CN218621113U - Quick recovery unit of a residual liquid plates - Google Patents
Quick recovery unit of a residual liquid plates Download PDFInfo
- Publication number
- CN218621113U CN218621113U CN202220824209.XU CN202220824209U CN218621113U CN 218621113 U CN218621113 U CN 218621113U CN 202220824209 U CN202220824209 U CN 202220824209U CN 218621113 U CN218621113 U CN 218621113U
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- Prior art keywords
- plate
- fixedly connected
- filter screen
- solution
- sealing plate
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- 239000007788 liquid Substances 0.000 title claims abstract description 22
- 238000011084 recovery Methods 0.000 title claims abstract description 16
- 238000007747 plating Methods 0.000 claims abstract description 10
- 238000007789 sealing Methods 0.000 claims description 36
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 26
- 238000009713 electroplating Methods 0.000 abstract description 27
- 230000000694 effects Effects 0.000 abstract description 5
- 238000003780 insertion Methods 0.000 description 12
- 230000037431 insertion Effects 0.000 description 12
- 239000002699 waste material Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 4
- 239000002351 wastewater Substances 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910001385 heavy metal Inorganic materials 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- 208000005623 Carcinogenesis Diseases 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 208000031320 Teratogenesis Diseases 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 238000005273 aeration Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 230000036952 cancer formation Effects 0.000 description 1
- 231100000504 carcinogenesis Toxicity 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000002703 mutagenesis Methods 0.000 description 1
- 231100000350 mutagenesis Toxicity 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
- Electroplating Methods And Accessories (AREA)
Abstract
The utility model discloses a plate quick recovery unit of a residual liquid relates to solution recovery technical field. The utility model discloses a bottom plate, the fixed surface of bottom plate is connected with the mounting bracket, fixed mounting has the solution bucket between mounting bracket and the bottom plate, the inside sliding connection of solution bucket has the filter screen, be provided with the locating component who is used for fixed filter screen between filter screen and the solution bucket, locating component includes the locating lever, the board is taken out to the tip fixedly connected with of filter screen, locating lever sliding connection takes out the inside of board, the locating lever extends to the outside and the fixedly connected with connecting rod of taking out the board, the tip of connecting rod is rotated and is connected with and rotates the wheel, fixedly connected with cowl on the outer wall of solution bucket. The utility model discloses a locating component and filter screen are collected and are cleared up the electroplating residue who produces when electroplating, and then can not have the electroplating residue in the solution bucket when guaranteeing to electroplate next time, influence the purity of plating solution to the effect is electroplated in the influence.
Description
Technical Field
The utility model belongs to the technical field of solution recovery, particularly, in particular to plate quick recovery unit of a residual liquid.
Background
The sources of the electroplating wastewater are generally: (1) workpiece cleaning water; (2) a waste plating solution; (3) Other waste waters, including flushing the floor of the plant, scrubbing the pole plate wash water, aeration equipment condensate water, and various bath solutions and drains that "run, pop, drip, leak" due to bath leakage or improper operation management; (4) The equipment cools the water, and the cooling water is not polluted except for temperature rise in the using process. The quality and quantity of the electroplating wastewater are related to the process conditions, production load, operation management, water using mode and other factors of electroplating production. The electroplating wastewater has complex water quality and difficult control of components, and contains heavy metal ions such as chromium, cadmium, nickel, copper, zinc, gold, silver and the like, cyanide and the like, and some of the heavy metal ions belong to highly toxic substances causing carcinogenesis, teratogenesis and mutagenesis.
After the electroplating, the inside of plating solution contains the various impurity of plated item usually, and the active ingredient content of plating solution compares in the past can greatly reduced, can't electroplate, also can not directly discharge to the external world, consequently, need carry out recovery processing to the waste liquid after the electroplating, but current recovery unit is when handling, directly extract the container that corresponds with the waste liquid in, can contain a quantitative electroplating residue in the waste liquid this moment, when extracting, cause the jam of water pump easily, great residue still can remain in the electrolysis barrel, it is not high to cause the electrolyte purity of back.
