CN218653056U - Filtering treatment system for self-precipitation of dust in process tail gas of atomic layer deposition equipment - Google Patents
Filtering treatment system for self-precipitation of dust in process tail gas of atomic layer deposition equipment Download PDFInfo
- Publication number
- CN218653056U CN218653056U CN202223220787.1U CN202223220787U CN218653056U CN 218653056 U CN218653056 U CN 218653056U CN 202223220787 U CN202223220787 U CN 202223220787U CN 218653056 U CN218653056 U CN 218653056U
- Authority
- CN
- China
- Prior art keywords
- guide plate
- condensation
- condensation guide
- tail gas
- pipeline
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Chemical Vapour Deposition (AREA)
Abstract
The utility model belongs to the technical field of atomic layer deposition equipment (ALD) technology tail gas processing technique and specifically relates to an ALD equipment technology tail gas dust is from filtration processing system who deposits, including the condensation jar bucket, the one end of condensation jar bucket is provided with admission line, and the other end is provided with the pipeline of giving vent to anger the fixed polylith condensation guide plate that is provided with in inside of condensation jar bucket, polylith condensation guide plate is in constitute tortuous air current channel in the condensation jar bucket, tortuous air current channel's one end intercommunication to admission line, the other end intercommunication to the pipeline of giving vent to anger. The utility model has the advantages that: more tail gas dust in the ALD process is trapped, and meanwhile, an exhaust pipeline is not blocked, so that the process maintenance period is prolonged, the equipment investment cost is reduced, and the cost of tail gas treatment at the rear end and the environmental pollution are further reduced; the tail gas hot air flow of the ALD process fully passes through the condensation guide plate with the designed structure to carry out self-reaction, and then a large amount of dust is subjected to self-precipitation, so that the filtering treatment effect is ensured.
Description
Technical Field
The utility model belongs to the technical field of atomic layer deposition equipment (ALD) technology tail gas processing technique and specifically relates to a filtration processing system of atomic layer deposition equipment technology tail gas dust self-precipitation.
Background
The existing ALD process tail gas treatment mode is a laminated honeycomb thermal surface reaction combined filtration grid interception type filtration mode, the thermal reaction surface area needs to be increased in a limited pipe diameter, the number of hole sites can only be reduced by reducing the hole diameter, the air flow resistance is increased, meanwhile, the too small hole diameter of the thermal surface reaction leads to premature blockage, if only filtration grid interception type filtration is used, the exhaust air flow is influenced by the premature blockage due to the fact that a large amount of process tail gas directly reacts on the filtration grid, and the existing ALD process tail gas treatment mode has the defect of short maintenance period.
Disclosure of Invention
The utility model aims at providing a filtration processing system of atomic layer deposition equipment technology tail gas dust self-precipitation according to above-mentioned prior art not enough, through setting up polylith condensation guide plate in the inside of a condensation jar body, make atomic layer deposition equipment technology tail gas contact with each condensation guide plate under condensation guide plate's water conservancy diversion effect, realize atomic layer deposition equipment technology tail gas's self-reaction condensation precipitation.
The utility model discloses the purpose is realized accomplishing by following technical scheme:
the utility model provides a filtration processing system of atomic layer deposition equipment technology tail gas dust self-precipitation which characterized in that: including the condensing cylinder bucket, the one end of condensing cylinder bucket is provided with inlet channel, and the other end is provided with the pipeline of giving vent to anger the fixed polylith condensation guide plate that is provided with in inside of condensing cylinder bucket, polylith condensation guide plate is in constitute tortuous air current channel in the condensing cylinder bucket, tortuous air current channel's one end intercommunication extremely inlet channel, the other end intercommunication extremely give vent to anger the pipeline.
The condensation guide plate comprises a first condensation guide plate, two second condensation guide plates and a third condensation guide plate, wherein the first condensation guide plate, the two second condensation guide plates and the third condensation guide plate are sequentially arranged in the air flow direction of the air outlet pipeline from the air inlet pipeline to the air outlet pipeline, the second condensation guide plates are respectively arranged at the rear positions of two end parts of the first condensation guide plate, and the third condensation guide plate is arranged at the rear position between the two second condensation guide plates.
The first condensation guide plate, the second condensation guide plate and the third condensation guide plate are all in arc structures.
The air flow direction from the air inlet pipeline to the air outlet pipeline is opposite to the arc opening of the first condensation guide plate, and the arc openings of the second condensation guide plate and the third condensation guide plate are opposite to the air flow direction.
The symmetrical center line position of the plate body of the second condensation guide plate corresponds to the end point position of the first condensation guide plate.
