CN219163330U

CN219163330U - Semiconductor wafer detecting device

Info

Publication number: CN219163330U
Application number: CN202320078305.9U
Authority: CN
Inventors: 陈庆敏; 陈加朋; 李丙科; 张桉民
Original assignee: Wuxi Songyu Technology Co ltd
Current assignee: Wuxi Songyu Technology Co ltd
Priority date: 2023-01-10
Filing date: 2023-01-10
Publication date: 2023-06-09
Anticipated expiration: 2033-01-10

Abstract

The utility model discloses a semiconductor wafer detection device, which comprises a lifting mechanism, a tray, a detection box, a separation table and a wafer container, wherein a plurality of wafers are stacked and contained in slots in the wafer container in a layered manner, a container cover body covers the outside of the wafer container, the lifting mechanism, the detection box and the separation table are respectively fixedly arranged on a frame of a process machine to drive the tray to lift up and down, and the wafer container with the wafers can be placed on the tray; the separating table is positioned right above the tray and is arranged corresponding to the tray; the separation platform is of a frame structure, the middle of the separation platform is hollow, the hollow position can be used for the wafer container to pass through, the detection box is arranged on the lower portion of one side of the separation platform along the length direction, and the detection box is horizontally arranged to face the hollow direction of the separation platform so as to detect the wafer. The utility model can accurately detect the accommodating state of the wafer, save detection time and protect the wafer detection photoelectric wafer detection device, and replaces the traditional device of installing the wafer detection device on the wafer taking manipulator.

Description

Semiconductor wafer detecting device

Technical Field

The utility model relates to the technical field of semiconductor manufacturing, in particular to a semiconductor wafer detection device.

Background

In the field of semiconductor manufacturing, a wafer housing container is often used, which houses a plurality of wafers in slots located in the wafer housing container, and allows the housed wafers to be moved in and out of the wafer housing container through an opening in the front portion of the wafer housing container. The wafer may have defects in different states, such as protruding, missing pieces, tilting, heavy pieces, etc., within the wafer holder. Therefore, detection of the wafer condition within the pod is necessary.

At present, most of the photodetectors for detecting the wafer state in the wafer container in the market are installed on a wafer taking manipulator, so that the manipulator needs to be modified, and the cost is high. Before taking out the wafer, the wafer needs to be subjected to protruding detection, and then a plurality of pieces of detection are performed, so that the whole wafer taking flow Cheng Shichang is increased. The wafer taking manipulator can unload wafers from the quartz boat and then is installed into the wafer container, the possible temperature is higher when the wafers are unloaded from the quartz boat, and the service life and the sensitivity of the wafer photoelectric detector on the wafer taking manipulator are easily influenced.

Disclosure of Invention

The applicant provides a semiconductor wafer detection device with reasonable structure, which can accurately detect the containing state of the wafer, save detection time and protect the wafer to detect the photoelectric wafer detection device, and replace the traditional device for mounting the wafer detection device on the wafer taking manipulator.

The technical scheme adopted by the utility model is as follows:

a semiconductor wafer detection device comprises a lifting mechanism, a tray, a detection box, a separation table and a wafer container, wherein a plurality of wafers are stacked and contained in slots in the wafer container in a layered manner, a container cover body covers the outer part of the wafer container, the lifting mechanism, the detection box and the separation table are respectively fixedly arranged on a frame of a process machine to drive the tray to lift up and down, and the wafer container with the wafers can be placed on the tray; the separating table is positioned right above the tray and is arranged corresponding to the tray; the separation platform is of a frame structure, the middle of the separation platform is hollow, the hollow position can be used for the wafer container to pass through, the detection box is arranged on the lower portion of one side of the separation platform along the length direction, and the detection box is horizontally arranged to face the hollow direction of the separation platform, so that the wafer on the wafer container passing through the hollow position of the separation platform is detected.

As a further improvement of the above technical scheme:

the lifting mechanism comprises a linear module and a lifting servo motor for driving the linear module, the linear module is vertically arranged, a tray is installed on a lifting arm of the linear module, and the linear module drives the tray to lift up and down.

The tray adopts square tray.

When the wafer container passes through the hollow position downwards from the upper part of the separating table, the container cover body is supported by the frame of the separating table to stay on the separating table, and the wafer container passes through the hollow position.

The detection box is internally provided with a rotating mechanism, the rotating mechanism comprises a rotating arm and a rotating cylinder, the upper surface of the rotating arm is provided with a wafer protruding photoelectric detector, and the end part of the rotating arm is provided with a wafer number photoelectric detector.

The box body of the detection box is provided with a rotary cylinder, and a rotary arm correspondingly driven by the rotary cylinder is arranged in the box body of the detection box.

The rotating arm is arranged on the output arm of the rotating cylinder and rotates, and extends out of the opening of the detection box and below the hollow position of the separation table.

The rotating mechanisms are arranged in two groups and are correspondingly arranged.

In the two sets of rotating mechanisms, the wafer protruding photoelectric detectors are oppositely arranged, and the wafer number photoelectric detectors face to the lower part of the hollow position of the separating table.

