CN218686576U - Photoresist bubble removing device - Google Patents

Photoresist bubble removing device Download PDF

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Publication number
CN218686576U
CN218686576U CN202222785676.9U CN202222785676U CN218686576U CN 218686576 U CN218686576 U CN 218686576U CN 202222785676 U CN202222785676 U CN 202222785676U CN 218686576 U CN218686576 U CN 218686576U
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Prior art keywords
degassing
photoresist
degassing cylinder
cylinder
degasser
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CN202222785676.9U
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Chinese (zh)
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温益华
王绪全
彭永杰
王占宇
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Jiangxi Defu Environmental Protection Technology Development Co ltd
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Jiangxi Defu Environmental Protection Technology Development Co ltd
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  • Degasification And Air Bubble Elimination (AREA)

Abstract

The utility model discloses a light resistance agent bubble removing device, its structure includes degasser and rabbling mechanism, through opening the back with first valve, inside the light resistance agent passed through feed liquor pipe input degasser, take out the inside air of degasser under the effect of vacuum pump afterwards, make to make the bubble broken under the effect of negative pressure, and driving motor drives the axis of rotation simultaneously and makes stirring roller stir the light resistance agent, with this bubble discharge with the light resistance agent inside gets rid of, and the heating pipe of temperature-controlled tank inside heats the degasser inside through the heat-conducting layer, make degasser more complete, with this avoid remaining in the inside existence of degasser during operation, lead to the not good problem of quality, and when arranging the material, driving motor drives the axis of rotation and makes the screw rod rotate, promote the row material through screw rod, avoid the light resistance agent to block up the discharge gate, make the row material more simple and convenient.