The air inlet pipeline and the air outlet pipeline are positioned on the same horizontal plane and have a certain distance with the bottom of the condensation tank barrel.
The plate body height of the condensation guide plate is higher than the opening positions of the air inlet pipeline and the air outlet pipeline.
The utility model has the advantages that:
1) More tail gas dust in the ALD process is trapped, and meanwhile, an exhaust pipeline is not blocked, so that the process maintenance period is prolonged, the equipment investment cost is reduced, and the cost of tail gas treatment at the rear end and the environmental pollution are further reduced;
2) The tail gas hot air flow of the ALD process fully passes through a condensation guide plate with a designed structure to carry out self-reaction, so that a large amount of dust is precipitated, and the filtering treatment effect is ensured;
3) Simple and reasonable structure, convenient use, wide application range and suitability for popularization.
Drawings
FIG. 1 is a schematic view of the present invention;
FIG. 2 is an elevational, cross-sectional view of FIG. 1;
fig. 3 is a schematic perspective view of the condensation guide plate of the present invention.
Detailed Description
The features of the present invention and other related features are described in further detail below by way of example in conjunction with the accompanying drawings to facilitate understanding by those skilled in the art:
as shown in fig. 1-3, the symbols 1-10 and h are respectively shown as: the device comprises a condensing tank barrel 1, an air inlet pipeline 2, an air outlet pipeline 3, a pipeline airflow channel 4, a first condensation guide plate 5, a second condensation guide plate 6, a third condensation guide plate 7, a tortuous airflow channel 8, self-reaction condensation sedimentation dust 9, a flange 10 for quick-release cleaning and a distance h between the airflow pipeline and the barrel bottom.
Example (b): as shown in fig. 1 to fig. 3, the filtering system subject matter of the atomic layer deposition equipment process tail gas dust self-precipitation in the embodiment is a condensing tank 1, and the atomic layer deposition equipment process tail gas can be subjected to self-reaction condensation and precipitation in the condensing tank 1.
As shown in fig. 1 and fig. 2, an air inlet pipe 2 is disposed at one end of the condensation tank 1, an air outlet pipe 3 is disposed at the other end of the condensation tank 1, the atomic layer deposition equipment process tail gas is input into the condensation tank 1 from a pipe airflow channel 4 of the air inlet pipe 2, the self-reaction condensation sedimentation dust 9 generated after the self-reaction condensation sedimentation is completed in the condensation tank 1 is left at the bottom of the condensation tank 1, and the filtered atomic layer deposition equipment process tail gas is output through the pipe airflow channel 4 of the air outlet pipe 3.
As shown in fig. 1 and fig. 2, the process tail gas of the atomic layer deposition equipment is led into a condensing tank 1 with a zigzag gas flow channel according to the arrow direction. Be provided with a first condensation guide plate 5, two second condensation guide plates 6 and a third condensation guide plate 7 in condensing tank bucket 1, three types of condensation guide plates all are arc and the bottom of every condensation guide plate all fixes on condensing tank bucket 1's barrel head, and every condensation guide plate all has these two kinds of functions of water conservancy diversion and condensation concurrently.
Take the internal layout of the condensation tank 1 shown in fig. 1 as an example; a first condensation guide plate 5, a second condensation guide plate 6 and a third condensation guide plate 7 are arranged in the condensation tank barrel 1 in a symmetrical layout mode. Specifically, the first condensation guide plate 5 is a circular arc-shaped plate body with a large size, is concentrically arranged with the condensation tank barrel 1, and has a radius slightly smaller than that of the condensation tank barrel 1; the first condensation guide plate 5 is a first condensation guide plate 5 facing the air inlet pipeline 2, the front side of the first condensation guide plate is directly facing the process tail gas of the atomic layer deposition equipment, when the hot gas of the process tail gas of the atomic layer deposition equipment flows through the pipeline air flow channel 4 of the air inlet pipeline 2, the hot gas directly contacts with the first condensation guide plate 5 facing the surface to generate self-reaction condensation, then self-reaction condensation and sedimentation dust 9 are generated and are precipitated at the bottom of the condensation tank barrel 1 (as shown in fig. 2). At this time, the first condensation guide plate 5 firstly performs the condensation function; then, the arc shape of the first condensation flow guiding plate 5 is an arc shape from the air inlet pipe 2 to the air outlet pipe 3, so under the guiding action of the arc-shaped first condensation flow guiding plate 5, as shown in the arrow direction in fig. 1, the inputted process exhaust gas of the ald apparatus is divided into two parts equally, and the two parts of process exhaust gas continue to flow through the tortuous airflow channel 8 formed between the inner wall of the condensation tank 1 and the first condensation flow guiding plate 5.
