CN218898368U - Heating element and electronic atomization device - Google Patents

Abstract

The utility model relates to a heating component and an electronic atomization device, wherein the heating component comprises: a substrate having an interior cavity; the accommodating piece is at least partially arranged in the inner cavity, and an accommodating cavity is formed in the accommodating piece; and the plasma heater is arranged in the accommodating cavity. According to the plasma heating device, the atomized medium in the inner cavity is heated through the plasma heater, at least part of the accommodating piece is transversely arranged in the inner cavity, when the plasma heater is assembled in the accommodating cavity, the plasma heater transmits heat to the accommodating piece, and the contact area between the accommodating piece and the atomized medium in the inner cavity is increased due to the fact that the accommodating piece is at least partially arranged in the inner cavity, heating efficiency is improved, and preheating time is shortened.

Description

Heating element and electronic atomization device

Technical Field

The utility model relates to the technical field of atomization, in particular to a heating assembly and an electronic atomization device.

Background

The aerosol is a colloid dispersion system formed by dispersing and suspending solid or liquid small particles in a gaseous medium, and can be absorbed by a human body through a respiratory system, so that a novel alternative absorption mode is provided for a user, for example, an atomization device which can bake and heat an aerosol generating substrate of herbaceous or paste type to generate the aerosol is applied to different fields, and the aerosol which can be inhaled is delivered for the user to replace the conventional product form and suction absorption mode.

The atomizing device generally heats an aerosol-generating substrate, which is a substrate material that generates an aerosol upon heating, with a plasma heater. However, current plasma heaters have low heating efficiency and long preheating time due to the small contact area between the plasma heater and the aerosol-generating substrate when heating the aerosol-generating substrate.

Disclosure of Invention

Based on this, it is necessary to provide a heating element and an electronic atomizing device for solving the problems of low heating efficiency and long preheating time caused by the small contact area between the plasma heater and the aerosol-generating substrate.

In a first aspect, the present application provides a heating assembly comprising:

a base body having an interior cavity for carrying an atomizing medium;

the accommodating piece is at least partially arranged in the inner cavity, and an accommodating cavity is formed in the accommodating piece; a kind of electronic device with high-pressure air-conditioning system

The plasma heater is arranged in the accommodating cavity.

In some embodiments, the substrate comprises a bottom wall and a side wall surrounding the periphery of the bottom wall, and the bottom wall and the side wall jointly surround to form the inner cavity;

the side wall is provided with a through hole in a penetrating mode along the direction intersecting with the axial direction of the base body, and the accommodating piece penetrates through the through hole and is arranged in the inner cavity.

In some embodiments, the heating assembly includes a seal disposed sealingly between the bore wall of the through bore and the receptacle.

In some embodiments, when the container is inserted into the cavity through the through hole, a distance between a bottommost end of the container and the bottom wall is greater than zero.

In some embodiments, the receptacle is configured as a discharge tube, and the plasma heater includes a first electrode and a second electrode each extending at least partially into the discharge tube, with a controlled generation of an arc within the discharge tube between the first electrode and the second electrode.

In some embodiments, the inner wall of the discharge tube is covered with an infrared radiation coating; and/or

The discharge tube is made of infrared radiation material.

In some embodiments, the substrate comprises a bottom wall and a side wall surrounding the periphery of the bottom wall, and the bottom wall and the side wall jointly surround to form the inner cavity;

the bottom wall is provided with a groove used for being connected with the accommodating piece, the accommodating piece is constructed into a semi-open groove-shaped structure, and the accommodating piece and the groove enclose together to form a discharge channel.

In some embodiments, the plasma heater includes a first electrode and a second electrode that each extend at least partially into the discharge channel, an arc being controlled to be generated between the first electrode and the second electrode within the discharge channel.

In some embodiments, the bottom wall is made of a high temperature resistant insulating material.

In some embodiments, the inner wall of the discharge channel is covered with an infrared radiation coating.

In a second aspect, the present application provides an electronic atomising device comprising a heating element as described above.

Above-mentioned heating element and electron atomizing device, the inner chamber is used for bearing atomizing medium, and the holding piece is used for holding plasma heater to heat the atomizing medium of intracavity through plasma heater, from this, locate the inner chamber with the at least part of holding piece, when plasma heater assembly in the holding intracavity, plasma heater will heat transfer to the holding piece on, and because holding piece is located the inner chamber at least part, thereby increase the area of contact of holding piece and intracavity medium, improved heating efficiency, shorten preheating time.