An effective solution to the problems in the related art has not been proposed yet.
SUMMERY OF THE UTILITY MODEL
To the problem in the correlation technique, the utility model provides a plate quick recovery unit of a residual liquid to overcome the above-mentioned technical problem that current correlation technique exists.
In order to solve the technical problem, the utility model discloses a realize through following technical scheme:
the utility model relates to a plate quick recovery unit of a residual liquid, comprising a base plate, the fixed surface of bottom plate is connected with the mounting bracket, fixed mounting has the solution bucket between mounting bracket and the bottom plate, the inside sliding connection of solution bucket has the filter screen, be provided with the locating component who is used for fixed filter screen between filter screen and the solution bucket.
Further, locating component includes the locating lever, the board is taken out to the tip fixedly connected with of filter screen, locating lever sliding connection is in the inside of taking out the board, the locating lever extends to the outside and the fixedly connected with connecting rod of taking out the board, the tip of connecting rod rotates and is connected with the rotation wheel, fixedly connected with cowl on the outer wall of solution bucket, the rotation wheel extend to cowl's inside and with cowl swing joint, cup jointed the second spring on the outer wall of locating lever, the second spring is located the inside of taking out the board.
Further, the bottom of the solution bucket is connected with a sealing plate in a sliding mode, and a distance adjusting mechanism used for adjusting the position of the sealing plate is arranged between the sealing plate and the solution bucket.
Further, the roll adjustment mechanism includes the limiting plate, limiting plate fixed connection is in the bottom of solution bucket, and the fixed surface of limiting plate is connected with the slide rail, closing plate and slide rail sliding connection, the spacing groove has been seted up on the surface of limiting plate, the closing plate extends to the inside of spacing groove, the top fixedly connected with connecting plate of limiting plate, the first spring of fixedly connected with between connecting plate and the closing plate, the bottom fixedly connected with socket of closing plate, it has the inserted bar to slide to peg graft in the socket, the inserted bar slides and runs through the slide rail and extends to the inside of spacing groove.
Furthermore, a movable groove is formed in the outer wall of the socket, a shifting block is fixedly connected to the outer wall of the inserted bar, the shifting block is movably connected to the movable groove, a plurality of insertion holes are formed in the surface of the sliding rail, and the insertion holes correspond to the inserted bar.
Further, the top fixed mounting of mounting bracket has the water pump, the end of intaking of water pump is connected with the water pipe, the water pipe extends to the inside of solution bucket, it has the outlet pipe to be fixed the intercommunication on the lateral wall of solution bucket, fixedly connected with fixed rail on the inner wall of solution bucket, fixed rail and filter screen sliding connection.
The utility model discloses following beneficial effect has:
the utility model discloses a positioning assembly and filter screen are collected and are cleared up the electroplating residue who produces when electroplating, and then can not have the electroplating residue in the solution bucket when guaranteeing to electroplate next time, influence the purity of plating solution to the effect is electroplated in the influence, specifically collect the electroplating residue through the filter screen, install and dismantle the filter screen through positioning assembly.
Of course, it is not necessary for any particular product to achieve all of the above-described advantages at the same time.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings used in the description of the embodiments will be briefly described below, and it is obvious that the drawings in the description below are only some embodiments of the present invention, and it is obvious for those skilled in the art that other drawings can be obtained according to these drawings without inventive work.
Fig. 1 is a schematic view of the overall structure of the present invention;
fig. 2 is a partial cross-sectional view of the present invention;
FIG. 3 is a schematic view of the structure at the position A of the present invention;
fig. 4 is a front sectional view of the present invention;
fig. 5 is an enlarged schematic view of the structure at B of the present invention.
In the drawings, the reference numbers indicate the following list of parts:
1. a base plate; 2. a mounting frame; 3. a solution barrel; 4. a water pump; 5. an arc-shaped baffle plate; 6. a limiting plate; 7. a filter screen; 8. a water outlet pipe; 9. a first spring; 10. a connecting plate; 11. a water pipe; 12. a limiting groove; 13. a slide rail; 14. a sealing plate; 15. a jack; 16. a socket; 17. inserting a rod; 18. shifting blocks; 19. positioning a rod; 20. a second spring; 21. a rotating wheel; 22. a fixed rail; 23. a connecting rod.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. All other embodiments obtained by a person skilled in the art without any inventive work based on the embodiments of the present invention belong to the protection scope of the present invention.
