CN218728598U - Photoetching machine support and support assembly - Google Patents
Photoetching machine support and support assembly Download PDFInfo
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- CN218728598U CN218728598U CN202222741713.6U CN202222741713U CN218728598U CN 218728598 U CN218728598 U CN 218728598U CN 202222741713 U CN202222741713 U CN 202222741713U CN 218728598 U CN218728598 U CN 218728598U
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The utility model is suitable for a lithography machine technical field provides a lithography machine support and bracket component, including the bottom plate, the lower extreme left and right sides of bottom plate all installs the supporting leg, and the lower extreme inboard of supporting leg is provided with the locating lever, the locating lever is installed the regulation pole with the junction of supporting leg, and the lower extreme of locating lever is provided with the non slipping spur; the limiting column is arranged at the upper end of the bottom plate, a supporting plate is arranged on the outer side of the upper end of the limiting column, and a first connecting plate is arranged on the lower side of the supporting plate; the adjusting plate is arranged on the inner side of the second connecting plate, the lower end of the adjusting plate is provided with an installation rod, and a buffer plate is arranged at the joint of the installation rod and the oil cavity; the photoetching machine base is arranged on the upper side of the supporting plate, and mounting plates are arranged on the left side and the right side of the supporting plate. This photoetching machine support and bracket component are favorable to supporting the photoetching machine, have good location effect, and are favorable to removing the device.
Description
Technical Field
The utility model belongs to the technical field of the lithography machine, especially, relate to a lithography machine support and bracket component.
Background
Lithography machines are also known as: the exposure machine is aimed at to the mask, exposure system, lithography system etc. is the core equipment of making the chip, and it adopts the technique of similar photo development, prints the exposure of the meticulous figure on the mask version through light on the silicon chip, and putting of lithography machine needs the bracket component to support, but most devices that have now still have some defects, the utility model provides a new scheme is used for solving weak point wherein.
Chinese patent No. CN111381450a discloses a lithography machine frame and lithography machine, including the measuring support, the main substrate, Y is to interferometer support and linking arm, the lower bottom surface of measuring support is formed with an extension, two opposite lateral walls along Y on the extension are first lateral wall and second lateral wall respectively, the bottom surface along Y to the both sides that lie in the extension on the lower bottom surface of measuring support is first bottom surface and second bottom surface respectively, a recess has been seted up on the main substrate, the extension is located in the recess, and the measuring support is connected with the main substrate through first bottom surface and second bottom surface, Y is to interferometer support fixed connection in measuring support one end, the linking arm sets up in the main substrate, linking arm one end fixed connection is in Y to interferometer support, the other end fixed connection is in first lateral wall.
The above prior art solutions have the following drawbacks: it is inconvenient to support the lithography machine, the positioning effect is not good, and the device is inconvenient to move, so a support and a support assembly of the lithography machine are provided, so that the problems provided in the above are solved.
SUMMERY OF THE UTILITY MODEL
The utility model provides a photoetching machine support and bracket component aims at solving and is not convenient for support the photoetching machine, and positioning effect is not good, and is not convenient for carry out the problem that removes with the device.
The utility model is realized in such a way, a support and a support component of a photoetching machine, which comprises a bottom plate, wherein the left side and the right side of the lower end of the bottom plate are both provided with supporting legs, the inner sides of the lower ends of the supporting legs are provided with positioning rods, the joints of the positioning rods and the supporting legs are provided with adjusting rods, and the lower ends of the positioning rods are provided with anti-skidding blocks;
the limiting column is installed at the upper end of the bottom plate, a supporting plate is arranged on the outer side of the upper end of the limiting column, a return spring is installed at the joint of the supporting plate and the bottom plate, a first connecting plate is arranged on the lower side of the supporting plate, and a second connecting plate is installed at the joint of the first connecting plate and the bottom plate;
the adjusting plate is arranged on the inner side of the second connecting plate, the lower end of the adjusting plate is provided with an installation rod, an oil cavity arranged in the bottom plate is arranged below the installation rod, a buffer plate is arranged at the joint of the installation rod and the oil cavity, and a circulation hole is arranged in the buffer plate;
photoetching machine base, its upside at the backup pad of installing, the mounting panel is all installed to the left and right sides of backup pad, and the junction of mounting panel and photoetching machine base is provided with the locating rack to the adjusting bolt is installed to the junction of locating rack and mounting panel.
Preferably, the locating lever constitutes elevation structure in the inboard of supporting leg, and the locating lever is connected with the mode that the regulation pole adopted the screw thread.
Preferably, the first connecting plate forms a rotating structure at the lower side of the supporting plate, and the supporting plate forms an elastic telescopic structure at the outer side of the limiting column through a return spring.
Preferably, the adjusting plate constitutes a sliding structure at an inner side of the second engaging plate, and the adjusting plate constitutes a lifting structure at an upper side of the oil chamber by means of the mounting rod.
