CN219084312U - Detection mechanism for deposition equipment - Google Patents

Detection mechanism for deposition equipment Download PDF

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Publication number
CN219084312U
CN219084312U CN202222541459.5U CN202222541459U CN219084312U CN 219084312 U CN219084312 U CN 219084312U CN 202222541459 U CN202222541459 U CN 202222541459U CN 219084312 U CN219084312 U CN 219084312U
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gas
detection mechanism
deposition apparatus
port
detector
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肖礼达
赵超
安云富
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Shanghai Dingtai Craftsman Core Technology Co ltd
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Shanghai Dingtai Craftsman Core Technology Co ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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Abstract

The present application relates to a detection mechanism for a deposition apparatus. A detection mechanism for deposition equipment, includes gas detector and air duct, and gas detector has the air inlet, and the air duct is connected in gas detector, and the one end that the air duct was connected gas detector is linked together with the air inlet. Wherein the gas detector is used for detecting the concentration of the target gas entering the gas inlet. The detection mechanism can be applied to a narrow space, and the application range of the detection mechanism can be widened.

Description

Detection mechanism for deposition equipment
Technical Field
The application relates to the technical field of deposition equipment, in particular to a detection mechanism for deposition equipment.
Background
Wafer fabrication processes include oxidation, deposition, photolithography, etching, and ion implantation/diffusion processes. In the related art, wafers are generally deposited by using a deposition apparatus, and the gas tightness of the deposition apparatus directly affects the quality of the deposition of the wafers, for which purpose the gas tightness of the deposition apparatus needs to be detected, however, the conventional detection mechanism has application limitations.
Disclosure of Invention
Based on this, it is necessary to provide a detection mechanism for a deposition apparatus, which can detect the airtightness of the deposition apparatus, in view of the above-described technical problems.
The application provides a detection mechanism for a deposition apparatus, comprising:
a gas detector having a gas inlet; and
the air duct is connected to the gas detector, and one end of the air duct connected with the gas detector is communicated with the air inlet;
wherein the gas detector is used for detecting the concentration of target gas entering the gas inlet.
In one embodiment, the detection mechanism further comprises a gas collecting component with a preset size, wherein the gas collecting component is provided with a gas collecting port and a gas guide port communicated with the gas collecting port;
the air duct is connected between the gas detector and the gas collecting component, one end of the air duct is communicated with the air inlet, and the other end of the air duct is communicated with the air duct.
In one embodiment, the gas collecting component is configured into an arc structure, one side of the gas collecting component, which is away from the gas guide port, is provided with an arc surface, and a plurality of gas collecting ports are arranged on the arc surface at intervals along the arc length direction of the arc surface.
In one embodiment, the gas collecting member is configured as an elliptical arc structure, and the gas guide port is provided at one end of the elliptical arc structure in the long axis direction of the elliptical arc structure.
In one embodiment, one end of the air duct is detachably communicated with the air inlet, and the other end of the air duct is detachably communicated with the air duct.
In one embodiment, a first gas collecting part and a second gas collecting part which are arranged in an angle are arranged on one side, away from the gas guide port, of the gas collecting component, and the gas collecting port is arranged on the first gas collecting part and the second gas collecting part.
In one embodiment, the opening area of all the gas collecting ports is larger than the opening area of all the gas guiding ports.
In one embodiment, the detection mechanism further comprises a suction mechanism;
a first port is arranged at one end of the air duct, which is far away from the gas detector;
the suction mechanism is provided on the gas guide tube and is configured to be capable of sucking a target gas at the first port of the gas guide tube to the gas detector.
In one embodiment, the gas detector comprises a concentration sensor and an alarm electrically connected to the concentration sensor;
the concentration sensor is used for detecting the concentration of target gas entering the gas inlet;
the alarm is configured to emit an alarm signal when the concentration value detected by the concentration sensor is greater than or equal to a preset value.
In one embodiment, the detection mechanism comprises a converging air pipe and a plurality of air guide pipes, each air guide pipe is connected with the gas detector through the converging air pipe, and the converging air pipe is respectively communicated with the air inlet and one ends of the plurality of air guide pipes.
According to the detection mechanism for the deposition equipment, one end of the air duct, which is far away from the gas detector, can be extended into a narrow space at the joint of the air inlet pipe of the deposition equipment, so that the gas detector can collect and detect the air tightness at the joint of the air inlet pipe, and the gas leakage at the joint is prevented from affecting the deposition quality of a wafer.
Drawings