As shown in fig. 1, the two second condensation baffles 6 are respectively disposed at the end positions of the plate body of the first condensation baffle 5, and the arc openings of the two second condensation baffles face the first condensation baffle 5, and the symmetric center line position of the plate body of each condensation baffle 6 is aligned with the end point position of the first condensation baffle 5. The two parts of the process tail gas condensed and divided by the first condensation guide plate 5 directly contact with the second condensation guide plate 6 at the tail end position of the first condensation guide plate 5 and carry out self-reaction condensation and precipitation again. Meanwhile, the process tail gas is reflected by the second condensation guide plate 6 and contacts with the back of the first condensation guide plate 5 again; therefore, the front surface and the back surface of the first condensation guide plate 5 have condensation functions, and the utilization rate is improved while the process tail gas treatment effect is improved.
As shown in fig. 1 and 3, the process off-gas reflected by the back surface of the first condensation baffle 5 is converged again in the region between the two second condensation baffles 6 to join together, thereby securing its gas flow velocity. The third condensation guide plate 7 is arranged in the area between the two second condensation guide plates 6, and the arc opening of the third condensation guide plate faces the process tail gas which is converged and converged. At the moment, the process tail gas reflected and gathered by the first condensation guide plate 5 flows towards the direction of the gas outlet pipeline 3 along the gap between the second condensation guide plate 6 and the third condensation guide plate 6, and in the process, part of the process tail gas still directly contacts with the back area of the second condensation guide plate 6 to carry out self-reaction condensation and precipitation; and part of the process tail gas contacts with the front surface of the third condensation guide plate 7 to carry out self-reaction condensation and precipitation, and is reflected to the back surface of the second condensation guide plate 6 to carry out self-reaction condensation and precipitation under the guide action of the third condensation guide plate, and is finally reflected to the gas outlet pipeline 3 under the guide action of the second condensation guide plate 6.
In this embodiment, the zigzag airflow channel 8 refers to each region through which the process tail gas of the atomic layer deposition apparatus flows, and the zigzag airflow channel 8 divides the internal region of the condensation tank 1 into symmetrical airflow channel regions, so that the process tail gas has a certain flow velocity when flowing inside, thereby not only improving the filtering treatment effect, but also improving the efficiency of the filtering treatment process. The air flow path of the extended zigzag air flow channel 8 is arranged according to the shape and position of each condensation guide plate, and meanwhile, the designed bandwidth does not influence the air flow.
In the condensation tank 1 shown in fig. 1 of the present embodiment, after the process gas is input into the barrel of the ald apparatus, the self-reaction condensation and precipitation can be performed for multiple times, and specifically, the self-reaction condensation and precipitation can be performed sequentially, which sequentially includes the front surface of the first condensation baffle 5 → the front surface of the second condensation baffle 6 → the back surface of the first condensation baffle 5 → the front surface of the third condensation baffle 7 → the back surface of the second condensation baffle. Meanwhile, in some cases, the inner wall of the condensation tank tub 1 may be an inner wall having a certain condensation function.
As shown in figure 2, the bottom of the condensing tank barrel 1 is provided with a flange 10 for quick-release cleaning, and after the filtering treatment is completed, the flange 10 for quick-release cleaning can be quickly removed to timely clean the self-reaction condensation settlement dust 9 in the condensing tank barrel 1.
As shown in fig. 2, the design of the pipeline in fig. 2, the position of the airflow pipeline is designed to satisfy the requirement that a certain distance is left between the pipeline and the bottom of the bucket, so as to avoid the airflow from driving the self-reaction condensed settled dust 9 lifted from the bottom of the condensation tank 1.
In the embodiment, in specific implementation: the material of the condensation tank 1 and the condensation guide plate is selected to be resistant to the corrosion of the ALD process off-gas, and generally, a metal with excellent corrosion resistance strength, such as SUS316, is selected.
The design of the size of the tank body of the condensation tank barrel 1 meets the requirement of a maintenance period while conforming to the overall layout of equipment.
Although the conception and the embodiments of the present invention have been described in detail with reference to the drawings, those skilled in the art will recognize that various changes and modifications can be made therein without departing from the scope of the appended claims, and therefore, the description thereof is not repeated herein.
Claims (7)
1. The utility model provides a filtration processing system of atomic layer deposition equipment technology tail gas dust self-precipitation which characterized in that: including the condensing cylinder bucket, the one end of condensing cylinder bucket is provided with inlet channel, and the other end is provided with the pipeline of giving vent to anger the fixed polylith condensation guide plate that is provided with in inside of condensing cylinder bucket, polylith condensation guide plate is in constitute tortuous air current channel in the condensing cylinder bucket, tortuous air current channel's one end intercommunication extremely inlet channel, the other end intercommunication extremely give vent to anger the pipeline.