A magnetic switch is arranged on a rotary cylinder of the detection box, and whether the rotary arm rotates in place is detected.

The beneficial effects of the utility model are as follows:

when the process is performed in the process machine, the utility model can detect the wafers in the next batch, and the manipulator waits for taking the wafer after the detection of the wafers is finished, thereby saving the time. When the manipulator inserts the wafer into the quartz boat after taking the wafer, the wafer detection photoelectricity is far away from the furnace body, so that the service life and sensitivity of the wafer detection photoelectricity are protected. Because the photoelectric detector does not need to be arranged on the slice taking manipulator, the manipulator cost can be saved. When the wafer does not need to be detected, the detection photoelectric detector is retracted, so that the safety of the photoelectric detector is ensured. Compared with the traditional wafer detection mechanism, the utility model saves more space, time and cost and can ensure the service life and sensitivity of the detection photoelectricity.

Drawings

FIG. 1 is a schematic diagram of the present utility model.

FIG. 2 is a schematic diagram of the present utility model.

Fig. 3 is a schematic view of the lifting mechanism of the present utility model.

FIG. 4 is a schematic diagram of the cartridge of the present utility model in operation.

FIG. 5 is a schematic view of a cartridge of the present utility model.

In the figure: 100. a lifting mechanism; 101. a linear module; 102. a lifting servo motor; 200. a tray; 300. a detection box; 301. a rotation mechanism; 302. a rotating arm; 303. a rotary cylinder; 304. the wafer protrudes beyond the photodetector; 305. a wafer count photodetector; 306. a magnetic switch; 400. a separation stage; 500. a wafer holder; 501. a container cover; 600. and (3) a wafer.

Detailed Description

The following describes specific embodiments of the present utility model with reference to the drawings.

As shown in fig. 1 to 5, the semiconductor wafer inspection apparatus according to the present utility model includes a lifting mechanism 100, a tray 200, a inspection box 300, a separation table 400, a wafer holder 500, a plurality of wafers 600 stacked in layers in slots in the wafer holder 500, and the wafers 600 accommodated therein are moved in and out of the wafer holder 500 through an opening in a front portion of the wafer holder 500. The wafer container 500 has a container cover 501, which covers the exterior of the wafer container 500 from top to bottom, accommodates the wafer container 500 therein, and closes the opening at the front of the wafer container 500.

The lifting mechanism 100, the detection box 300 and the separation table 400 are respectively and fixedly installed on a frame of the process machine, the lifting mechanism 100 comprises a linear module 101 and a lifting servo motor 102 for driving the linear module 101, the linear module 101 is vertically arranged, the tray 200 is installed on a lifting arm of the linear module 101, the linear module 101 drives the tray 200 to lift up and down, and the wafer container 500 carrying the wafer 600 can be placed on the tray 200. The tray 200 is a square tray, and the separation table 400 is located right above the tray 200 and is disposed corresponding to the tray 200. The separation table 400 has a frame structure, the middle is hollow, the hollow position can be used for the wafer container 500 to pass through, when the wafer container 500 passes through the hollow position downwards from the upper side of the separation table 400, the container cover 501 is supported by the frame of the separation table 400 to stay on the separation table 400, and the wafer container 500 passes through the hollow position. The detection box 300 is arranged along the length direction of the side lower part of the separation table 400, the detection box 300 is horizontally arranged opposite to the hollow direction of the separation table 400, and the wafer 600 on the wafer container 500 passing through the hollow position of the separation table 400 can be detected.

The detection box 300 is provided with a rotating mechanism 301, the rotating mechanism 301 comprises a rotating arm 302 and a rotating cylinder 303, the box body of the detection box 300 is provided with the rotating cylinder 303, the box body of the detection box 300 is internally provided with the rotating arm 302 correspondingly driven by the rotating cylinder 303, the rotating arm 302 is mounted on an output arm of the rotating cylinder 303 and rotates, and the rotating arm 302 extends out of an opening of the detection box 300 and extends to the lower part of the hollow position of the separation table 400. The rotary arm 302 is rotated by the rotary cylinder 303 to retract into the inside of the cartridge 300 when not in operation. The rotation mechanisms 301 are preferably two groups and are correspondingly arranged. A wafer projecting photodetector 304 is provided on the upper surface of the rotary arm 302, and a wafer count photodetector 305 is provided at the end of the rotary arm 302. The wafer protrusion photo detector 304 can perform photo detection on the protrusion of the wafer 600, and the wafer count photo detector 305 can perform photo detection on the number of wafers 600, so as to complete detection on the problems such as protrusion, missing, inclination, heavy wafer, and the like of the wafer 600 in the wafer container 500. In the two sets of rotating mechanisms 301, the wafer protruding photodetectors 304 are disposed opposite to each other, and the wafer count photodetectors 305 face downward from the hollow position of the separation stage 400. A magnetic switch 306 is provided on the rotary cylinder 303 of the cartridge 300 to detect whether the rotary arm 302 is rotated into place.