In the description of the present invention, it is to be understood that the terms "open hole", "upper", "lower", "top", "middle", "inner", and the like indicate positional or orientational relationships and are merely for convenience of description and simplicity of description, and do not indicate or imply that the referenced component or element must have a particular orientation, be constructed and operated in a particular orientation, and therefore should not be construed as limiting the invention.
Please refer to fig. 1-5, the utility model relates to a plate quick recovery unit of a residual liquid, including bottom plate 1, the fixed surface of bottom plate 1 is connected with mounting bracket 2, fixed mounting has solution bucket 3 between mounting bracket 2 and the bottom plate 1, the inside sliding connection of solution bucket 3 has filter screen 7, be provided with the locating component who is used for fixed filter screen 7 between filter screen 7 and the solution bucket 3.
In an embodiment, for the above positioning assembly, the positioning assembly includes a positioning rod 19, the end of the filter screen 7 is fixedly connected with a pulling plate, the positioning rod 19 is slidably connected inside the pulling plate, the positioning rod 19 extends to the outside of the pulling plate and is fixedly connected with a connecting rod 23, the end of the connecting rod 23 is rotatably connected with a rotating wheel 21, the outer wall of the solution barrel 3 is fixedly connected with an arc baffle 5, the rotating wheel 21 extends to the inside of the arc baffle 5 and is movably connected with the arc baffle 5, the outer wall of the positioning rod 19 is sleeved with a second spring 20, the second spring 20 is located inside the pulling plate, so that the electroplating residue generated during electroplating is collected and cleaned through the positioning assembly and the filter screen 7, and further, the electroplating residue is prevented from being generated in the solution barrel during next electroplating, the purity of electroplating solution is influenced, the electroplating effect is specifically collected through the filter screen 7, and then the filter screen 7 is installed and detached through the positioning assembly, specifically, when the filter screen 7 is detached, the rotating wheel 21 is driven to move by pressing and rotating the connecting rod 23, and the arc baffle 5 is separated from the filter screen 7. In addition, the rotating wheel 21 is rotatably connected with the inner wall of the arc-shaped baffle 5, and when the arc-shaped baffle is used in a specific mode, the rotating wheel 21 and the arc-shaped baffle 5 are rotatably connected with rolling friction, so that friction force can be reduced compared with sliding friction.
In one embodiment, as for the solution barrel 3, a sealing plate 14 is slidably connected to the bottom of the solution barrel 3, and a distance adjusting mechanism for adjusting the position of the sealing plate 14 is arranged between the sealing plate 14 and the solution barrel 3, so that the sealing plate 14 can be mounted and dismounted through the distance adjusting mechanism, and waste liquid residues on the sealing plate 14 can be cleaned. In addition, the edge of the sealing plate 14 is provided with a sealing strip, and the sealing performance can be further improved by the sealing strip in specific application.
In an embodiment, for the distance adjusting mechanism, the distance adjusting mechanism includes a limiting plate 6, the limiting plate 6 is fixedly connected to the bottom of the solution barrel 3, a sliding rail 13 is fixedly connected to the surface of the limiting plate 6, the sealing plate 14 is slidably connected to the sliding rail 13, a limiting groove 12 is formed in the surface of the limiting plate 6, the sealing plate 14 extends into the limiting groove 12, a connecting plate 10 is fixedly connected to the top of the limiting plate 6, a first spring 9 is fixedly connected between the connecting plate 10 and the sealing plate 14, a socket 16 is fixedly connected to the bottom of the sealing plate 14, an inserting rod 17 is slidably inserted into the socket 16, the inserting rod 17 slidably penetrates through the sliding rail 13 and extends into the limiting groove 12, so that the position of the sealing plate 14 can be adjusted through the distance adjusting mechanism, the sealing plate 14 is convenient to mount and dismount with the solution barrel 3, the waste liquid residue on the sealing plate 14 is cleaned after dismounting, it is further ensured that the waste liquid residue on the sealing plate 14 does not remain inside when the solution barrel is used next time, the purity of the electroplating solution barrel is affected, and the electroplating solution effect is affected, specifically, when the inserting rod 17 is dismounted, the inserting rod 17 is pulled, the inserting rod 17 is not aligned with the sliding rail 13, and the inserting hole is aligned with another inserting hole 14, and the sealing plate 14 is positioned. In addition, the end of the limiting groove 12 is located at the bottom opening of the solution barrel 3, and when the limiting groove is used specifically, the sealing plate 14 can be limited, so that the position of the sealing plate 14 is fixed.
