CN218666255U - Magnetron sputtering rotating cathode magnetic field detection device - Google Patents
Magnetron sputtering rotating cathode magnetic field detection device Download PDFInfo
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- CN218666255U CN218666255U CN202222281788.0U CN202222281788U CN218666255U CN 218666255 U CN218666255 U CN 218666255U CN 202222281788 U CN202222281788 U CN 202222281788U CN 218666255 U CN218666255 U CN 218666255U
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Abstract
The utility model discloses a magnetron sputtering rotating cathode magnetic field detection device, which belongs to the field of magnetron coating, and comprises a simulation target cylinder and a measuring mechanism, wherein the simulation target cylinder is provided with a limiting mechanism along the axial direction thereof; the measuring mechanism comprises a gaussmeter and a fixed seat, a fixed part is arranged on the fixed seat, one end of the gaussmeter is clamped in the fixed part, and the fixed seat moves in the limiting mechanism along the length direction of the simulation target cylinder. The utility model overcomes among the prior art not accurate not enough of magnetic field intensity measurement result of somewhere on the cylindrical target places in former target position department through setting up a simulation target, and then accurately surveys the magnetic field intensity of each department on the target through removing measuring mechanism on the simulation target.
Description
Technical Field
The utility model relates to a magnetron coating film technical field, more specifically say, relate to a magnetron sputtering rotating cathode magnetic field detection device.
Background
Magnetron sputtering is a widely used coating technique in which a target material is bombarded with ionized inert gas ions under the combined action of a voltage and a magnetic field in a vacuum environment, so that the target material is sputtered in the form of ions, atoms or molecules and deposited on a substrate to form a thin film. In practical production application, production and equipment and process personnel need to investigate whether the coating result such as film thickness, uniformity and the like are consistent with a set target and adjust equipment parameters including but not limited to power supply, magnetic field of a magnetic bar, other flow of the process and the like according to conditions.
The adjustment of the magnetic rod magnetic field needs a magnetic rod manufacturer to obtain film layer parameters and then adjust the film layer parameters, and the reaction speed and the adjustment work efficiency are reduced due to the fact that the magnetic rod manufacturer needs to contact the original factory or a foreign manufacturer many times. In order to enable field personnel to fully research the regulation rule of the magnetic field as much as possible, a stable magnetic field measurement method is required to obtain basic data as a premise. At present, field personnel basically use a handheld gauss meter to visually estimate measuring points to measure the magnetic field distribution, and the error is large.
SUMMERY OF THE UTILITY MODEL
1. Technical problem to be solved by the utility model
The utility model aims to overcome the not accurate not enough of magnetic field intensity measurement result of somewhere on the cylindrical target among the prior art, provide a magnetron sputtering rotating cathode magnetic field detection device and measuring method, place in former target position department through setting up a simulation target, and then accurately survey the magnetic field intensity of each department on the target through removing measuring mechanism on the simulation target.
2. Technical scheme
In order to achieve the above purpose, the utility model provides a technical scheme does:
the utility model discloses a magnetron sputtering rotating cathode magnetic field detection device, which comprises a simulation target cylinder, wherein a limiting mechanism is arranged on the simulation target cylinder along the axial direction of the simulation target cylinder; and the measuring mechanism comprises a gaussmeter and a fixed seat, a fixed part is arranged on the fixed seat, one end of the gaussmeter is clamped in the fixed part, and the fixed seat moves along the length direction of the simulation target cylinder in the limiting mechanism.
As a further improvement of the present invention, the fixing portion is a groove structure or a hole structure.
As a further improvement of the present invention, the fixing base includes a long axis portion and a short axis portion, and the short axis portion is vertically disposed on the long axis portion.
As a further improvement of the present invention, the long axis portion and the short axis portion have the same thickness, and the short axis portion is vertically disposed at one end of the long axis portion to form an L-shaped structure.