In operation of the present utility model, first, a plurality of wafers 600 are stacked and accommodated in slots in the wafer accommodator 500, the accommodator cover 501 is covered outside the wafer accommodator 500, and the wafer accommodator 500 and the wafers 600 are accommodated in the accommodator cover 501. The tray 200 is mated with the separation stage 400, and the pod cover 501 and the wafer pod 500 are placed over the separation stage 400 and supported by the tray 200. When the wafer 600 in the wafer container 500 needs to be detected, the lifting servo motor 102 drives the linear module 101, the linear module 101 drives the tray 200 and the wafer container 500 to move downwards through the lifting arm, and the container cover 501 is left on the separation table 400.

When the wafer holder 500 carrying the wafer 600 moves down to the inspection start position of the inspection cassette 300, the rotating arm 302 of the inspection cassette 300 is rotated out. At this time, the wafer protrusion photodetector 304 and the wafer count photodetector 305 perform real-time synchronous detection on the wafer 600. When the wafer 600 is out of position or is missing, the wafer out-of-position photo detector 304 and the wafer count photo detector 305 send information to the control system, the rotary arm 302 of the detection box 300 rotates to retract, the wafer container 500 is retracted into the container cover 501 for correction, and then the wafer 600 detection procedure is performed again. When the wafer cassette 500 carrying the wafers 600 moves down to the inspection end position, the rotating arm 302 of the inspection cassette 300 rotates to retract for the next round of inspection or the inspection end. In this process, the magnetic switch 306 provided on the rotary cylinder 303 can detect whether the rotary arm 302 rotates in place, i.e. detect whether the wafer protrusion photodetector 304 and the wafer number photodetector 305 rotate out of place or rotate back into place, so as to ensure the safety of the detectors and the wafer 600.

The above description is illustrative of the utility model and is not intended to be limiting, and the utility model may be modified in any form without departing from the spirit of the utility model.

Claims

1. A semiconductor wafer detecting device is characterized in that: the wafer container comprises a lifting mechanism (100), a tray (200), a detection box (300), a separation table (400) and a wafer container (500), wherein a plurality of wafers (600) are stacked and contained in slots in the wafer container (500) in a layered manner, a container cover body (501) covers the outside of the wafer container (500), the lifting mechanism (100), the detection box (300) and the separation table (400) are respectively and fixedly installed on a frame of a process machine to drive the tray (200) to lift up and down, and the wafer container (500) carrying the wafers (600) can be placed on the tray (200); the separation table (400) is positioned right above the tray (200) and is arranged corresponding to the tray (200); the separation table (400) is of a frame structure, the middle of the separation table is hollow, the hollow position can be used for the wafer container (500) to pass through, the detection box (300) is arranged on the lower portion of one side of the separation table (400) along the length direction, the detection box (300) is horizontally arranged to face the hollow direction of the separation table (400), and the wafer (600) on the wafer container (500) passing through the hollow position of the separation table (400) is detected.

2. The semiconductor wafer detection apparatus according to claim 1, wherein: the lifting mechanism (100) comprises a linear module (101) and a lifting servo motor (102) for driving the linear module (101), the linear module (101) is vertically arranged, the tray (200) is installed on a lifting arm of the linear module (101), and the linear module (101) drives the tray (200) to lift up and down.

3. The semiconductor wafer detection apparatus according to claim 1, wherein: the tray (200) is a square tray.

4. The semiconductor wafer detection apparatus according to claim 1, wherein: when the wafer container (500) passes through the hollow position downwards from above the separation table (400), the container cover body (501) is supported by the frame of the separation table (400) and stays on the separation table (400), and the wafer container (500) passes through the hollow position.

5. The semiconductor wafer detection apparatus according to claim 1, wherein: the detection box (300) is provided with a rotating mechanism (301), the rotating mechanism (301) comprises a rotating arm (302) and a rotating cylinder (303), the upper surface of the rotating arm (302) is provided with a wafer protruding photoelectric detector (304), and the end part of the rotating arm (302) is provided with a wafer number photoelectric detector (305).

6. The semiconductor wafer detection apparatus according to claim 5, wherein: the box body of the detection box (300) is provided with a rotary cylinder (303), and the box body of the detection box (300) is internally provided with a rotary arm (302) correspondingly driven by the rotary cylinder (303).

7. The semiconductor wafer detection apparatus according to claim 6, wherein: the rotating arm (302) is arranged on the output arm of the rotating cylinder (303) and rotates, and the rotating arm (302) extends out of the opening of the detection box (300) and extends to the lower part of the hollow position of the separation table (400).

8. The semiconductor wafer detection apparatus according to claim 5, wherein: the rotation mechanisms (301) are arranged in two groups and are correspondingly arranged.

9. The semiconductor wafer detection apparatus according to claim 8, wherein: in the two sets of rotating mechanisms (301), the wafer protruding photodetectors (304) are arranged oppositely, and the wafer number photodetectors (305) face to the lower part of the hollow position of the separation table (400).

10. The semiconductor wafer detection apparatus according to claim 5, wherein: a magnetic switch (306) is arranged on a rotary cylinder (303) of the detection box (300) to detect whether the rotary arm (302) rotates in place.