Preferably, the locating rack is connected with the photoetching machine base in a clamping mode, and the locating rack and the mounting plate are connected with the adjusting bolt in a threaded mode.
Preferably, the positioning frame forms a sliding structure at the inner side of the mounting plate, and the mounting plate forms a rotating structure at the upper side of the support plate.
Compared with the prior art, the beneficial effects of the utility model are that: this photoetching machine support and bracket component are favorable to supporting the photoetching machine, have good location effect, and are favorable to removing the device.
1. Set up first linkage plate and constitute rotating-structure in the downside of backup pad, and the regulating plate constitutes sliding structure in the inboard of second linkage plate, and the regulating plate constitutes elevation structure through the upside of installation pole at the oil pocket, can drive first linkage plate when the backup pad moves down and rotate, utilize second linkage plate to drive the regulating plate and descend, the cooperation backup pad passes through reset spring and constitutes elastic telescopic structure in the outside of spacing post, be favorable to reset spring to promote the backup pad, support the photoetching machine base through the backup pad, the effectual supporting effect who improves the device.
2. Set up the locating rack and constitute sliding construction in the inboard of mounting panel, and the mounting panel constitutes rotating-structure at the upside of backup pad, can slide the locating rack down after rotating the mounting panel, and the cooperation locating rack adopts the mode of block to be connected with the photo-etching machine base, is favorable to the locating rack to fix a position the photo-etching machine base, the effectual location effect that has improved the device.
3. Set up the locating lever and constitute elevation structure in the inboard of supporting leg, and the locating lever is connected with the mode that adjusts the pole and adopt the screw thread, can drive the locating lever rebound when rotating the regulation pole, cancel the non slipping spur to the support tight on ground, be convenient for remove the device, the effectual mobility that improves the device.
Drawings
Fig. 1 is a schematic view of the front cross-sectional structure of the present invention;
FIG. 2 is an enlarged schematic view of the structure at A of FIG. 1 according to the present invention;
figure 3 is a schematic side view in cross-section of the connection of a first connector tile to a second connector tile according to the present invention;
fig. 4 is an enlarged schematic structural diagram of the point B in fig. 1 according to the present invention.
In the figure: 1-a bottom plate, 2-supporting legs, 3-positioning rods, 4-adjusting rods, 5-anti-skidding blocks, 6-limiting columns, 7-supporting plates, 8-reset springs, 9-first connecting plates, 10-second connecting plates, 11-adjusting plates, 12-mounting rods, 13-oil chambers, 14-buffer plates, 15-circulation holes, 16-photoetching machine bases, 17-mounting plates, 18-positioning frames and 19-adjusting bolts.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
Referring to fig. 1-4, the present invention provides a technical solution of a support and a support assembly of a lithography machine: the anti-skid device comprises a bottom plate 1, supporting legs 2 are arranged on the left side and the right side of the lower end of the bottom plate 1, a positioning rod 3 is arranged on the inner side of the lower end of each supporting leg 2, an adjusting rod 4 is arranged at the joint of each positioning rod 3 and each supporting leg 2, and an anti-skid block 5 is arranged at the lower end of each positioning rod 3;
the limiting column 6 is arranged at the upper end of the bottom plate 1, a supporting plate 7 is arranged on the outer side of the upper end of the limiting column 6, a reset spring 8 is arranged at the joint of the supporting plate 7 and the bottom plate 1, a first connecting plate 9 is arranged on the lower side of the supporting plate 7, and a second connecting plate 10 is arranged at the joint of the first connecting plate 9 and the bottom plate 1;
the adjusting plate 11 is arranged on the inner side of the second connecting plate 10, the lower end of the adjusting plate 11 is provided with a mounting rod 12, an oil cavity 13 mounted in the bottom plate 1 is arranged below the mounting rod 12, a buffer plate 14 is arranged at the joint of the mounting rod 12 and the oil cavity 13, and a circulation hole 15 is arranged in the buffer plate 14;
the photoetching machine base 16 is arranged on the upper side of the supporting plate 7, mounting plates 17 are arranged on the left side and the right side of the supporting plate 7, a positioning frame 18 is arranged at the joint of the mounting plates 17 and the photoetching machine base 16, and an adjusting bolt 19 is arranged at the joint of the positioning frame 18 and the mounting plates 17.
When the photoetching machine support and support assembly is used, firstly, all parts are assembled, as shown in fig. 1 and 4, when the photoetching machine needs to be separated from the support plate 7, because the positioning frame 18 is connected with the photoetching machine base 16 in a clamping mode, and the positioning frame 18 and the mounting plate 17 are both connected with the adjusting bolt 19 in a threaded mode, the adjusting bolt 19 is rotated and taken out firstly, meanwhile, because the positioning frame 18 forms a sliding structure on the inner side of the mounting plate 17, and the mounting plate 17 forms a rotating structure on the upper side of the support plate 7, the positioning frame 18 slides upwards to prevent the photoetching machine base 16 from being fixed, then the mounting plate 17 rotates outwards, at the moment, the photoetching machine base 16 and the photoetching machine can be taken down from the support plate 7, when the device needs to be moved, the adjusting rod 4 rotates firstly, because the positioning rod 3 forms a lifting structure on the inner side of the support legs 2, and the positioning rod 3 is connected with the adjusting rod 4 in a threaded mode, so that the lower end of the anti-skid block 5 is not attached to the ground after the positioning rod 3 is lifted, at the moment, the bottom plate 1 can be pushed, and the universal wheels at the bottom of the support legs 2 can be moved.
As shown in fig. 1, 2 and 3, if the support plate 7 is bumpy during moving, the support plate 7 can rise and fall due to the fact that the first connecting plate 9 forms a rotating structure at the lower side of the support plate 7, the adjusting plate 11 forms a sliding structure at the inner side of the second connecting plate 10, the adjusting plate 11 forms a lifting structure at the upper side of the oil cavity 13 through the mounting rod 12, when the support plate 7 descends rapidly, the first connecting plate 9 and the second connecting plate 10 rotate, the adjusting plate 11 slides downwards, the mounting rod 12 slides downwards in the oil cavity 13 through the buffer plate 14, silicone oil in the oil cavity 13 rapidly passes through the through hole 15, the descending speed of the support plate 7 is reduced, and due to the fact that the support plate 7 forms an elastic telescopic structure at the outer side of the limiting column 6 through the return spring 8, the return spring 8 plays a role in pushing the support plate 7, and the support plate 7 rises and returns.
The above description is only exemplary of the present invention and should not be taken as limiting the scope of the present invention, as any modifications, equivalents, improvements and the like made within the spirit and principles of the present invention are intended to be included within the scope of the present invention.
Claims (6)
1. A support and support assembly for a lithography machine, comprising:
the anti-skidding device comprises a bottom plate, wherein supporting legs are arranged on the left side and the right side of the lower end of the bottom plate, positioning rods are arranged on the inner sides of the lower ends of the supporting legs, adjusting rods are arranged at the joints of the positioning rods and the supporting legs, and anti-skidding blocks are arranged at the lower ends of the positioning rods;
the limiting column is installed at the upper end of the bottom plate, a supporting plate is arranged on the outer side of the upper end of the limiting column, a return spring is installed at the joint of the supporting plate and the bottom plate, a first connecting plate is arranged on the lower side of the supporting plate, and a second connecting plate is installed at the joint of the first connecting plate and the bottom plate;
the adjusting plate is arranged on the inner side of the second connecting plate, the lower end of the adjusting plate is provided with an installation rod, an oil cavity arranged in the bottom plate is arranged below the installation rod, a buffer plate is arranged at the joint of the installation rod and the oil cavity, and a circulation hole is arranged in the buffer plate;
photoetching machine base, its upside at the backup pad of installing, the mounting panel is all installed to the left and right sides of backup pad, and the junction of mounting panel and photoetching machine base is provided with the locating rack to the adjusting bolt is installed to the junction of locating rack and mounting panel.
2. A lithography machine support and support assembly according to claim 1, wherein: the locating lever constitutes elevation structure in the inboard of supporting leg, and the locating lever adopts the mode of screw thread to be connected with the regulation pole.
3. A lithography machine frame and frame assembly according to claim 1, wherein: the first connecting plate forms a rotating structure at the lower side of the supporting plate, and the supporting plate forms an elastic telescopic structure at the outer side of the limiting column through a return spring.
4. A lithography machine support and support assembly according to claim 1, wherein: the adjusting plate forms a sliding structure on the inner side of the second connecting plate, and the adjusting plate forms a lifting structure on the upper side of the oil cavity through the mounting rod.
5. A lithography machine support and support assembly according to claim 1, wherein: the locating rack is connected with the photoetching machine base in a clamping mode, and the locating rack and the mounting plate are connected with the adjusting bolt in a threaded mode.
6. A lithography machine support and support assembly according to claim 1, wherein: the locating rack forms a sliding structure on the inner side of the mounting plate, and the mounting plate forms a rotating structure on the upper side of the supporting plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222741713.6U CN218728598U (en) | 2022-10-18 | 2022-10-18 | Photoetching machine support and support assembly |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222741713.6U CN218728598U (en) | 2022-10-18 | 2022-10-18 | Photoetching machine support and support assembly |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN218728598U true CN218728598U (en) | 2023-03-24 |
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ID=85585071
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202222741713.6U Active CN218728598U (en) | 2022-10-18 | 2022-10-18 | Photoetching machine support and support assembly |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN218728598U (en) |
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2022
- 2022-10-18 CN CN202222741713.6U patent/CN218728598U/en active Active
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