2. The system of claim 1, wherein the system comprises: the condensation guide plate comprises a first condensation guide plate, two second condensation guide plates and a third condensation guide plate, wherein the first condensation guide plate, the two second condensation guide plates and the third condensation guide plate are sequentially arranged in the air flow direction of the air outlet pipeline from the air inlet pipeline to the air outlet pipeline, the second condensation guide plates are respectively arranged at the rear positions of two end parts of the first condensation guide plate, and the third condensation guide plate is arranged at the rear position between the two second condensation guide plates.
3. The system for filtering off-gas dust from deposition of atomic layer deposition equipment according to claim 2, wherein: the first condensation guide plate, the second condensation guide plate and the third condensation guide plate are all in arc structures.
4. The system of claim 3, wherein the system comprises: the air flow direction from the air inlet pipeline to the air outlet pipeline is opposite to the arc opening of the first condensation guide plate, and the arc openings of the second condensation guide plate and the third condensation guide plate are opposite to the air flow direction.
5. The system of claim 2, wherein the system comprises: the symmetrical center line position of the plate body of the second condensation guide plate corresponds to the end point position of the first condensation guide plate.
6. The system of claim 1, wherein the system comprises: the air inlet pipeline and the air outlet pipeline are positioned on the same horizontal plane and have a certain distance with the bottom of the condensation tank barrel.
7. The system of claim 1, wherein the system comprises: the plate body height of the condensation guide plate is higher than the opening positions of the air inlet pipeline and the air outlet pipeline.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202223220787.1U CN218653056U (en) | 2022-12-02 | 2022-12-02 | Filtering treatment system for self-precipitation of dust in process tail gas of atomic layer deposition equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202223220787.1U CN218653056U (en) | 2022-12-02 | 2022-12-02 | Filtering treatment system for self-precipitation of dust in process tail gas of atomic layer deposition equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN218653056U true CN218653056U (en) | 2023-03-21 |
Family
ID=85543457
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202223220787.1U Active CN218653056U (en) | 2022-12-02 | 2022-12-02 | Filtering treatment system for self-precipitation of dust in process tail gas of atomic layer deposition equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN218653056U (en) |
-
2022
- 2022-12-02 CN CN202223220787.1U patent/CN218653056U/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN218653056U (en) | Filtering treatment system for self-precipitation of dust in process tail gas of atomic layer deposition equipment | |
| CN201195084Y (en) | Apparatus for purifying waste air | |
| CN104455897B (en) | Three-phase vortex street current sharing method and device | |
| CN109865390A (en) | A kind of flue gas processing device | |
| CN201488606U (en) | water-cooled cyclone cooler | |
| CN210292885U (en) | Smelting furnace gas purification device for aluminum alloy production | |
| CN210292886U (en) | Smelting pot waste heat utilization equipment is used in aluminum alloy production | |
| CN211051150U (en) | Poisonous and harmful gaseous pollutants administers deep purification device | |
| CN118122065A (en) | Filtering treatment process for self-precipitation of tail gas dust of atomic layer deposition equipment process | |
| CN208711443U (en) | A kind of SCR equipment for denitrifying flue gas with accumulatingdust guide functions | |
| CN205400856U (en) | Automobile emission purification device | |
| CN208281030U (en) | flange | |
| CN108392983B (en) | SCR flue gas denitrification facility with prevent deposition water conservancy diversion effect | |
| CN209752609U (en) | High-efficient desulfurization dust removal integrated device | |
| CN209637861U (en) | A kind of inlet exhaust gas guiding device | |
| CN212881863U (en) | A disturbance device for wet flue gas desulfurization tower | |
| CN217526886U (en) | Wet dust collector | |
| CN112728974A (en) | Glass tube heat exchanger capable of preventing dust deposition and blocking and application thereof | |
| CN217274227U (en) | Waste heat recovery device for environmental engineering waste gas treatment | |
| CN212236547U (en) | Flue gas dust collector for chemical industry | |
| CN206111294U (en) | Tail gas water filter equipment | |
| CN215609979U (en) | Air duct of dust remover | |
| CN204113399U (en) | Single tube momentum-exchange machine and integrated momentum-exchange machine | |
| CN213202930U (en) | Coke oven gas buffer tank | |
| CN220601544U (en) | Waste heat utilization structure of boiler tail gas |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |