CN218689264U - Continuous slurry distributing device - Google Patents

Abstract

The utility model discloses a continuous type thick liquids distributor, continuous type thick liquids distributor includes casing and batching subassembly, the casing has the distribution chamber that holds the material chamber and be located its below, the distribution chamber includes finished product material distribution chamber and bed charge distribution chamber, finished product material distribution chamber diapire has first discharge gate, bed charge distribution chamber diapire has the second discharge gate, the batching subassembly includes distributing pipe and driving piece, the distributing pipe communicates with the feed inlet that holds the material chamber, the other end orientation distribution chamber of distributing pipe, and the central axis at distributing pipe both ends is spaced apart in the footpath of casing upwards, the driving piece can drive distributing pipe rotation a week and form batching district, on the horizontal projection face, batching district and bed charge distribution chamber and finished product material distribution chamber all at least partially coincide. The utility model discloses a continuous type thick liquids distributor can carry out the finished product of thick liquids simultaneously and carry work and the bed charge of thick liquids to stay and get the work, does continuous production, improves nanometer powder preparation efficiency.

Description

Continuous slurry distributing device

Technical Field

The utility model relates to a powder production facility technical field especially relates to a continuous type thick liquids distributor.

Background

The nano powder material is an important component of a new material, and has wide technical application prospect in the aspect of high-new fine chemical engineering.

At present, in order to ensure the uniformity of the prepared nano powder material, a seed crystal template method is usually adopted in a reaction kettle to prepare the nano powder material so as to control the growth structure of nano particles, so that a part of the nano powder slurry which is already used as a finished product is reserved as a seed crystal base material for many times in the preparation process, and the seed crystal base material is added into the reaction kettle to participate in the next preparation of the nano powder slurry.

In the related technology, the prepared nano powder slurry is generally conveyed by a funnel, when part of the nano powder slurry is left and taken, a conveying and feeding mechanism above the funnel needs to be stopped, equipment at a discharge port of the funnel is replaced by a reaction kettle so as to receive and take 'seed crystal base material', the process needs to intermittently prepare the nano powder, and the production efficiency is low.

SUMMERY OF THE UTILITY MODEL

The present invention aims at solving at least one of the technical problems in the related art to a certain extent.

Therefore, the embodiment of the utility model provides a continuous type thick liquids distributor, continuous type thick liquids distributor can carry out the finished product of nanometer powder thick liquids simultaneously and carry work and the bed charge of nanometer powder thick liquids to stay and get work, does continuous production, improves nanometer powder preparation efficiency.

The utility model discloses a continuous type thick liquids distributor of embodiment includes: the bottom wall of the finished product material distribution cavity is provided with a first discharge hole for outputting a nano powder backing material, and the bottom wall of the backing material distribution cavity is provided with a second discharge hole for outputting the nano powder backing material; the batching subassembly, the batching subassembly is located hold the material intracavity, the batching subassembly includes distributing pipe and driving piece, the first end of distributing pipe with the feed inlet intercommunication, the second end orientation of distributing pipe the distribution chamber, just the central axis of first end with the central axis of second end is in the footpath of casing is spaced apart, the driving piece can drive the distributing pipe rotates, just the second end rotates the region that a week formed and distinguishes for the batching, on the horizontal projection face, the batching district with bed charge distribution chamber at least partial coincidence, and the batching district with finished product material distribution chamber at least partial coincidence.

According to the utility model discloses a continuous type thick liquids distributor, the casing has and holds material chamber and distribution chamber, the distribution chamber is located the bottom that holds the material chamber, the top that holds the material chamber has the feed inlet, the distribution chamber includes finished product distribution chamber and bed charge distribution chamber, finished product distribution chamber diapire has the first discharge gate that is used for exporting the nanometer powder bed charge, bed charge distribution chamber diapire has the second discharge gate that is used for exporting the nanometer powder bed charge, the batching subassembly is located and is held the material intracavity, the batching subassembly includes distributing pipe and driving piece, the first end and the feed inlet intercommunication of distributing pipe, the second end orientation distribution chamber of distributing pipe, and the central axis of first end is spaced apart in the footpath of casing with the central axis of second end, the driving piece can drive the distributing pipe and rotate, and the regional for batching district that a week formed rotates the second end, on the horizontal projection face, at least partial coincidence of batching district and bed charge distribution chamber, and at least partial coincidence of finished product distribution chamber, therefore, driving piece drive distributing pipe rotates when going into the position relative with the finished product distribution chamber, nanometer powder slurry can fall into the production and carry out the production efficiency as the continuous production of powder slurry distribution chamber and the production of the nanometer powder bed charge distribution chamber, thereby it can carry out the production efficiency to carry out the nanometer powder to carry out the product to carry out the nanometer powder as the product.

In some embodiments, the continuous slurry distribution device further comprises an adjusting component, the adjusting component is arranged in the material containing cavity, and the adjusting component can adjust the proportioning ratio of the finished material distribution cavity and the backing material distribution cavity.

In some embodiments, the adjusting component includes striker plate and regulating plate, the striker plate is located the distributing pipe with between the distribution chamber, just the striker plate passes through the stand and is connected with the casing, the striker plate is kept away from one side of stand has the turn-ups of upwards extending, the regulating plate is located on the striker plate towards the side of distributing pipe, the one end of regulating plate with the stand is connected and is followed the circumference in holding the material chamber is rotatable, the other end of regulating plate with the turn-ups contact, on the horizontal projection face, the striker plate with bed charge distribution chamber part coincides, just in the circumference in holding the material chamber, bed charge distribution chamber part surpasses the striker plate, and the striker plate with finished product distribution chamber part coincides, and in the circumference in holding the material chamber, finished product distribution chamber part surpasses the striker plate.

In some embodiments, the striker plate extends obliquely in a direction away from the post.

In some embodiments, the striker plate is a sector plate.

In some embodiments, the distribution pipe comprises a first vertical pipe, a second vertical pipe and a connecting pipe, the first vertical pipe is connected with the feed port, one end of the second vertical pipe is connected with the first vertical pipe through the connecting pipe, the other end of the second vertical pipe faces the distribution cavity, and the connecting pipe extends downwards in a direction away from the first vertical pipe.

In some embodiments, the casing includes a body and a funnel, the body has the material containing cavity and the distribution cavity, a funnel body of the funnel is located in the distribution cavity, a funnel neck of the funnel extends out of the casing through the second material outlet, and an inner cavity of the funnel body is the backing material distribution cavity.

In some embodiments, the bottom of the body is a tapered section, the cross-sectional area of the tapered section decreases from top to bottom, and the first discharge port is located at the bottom wall of the tapered section.

In some embodiments, the top surface of the bucket body is higher than the bottom surface of the tapered section.

In some embodiments, the continuous slurry distribution device further comprises a buffer funnel disposed in the material containing chamber and connected between the feed port and the distribution pipe.

Drawings

Fig. 1 is a schematic structural diagram of a continuous slurry distribution device according to an embodiment of the present invention.

Fig. 2 is an assembly schematic diagram of a dam assembly of the continuous slurry distribution device of the present invention.

Fig. 3 is a side view of a dam assembly of an in-line slurry dispensing apparatus according to an embodiment of the present invention.

Reference numerals:

the feed inlet comprises a shell 1, a feed inlet 11, a body 12, a funnel 13, a funnel body 131, a funnel neck 132, a batching assembly 2, a distribution pipe 21, a first vertical pipe 211, a connecting pipe 212, a second vertical pipe 213, a driving part 22, a first discharge hole 3, a second discharge hole 4, an adjusting assembly 5, a baffle plate 51, an adjusting plate 52, a flanging 53, a stand column 6 and a buffer funnel 7.

Detailed Description

Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings. The embodiments described below by referring to the drawings are exemplary intended for explaining the present invention, and should not be construed as limiting the present invention.

As shown in fig. 1-3, the continuous slurry dispensing apparatus of the present invention includes a housing 1 and a dispensing assembly 2.

Specifically, the housing 1 has a material accommodating cavity and a distribution cavity, the distribution cavity is located at the bottom of the material accommodating cavity, the top of the material accommodating cavity has a feed inlet 11, the distribution cavity includes a finished material distribution cavity and a backing material distribution cavity, a finished material distribution cavity bottom wall has a first discharge outlet 3 for outputting a nano powder backing material, the backing material distribution cavity bottom wall has a second discharge outlet 4 for outputting a nano powder backing material, the batching assembly 2 is disposed in the material accommodating cavity, the batching assembly 2 includes a distribution pipe 21 and a driving member 22, a first end of the distribution pipe 21 is communicated with the feed inlet 11, a second end of the distribution pipe 21 faces the distribution cavity, a central axis of the first end is radially spaced from a central axis of the second end of the housing 1, the driving member 22 can drive the distribution pipe 21 to rotate, an area formed by one rotation of the second end is a batching area, on a horizontal projection plane, the batching area is at least partially overlapped with the backing material distribution cavity, and the batching area is at least partially overlapped with the finished material distribution cavity.

In other words, the cavity inside the housing 1 is divided into a top material accommodating cavity and a bottom distribution cavity, the material accommodating cavity is used for accommodating the input nano-powder slurry, the nano-powder slurry is distributed through the batching component 2 arranged inside the housing, and the distribution cavity is used for storing and outputting the nano-powder slurry distributed by the material accommodating cavity in a partitioning manner, wherein the finished material distribution cavity can be used for distributing nano-powder finished product and outputting the nano-powder finished product through the first discharge port 3, and the backing material distribution cavity can be used for distributing nano-powder backing material and outputting the nano-powder backing material through the second discharge port 4, therefore, the outflow processes of the nano-powder slurry of the first discharge port 3 and the second discharge port 4 do not affect each other and the conveying work of the nano-powder slurry finished product and the backing material retaining work can be performed simultaneously.

It can be understood that the first end of the distribution pipe 21 is communicated with the feed port 11 and can be used for receiving the nano-powder slurry in the feed port 11, the second end of the distribution pipe 21 faces the distribution chamber so as to directly scatter the nano-powder slurry into the distribution chamber, the central axis of the first end of the distribution pipe 21 is spaced from the central axis of the second end in the radial direction of the housing 1, that is, the central axes of the first end and the second end of the distribution pipe 21 are not coaxial in the axial direction of the housing 1, therefore, when the driving member 22 drives the distribution pipe 21 to rotate, the path of the second end of the distribution pipe 21 forms an annular shape, so that the nano-powder slurry flowing out from the distribution pipe 21 can be scattered into different areas of the distribution chamber.

Furthermore, on the horizontal projection plane, one part of the circular ring-shaped batching area formed by one rotation of the distribution pipe 21 coincides with a small part of the backing material distribution cavity, and the other part coincides with a small part of the backing material distribution cavity, therefore, the circular ring-shaped batching area of the distribution pipe 21 is circumferentially divided by the backing material distribution cavity and the finished product distribution cavity on the horizontal projection plane, the nanometer powder slurry amount flowing out by one rotation of the distribution pipe 21 is distributed according to the size of the divided areas of the backing material distribution cavity and the finished product distribution cavity and respectively flows into the backing material distribution cavity and the finished product distribution cavity, and therefore the seed crystal backing material with a certain proportion can be left in the nanometer powder slurry amount.

For convenience of understanding, the application process of the present application will be described with reference to the process of inputting and distributing nano-powder slurry, for example, the nano-powder slurry is first input from the input port 11 of the material-containing chamber, then flows into the first end of the distribution pipe 21 connected to the input port 11, the second end of the distribution pipe 21 can rotate circumferentially under the action of the driving member 22, so that the nano-powder slurry in the distribution pipe 21 is circumferentially scattered into different areas of the distribution chamber in a ring shape, the nano-powder slurry falling into the distribution chamber of the finished material flows out from the first output port 3 as the finished material to be prepared into nano-powder, and the nano-powder slurry falling into the distribution chamber of the base material flows out from the second output port 4 as the "seed material" to participate in the next process of preparing nano-powder slurry.

In addition, this application utilizes the rotary motion of distributing pipe 21 first end and second end to distribute nanometer powder thick liquids volume into bed charge distribution chamber and finished product material distribution chamber according to certain proportion, and the theory of structure is simple, and the applicability is high.

According to the utility model discloses a continuous type thick liquids distributor, the casing has and holds material chamber and distribution chamber, the distribution chamber is located the bottom that holds the material chamber, the top that holds the material chamber has the feed inlet, the distribution chamber includes finished product distribution chamber and bed charge distribution chamber, finished product distribution chamber diapire has the first discharge gate that is used for exporting the nanometer powder bed charge, bed charge distribution chamber diapire has the second discharge gate that is used for exporting the nanometer powder bed charge, the batching subassembly is located and is held the material intracavity, the batching subassembly includes distributing pipe and driving piece, the first end and the feed inlet intercommunication of distributing pipe, the second end orientation distribution chamber of distributing pipe, and the central axis of first end is spaced apart in the footpath of casing with the central axis of second end, the driving piece can drive the distributing pipe and rotate, and the regional for batching district that a week formed rotates the second end, on the horizontal projection face, at least partial coincidence of batching district and bed charge distribution chamber, and at least partial coincidence of finished product distribution chamber, therefore, driving piece drive distributing pipe rotates when going into the position relative with the finished product distribution chamber, nanometer powder slurry can fall into the production and carry out the production efficiency as the continuous production of powder slurry distribution chamber and the production of the nanometer powder bed charge distribution chamber, thereby it can carry out the production efficiency to carry out the nanometer powder to carry out the product to carry out the nanometer powder as the product.

Further, as shown in fig. 1-3, the continuous slurry distribution device further includes an adjusting assembly 5, the adjusting assembly 5 is disposed in the material accommodating chamber, and the adjusting assembly 5 can adjust the material proportion of the finished material distribution chamber and the bottom material distribution chamber.

It should be noted that, when preparing different kinds of nano-powder, the proportion of the required "crystal bed charge" is different, at this moment, if adopt same production line to prepare nano-powder, just need to change thick liquids distributor, the installation is loaded down with trivial details and reduction in production efficiency, consequently this application has add adjusting part 5 on thick liquids distributor, adjusting part 5 can carry out secondary distribution to nano-powder thick liquids to adjust the proportion of the nano-powder thick liquids that get into bed charge distribution chamber, and the producer can be according to the different arbitrary control "crystal bed charge" of preparing nano-powder and leave the proportion, improves single thick liquids distributor's suitability.

Further, as shown in fig. 1-3, the adjusting assembly 5 includes a striker plate 51 and an adjusting plate 52, the striker plate 51 is disposed between the distribution pipe 21 and the distribution chamber, and the striker plate 51 is connected to the housing 1 through the upright 6, one side of the striker plate 51 away from the upright 6 is provided with a flange 53 extending upward, the adjusting plate 52 is disposed on a side of the striker plate 51 facing the distribution pipe 21, one end of the adjusting plate 52 is connected to the upright 6 and is rotatable along the circumferential direction of the material containing chamber, the other end of the adjusting plate 52 is in contact with the flange 53, on the horizontal projection plane, the striker plate 51 is partially overlapped with the primer distribution chamber, and in the circumferential direction of the material containing chamber, the primer distribution chamber partially exceeds the striker plate 51, and the striker plate 51 is partially overlapped with the finished product distribution chamber, and in the circumferential direction of the material containing chamber, the finished product distribution chamber partially exceeds the striker plate 51.

In other words, the column 6 is connected with the housing 1, the baffle plate 51 is installed between the second end of the distribution pipe 21 and the distribution cavity through the column 6, a tray-shaped structure is formed, the baffle plate can be used for reserving nano powder slurry flowing out of the distribution pipe 21 in a short time, meanwhile, the baffle plate 51 is fixedly connected with the column 6 to fix the position of the baffle plate 51, the baffle plate 51 is prevented from shaking and falling off under the impact of the nano powder slurry, the regulating plate 52 divides the upper side surface of the baffle plate 51 into two material bearing areas with variable areas, meanwhile, the material bearing areas on two sides of the regulating plate 52 are separated by the contact of the regulating plate 52 and the flanging 53, slurry in the material bearing area on one side of the regulating plate 52 facing the bottom material distribution cavity can flow into the bottom material distribution cavity along the flanging 53, slurry in the material forming area on one side of the regulating plate 52 facing the finished material distribution cavity can flow into the finished material distribution cavity along the flanging 53, and the regulating plate 52 can rotate to different positions, namely, the areas of the material bearing areas on two sides of the regulating plate 52 can be adjusted at will, thereby adjusting the bottom material distribution cavity and the controllable preparation proportion of the production personnel can be adjusted, thereby, the controllable preparation proportion of the crystal can be satisfied, and the requirements of different production personnel can be satisfied.

It should be noted that the form of the adjustment assembly 5 is not limited to the above embodiment, and for example, a cut-off plate is provided at the inlet of the backing material distribution chamber as the adjustment assembly 5, so that the adjustment assembly 5 can control the ratio of the nano powder slurry entering the backing material distribution chamber by adjusting the opening of the cut-off plate.

Further, as shown in fig. 1-3, the baffle plate 51 extends obliquely downward in a direction away from the column 6, that is, the upper end of the baffle plate 51 is connected to the column 6, and the baffle plate 51 is disposed obliquely downward, so that the inclined surface can guide the nano powder bed charge to flow toward the bottom of the baffle plate 51 quickly.

Preferably, as shown in fig. 1 to 3, the striker plate 51 is a sector plate, the circle center of the sector plate is connected to the column 6, the arc edge of the sector plate forms a flanging structure, and the adjusting plate 52 can rotate around the circle center of the sector plate on the upper side of the sector plate, so that the adjusting plate 52 can adjust the amount of the nano-powder slurry flowing to the primer distribution cavity according to the included angle formed between the adjusting plate 52 and the radius side edge of the sector plate, and thus, the sector plate is used as the striker plate 51, and the installation is simple and convenient to control.

Further, as shown in fig. 1, the distribution pipe 21 includes a first vertical pipe 211, a second vertical pipe 213 and a connection pipe 212, the first vertical pipe 211 is connected to the feed port 11, one end of the second vertical pipe 213 is connected to the first vertical pipe 211 through the connection pipe 212, and the other end of the second vertical pipe 213 faces the distribution chamber, the connection pipe 212 extends downward in a direction away from the first vertical pipe 211, and the connection pipe 212 extends downward

It can be understood that the connection pipe 212 is arranged to be inclined downwards along the radial direction of the housing 1, so that after the nano-powder slurry flows out from the first pipe to the connection pipe 212, the nano-powder slurry flows to the second pipe under the guidance of the connection pipe 212, so that the flow direction of the nano-powder slurry in the second pipe is not coaxial with that of the nano-powder slurry in the first pipe, and therefore, when the driving member 22 drives the distribution pipe 21 to rotate, the second pipe rotates circumferentially to form an annular material distribution area.

Preferably, the driver 22 is disposed below the first tube and drives the second tube to rotate about the central axis of the first tube, thereby facilitating assembly while avoiding the location of the driver 22 from affecting the radius of rotation of the second tube.

Further, as shown in fig. 1 and 2, the housing 1 includes a body 12 and a funnel 13, the body 12 has a material containing cavity and a distribution cavity, a funnel body 131 of the funnel 13 is located in the distribution cavity, a funnel neck 132 of the funnel 13 extends out of the body 12 through the second discharge hole 4, and an inner cavity of the funnel body 131 is a bed material distribution cavity.

It can be understood that the hopper 13 is installed at the bottom of the body 12, the body 131 of the hopper 13 divides the distribution chamber into a bottom material distribution chamber and a finished material distribution chamber, the inner chamber of the body 131 is the bottom material distribution chamber, the space enclosed by the outer wall of the body 131 and the inner wall of the body 12 is the finished material distribution chamber, the hopper neck 132 of the hopper 13 protrudes from the bottom of the body 12, thereby the distribution chamber is divided by installing the hopper 13, and the hopper 13 is easy to disassemble and clean for maintenance.

Further, as shown in fig. 1, the bottom of the body 12 is a tapered section, the sectional area of the tapered section decreases from top to bottom, and the first discharge hole 3 is located at the bottom wall of the tapered section.

In other words, the toper section of body 12 bottom from top to bottom forms hopper-shaped structure, and the end mouth of conical hopper 13 is first discharge gate 3, and the interior cavity of conical hopper can hold nano powder finished product material, and the toper section has the mass flow acceleration rate effect from this, is convenient for derive fast of nano powder finished product material.

Further, as shown in fig. 1, the top surface of the hopper 13 is higher than the top surface of the tapered section, that is, the top surface of the hopper 13 for storing the nano-powder base material is higher than the top surface of the tapered section for storing the nano-powder finished material, thereby preventing the nano-powder finished material from flowing into the hopper 13 from the tapered section, which results in excessive distribution of the nano-powder base material and waste, and the excessive nano-powder base material affects the next slurry preparation.

Further, as shown in fig. 1, the continuous slurry distribution device further includes a buffer hopper 7, and the buffer hopper 7 is disposed in the material containing chamber and connected between the feed port 11 and the distribution pipe 21.

In other words, the opening 131 of the buffering funnel 7 is connected to the inlet 11, and the funnel neck 132 of the buffering funnel 7 is connected to the distribution pipe 21, so that the buffering funnel 7 can receive the nano-powder slurry flowing from the inlet 11 and simultaneously pass the nano-powder slurry into the distribution pipe 21.

It can be understood that a certain amount of nano powder slurry can be stored in the buffer hopper 7, which is convenient for quality testing personnel to sample and detect the nano powder slurry in the buffer hopper, and ensures that the prepared nano powder slurry meets the quality requirement.

In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", and the like, indicate the orientation or positional relationship indicated based on the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention.

Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless explicitly defined otherwise.

In the present invention, unless otherwise explicitly specified or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly, e.g., as being fixedly connected, detachably connected, or integrated; may be mechanically coupled, may be electrically coupled or may be in communication with each other; they may be directly connected or indirectly connected through intervening media, or they may be connected internally or in any other suitable relationship, unless expressly stated otherwise. The specific meaning of the above terms in the present invention can be understood according to specific situations by those of ordinary skill in the art.

In the present application, unless expressly stated or limited otherwise, the first feature may be directly on or directly under the second feature or indirectly via intermediate members. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.

In the present disclosure, the terms "one embodiment," "some embodiments," "an example," "a specific example," or "some examples" or the like mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present disclosure. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples and features of different embodiments or examples described in this specification can be combined and combined by one skilled in the art without contradiction.

Although embodiments of the present invention have been shown and described, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention, and that variations, modifications, substitutions and alterations can be made to the above embodiments by those of ordinary skill in the art without departing from the scope of the present invention.

Claims (10)

1. A continuous slurry dispensing apparatus, comprising:

the bottom wall of the finished product material distribution cavity is provided with a first discharge hole for outputting a nano powder backing material, and the bottom wall of the backing material distribution cavity is provided with a second discharge hole for outputting the nano powder backing material;

the batching subassembly, the batching subassembly is located hold the material intracavity, the batching subassembly includes distributing pipe and driving piece, the first end of distributing pipe with the feed inlet intercommunication, the second end orientation of distributing pipe the distribution chamber, just the central axis of first end with the central axis of second end is in the footpath of casing is spaced apart, the driving piece can drive the distributing pipe rotates, just the second end rotates the region that a week formed and distinguishes for the batching, on the horizontal projection face, the batching district with bed charge distribution chamber at least partial coincidence, and the batching district with finished product material distribution chamber at least partial coincidence.

2. The continuous slurry dispensing apparatus according to claim 1, further comprising an adjusting assembly, wherein the adjusting assembly is disposed in the material accommodating chamber, and the adjusting assembly can adjust the material proportion of the finished material dispensing chamber and the bottom material dispensing chamber.

3. The continuous slurry distribution device according to claim 2, wherein the adjusting assembly comprises a baffle plate and an adjusting plate, the baffle plate is arranged between the distribution pipe and the distribution cavity, the baffle plate is connected with the shell through a stand column, one side of the baffle plate, which is far away from the stand column, is provided with a flanging extending upwards, the adjusting plate is arranged on the side surface, facing the distribution pipe, of the baffle plate, one end of the adjusting plate is connected with the stand column and can rotate along the circumferential direction of the material containing cavity, the other end of the adjusting plate is in contact with the flanging, and on a horizontal projection plane, the baffle plate is partially overlapped with the backing material distribution cavity and circumferentially extends to the material containing cavity, the backing material distribution cavity is partially overlapped with the baffle plate, and the baffle plate is partially overlapped with the finished material distribution cavity and circumferentially extends to the backing material containing cavity.

4. The continuous slurry distribution apparatus of claim 3, wherein the dam extends obliquely in a direction away from the column.

5. The continuous slurry distribution apparatus of claim 3, wherein the dam is a sector plate.

6. The continuous slurry distribution apparatus of claim 1, wherein the distribution pipe comprises a first vertical pipe, a second vertical pipe and a connecting pipe, the first vertical pipe is connected with the feed port, one end of the second vertical pipe is connected with the first vertical pipe through the connecting pipe, the other end of the second vertical pipe faces the distribution chamber, and the connecting pipe extends downwards in a direction away from the first vertical pipe.

7. The continuous slurry dispensing apparatus of claim 1, wherein the housing includes a body and a funnel, the body has the receiving chamber and the dispensing chamber, a body of the funnel is located in the dispensing chamber, a neck of the funnel extends out of the housing through the second outlet, and an inner chamber of the body is the backing material dispensing chamber.

8. The continuous slurry distributing device according to claim 7, wherein the bottom of the body is a tapered section, the cross-sectional area of the tapered section decreases from top to bottom, and the first discharge port is located at the bottom wall of the tapered section.

9. The continuous slurry distribution apparatus of claim 8, wherein the top surface of the hopper body is higher than the bottom surface of the conical section.

10. The continuous slurry distribution apparatus of claim 1, further comprising a surge hopper disposed within the holding chamber and connected between the feed inlet and the distribution pipe.

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