As a further improvement of the present invention, the long axis portion and the short axis portion have the same thickness, and the short axis portion is vertically disposed at the middle position of the long axis portion to form a T-shaped structure.
As a further improvement of the utility model, the limiting mechanism is a first groove arranged along the length direction of the simulation target cylinder.
As a further improvement of the utility model, the simulation target cylinder is made of acrylic material.
As a further improvement of the utility model, the simulation target cylinder is transparent.
As a further improvement of the utility model, one side of the first groove is provided with scales.
A method for detecting a magnetic field of a magnetron sputtering rotating cathode comprises the following steps:
taking down the original target from the target tool;
mounting the simulation target cylinder on a target material tool;
fixing a long shaft part and a short shaft part of the measuring mechanism in the first groove;
and moving the measuring mechanism to enable the measuring mechanism to stably move in the first groove, and recording the measuring result.
As a further improvement of the present invention,
when the direction of measurement is to be changed,
taking down the gaussmeter from the fixing part of the fixing seat;
rotating the fixed seat for 180 degrees;
the gaussmeter is inserted into the fixing portion.
3. Advantageous effects
Adopt the technical scheme provided by the utility model, compare with prior art, have following beneficial effect:
(1) The utility model discloses an original target position department has installed a simulation target section of thick bamboo, it comes to carry on spacingly to the gaussmeter to be equipped with stop gear on a simulation target section of thick bamboo, make the gaussmeter can not take place the shake at the removal in-process, make the accuracy greatly increased who acquires data, the homogeneity of measuring point has been guaranteed to stop gear and the transparent target section of thick bamboo of taking the scale, can rotate the relative position that a simulation target section of thick bamboo can adjust the measuring point according to craftsman's experience after measuring a straight line, and then obtain the distribution of magnetic field in the wider range.
(2) The utility model discloses a gauss meter fixing base has included major axis portion and minor axis portion, when needs are changed the gauss meter direction, only need with the fixing base rotation 180, again with the gauss meter insert in the fixing base can to minor axis portion sets up perpendicularly in the one end of major axis portion, can make the gauss meter insert the fixing base in the back position unanimous at every turn, measured data is comparatively accurate.
Drawings
FIG. 1 is a schematic structural diagram of a measuring device on a simulated target cylinder;
FIG. 2 is a schematic diagram of a gaussmeter measuring vertical component B ^ on a simulated target cylinder;
FIG. 3 is a schematic representation of a gaussmeter on a simulated target cylinder when measuring the tangential component B// B;
fig. 4 is a schematic view of the magnetic field distribution.
The reference numerals in the schematic drawings illustrate:
100. simulating a target cylinder; 101. a first groove;
200. a measuring mechanism; 201. a Gauss meter; 202. a fixed seat; 2021. a long shaft portion; 2022. a short shaft portion; 2023. a fixing portion.
Detailed Description
For a further understanding of the present invention, reference will be made to the following detailed description taken in conjunction with the accompanying drawings and examples.
The structure, ratio, size and the like shown in the drawings of the present specification are only used for matching with the content disclosed in the specification, so as to be known and read by people familiar with the technology, and are not used for limiting the limit conditions which can be implemented by the present invention, so that the present invention does not have the substantial significance in the technology, and any structure modification, ratio relationship change or size adjustment should still fall within the scope which can be covered by the technical content disclosed by the present invention without affecting the efficacy which can be produced by the present invention and the achievable purpose. In addition, the terms "upper", "lower", "left", "right" and "middle" used in the present specification are for clarity of description, and are not intended to limit the scope of the present invention, and the relative relationship between the terms and the terms is not to be construed as a scope of the present invention.
The present invention will be further described with reference to the following examples, with reference to fig. 1 to 4.
The magnetron sputtering rotating cathode magnetic field detection device in the embodiment comprises a simulation target cylinder 100 and a measuring mechanism 200, wherein a limiting mechanism is arranged on the simulation target cylinder 100 along the axial direction; the measuring mechanism 200 includes a gaussmeter 201 and a fixing seat 202, the fixing seat 202 is provided with a fixing portion 2023, one end of the gaussmeter 201 is clamped in the fixing portion 2023, and the fixing seat 202 moves along the length direction of the simulated target cylinder 100 in the limiting mechanism. The original target material is detached at the station, the simulation target cylinder 100 is installed at the position of the original target material, and the installation mechanisms identical to those of the original target material are arranged at the two ends of the simulation target cylinder 100, so that the simulation target cylinder 100 can be installed at the position of the original target material in the same installation mode as the original target material. A limiting mechanism is arranged on the simulation target cylinder 100 along the axial direction thereof, and specifically, the limiting mechanism is a first groove 101 formed along the length direction of the simulation target cylinder 100. The measuring mechanism 200 can move in the first groove 101 along the length direction of the simulated target cylinder 100, so that the magnetic field strength at each position on the simulated target cylinder 100, that is, the magnetic field strength at each position on the original target material, can be measured.
According to the magnetron sputtering principle and the measuring working mode of the conventional magnetic field intensity measuring mechanism 200, the tangential component B// and the vertical component B ^ of the magnetic field intensity are mainly measured and then subjected to statistical analysis. As shown in fig. 4: the magnetic field intensity of each point on the dotted line can be decomposed into a component B/tangent to the surface of the target and a vertical component B along the diameter direction, and the third component of the magnetic field designed according to the magnetic rod structure is almost zero and perpendicular to the paper surface along the axial direction of the target cylinder and is not a measurement target.
Wherein, measuring mechanism 200 has included gauss meter 201 and fixing base 202, and gauss meter 201 inserts in the fixed part 2023 on fixing base 202 and pegs graft with fixing base 202, and the width of fixed part 2023 is unanimous with the width of gauss meter 201 one end for gauss meter 201 just blocks can not become flexible in fixed part 2023, when needing to take out gauss meter 201 from fixing base 202, then only need rely on operating personnel to pull out gauss meter 201 can. The non-fixed connection can conveniently use the same gaussmeter 201 to measure the tangential component B// and the vertical component B of the magnetic field intensity at the same point, namely the same gaussmeter 201 is used to measure the vertical component B after the tangential component B// is measured, so that interference items are eliminated, and the measurement result is more accurate.
In one embodiment, the fixing base 202 includes a long axis portion 2021 and a short axis portion 2022, the long axis portion 2021 and the short axis portion 2022 have the same thickness, the short axis portion 2022 is vertically disposed on the long axis portion 2021, and the short axis portion 2022 is vertically disposed at one end of the long axis portion 2021 or located at the middle position of the long axis portion 2021 to form an L-shaped structure or a T-shaped structure. Specifically, in the present embodiment, the short shaft portion 2022 is vertically disposed at one end of the long shaft portion 2021 to form an L-shaped structure, and one end of the gaussmeter 201 is inserted into the fixing portion 2023 of the long shaft portion 2021, so that one end of the gaussmeter 201 is completely flush with the end surface of the long shaft portion 2021, and it is ensured that each time the gaussmeter 201 is completely flush with one end of the long shaft portion 2021, the inaccuracy of the measured data caused by the position change problem of the gaussmeter 201 is reduced. The fixing portion 2023 may be a groove structure or a hole structure, and the purpose of fixing and clamping the gaussmeter can be achieved. In this embodiment, the fixing portion 2023 is a groove structure penetrating through the long shaft portion 2021, the width of the groove structure is the same as the width of the fixing rod below the gaussmeter 201, and an operator can fix the gaussmeter 201 in the groove structure by pressing. When the fixing portion 2023 is provided with the hole formation structure, one end of the gaussmeter is inserted into the hole and fixed.
The short axis portion 2022 is disposed on the long axis portion 2021, when the vertical component B ″, needs to be measured, as shown in fig. 2, the gaussmeter 201 is fixed on the fixing base 202 by the fixing portion 2023, then the short axis portion 2022 of the fixing base 202 is inserted into the first groove 101 of the simulation target barrel 100, at this time, the magnetic induction line of the vertical component B ″, passes through the gaussmeter 201 tangent to the outer surface of the simulation target barrel 100, the gaussmeter 201 records the vertical component B ″, and the length of the short axis portion 2022 is set to be consistent with the depth of the first groove 101, so that when the short axis portion 2022 moves in the first groove 101, the gaussmeter 201 is stable as a whole, no shaking occurs, and the magnetic field strength of the vertical component B ″, can be measured stably. When the tangential component B// needs to be measured, as shown in FIG. 3, the gaussmeter 201 is only required to be removed from the fixed seat 202, then the fixed seat 202 is rotated by 180 degrees, then the gaussmeter 201 is inserted into the fixed seat 2023, the long shaft part 2021 of the fixed seat 202 is inserted into the first groove 101 on the simulation target cylinder 100, the axis of the gaussmeter 201 is perpendicular to the tangent line at the intersection of the simulation target cylinder 100, the magnetic induction line of the tangential component B// passes through the gaussmeter 201 at the moment, and the gaussmeter 201 records the tangential component B///at the moment.
Further, a simulation target section of thick bamboo 100 is the ya keli material, and yakeli material texture is lighter, and the yakeli material can not influence the distribution change of magnetic field, makes things convenient for operating personnel installation and dismantlement, and simultaneously, a simulation target section of thick bamboo 100 is transparent, overlaps transparent simulation target section of thick bamboo 100 on the bar magnet, through transparent simulation target section of thick bamboo 100, can see the magnet position that gaussmeter 201 probe was right, can use magnetic pole developing paper (not shown) can assist the relative power of observing the magnetic field simultaneously.
Further, first recess 101 one side is equipped with the scale, the even one side that can be at first recess 101 of scale, when the magnetic field intensity is measured to the actual utilization gauss meter 201, record corresponding reading after the scale removal certain distance along first recess 101, because gauss probe has retrained the relative position by fixing base 202 and first recess 101, the shake can not take place hardly, make the accuracy greatly increased who acquires the data, the homogeneity of measuring point has been guaranteed with transparent simulation target section of thick bamboo 100 to first recess 101 of taking the scale, can rotate the relative position that simulation target section of thick bamboo 100 can adjust the measuring point according to operating personnel's experience after measuring a straight line, and then obtain the distribution condition of magnetic field in the wide range.
In one embodiment, a magnetron sputtering rotating cathode magnetic field detection method:
taking the original target material off the target material tool, installing the simulated target cylinder 100 on the target material tool, wherein the simulated target cylinder 100 and the original target material are provided with the same installation device, and the simulated target cylinder 100 and the original target material are provided with the same diameter;
an operator firstly inserts the long slot end of the gaussmeter 201 into the fixing portion 2023, so that the insertion end of the gaussmeter 201 is flush with the end of the long slot end, and then manually places the gaussmeter 201 and the fixed seat 202 in the first groove 101, so that the bottom of the fixed seat 202 is abutted to the bottom of the first groove 101.
Moving the measuring mechanism 200 to make the measuring mechanism 200 move smoothly in the first groove 101, and recording the measuring result;
the measurement means 200 is changed in direction so that the gaussmeter 201 is tangent to the outer surface of the dummy target cylinder 100, the measurement means 200 is moved so that the measurement means 200 is smoothly moved in the first groove 101, and the measurement result is recorded.
Wherein, when the probe of the gauss meter 201 is vertically arranged, the tangential component B/of the magnetic field intensity at the end part of the probe can be measured, and when the probe of the gauss meter 201 is tangentially arranged with the outer surface of the simulation target cylinder 100, the vertical component B t of the magnetic field intensity at the end part of the probe can be measured. Through transparent target cylinder, can see the magnet position that the probe is right, use magnetic pole development paper can assist the relative power of observing the magnetic field, select probe position after, record corresponding reading after removing certain distance along first recess 101 scale.
Specifically, when the direction of the measuring mechanism 200 is changed, the gaussmeter 201 is taken out from the fixing portion 2023 of the fixing base 202; rotating the fixing base 202 by 180 degrees; the gaussmeter 201 is inserted into the fixing portion 2023. The same gaussmeter 201 and the same fixed seat 202 are used, so that objective variables are reduced when the same set of tangential components B// and vertical components B ^ are measured, the final measurement result is more accurate, and the measurement efficiency is improved.
The present invention and its embodiments have been described above schematically, and the description is not limited thereto, and what is shown in the drawings is only one of the embodiments of the present invention, and the actual structure is not limited thereto. Therefore, if the person skilled in the art receives the teaching of the present invention, without departing from the inventive spirit of the present invention, the person skilled in the art should also design the similar structural modes and embodiments without creativity to the technical solution, and all shall fall within the protection scope of the present invention.
Claims (9)
1. A magnetron sputtering rotating cathode magnetic field detection device is characterized in that: comprises the steps of (a) preparing a mixture of a plurality of raw materials,
the simulation target cylinder (100), the simulation target cylinder (100) is provided with a limiting mechanism along the axial direction; and the number of the first and second groups,
the measuring mechanism (200), the measuring mechanism (200) includes gauss meter (201) and fixing base (202), be equipped with fixed part (2023) on fixing base (202), gauss meter (201) one end joint is in fixed part (2023), fixing base (202) move along simulation target cylinder (100) length direction in stop gear.
2. The magnetron sputtering rotating cathode magnetic field detection device according to claim 1, characterized in that: the fixing part (2023) is of a groove structure or a hole structure.
3. The magnetron sputtering rotating cathode magnetic field detection device according to claim 1 or 2, characterized in that: the fixed seat (202) comprises a long shaft part (2021) and a short shaft part (2022), and the short shaft part (2022) is vertically arranged on the long shaft part (2021).
4. The magnetron sputtering rotating cathode magnetic field detection device according to claim 3, characterized in that: the long shaft part (2021) and the short shaft part (2022) have the same thickness, and the short shaft part (2022) is vertically arranged at one end of the long shaft part (2021) to form an L-shaped structure.
5. The magnetron sputtering rotating cathode magnetic field detection device according to claim 3, characterized in that: the long shaft part (2021) and the short shaft part (2022) have the same thickness, and the short shaft part (2022) is vertically arranged at the middle position of the long shaft part (2021) to form a T-shaped structure.
6. The magnetron sputtering rotating cathode magnetic field detection device according to claim 1, characterized in that: the limiting mechanism is a first groove (101) formed in the length direction of the simulation target cylinder (100).
7. The magnetron sputtering rotating cathode magnetic field detection device according to claim 1, characterized in that: the simulation target cylinder (100) is made of acrylic materials.
8. The magnetron sputtering rotating cathode magnetic field detection device according to claim 7, characterized in that: the simulation target cylinder (100) is transparent.
9. The magnetron sputtering rotary cathode magnetic field detection device according to claim 6, characterized in that: scales are arranged on one side of the first groove (101).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222281788.0U CN218666255U (en) | 2022-08-29 | 2022-08-29 | Magnetron sputtering rotating cathode magnetic field detection device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222281788.0U CN218666255U (en) | 2022-08-29 | 2022-08-29 | Magnetron sputtering rotating cathode magnetic field detection device |
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| Publication Number | Publication Date |
|---|---|
| CN218666255U true CN218666255U (en) | 2023-03-21 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202222281788.0U Active CN218666255U (en) | 2022-08-29 | 2022-08-29 | Magnetron sputtering rotating cathode magnetic field detection device |
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| CN (1) | CN218666255U (en) |
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2022
- 2022-08-29 CN CN202222281788.0U patent/CN218666255U/en active Active
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