to claim 1, characterized in that the second electrode (300) is spaced apart from the first electrode (100) in a direction in which the second electrode (300) surrounds the dielectric layer (200).

6. The plasma generator according to claim 1, wherein the current input to the first electrode (100) or the second electrode (300) is an alternating current or pulsed electricity with a frequency of more than 20 Khz.

7. The plasma-generating device as recited in claim 1, characterized in that the dielectric layer (200) is made of quartz.

8. The plasma-generating device according to claim 1, characterized in that the first electrode (100) is made of a rigid material.

9. The plasma generator according to claim 8, wherein the material of the first electrode (100) is tungsten.

10. A cleaning apparatus comprising a plasma-generating device as claimed in any one of claims 1 to 9.

11. The purification device of claim 10, further comprising a base (400) and a mesh enclosure (500), wherein the plasma generating device is disposed on the base (400), the mesh enclosure (500) encloses the plasma generating device, and the mesh enclosure (500) is provided with an air inlet (510).

12. The purification apparatus of claim 11, further comprising a catalyst layer applied to the mesh enclosure (500).

13. The purification apparatus according to claim 11 or 12, further comprising an air flow channel, wherein the mesh enclosure (500) is arranged in the air flow channel, and wherein the air flow direction in the air flow channel is towards the mesh enclosure (500).

14. The apparatus of claim 13, wherein the number of plasma generating devices is plural, and a plurality of the plasma generating devices are connected to the base (400) and distributed around the base (400), and the flow direction of the gas flow in the gas flow passage intersects with the axis of the plasma generating device.

15. An air conditioning system comprising a purification apparatus as claimed in any one of claims 10 to 14.