Description

Photoresist bubble removing device
Technical Field
The utility model relates to a photoresist production facility technical field especially relates to a photoresist degasification device.
Background
The photoresist is also called as photoresist, in the manufacturing process of semiconductor devices, the application of the photoetching process is very frequent, the dosage of the photoresist is very large, and when residual bubbles exist in the photoresist, the photoresist can not fully contact with processed products, thereby affecting the product quality.
Need get rid of the inside bubble of photoresist for this reason in process of production, so as not to cause the influence to the quality of photoresist, consequently, need adopt some devices of defoaming to carry out work, but in the middle of prior art, degassing the bubble device still has some technical defects, just for example the china utility model discloses a public (announcement) number is CN209596616U degasification device, including top open-ended bubble removal jar and vacuum pump, the fixed intercommunication in lateral wall top of bubble removal jar has the trachea, the trachea is kept away from the fixed intercommunication of the one end of bubble removal jar and the air inlet of vacuum pump, the lateral wall top threaded connection who removes the bubble jar has the cover, annular mounting groove has been seted up at the top of bubble removal jar, the inside of mounting groove is inlayed and is equipped with mounting groove assorted rubber circle, annular holding tank has been seted up at the interior top of cover, the top of rubber circle extends to the inside of holding tank, the top of rubber circle offsets with the interior top of holding tank, and the inside wall of rubber circle offsets with two of holding tank respectively, the fixed intercommunication in top of cover has the inlet pipe, the inside wall of holding tank and lateral wall offsets, the discharging pipe, the bottom of bubble removal jar is fixed with the discharging pipe.
Among the above patents are the following drawbacks: 1. in the patent, air in the bubble removing tank is pumped out by a vacuum pump so as to remove bubbles in the photoresist, but the method can only remove the bubbles on the surface of the photoresist, and the bubbles in the photoresist cannot be removed, so that the problem of residual exists and the quality of the photoresist is poor.
2. When the photoresist is discharged, the photoresist has certain viscosity, so that the discharge port can be bonded and blocked during discharging, and the problem of inconvenient discharging is caused.
SUMMERY OF THE UTILITY MODEL
Technical problem to be solved
In order to overcome the defects of the prior art, a photoresist bubble removing device is provided so as to solve the problems that the removal of bubbles is incomplete, bubbles in photoresist cannot be removed, residues exist, the quality is poor, and a discharge port is easy to block during discharging in the prior art.
(II) technical scheme
The utility model discloses a following technical scheme realizes: the utility model provides a photoresist degasification device, which comprises a degassing cylinder, wherein the bottom end surface of the degassing cylinder is provided with a supporting leg, the outer side of the degassing cylinder is provided with a controller, the upper end and the lower end of the degassing cylinder are respectively provided with a feed inlet and a discharge outlet, a second valve is arranged inside the discharge outlet, the upper part of the outer end of the degassing cylinder is provided with a vacuum pump, and one end of the vacuum pump penetrates through the degassing cylinder through a suction pipe;
the stirring mechanism comprises a driving motor arranged at the top end of the degassing cylinder, a rotating shaft is arranged in the degassing cylinder through a bearing, the output end of the driving motor penetrates through the degassing cylinder and is connected with the rotating shaft, and a plurality of stirring rollers are arranged at the side end of the rotating shaft.
Further, the bottom end of the stirring roller is provided with a spiral push rod, and the spiral push rod is positioned inside the discharge port.
Further, a temperature control groove is formed in the lower portion of the degassing cylinder, a heat conduction layer is arranged on the inner wall of the temperature control groove, a heating pipe is arranged inside the temperature control groove, a temperature sensor is arranged at the upper end of the inner wall of the degassing cylinder, a cover door is arranged on one side of the temperature control groove, and a handle is arranged on the cover door.
Furthermore, an observation window is arranged at the upper end of the degassing cylinder.
Furthermore, a pressure gauge is arranged on one side of the top end of the degassing cylinder.
Further, the feed inlet includes the fixing base of infundibulate, the inside piston that has closely laminated of fixing base, the inside feed liquor pipe that runs through of piston is equipped with, and feed liquor intraduct is equipped with first valve, piston top symmetry is equipped with the handle.
(III) advantageous effects
Compared with the prior art, the utility model, following beneficial effect has:
1. the utility model discloses a driving motor drives the axis of rotation and makes the stirring roller stir the photoresist at the degassing cylinder to make the inside bubble of photoresist run out, and with the whole discharges of bubble under the effect of vacuum pump, make the photoresist quality better, avoided the inside bubble of existence of photoresist to lead to the not good problem of quality.
2. The utility model discloses an inside heating pipe work of temperature-controlled tank heats the inside photoresist of degassing section of thick bamboo under the effect of heat-conducting layer to this makes the inside bubble of photoresist eliminate more easily, makes work efficiency faster with this.
3. The utility model discloses a rotation axis drives screw rod and makes it rotate for screw rod can discharge the photoresist, and so avoid the photoresist to block up the discharge gate because of there being viscidity discharging, cause the unable effectual problem of arranging the material of going on.
Drawings
Other features, objects and advantages of the invention will become more apparent upon reading of the detailed description of non-limiting embodiments with reference to the following drawings:
FIG. 1 is a schematic view of the present invention;
FIG. 2 is a schematic side view of the internal structure of the present invention;
fig. 3 is a schematic view of the top view of the internal structure of the present invention;
FIG. 4 is a schematic view of the enlarged structure of the part A of the present invention;
in the figure: the device comprises a degassing cylinder-1, a controller-2, support legs-3, an observation window-4, a cover door-5, a handle-6, a pressure gauge-7, a driving motor-8, a feed inlet-9, a fixed seat-91, a piston-92, a liquid inlet pipe-93, a first valve-94, a handle-95, a discharge outlet-10, a second valve-11, a rotating shaft-12, a temperature sensor-13, a stirring roller-14, a spiral push rod-15, a vacuum pump-16, a suction pipe-17, a temperature control groove-18, a heating pipe-19 and a heat conduction layer-110.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more clearly understood, the present invention will be further described in detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the invention.
Referring to fig. 1, 2, 3 and 4, the present invention provides a photoresist degassing apparatus, including a degassing cylinder 1, such that the photoresist is stacked on the lower portion of the degassing cylinder 1, and does not exceed the position of an outer observation window 4, the bottom end surface of the degassing cylinder 1 is provided with support legs 3, so as to conveniently contact and store a discharge port 10 at the lower end, and to have enough space, the outer side of the degassing cylinder 1 is provided with a controller 2, the upper and lower ends of the degassing cylinder 1 are respectively provided with a feed port 9 and a discharge port 10, and the discharge port 10 is internally provided with a second valve 11, the discharge problem of the discharge port 10 can be controlled by the second valve 11, so as to prevent a rotating shaft 12 from driving a spiral push rod 15 to discharge the photoresist when rotating during degassing, the upper portion of the outer end of the degassing cylinder 1 is provided with a vacuum pump 16, and one end of the vacuum pump 16 penetrates through the degassing cylinder 1 through a suction pipe 17, and the vacuum pump 16 and the suction pipe 17 pump out the air in the degassing cylinder 1, so as to make the interior of the degassing cylinder 1 in a vacuum state, thereby generating negative pressure effect, and breaking the photoresist in the photoresist, and achieving the degassing effect.
Stirring mechanism, stirring mechanism is including locating the driving motor 8 on the 1 top of degassing cylinder, 1 inside rotation axis 12 that is equipped with through the bearing of degassing cylinder, and 8 output of driving motor run through degassing cylinder 1 and rotation axis 12 connection, rotation axis 12 side is equipped with a plurality of stirring roller 14, drive rotation axis 12 through driving motor 8 and make stirring roller 14 stir the photoresist of degassing cylinder 1 inside, thereby let the bubble in the photoresist overturn, make the effect of getting rid of the bubble more complete with this, avoid the bubble to remain in the inside unable exhaust problem of photoresist.
Wherein, stirring 14 bottom ends of rollers is equipped with screw rod 15, and screw rod 15 is located inside discharge gate 10, drives axis of rotation 12 through driving motor 8 and makes screw rod 15 rotate, and screw rod 15 can make the photoresist in discharge gate 10 discharge when rotating to avoid the photoresist probably because of having viscidity and leading to the problem of blockking up discharge gate 10, make the row of expecting inconvenient.
Wherein, degassing cylinder 1 lower part is equipped with temperature-controlled tank 18, and temperature-controlled tank 18 inner wall is equipped with heat-conducting layer 110, the inside heating pipe 19 that is equipped with of temperature-controlled tank 18, heat through heating pipe 19, make the inside temperature of temperature-controlled tank 18 rise, and conduct the heat to degassing cylinder 1 inside under the effect of heat-conducting layer 110 and make the temperature of photoresist increase, with this bubble of existence in the photoresist get rid of fast, degassing cylinder 1 inner wall upper end is equipped with temperature-sensing ware 13, and avoid inside high temperature under the effect of temperature-sensing ware 13, lead to producing the influence to the quality of photoresist agent, and be equipped with the insulating layer in the outside of temperature-controlled tank 18 and avoid the temperature to cause the influence to the staff, temperature-controlled tank 18 one side is equipped with lid door 5, can change it when heating pipe 19 breaks down etc. through lid door 5 convenience, and be equipped with handle 6 on lid door 5, make things convenient for the staff's pulling.
Wherein, degasification section of thick bamboo 1 upper end is equipped with observation window 4, can observe the condition of the inside bubble of getting rid of degasification section of thick bamboo 1 through observation window 4 for work efficiency is higher.
Wherein, degassing cylinder 1 top one side is equipped with pressure gauge 7 to this detects degassing cylinder 1 inside pressure, avoids too big or the undersize of internal pressure and leads to the problem of potential safety hazard.
Wherein, feed inlet 9 includes the fixing base 91 of infundibulate, the inside inseparable laminating of fixing base 91 has piston 92, the inside feed liquor pipe 93 that runs through of piston 92 is equipped with, and the inside first valve 94 that is equipped with of feed liquor pipe 93, piston 92 top symmetry is equipped with handle 95, can extract piston 92 through handle 95, make when clearing up 1 inside degasification section of thick bamboo, conveniently pour into the water source and clear up, make more convenient, and seal feed inlet 9 through piston 92, avoid the problem of gas leakage, increase holistic sealing performance.
The working principle is as follows: the user firstly connects the controller 2, the pressure gauge 7, the driving motor 8, the first valve 94, the second valve 11, the temperature sensor 13, the vacuum pump 16 and the heating pipe 19 to an external power supply, then opens the first valve 94 and then leads the photoresist into the degassing cylinder 1 through the liquid inlet pipe 93 inside the feed inlet 9, then pumps out the air inside the degassing cylinder 1 under the action of the vacuum pump 16 and the suction pipe 17 to enable the inside to be in a negative pressure state so as to remove bubbles, then simultaneously drives the rotating shaft 12 by the driving motor 8 so as to enable the stirring roller 14 to stir the photoresist inside the degassing cylinder 1, enables the gas inside the photoresist to run out and be removed, avoids the bubbles remaining inside the photoresist, then simultaneously works the heating pipe 19 inside the temperature control groove 18, heats the inside of the degassing cylinder 1 through the heat conduction layer 110, thereby enabling the bubble removal effect to be better, and then when discharging the photoresist, opens the second valve 11 to discharge the photoresist under the action of the rotation of the screw push rod 15, thereby completing the work.
The foregoing shows and describes the general principles, essential features, and advantages of the invention. It should be understood by those skilled in the art that the present invention is not limited by the above embodiments, and the description in the above embodiments and the description is only the preferred embodiments of the present invention, and is not intended to limit the present invention, and that there may be various changes and modifications without departing from the spirit and scope of the present invention, and these changes and modifications all fall within the scope of the present invention as claimed. The scope of the invention is defined by the appended claims and equivalents thereof.

Claims (6)

1. A photoresist degassing bubble device is characterized by comprising
The device comprises a degassing cylinder (1), wherein supporting legs (3) are arranged on the bottom end face of the degassing cylinder (1), a controller (2) is arranged on the outer side of the degassing cylinder (1), a feeding hole (9) and a discharging hole (10) are respectively formed in the upper end and the lower end of the degassing cylinder (1), a second valve (11) is arranged in the discharging hole (10), a vacuum pump (16) is arranged on the upper portion of the outer end of the degassing cylinder (1), and one end of the vacuum pump (16) penetrates through the degassing cylinder (1) through a suction pipe (17);
the stirring mechanism comprises a driving motor (8) arranged at the top end of the degassing cylinder (1), a rotating shaft (12) is arranged in the degassing cylinder (1) through a bearing, the output end of the driving motor (8) penetrates through the degassing cylinder (1) to be connected with the rotating shaft (12), and a plurality of stirring rollers (14) are arranged at the side end of the rotating shaft (12).
2. A photoresist degassing apparatus as claimed in claim 1, wherein: the bottom end of the stirring roller (14) is provided with a spiral push rod (15), and the spiral push rod (15) is positioned inside the discharge hole (10).
3. A photoresist degassing bubble apparatus according to claim 1, wherein: the improved degassing device is characterized in that a temperature control groove (18) is formed in the lower portion of the degassing cylinder (1), a heat conduction layer (110) is arranged on the inner wall of the temperature control groove (18), a heating pipe (19) is arranged inside the temperature control groove (18), a temperature sensor (13) is arranged at the upper end of the inner wall of the degassing cylinder (1), a cover door (5) is arranged on one side of the temperature control groove (18), and a handle (6) is arranged on the cover door (5).
4. A photoresist degassing bubble apparatus according to claim 1, wherein: an observation window (4) is arranged at the upper end of the degassing cylinder (1).
5. A photoresist degassing bubble apparatus according to claim 1, wherein: and a pressure gauge (7) is arranged on one side of the top end of the degassing cylinder (1).
6. A photoresist degassing bubble apparatus according to claim 1, wherein: feed inlet (9) are including fixing base (91) of infundibulate, the inside piston (92) that closely laminates of fixing base (91), inside running through of piston (92) is equipped with feed liquor pipe (93), and feed liquor pipe (93) is inside to be equipped with first valve (94), piston (92) top symmetry is equipped with handle (95).
CN202222785676.9U 2022-10-22 2022-10-22 Photoresist bubble removing device Active CN218686576U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202222785676.9U CN218686576U (en) 2022-10-22 2022-10-22 Photoresist bubble removing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202222785676.9U CN218686576U (en) 2022-10-22 2022-10-22 Photoresist bubble removing device

Publications (1)

Publication Number Publication Date
CN218686576U true CN218686576U (en) 2023-03-24

Family

ID=85589603

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202222785676.9U Active CN218686576U (en) 2022-10-22 2022-10-22 Photoresist bubble removing device

Country Status (1)

Country Link
CN (1) CN218686576U (en)

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