CN218875099U - Nano-polishing stock solution separation device - Google Patents
Nano-polishing stock solution separation device Download PDFInfo
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- CN218875099U CN218875099U CN202320025600.8U CN202320025600U CN218875099U CN 218875099 U CN218875099 U CN 218875099U CN 202320025600 U CN202320025600 U CN 202320025600U CN 218875099 U CN218875099 U CN 218875099U
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract
The utility model belongs to the technical field of the technique of nanometer polishing and specifically relates to a nanometer polishing stock solution separator is related to, this nanometer polishing stock solution separator is including polishing electrically conductive groove and liquid reserve tank, and the electrically conductive groove of polishing is used for circular telegram to polish the work piece, and the liquid reserve tank is used for storing, heating polishing solution and provides the polishing solution to polishing electrically conductive inslot. The utility model discloses a nanometer polishing stock solution separator, when polishing, only need to put into the liquid reserve tank with the polishing solution that polishing work piece needs and heat, need not heat together the polishing solution of prediction loss, then the polishing solution that the heating finishes gets into the polishing electrically conductive groove, then when polishing the work piece, put into the liquid reserve tank with prediction loss polishing solution again and heat, then carry out the fluid infusion to the polishing solution of polishing electrically conductive inslot, the preparation operating time of plasma nanometer polishing prophase has been reduced, the purpose that improves plasma nanometer polishing work efficiency has been reached.
Description
Technical Field
The utility model belongs to the technical field of the technique of nanometer polishing and specifically relates to a nanometer polishing stock solution separator is related to.
Background
The polishing process is always an important link in the production and manufacturing process of metal products, the currently common polishing method mainly adopts mechanical or manual polishing, the plasma nano polishing technology is a green polishing method aiming at metal workpieces, workpieces with complex shapes can be efficiently polished, waste liquid which is difficult to treat is not generated in the polishing process, and the conventional polishing methods such as mechanical polishing, chemical polishing, electrolytic polishing and the like can be replaced.
In the existing plasma nano polishing equipment, a polishing conductive groove and a liquid storage cavity are of an integrated structure. Because can produce a large amount of vapor in the nanometer polishing, lead to the polishing solution to produce quantitative loss, when a box undertakes two functions of processing and deposit liquid simultaneously, need the volume of box big, put into the polishing solution of prediction loss in advance in the box, just can satisfy the demand guarantee to the polishing solution of processing man-hour, therefore the injection liquid of current plasma nanometer polishing equipment in the preliminary preparation work and for liquid heating need spend long time, lead to the production efficiency of plasma nanometer polishing to hang down.
In view of the foregoing, there is a need for a nano-polishing stock solution separation device.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a nanometer polishing stock solution separator to the plasma nanometer polishing prophase that exists among the solution prior art prepares operating time long, leads to the technical problem that production efficiency is low.
In order to solve the technical problem, the utility model provides a pair of nanometer polishing stock solution separator, this nanometer polishing stock solution separator are including polishing electrically conductive groove and liquid reserve tank, and the electrically conductive groove of polishing is used for circular telegram to polish the work piece, and the liquid reserve tank is used for storing, heating polishing solution and provides the polishing solution to the electrically conductive inslot of polishing.
Through the improved technical scheme, the polishing conductive groove and the liquid storage tank are separated into two bodies, and the polishing liquid with expected loss does not need to be contained any more, so that the volume of the polishing conductive groove can be reduced to the size of containing a workpiece, the volume of the polishing conductive groove is reduced, and the probability of damage faults of the polishing conductive groove is reduced; when polishing is carried out, only polishing solution required by a polished workpiece is put into the liquid storage tank to be heated, the polishing solution with expected loss is not required to be heated together, then the polishing solution after heating enters the polishing conductive groove, then the polishing solution with expected loss is put into the liquid storage tank to be heated when the workpiece is polished, then the polishing solution in the polishing conductive groove is replenished, the preparation working time of the plasma nano polishing in the front period is shortened, and the purpose of improving the working efficiency of the plasma nano polishing is achieved.
Furthermore, a conveying device is arranged between the liquid storage tank and the polishing conductive groove, and the conveying device is used for conveying the polishing liquid in the liquid storage tank to the polishing conductive groove.
Through above-mentioned modified technical scheme, set up conveyor, utilize conveyor to carry the polishing solution in the liquid reserve tank to the guide groove in, speed and convenience when promoting the liquid reserve tank to carry the polishing solution to the guide groove in.