FIG. 1 shows a schematic structure of a deposition apparatus in an embodiment of the present application;
FIG. 2 shows a schematic structural view of a detection mechanism for a deposition apparatus in an embodiment of the present application;
FIG. 3 shows a schematic structural view of a detection mechanism for a deposition apparatus in another embodiment of the present application;
FIG. 4 shows a schematic structural view of a gas collecting member and a gas duct in an embodiment of the present application;
fig. 5 shows a schematic structural diagram of a gas collecting member and a gas duct in another embodiment of the present application.
In the figure: 10. a detection mechanism; 110. a gas detector; 111. an air inlet; 112. a concentration sensor; 113. an alarm; 114. a switch; 120. an air duct; 121. a first port; 130. a gas collecting member; 131. an air collecting port; 132. an air guide port; 133. a cambered surface; 134. a first gas collection portion; 135. a second gas collection portion; 140. an air extraction mechanism; 20. a deposition apparatus; 21. an apparatus main body; 22. an air inlet pipe; 221. a first tube; 222. a second tube; 223. a seal ring; 23. a pipe clamp assembly.
Detailed Description
In order to make the above objects, features and advantages of the present application more comprehensible, embodiments accompanied with figures are described in detail below. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present application. This application is, however, susceptible of embodiment in many other forms than those described herein and similar modifications can be made by those skilled in the art without departing from the spirit of the application, and therefore the application is not to be limited to the specific embodiments disclosed below.
In the description of the present application, it should be understood that the terms "center," "longitudinal," "transverse," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," etc. indicate orientations or positional relationships based on the orientation or positional relationships shown in the drawings, are merely for convenience in describing the present application and simplifying the description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be configured and operated in a particular orientation, and therefore should not be construed as limiting the present application.
Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include at least one such feature. In the description of the present application, the meaning of "plurality" is at least two, such as two, three, etc., unless explicitly defined otherwise.
In this application, unless specifically stated and limited otherwise, the terms "mounted," "connected," "secured," and the like are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; either directly or indirectly, through intermediaries, or both, may be in communication with each other or in interaction with each other, unless expressly defined otherwise. The specific meaning of the terms in this application will be understood by those of ordinary skill in the art as the case may be.
In this application, unless expressly stated or limited otherwise, a first feature "up" or "down" a second feature may be the first and second features in direct contact, or the first and second features in indirect contact via an intervening medium. Moreover, a first feature being "above," "over" and "on" a second feature may be a first feature being directly above or obliquely above the second feature, or simply indicating that the first feature is level higher than the second feature. The first feature being "under", "below" and "beneath" the second feature may be the first feature being directly under or obliquely below the second feature, or simply indicating that the first feature is less level than the second feature.
It will be understood that when an element is referred to as being "fixed" or "disposed" on another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and the like are used herein for illustrative purposes only and are not meant to be the only embodiment.
Wafer fabrication processes include oxidation, deposition, photolithography, etching, and ion implantation/diffusion processes. In the related art, wafers are generally deposited by using a deposition apparatus, and the gas tightness of the deposition apparatus directly affects the quality of the deposition of the wafers, for which purpose the gas tightness of the deposition apparatus needs to be detected, however, the conventional detection mechanism has application limitations.
The deposition apparatus includes an apparatus body and a gas pipe (including a gas inlet pipe and a gas outlet pipe) provided on the apparatus body. The inventor of the application finds that gas leakage easily occurs at the joint of the air pipe, so that the air tightness of the joint of the air pipe is required to be detected generally, but the space of the joint on the air pipe is narrow, and a traditional detection mechanism cannot extend into the narrow space, so that the traditional detection mechanism has application limitation.
In order to solve the problem that traditional detection mechanism exists the application limitation, this application has designed a detection mechanism, and detection mechanism includes gas detector and air duct, and the one end and the air inlet of gas detector of air duct are linked together, so, can keep away from the one end of gas detector with the air duct and stretch into narrow and small space department, for example stretch into the junction of the intake pipe of deposition equipment to detect the gas tightness of the junction of this intake pipe, can widen detection mechanism's range of application.
Fig. 1 shows a schematic structural view of a deposition apparatus 20 in an embodiment of the present application, and fig. 2 shows a schematic structural view of a detection mechanism 10 for the deposition apparatus 20 in an embodiment of the present application.
Referring to fig. 1 and 2, the deposition apparatus 20 includes an apparatus main body 21 and an air inlet pipe 22 disposed on the apparatus main body 21, the air inlet pipe 22 includes a first pipe 221, a second pipe 222, and a sealing ring 223 connected between the first pipe 221 and the second pipe 222, and a joint of the first pipe 221 and the second pipe 222 is fixed by a pipe collar assembly 23 to seal-connect the first pipe 221 and the second pipe 222.
Referring to fig. 2, a detection mechanism 10 for a deposition apparatus 20 according to an embodiment of the present application includes a gas detector 110 and a gas guide 120.
Wherein the gas detector 110 has a gas inlet 111, the gas guide tube 120 is connected to the gas detector 110, and one end of the gas guide tube 120 connected to the gas detector 110 is communicated with the gas inlet 111, and the gas detector 110 is used for detecting the concentration of the target gas entering the gas inlet 111.
In this way, the end of the air duct 120 far away from the gas detector 110 can be extended into a narrow space such as the joint of the air inlet pipe 22, the air tightness of the joint of the air inlet pipe 22 can be detected by the gas detector 110, for example, the end of the air duct 120 far away from the gas detector 110 can be extended into the pipe hoop assembly 23 of the deposition device 20, the air tightness of the joint of the air inlet pipe 22 can be detected, and thus, the detection mechanism 10 can be applied to the narrow space, the quality of the deposition of the wafer is prevented from being affected by the gas leakage of the joint, and the application range of the detection mechanism 10 is widened.
It should be noted that, because the temperature in the apparatus main body 21 of the deposition apparatus 20 is relatively high, the material of the air duct 120 may be a high temperature resistant material, for example, the material of the air duct 120 is nylon, so that the service life of the air duct 120 may be prolonged.
In some embodiments, referring to fig. 3, the detecting mechanism 10 further includes a gas collecting member 130 having a predetermined size, the gas collecting member 130 has a gas collecting port 131 and a gas guiding port 132 communicating with the gas collecting port 131, the gas guiding tube 120 is connected between the gas detector 110 and the gas collecting member 130, one end of the gas guiding tube 120 is communicated with the gas inlet 111, and the other end of the gas guiding tube 120 is communicated with the gas guiding port 132.
The gas collecting member 130 having a predetermined size means that the gas collecting member 130 is configured to be able to extend into a small space, and the gas collecting member 130 may be extended into a small space such as a joint of the gas inlet pipe 22 to be able to collect gas leaking from the joint of the gas inlet pipe 22. Such as extending the gas collecting member 130 into the pipe clamp assembly 23 of the deposition apparatus 20, it is convenient to collect the gas leaked from the joint of the gas inlet pipe 22, so as to detect the tightness of the joint of the gas inlet pipe 22 of the deposition apparatus 20 using the gas detector 110.
In some embodiments, the gas collecting member 130 is configured in an arc structure, a cambered surface 133 is disposed on a side of the gas collecting member 130 facing away from the gas guiding port 132, and a plurality of gas collecting ports 131 are disposed on the cambered surface 133 at intervals along the arc length direction of the cambered surface 133.
Since the gas collecting member 130 is constructed in an arc-shaped structure, it is convenient to extend the gas collecting member 130 into a small space such as the joint of the gas inlet pipe 22, and it is also convenient to collect the gas leaking from the joint of the gas inlet pipe 22 by using the plurality of gas collecting ports 131.
In some embodiments, the gas collecting member 130 is configured in an elliptical arc structure, and the gas guide opening 132 is provided at one end of the elliptical arc structure in the long axis direction of the elliptical arc structure.
It will be appreciated that the gas collecting member 130 of the elliptical arc structure can be well extended into a narrow space such as the joint of the gas inlet pipe 22, so that the gas collecting port 131 can collect the gas leaked from the joint of the gas inlet pipe 22.
In some embodiments, one end of the air duct 120 is in removable communication with the air inlet 111 and the other end of the air duct 120 is in removable communication with the air duct 132.
In this manner, the air duct 120 and the air collecting member 130 can be replaced as needed.
In some embodiments, referring to fig. 4 and 5, a first gas collecting portion 134 and a second gas collecting portion 135 are disposed on a side of the gas collecting member 130 facing away from the gas guiding port 132, and the first gas collecting portion 134 and the second gas collecting portion 135 are both provided with the gas collecting port 131.
The first gas collecting portion 134 and the second gas collecting portion 135 which are arranged at an angle can face to the part to be detected, such as a triangular connector is arranged on the gas inlet pipe 22, so that the first gas collecting portion 134 and the second gas collecting portion 135 which are arranged at an angle can face to the triangular connector, gas leaking from the triangular connector can be collected through the gas collecting ports 131 on the first gas collecting portion 134 and the second gas collecting portion 135, and the detection mechanism 10 can be used for conveniently detecting the gas tightness of different parts of the gas inlet pipe 22.
In some embodiments, the first and second gas collection portions 134, 135 are perpendicular to each other.
The whole that the perpendicular first gas collection portion 134 that connects and second gas collection portion 135 formed can semi-enclose in the triangle-shaped connects, conveniently collect the gas that this triangle-shaped connects department leaked through gas collection mouth 131 on first gas collection portion 134 and the second gas collection portion 135, be convenient for utilize this detection mechanism 10 to carry out the gas tightness detection to the different positions of intake pipe 22.
In some embodiments, the opening area of all the gas collecting ports 131 is larger than the opening area of all the gas guiding ports 132.
It will be appreciated that a negative pressure can be formed in the space between the gas collecting port 131 and the gas guiding port 132, and that the leaked gas can be better collected by the gas collecting member 130, so that the gas tightness of the gas inlet pipe 22 can be detected by the detecting mechanism 10.
In some embodiments, the gas detector 110 includes a concentration sensor 112 and an alarm 113 electrically connected to the concentration sensor 112, the concentration sensor 112 being configured to detect a concentration of a target gas entering the gas inlet 111, the alarm 113 being configured to emit an alarm signal when a concentration value detected by the concentration sensor 112 is greater than or equal to a preset value.
The target gas may be oxygen or other gases, etc.
One end of the gas-permeable pipe 120 far from the gas detector 110 extends into a narrow space such as the joint of the gas inlet pipe 22, and when the concentration value detected by the concentration sensor 112 is greater than or equal to a preset value, the alarm 113 can send an alarm signal to indicate that gas leakage exists in the narrow space such as the joint of the gas inlet pipe 22, so that maintenance can be performed in a targeted manner.
In some embodiments, the gas detector 110 further includes a power source electrically connected to the concentration sensor 112 and the alarm 113, respectively, to provide power to the concentration sensor 112 and the alarm 113.
In some embodiments, the gas detector 110 further includes a switch 114 electrically connected to the concentration sensor 112, the switch 114 being configured to control the opening and closing of the concentration sensor 112 to open or close the concentration sensor 112 as desired.
In some embodiments, detection mechanism 10 includes a converging air tube and a plurality of air tubes 120, each air tube 120 being connected to gas detector 110 by a converging air tube, and the converging air tube being in communication with inlet port 111 and one end of the plurality of air tubes 120, respectively.
In this manner, one end of the plurality of gas guide pipes 120 remote from the gas detector 110 may be disposed at different portions of the deposition apparatus 20, respectively, to detect the gas tightness of the different portions of the deposition apparatus 20. For example, one ends of the plurality of gas guide pipes 120, which are far from the gas detector 110, may be disposed at the joints of the plurality of gas inlet pipes 22 of the deposition apparatus 20 in a one-to-one correspondence manner, respectively, to detect the gas tightness at the joints of the plurality of gas inlet pipes 22, respectively.
In some embodiments, referring to fig. 2, the detecting mechanism 10 further includes a suction mechanism 140, where a first port 121 is disposed at an end of the gas tube 120 away from the gas detector 110, and the suction mechanism 140 is disposed on the gas tube 120 and configured to be capable of sucking the target gas at the first port 121 of the gas tube 120 to the gas detector 110.
When the first port 121 of the gas guide tube 120 is extended into a narrow space such as the joint of the gas inlet tube 22, the gas suction mechanism 140 may be used to suck the target gas at the joint of the gas inlet tube 22 to the gas detector 110, so that the gas detector 110 may perform the gas tightness detection on the joint of the gas inlet tube 22 more quickly and better, and the efficiency and effect of the gas tightness detection may be improved.
The air extraction mechanism 140 may be a micro fan, so that the air at the joint is sucked into the air detector 110 for detection by the air detector 110.
In some embodiments, detection mechanism 10 includes a gas detector 110, a gas conduit 120, and a gas-collecting member 130, with gas conduit 120 connected between gas detector 110 and gas-collecting member 130, one end of gas conduit 120 being in communication with gas inlet 111, and the other end of gas conduit 120 being in communication with gas conduit 132. The gas collecting member 130 has a predetermined size.
The gas collecting member 130 may be extended into the pipe clamp assembly 23 of the deposition apparatus 20 to facilitate collection of the gas leaked at the pipe clamp assembly 23, so as to detect the airtightness at the pipe clamp assembly 23 of the deposition apparatus 20 using the gas detector 110.
The technical features of the above-described embodiments may be arbitrarily combined, and all possible combinations of the technical features in the above-described embodiments are not described for brevity of description, however, as long as there is no contradiction between the combinations of the technical features, they should be considered as the scope of the description.
The above examples merely represent a few embodiments of the present application, which are described in more detail and are not to be construed as limiting the scope of the utility model. It should be noted that it would be apparent to those skilled in the art that various modifications and improvements could be made without departing from the spirit of the present application, which would be within the scope of the present application. Accordingly, the scope of protection of the present application is to be determined by the claims appended hereto.