In one embodiment, for the socket 16, a movable groove is formed in an outer wall of the socket 16, a shifting block 18 is fixedly connected to an outer wall of the insertion rod 17, the shifting block 18 is movably connected in the movable groove, a plurality of insertion holes 15 are formed in the surface of the sliding rail 13, the insertion holes 15 correspond to the insertion rod 17, so that the insertion rod 17 is pulled through the shifting block 18, the position of the sealing plate 14 is further adjusted, when residues on the surface of the sealing plate 14 need to be cleaned, the shifting block 18 is pulled to pull the insertion hole 15 out of the insertion hole 17, the insertion rod 17 is then inserted into another insertion hole 15, and the sealing plate 14 is separated from the solution barrel 3, so that the sealing plate 14 can be cleaned. In addition, the number of the socket 16 and the insertion rod 17 is two, so that the connection stability of the sealing plate 14 and the solution barrel 3 can be ensured in specific application.
In one embodiment, for the above-mentioned mounting frame 2, a water pump 4 is fixedly mounted on the top of the mounting frame 2, a water pipe 11 is connected to a water inlet end of the water pump 4, the water pipe 11 extends to the inside of the solution barrel 2, so that the waste liquid in the solution barrel 3 is recovered by the water pump 4, and then the waste liquid is treated and then discharged. In addition, the water outlet end of the water pump 4 is connected with a waste liquid recycling bin, and the waste liquid recycling bin is located on the surface of the bottom plate 1 during specific application.
To sum up, with the help of the above technical scheme of the utility model, the electroplating residue that produces when electroplating is collected and cleared up through locating component and filter screen 7, and then there is not electroplating residue in the solution bucket when guaranteeing to electroplate next time, influence the purity of plating solution, thereby influence the electroplating effect, specifically collect electroplating residue through filter screen 7, install and dismantle filter screen 7 through locating component, specifically when dismantling, through pressing down and rotating connecting rod 23 and drive and rotate wheel 21 and remove, it breaks away from cowl 5 to rotate wheel 21, can take out filter screen 7.
In the description of the present specification, reference to the description of "one embodiment," "an example," "a specific example" or the like means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
The preferred embodiments of the invention disclosed above are intended only to help illustrate the invention. The preferred embodiments are not intended to be exhaustive or to limit the invention to the precise embodiments disclosed. Obviously, many modifications and variations are possible in light of the above teaching. The embodiments were chosen and described in order to best explain the principles of the invention and its practical application, to thereby enable others skilled in the art to best understand and utilize the invention. The invention is limited only by the claims and their full scope and equivalents.
Claims (5)
1. The utility model provides a plate quick recovery unit of a residual liquid, includes bottom plate (1), the fixed surface of bottom plate (1) is connected with mounting bracket (2), fixed mounting has solution bucket (3), its characterized in that between mounting bracket (2) and bottom plate (1): a filter screen (7) is connected inside the solution barrel (3) in a sliding manner, and a positioning assembly for fixing the filter screen (7) is arranged between the filter screen (7) and the solution barrel (3);
the utility model discloses a solution tank, including solution bucket (3), locating component, filter screen (7), locating lever (19) sliding connection are in the inside of taking out the board, locating lever (19) extend to the outside of taking out the board and fixedly connected with connecting rod (23), the tip of connecting rod (23) rotates and is connected with and rotates wheel (21), fixedly connected with cowl (5) on the outer wall of solution bucket (3), rotate wheel (21) extend to cowl (5) inside and with cowl (5) swing joint, second spring (20) have been cup jointed on the outer wall of locating lever (19), second spring (20) are located the inside of taking out the board.