Further, conveyor includes conveyer pipe, valve and actuating pump, and the both ends of conveyer pipe are connected with the electrically conductive groove of liquid reserve tank and polishing respectively, and actuating pump and valve are installed on the conveyer pipe, and the actuating pump is used for providing power and carries the polishing solution in the liquid reserve tank to the electrically conductive inslot of polishing through the conveyer pipe, and the valve is used for controlling opening and close of conveyer pipe.
Through above-mentioned modified technical scheme, at first the valve that rotates opens the conveyer pipe, then start the actuating pump, the actuating pump provides power and carries the polishing solution to the electrically conductive inslot of polishing in with the liquid reserve tank, when heating the polishing solution of follow-up prediction loss, closes the actuating pump and closes the valve again.
Further, conveyor includes conveyer pipe and valve, and the valve is installed on the conveyer pipe, and the valve is used for controlling opening and close of conveyer pipe, and the conveyer pipe slope sets up, and the liquid reserve tank is located the one end that the conveyer pipe is high, and the electrically conductive groove of polishing is located the one end that the conveyer pipe is low, and the polishing solution in the liquid reserve tank gets into the electrically conductive inslot of polishing through the conveyer pipe.
Through above-mentioned modified technical scheme, open the valve, utilize the effect of gravity, make the polishing solution flow to the electrically conductive groove of polishing through the delivery pipe, need not extra power and can realize carrying the polishing solution in the liquid reserve tank to the electrically conductive inslot of polishing.
Furthermore, the lateral wall fixedly connected with level gauge of liquid reserve tank, the level gauge is used for showing the liquid level height of polishing solution in the liquid reserve tank.
Through the improved technical scheme, the liquid level height of the polishing solution is observed through the liquid level meter, so that excessive addition of the polishing solution is avoided, the situation that the driving pump continues to work after the polishing solution is conveyed to the bottom is avoided, and the liquid level height of the polishing solution in the liquid storage tank is visible.
Furthermore, a liquid inlet is formed in the top end of the liquid storage tank and used for adding polishing liquid into the liquid storage tank.
Furthermore, inlet department is provided with the filter screen, and the filter screen is used for filtering the polishing solution that gets into the liquid reserve tank through the inlet.
Further, the filter screen is connected with the liquid reserve tank through fixed frame, fixed frame and liquid reserve tank fixed connection, and the filter screen is laid in fixed frame, and fixed connection can be dismantled with fixed frame to the filter screen.
Through above-mentioned modified technical scheme, when having used polishing solution to processing and carrying out reuse, set up the filter screen and filter the polishing solution, avoid impurity to get into the polishing solution in the liquid reserve tank.
Furthermore, a heating rod is arranged in the liquid storage tank and used for heating polishing liquid in the liquid storage tank.
Adopt above-mentioned technical scheme, the utility model discloses following beneficial effect has:
the utility model provides a nanometer polishing stock solution separator, will polish electrically conductive groove and liquid reserve tank separation for two individuals, because no longer need hold the polishing solution of prediction loss, can reduce the volume of polishing electrically conductive groove to hold the work piece size can, reduce the volume of polishing electrically conductive groove, reduce the probability of polishing electrically conductive groove damage trouble; when polishing is carried out, only polishing solution required by a polished workpiece is put into the liquid storage tank to be heated, the polishing solution with expected loss is not required to be heated together, then the polishing solution after heating enters the polishing conductive groove, then the polishing solution with expected loss is put into the liquid storage tank to be heated when the workpiece is polished, then the polishing solution in the polishing conductive groove is replenished, the preparation working time of the plasma nano polishing in the front period is shortened, and the purpose of improving the working efficiency of the plasma nano polishing is achieved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed to be used in the embodiments or the description in the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
Fig. 1 is a schematic structural diagram of a nano-polishing stock solution separation device according to an embodiment of the present invention;
FIG. 2 is a schematic structural view showing the position of the filter screen in the liquid storage tank;
fig. 3 is a schematic view showing the structure of the fixing frame in the liquid storage tank.
Reference numerals:
1. polishing the conductive groove; 2. a liquid storage tank; 21. a liquid inlet; 3. a filter screen; 4. a conveying device; 41. a delivery pipe; 42. a valve; 43. driving the pump; 5. a liquid level meter; 6. a fixing frame is provided.
Detailed Description
The technical solutions of the present invention will be described more clearly and completely with reference to the accompanying drawings, and it should be understood that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplification of description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected" and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.
The present invention will be further explained with reference to specific embodiments.
As shown in fig. 1, the nano-polishing, stock solution and separation device provided in this embodiment includes a polishing conductive groove 1 and a liquid storage tank 2, the polishing conductive groove 1 is used for conducting power to polish a workpiece, the liquid storage tank 2 is used for storing, heating and providing polishing liquid into the polishing conductive groove 1, a conveying device 4 is arranged between the liquid storage tank 2 and the polishing conductive groove 1, and the conveying device 4 is used for conveying the polishing liquid in the liquid storage tank 2 into the polishing conductive groove 1.
When polishing, only polishing solution required by a polished workpiece is put into the liquid storage tank 2 to be heated, the polishing solution with expected loss is not required to be heated together, then the polishing solution after heating enters the polishing conductive groove 1, then the polishing solution with expected loss is put into the liquid storage tank 2 to be heated when the workpiece is polished, then the polishing solution in the polishing conductive groove 1 is replenished, the preparation working time of the plasma nano polishing in the early period is shortened, and the purpose of improving the working efficiency of the plasma nano polishing is achieved.
As shown in fig. 1 and 2, a liquid level meter 5 is fixedly connected to a side wall of the liquid storage tank 2, and the liquid level meter 5 is used for displaying the liquid level of the polishing liquid in the liquid storage tank 2; a liquid inlet 21 is formed in the top end of the liquid storage tank 2, the liquid inlet 21 is used for adding polishing liquid into the liquid storage tank 2, a filter screen 3 is arranged at the liquid inlet 21, the filter screen 3 is used for filtering the polishing liquid entering the liquid storage tank 2 through the liquid inlet 21, the filter screen 3 is connected with the liquid storage tank 2 through a fixing frame 6 (as shown in fig. 3), the fixing frame 6 is fixedly connected with the liquid storage tank 2, in the embodiment, the fixing frame 6 is fixed with the side wall of the liquid storage tank 2 through a lacing wire, a support rod is fixedly connected to the bottom end of the fixing frame 6, two ends of the support rod are respectively fixedly connected with the fixing frame 6 and the liquid storage tank 2, the filter screen 3 is laid in the fixing frame 6, and the filter screen 3 is detachably and fixedly connected with the fixing frame 6; a heating rod is arranged in the liquid storage tank 2 and used for heating the polishing liquid in the liquid storage tank 2.
The conveying device 4 comprises a conveying pipe 41, a valve 42 and a driving pump 43, two ends of the conveying pipe 41 are respectively connected with the liquid storage tank 2 and the polishing conductive groove 1, the driving pump 43 and the valve 42 are installed on the conveying pipe 41, the driving pump 43 is used for providing power to convey polishing liquid in the liquid storage tank 2 to the polishing conductive groove 1 through the conveying pipe 41, and the valve 42 is used for controlling opening and closing of the conveying pipe 41.
In this embodiment, conveyor 4 can also only include conveyer pipe 41 and valve 42, and valve 42 is installed on conveyer pipe 41, and valve 42 is used for controlling opening and closing of conveyer pipe 41, only needs to set up conveyer pipe 41 slope, and liquid reserve tank 2 is located the high one end of conveyer pipe 41, and the electrically conductive groove 1 of polishing is located the low one end of conveyer pipe 41, and the polishing solution in liquid reserve tank 2 gets into the electrically conductive groove 1 of polishing through conveyer pipe 41 under the action of gravity.
The embodiment of the utility model provides a nanometer polishing stock solution separator's implementation principle does: when a workpiece is polished, firstly, polishing liquid required by polishing the workpiece is put into the liquid storage tank 2 through the liquid inlet 21, the polishing liquid in the liquid storage tank 2 is heated by the heating rod, and the polishing liquid with expected loss does not need to be added into the liquid storage tank 2; after the polishing solution is heated, opening the valve 42 to start the driving pump 43, driving the polishing solution in the liquid storage tank 2 to be conveyed into the polishing conductive tank 1 through the conveying pipe 41, and when the polishing solution in the polishing conductive tank 1 is enough to polish the workpiece, closing the driving pump 43 to close the valve 42 to polish the workpiece; meanwhile, the polishing liquid with expected loss is conveyed into the liquid storage tank 2 from the liquid inlet 21, the polishing liquid flowing into the liquid inlet 21 is filtered by the filter screen 3, the polishing liquid in the liquid storage tank 2 is heated by the heating rod, the polishing liquid is heated to a specified temperature and is kept warm, then the consumption degree of the polishing liquid in the polishing conductive groove 1 is observed, the polishing liquid in the polishing conductive groove 1 is replenished from the liquid storage tank 2 by the conveying device 4 until the plasma nano-polishing of the workpiece is completed, the preparation working time of the plasma nano-polishing in the front period is reduced, and the purpose of improving the working efficiency of the plasma nano-polishing is achieved.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; although the present invention has been described in detail with reference to the foregoing embodiments, it should be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; such modifications or substitutions do not depart from the scope of the invention in its corresponding aspects.