Drawings

FIG. 1 is a schematic diagram of an overall structure of a heating assembly according to one embodiment of the present application;

FIG. 2 is a top view of the heating assembly shown in FIG. 1;

FIG. 3 is a schematic cross-sectional view of the heating assembly shown in FIG. 1;

FIG. 4 is a schematic view of the overall structure of a heating assembly according to another embodiment of the present application;

FIG. 5 is a schematic perspective view of a substrate in the heating assembly of FIG. 4;

FIG. 6 is a schematic cross-sectional view of the substrate shown in FIG. 5;

reference numerals illustrate: 100. a heating assembly; 10. a base; 20. a receiving member; 30. a plasma heater; 40. a seal; 50. a discharge channel; 11. an inner cavity; 12. a bottom wall; 13. a sidewall; 31. a first electrode; 32. a second electrode; 121. a groove; a. axial direction.

Detailed Description

In order that the above objects, features and advantages of the utility model will be readily understood, a more particular description of the utility model will be rendered by reference to the appended drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present utility model. The present utility model may be embodied in many other forms than described herein and similarly modified by those skilled in the art without departing from the spirit of the utility model, whereby the utility model is not limited to the specific embodiments disclosed below.

In the description of the present utility model, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings are merely for convenience in describing the present utility model and simplifying the description, and do not indicate or imply that the device or element being referred to must have a specific orientation, be configured and operated in a specific orientation, and therefore should not be construed as limiting the present utility model.

Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include at least one such feature. In the description of the present utility model, the meaning of "plurality" means at least two, for example, two, three, etc., unless specifically defined otherwise.

In the present utility model, unless explicitly specified and limited otherwise, the terms "mounted," "connected," "secured," and the like are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; either directly or indirectly, through intermediaries, or both, may be in communication with each other or in interaction with each other, unless expressly defined otherwise. The specific meaning of the above terms in the present utility model can be understood by those of ordinary skill in the art according to the specific circumstances.

In the present utility model, unless expressly stated or limited otherwise, a first feature "up" or "down" a second feature may be the first and second features in direct contact, or the first and second features in indirect contact via an intervening medium. Moreover, a first feature being "above," "over" and "on" a second feature may be a first feature being directly above or obliquely above the second feature, or simply indicating that the first feature is level higher than the second feature. The first feature being "under", "below" and "beneath" the second feature may be the first feature being directly under or obliquely below the second feature, or simply indicating that the first feature is less level than the second feature.

It will be understood that when an element is referred to as being "fixed" or "disposed" on another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and the like are used herein for illustrative purposes only and are not meant to be the only embodiment.

Referring to fig. 1, a heating assembly 100 according to an embodiment of the present utility model includes a substrate 10, a receiving member 20, and a plasma heater 30. Wherein the base body 10 has an inner space 11 for carrying an atomizing medium. The accommodating element 20 is at least partially disposed in the inner cavity 11, and an accommodating cavity is formed in the accommodating element 20. In addition, a plasma heater 30 is disposed in the receiving chamber.

The base body 10 has an interior 11 formed therein, the interior 11 being adapted to carry an atomizing medium to be heated. The atomizing medium to be heated in the inner chamber 11 may be a paste-like substance or other medium without a fixed form.

The accommodating part 20 is used for carrying the plasma heater 30, that is, the plasma heater 30 is accommodated in the accommodating cavity and can generate heat in the accommodating cavity and transfer the heat to the accommodating part 20.

The receiving element 20 is at least partially disposed in the interior cavity 11, in particular, the receiving element 20 is at least partially disposed transversely to the interior cavity 11. When the plasma heater 30 transfers heat to the accommodating member 20, the contact area between the accommodating member 20 and the atomized medium to be heated in the inner cavity 11 is larger, so that the heating efficiency can be improved, and the preheating time can be shortened.

The accommodating cavity formed in the accommodating member 20 may be an accommodating cavity formed in the accommodating member 20 itself, or may be an accommodating cavity formed by connecting the accommodating member 20 and the inner wall of the base 10, or may be an accommodating cavity formed by enclosing the accommodating member 20 and the inner wall of the base 10, or may be an accommodating cavity formed in the accommodating member 20 and between the accommodating member 20 and the inner wall of the base 10.

Specifically, the base 10 may be configured as a cylindrical structure, and the inner cavity 11 is correspondingly configured as a cylindrical cavity structure formed inside the base 10. The accommodating element 20 is transversely arranged on the base body 10 along the radial direction of the base body 10, namely, the accommodating element 20 is perpendicular to the axial direction a of the base body 10. Therefore, on the basis of being convenient for processing and forming, the length of the accommodating piece 20 in the inner cavity 11 can reach the maximum value, and the contact area between the accommodating piece 20 and the atomizing medium in the inner cavity 11 is further improved.

In some other embodiments, the accommodating element 20 may also penetrate the base body 10 along other directions intersecting the axial direction a of the base body 10, for example, the accommodating element 20 may be obliquely disposed in the inner cavity 11. Of course, the substrate 10 may be configured in a cubic structure or other structures, and the inner cavity 11 may be configured in a cubic cavity structure or other cavity structures, which will not be described herein.

In the conventional heating assembly, the plasma heater is generally disposed at the bottom of the substrate, that is, the bottom wall of the cavity in the inner cavity of the substrate is in a planar structure, and the plasma heater is buried at the bottom of the substrate. Thus, the contact area between the atomizing medium in the inner chamber and the chamber bottom wall of the inner chamber 11 is the surface area of the chamber bottom wall of the inner chamber. When the plasma heater heats, heat is transferred to the cavity bottom wall of the inner cavity, so that the area of the heating position of the cavity bottom wall of the inner cavity is smaller than the surface area of the cavity bottom wall of the inner cavity, and the heating efficiency is low, and the preheating time is long.

Based on this, in the present application, the plasma heater 30 is capable of generating heat inside the container 20 and transferring the heat to the container 20. Because the accommodating part 20 is at least partially transversely arranged in the inner cavity 11, the contact area between the accommodating part 20 and the atomized medium in the inner cavity 11 is larger, so that the heating efficiency can be improved, and the preset time can be shortened.

Referring to fig. 2 and 3, in some embodiments, the substrate 10 includes a bottom wall 12 and a side wall 13 surrounding the bottom wall 12, and the bottom wall 12 and the side wall 13 together form an inner cavity 11. The side wall 13 is provided with a through hole in a penetrating manner along the direction intersecting with the axial direction a of the base body 10, and the accommodating piece 20 is arranged in the inner cavity 11 in a penetrating manner through the through hole.

The inner cavity 11 is formed by enclosing the bottom wall 12 and the side wall 13, so that the inner cavity 11 is of a cavity structure with an open top, and the atomized medium in the inner cavity 11 is heated and atomized and then diffused from the open top.

Specifically, a through hole is formed in the sidewall 13 along the radial direction of the base 10, so that the accommodating member 20 can be inserted into the inner cavity 11 through the through hole.

Since the inner cavity 11 is used as a container for carrying the atomizing medium and a carrier for heating the atomizing medium, the bottom wall 12 and the side wall 13 can be made of insulating materials such as quartz or ceramics. In addition, the thickness of the sidewall 13 may be set between 0.3mm and 1mm, ensuring the structural stability of the substrate 10, and facilitating the opening of the through-holes in the sidewall 13.

In some embodiments, the heating assembly 100 includes a seal 40, the seal 40 being sealingly disposed between the wall of the through-hole and the receptacle 20.

When the accommodating piece 20 is penetrated in the inner cavity 11 through the through hole, the sealing piece 40 is arranged between the accommodating piece 20 and the hole wall of the through hole, so that the sealing performance between the accommodating piece 20 and the hole wall of the through hole is improved, and the integrity of the whole structure of the heating assembly 100 is ensured.

Specifically, the sealing member 40 may be configured as a sealing ring matching with the receiving member 20 and the through hole, so as to be sealed between the receiving member 20 and the wall of the through hole. In addition, the sealing mode can also select to fuse the accommodating piece 20 and the hole wall of the through hole to form an integral structure, so that the sealing performance between the accommodating piece 20 and the hole wall of the through hole is improved.

In some embodiments, when the container 20 is inserted into the cavity 11 through the through hole, the distance between the bottom end of the container 20 and the bottom wall 12 is greater than zero.

Specifically, the accommodating member 20 is configured as a hollow cylindrical tubular structure, and the inner diameter of the through hole is matched with the outer diameter of the accommodating member 20, so that the accommodating member 20 can be smoothly inserted into the inner cavity 11 through the through hole. Furthermore, the receiving element 20 is arranged in the interior space 11 in the radial direction of the base body 10, i.e. in a direction parallel to the bottom wall 12 of the interior space 11. The distance between the bottommost end of the accommodating part 20 and the bottom wall 12 is set to be larger than zero, so that on one hand, the contact area between the accommodating part 20 and the atomizing medium in the inner cavity 11 can be increased, and the heating efficiency is improved as much as possible. On the other hand, cleaning of the receiving member 20 can also be facilitated.

In some embodiments, the pod 20 is configured as a discharge tube and the plasma heater 30 includes a first electrode 31 and a second electrode 32 that each extend at least partially into the discharge tube, with a controlled generation of an arc within the discharge tube between the first electrode 31 and the second electrode 32.

Specifically, when the discharge tube is inserted into the inner cavity 11 through the through hole, two ends of the discharge tube extend out of the inner cavity 11, at least part of the first electrode 31 and the second electrode 32 extend into the discharge tube from two ends of the discharge tube respectively, an arc is generated by breakdown between the first electrode 31 and the second electrode 32 powered by alternating current, and then plasma is formed by ionizing gas in the discharge tube, and the plasma heats the discharge tube, so that an atomization medium in the inner cavity 11 is heated and atomized.

When the first electrode 31 and the second electrode 32 extend into the discharge tube from both ends of the discharge tube, respectively, the first electrode 31 and the second electrode 32 may be disposed at a distance of between 4mm and 10mm in the discharge tube. The materials of the first electrode 31 and the second electrode 32 may be alloy copper, stainless steel, nickel and nickel-based alloy, tungsten, zirconium, hafnium, and other metal materials according to the discharge gas.

The ac power supply is applied to the first electrode 31 and the second electrode 32, so that the uniformity of ablation of the first electrode 31 and the second electrode 32 can be ensured, and the uniformity of heating of the discharge tube by the plasma can be ensured.

Further, the inert gas is filled in the discharge tube, after the arc is generated by breakdown between the first electrode 31 and the second electrode 32 in the discharge tube, the inert gas filled in the discharge tube can be ionized to form plasma and generate heat, and the generated heat can be efficiently transferred to the substrate 10 through the inert gas, so that the heat transfer efficiency is improved. For example, the discharge tube may be filled with a process gas such as argon, nitrogen, air, or carbon dioxide.

In addition, the discharge tube is constructed in a cylindrical tubular structure, and the discharge tube may be made of quartz, silicon oxide, aluminum oxide, zirconium oxide, or the like.

In some embodiments, the inner wall of the discharge vessel is covered with an infrared radiation coating and/or the material of the discharge vessel is an infrared radiation material.

When the first electrode 31 and the second electrode 32 ionize the gas in the discharge tube to form plasma and heat the discharge tube, the discharge tube can also form infrared rays radiated to the inner cavity 11, so that the medium is heated by high-temperature infrared radiation, and the heating efficiency is further improved.

Referring to fig. 4, 5 and 6, in some embodiments, the bottom wall 12 is provided with a groove 121 for connecting with the accommodating element 20, the accommodating element 20 is configured as a semi-open groove structure, and the accommodating element 20 and the groove 121 jointly enclose to form the discharge channel 50.

Specifically, the bottom wall 12 of the base 10 is provided with a groove 121, and the accommodating member 20 is provided with a semi-open groove structure, and the notch of the accommodating member 20 and the notch of the groove 121 on the bottom wall 12 are connected to each other, so as to jointly enclose and form the discharge channel 50.

It should be noted that the recess 121 on the bottom wall 12 may be configured in a circular, oval or rectangular shape, and correspondingly, the accommodating element 20 may also be configured in a circular, oval or rectangular shape matching the recess 121. In addition, the accommodating element 20 may be disposed separately from the bottom wall 12 of the base 10, that is, the accommodating element 20 is connected to the bottom wall 12 of the base 10 by a connection method such as welding. Of course, the accommodating element 20 may also be integrally formed with the bottom wall 12 of the base 10, and the specific structure may be adjusted according to actual situations, which will not be described herein.

Further, at least part of the first electrode 31 and the second electrode 32 extend into the discharge channel 50 from two ends of the discharge channel 50 respectively, an arc is generated by breakdown between the first electrode 31 and the second electrode 32 powered by alternating current, and then plasma is formed by ionizing gas in the discharge channel 50, so that the container 20 heats up, and the atomized medium in the inner cavity 11 is heated and atomized.

Similarly, when the first electrode 31 and the second electrode 32 extend into the discharge channel 50 from both ends of the discharge channel 50, respectively, the distance between the first electrode 31 and the second electrode 32 in the discharge channel 50 may be set between 4mm and 10 mm. In addition, the ac power supply is used for the first electrode 31 and the second electrode 32, so that the uniformity of ablation of the first electrode 31 and the second electrode 32 can be ensured, and the uniformity of heating of the container 20 by the plasma can be ensured.

In some embodiments, the bottom wall 12 is made of a high temperature resistant insulating material. Thus, when the first electrode 31 and the second electrode 32 ionize the gas and form plasma in the discharge channel 50 formed by the holder 20 and the bottom wall 12 together, smooth progress of the ionization reaction can be ensured.

Further, the inner wall of the discharge channel 50 is covered with an infrared radiation coating. When the first electrode 31 and the second electrode 32 ionize the gas inside the discharge channel 50 to form plasma and heat the discharge channel 50, the discharge channel 50 can also form infrared rays radiated to the inner cavity 11, thereby heating the medium by high-temperature infrared radiation and further improving the heating efficiency.

Based on the same concept as the heating assembly 100 described above, the present application also provides an electronic atomizing device including the heating assembly 100 described above.

When the device is specifically used, at least part of the first electrode 31 and the second electrode 32 extend into the accommodating cavity from two ends of the accommodating piece 20 respectively, an arc is generated by breakdown between the first electrode 31 and the second electrode 32 which are powered by alternating current, and then plasma is formed by ionizing gas in the accommodating cavity, so that the accommodating piece 20 heats up by the plasma. Because the container 20 is wholly or partially located in the inner cavity 11, the atomized medium in the inner cavity 11 contacts the container 20, and the container 20 heats and atomizes the atomized medium in the inner cavity 11.

The technical features of the above-described embodiments may be arbitrarily combined, and all possible combinations of the technical features in the above-described embodiments are not described for brevity of description, however, as long as there is no contradiction between the combinations of the technical features, they should be considered as the scope of the description.

The above examples illustrate only a few embodiments of the utility model, which are described in detail and are not to be construed as limiting the scope of the utility model. It should be noted that it will be apparent to those skilled in the art that several variations and modifications can be made without departing from the spirit of the utility model, which are all within the scope of the utility model. Accordingly, the scope of protection of the present utility model is to be determined by the appended claims.

Claims (11)

1. A heating assembly, comprising:

a base body having an interior cavity for carrying an atomizing medium;

the accommodating piece is at least partially arranged in the inner cavity, and an accommodating cavity is formed in the accommodating piece; a kind of electronic device with high-pressure air-conditioning system

The plasma heater is arranged in the accommodating cavity.

2. The heating assembly of claim 1, wherein the base comprises a bottom wall and a side wall surrounding an outer periphery of the bottom wall, the bottom wall and the side wall together surrounding to form the interior cavity;

the side wall is provided with a through hole in a penetrating mode along the direction intersecting with the axial direction of the base body, and the accommodating piece penetrates through the through hole and is arranged in the inner cavity.

3. The heating assembly of claim 2, comprising a seal disposed sealingly between the bore wall of the through bore and the receptacle.

4. The heating assembly of claim 2, wherein a distance between a bottommost end of the receiver and the bottom wall is greater than zero when the receiver is threaded through the through hole in the interior cavity.

5. The heating assembly of claim 2, wherein the receptacle is configured as a discharge tube, the plasma heater comprising a first electrode and a second electrode each extending at least partially into the discharge tube, an arc being controlled to be generated within the discharge tube between the first electrode and the second electrode.

6. The heating assembly of claim 5, wherein the inner wall of the discharge tube is coated with an infrared radiation coating; and/or

The discharge tube is made of infrared radiation material.

7. The heating assembly of claim 1, wherein the base comprises a bottom wall and a side wall surrounding an outer periphery of the bottom wall, the bottom wall and the side wall together surrounding to form the interior cavity;

the bottom wall is provided with a groove used for being connected with the accommodating piece, the accommodating piece is constructed into a semi-open groove-shaped structure, and the accommodating piece and the groove enclose together to form a discharge channel.

8. The heating assembly of claim 7, wherein the plasma heater comprises a first electrode and a second electrode each extending at least partially into the discharge channel, an arc being controlled to be generated between the first electrode and the second electrode within the discharge channel.

9. The heating assembly of claim 7, wherein the bottom wall is made of a high temperature resistant insulating material.

10. The heating assembly of claim 7, wherein an inner wall of the discharge channel is coated with an infrared radiation coating.

11. An electronic atomizing device comprising a heating assembly as set forth in any one of claims 1-10.

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