2. The rapid recovery device of plating piece residual liquid according to claim 1, characterized in that: the bottom of the solution barrel (3) is connected with a sealing plate (14) in a sliding mode, and a distance adjusting mechanism used for adjusting the position of the sealing plate (14) is arranged between the sealing plate (14) and the solution barrel (3).
3. The rapid recovery device of plating piece residual liquid according to claim 2, characterized in that: the distance adjusting mechanism comprises a limiting plate (6), the limiting plate (6) is fixedly connected to the bottom of the solution barrel (3), a sliding rail (13) is fixedly connected to the surface of the limiting plate (6), a sealing plate (14) is connected with the sliding rail (13) in a sliding mode, a limiting groove (12) is formed in the surface of the limiting plate (6), the sealing plate (14) extends to the inside of the limiting groove (12), a connecting plate (10) is fixedly connected to the top of the limiting plate (6), a first spring (9) is fixedly connected between the connecting plate (10) and the sealing plate (14), a socket (16) is fixedly connected to the bottom of the sealing plate (14), an inserting rod (17) is inserted into the socket (16) in a sliding mode, and the inserting rod (17) penetrates through the sliding rail (13) in a sliding mode and extends to the inside of the limiting groove (12).
4. The rapid recovery device of plating piece residual liquid according to claim 3, characterized in that: the socket is characterized in that a movable groove is formed in the outer wall of the socket (16), a shifting block (18) is fixedly connected to the outer wall of the inserted link (17), the shifting block (18) is movably connected to the movable groove, a plurality of inserting holes (15) are formed in the surface of the sliding rail (13), and the inserting holes (15) correspond to the inserted link (17).
5. The rapid recovery device of plating piece residual liquid according to claim 4, characterized in that: the top fixed mounting of mounting bracket (2) has water pump (4), the end of intaking of water pump (4) is connected with water pipe (11), water pipe (11) extend to the inside of solution bucket (3), fixed intercommunication has outlet pipe (8) on the lateral wall of solution bucket (3), fixedly connected with fixed rail (22) on the inner wall of solution bucket (3), fixed rail (22) and filter screen (7) sliding connection.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202220824209.XU CN218621113U (en) | 2022-04-11 | 2022-04-11 | Quick recovery unit of a residual liquid plates |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN202220824209.XU CN218621113U (en) | 2022-04-11 | 2022-04-11 | Quick recovery unit of a residual liquid plates |
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CN218621113U true CN218621113U (en) | 2023-03-14 |
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CN202220824209.XU Active CN218621113U (en) | 2022-04-11 | 2022-04-11 | Quick recovery unit of a residual liquid plates |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN116427010A (en) * | 2023-06-12 | 2023-07-14 | 仪征市华扬电镀有限公司 | Metal electroplating residual liquid recycling device |
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2022
- 2022-04-11 CN CN202220824209.XU patent/CN218621113U/en active Active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN116427010A (en) * | 2023-06-12 | 2023-07-14 | 仪征市华扬电镀有限公司 | Metal electroplating residual liquid recycling device |
CN116427010B (en) * | 2023-06-12 | 2023-09-22 | 仪征市华扬电镀有限公司 | Metal electroplating residual liquid recycling device |
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Legal Events
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GR01 | Patent grant | ||
GR01 | Patent grant | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of utility model: A Rapid Recovery Device for Residual Liquid in Plating Parts Effective date of registration: 20231108 Granted publication date: 20230314 Pledgee: Shenzhen SME financing Company limited by guarantee Pledgor: SHENZHEN XINFUHUA SURFACE TECHNOLOGY Co.,Ltd. Registration number: Y2023980064699 |
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PE01 | Entry into force of the registration of the contract for pledge of patent right |