Claims (9)
1. The nanometer polishing, stock solution and separation device is characterized by comprising a polishing conductive groove (1) and a liquid storage tank (2), wherein the polishing conductive groove (1) is used for electrifying to polish a workpiece, and the liquid storage tank (2) is used for storing and heating polishing liquid and supplying the polishing liquid into the polishing conductive groove (1).
2. The nano-polishing stock solution separation device according to claim 1, wherein a conveying device (4) is arranged between the stock solution tank (2) and the polishing conductive tank (1), and the conveying device (4) is used for conveying the polishing solution in the stock solution tank (2) into the polishing conductive tank (1).
3. The nano-polishing stock solution separation device according to claim 2, wherein the conveying device (4) comprises a conveying pipe (41), a valve (42) and a driving pump (43), two ends of the conveying pipe (41) are respectively connected with the liquid storage tank (2) and the polishing conductive groove (1), the driving pump (43) and the valve (42) are installed on the conveying pipe (41), the driving pump (43) is used for providing power to convey polishing liquid in the liquid storage tank (2) to the polishing conductive groove (1) through the conveying pipe (41), and the valve (42) is used for controlling the opening and closing of the conveying pipe (41).
4. The nano-polishing liquid storage separation device according to claim 2, wherein the conveying device (4) comprises a conveying pipe (41) and a valve (42), the valve (42) is installed on the conveying pipe (41), the valve (42) is used for controlling the opening and closing of the conveying pipe (41), the conveying pipe (41) is obliquely arranged, the liquid storage tank (2) is located at one high end of the conveying pipe (41), the polishing conductive tank (1) is located at one low end of the conveying pipe (41), and the polishing liquid in the liquid storage tank (2) enters the polishing conductive tank (1) through the conveying pipe (41).
5. The nano-polishing stock solution separation device according to claim 1, wherein a liquid level meter (5) is fixedly connected to a side wall of the stock solution tank (2), and the liquid level meter (5) is used for displaying the liquid level of the polishing solution in the stock solution tank (2).
6. The nano-polishing stock solution separation device according to claim 1, wherein a liquid inlet (21) is formed at the top end of the stock solution tank (2), and the liquid inlet (21) is used for adding polishing solution into the stock solution tank (2).
7. The nano-polishing stock solution separation device according to claim 6, wherein a filter screen (3) is arranged at the liquid inlet (21), and the filter screen (3) is used for filtering the polishing solution entering the liquid storage tank (2) through the liquid inlet (21).
8. The nano-polishing stock solution separation device according to claim 7, wherein the filter screen (3) is connected with the liquid storage tank (2) through a fixing frame (6), the fixing frame (6) is fixedly connected with the liquid storage tank (2), the filter screen (3) is laid in the fixing frame (6), and the filter screen (3) and the fixing frame (6) are detachably and fixedly connected.
9. The nano-polishing stock solution separation device according to claim 1, wherein a heating rod is arranged in the stock solution tank (2) and used for heating the polishing solution in the stock solution tank (2).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320025600.8U CN218875099U (en) | 2023-01-05 | 2023-01-05 | Nano-polishing stock solution separation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320025600.8U CN218875099U (en) | 2023-01-05 | 2023-01-05 | Nano-polishing stock solution separation device |
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| Publication Number | Publication Date |
|---|---|
| CN218875099U true CN218875099U (en) | 2023-04-18 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202320025600.8U Active CN218875099U (en) | 2023-01-05 | 2023-01-05 | Nano-polishing stock solution separation device |
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| CN (1) | CN218875099U (en) |
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2023
- 2023-01-05 CN CN202320025600.8U patent/CN218875099U/en active Active
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