Claims (10)

1. A detection mechanism for a deposition apparatus, comprising:
a gas detector (110) having a gas inlet (111); and
an air duct (120) connected to the gas detector (110), and one end of the air duct (120) connected to the gas detector (110) is communicated with the air inlet (111);
wherein the gas detector (110) is configured to detect a concentration of a target gas entering the gas inlet (111).
2. The detection mechanism for a deposition apparatus according to claim 1, wherein the detection mechanism (10) further comprises a gas collecting member (130) having a predetermined size, the gas collecting member (130) having a gas collecting port (131) and a gas guide port (132) communicating with the gas collecting port (131);
the gas guide pipe (120) is connected between the gas detector (110) and the gas collecting component (130), one end of the gas guide pipe (120) is communicated with the gas inlet (111), and the other end of the gas guide pipe (120) is communicated with the gas guide port (132).
3. The detection mechanism for a deposition apparatus according to claim 2, wherein the gas collecting member (130) is configured as an arc structure, a cambered surface (133) is provided on a side of the gas collecting member (130) facing away from the gas guiding port (132), and a plurality of gas collecting ports (131) are provided on the cambered surface (133) at intervals along an arc length direction of the cambered surface (133).
4. A detection mechanism for a deposition apparatus according to claim 3, wherein the gas collecting member (130) is configured as an elliptical arc structure, and the gas guide port (132) is provided at one end of the elliptical arc structure in a long axis direction of the elliptical arc structure.
5. The detection mechanism for a deposition apparatus according to claim 2, wherein one end of the air duct (120) is detachably communicated with the air inlet (111), and the other end of the air duct (120) is detachably communicated with the air guide port (132).
6. The detection mechanism for a deposition apparatus according to claim 2, wherein a first gas collecting portion (134) and a second gas collecting portion (135) which are arranged at an angle are provided on a side of the gas collecting member (130) facing away from the gas guide port (132), and the gas collecting port (131) is provided on both the first gas collecting portion (134) and the second gas collecting portion (135).
7. The detection mechanism for a deposition apparatus according to claim 2, wherein an opening area of all the gas collecting ports (131) is larger than an opening area of all the gas guiding ports (132).
8. The detection mechanism for a deposition apparatus according to any one of claims 1 to 7, wherein the detection mechanism (10) further comprises a suction mechanism (140);
a first port (121) is arranged at one end of the air duct (120) away from the gas detector (110);
the suction mechanism (140) is provided on the gas guide tube (120) and is configured to be able to suck a target gas at the first port (121) of the gas guide tube (120) to the gas detector (110).
9. The detection mechanism for a deposition apparatus according to any one of claims 1 to 7, wherein the gas detector (110) comprises a concentration sensor (112) and an alarm (113) electrically connected to the concentration sensor (112);
the concentration sensor (112) is used for detecting the concentration of target gas entering the gas inlet (111);
the alarm (113) is configured to emit an alarm signal when the concentration value detected by the concentration sensor (112) is greater than or equal to a preset value.
10. A detection mechanism for a deposition apparatus according to any one of claims 1 to 7, wherein the detection mechanism (10) comprises a converging gas pipe and a plurality of said gas-guide pipes (120), each of said gas-guide pipes (120) being connected to the gas detector (110) through said converging gas pipe, and said converging gas pipe being in communication with the gas inlet (111) and one end of the plurality of said gas-guide pipes (120), respectively.
CN202222541459.5U 2022-09-26 2022-09-26 Detection mechanism for deposition equipment Active CN219084312U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202222541459.5U CN219084312U (en) 2022-09-26 2022-09-26 Detection mechanism for deposition equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202222541459.5U CN219084312U (en) 2022-09-26 2022-09-26 Detection mechanism for deposition equipment

Publications (1)

Publication Number Publication Date
CN219084312U true CN219084312U (en) 2023-05-26

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