CN218574119U - Open type liquid tank structure suitable for gravure coating - Google Patents
Open type liquid tank structure suitable for gravure coating Download PDFInfo
- Publication number
- CN218574119U CN218574119U CN202223138871.9U CN202223138871U CN218574119U CN 218574119 U CN218574119 U CN 218574119U CN 202223138871 U CN202223138871 U CN 202223138871U CN 218574119 U CN218574119 U CN 218574119U
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- gravure coating
- structure suitable
- groove
- bottom groove
- coating according
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- 239000007788 liquid Substances 0.000 title claims abstract description 46
- 238000007756 gravure coating Methods 0.000 title claims abstract description 20
- 239000012530 fluid Substances 0.000 claims 7
- 239000002002 slurry Substances 0.000 abstract description 30
- 238000000576 coating method Methods 0.000 abstract description 8
- 239000011248 coating agent Substances 0.000 abstract description 7
- 238000001556 precipitation Methods 0.000 abstract description 3
- 239000002699 waste material Substances 0.000 abstract description 3
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 230000000903 blocking effect Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
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Abstract
The application relates to an open type liquid tank structure suitable for gravure coating, which comprises an arc-shaped bottom structure, wherein the arc-shaped bottom structure is a bottom tank with an arc-shaped bottom surface; the liquid tank expanding structure comprises expanding parts arranged on two sides of the width direction of a notch of the bottom tank and end plates fixed on two ends of the expanding part in the length direction, and the expanding parts and the end plates are matched with each other to enclose an expanding area arranged above the bottom tank. The coating machine has the advantages of being capable of performing normal coating operation on a small amount of slurry and reducing slurry waste and precipitation.
Description
Technical Field
The application relates to the technical field of gravure coating, in particular to an open type liquid tank structure suitable for gravure coating.
Background
At present, a gravure coating head adopts a liquid tank with a horizontal or inclined bottom structure, can be suitable for various gravure roll coatings, and is widely used in roll-to-roll coating in lithium battery and photoelectric display industries; the coating head structure generally comprises a gravure roller, a scraper, a rubber compression roller, a liquid tank, a slurry circulating device, a slurry filtering device, a pressure adjusting device, a liquid supply device and a gravure clamping device; the material is supplied to the material groove through the liquid supply system, the pulp enters the mesh on the surface of the gravure roller after the gravure plate is contacted with the pulp in the liquid groove, the redundant material on the surface is removed through the scraper, and the material is transferred to the surface of the foil in the operation process under the pressure of the rubber compression roller.
Most of the existing liquid tanks adopt a flat-bottom or inclined-bottom structure, and slurry can well infiltrate the gravure roller after entering the liquid tank and needing to fill most of bottom space; however, the flat bottom or inclined bottom structure adopted by the liquid tank is easy to settle under the conditions of small amount of slurry and easy settling, and the problems of slurry settling or material shortage are easily caused, so that the attenuation of the subsequent coating thickness is influenced, and the product quality and the production efficiency are influenced, and thus the improvement is needed.
SUMMERY OF THE UTILITY MODEL
In order to solve the problems that a small amount of slurry can be used on a coating machine and the slurry is easy to settle, the application provides an open type liquid groove structure suitable for gravure coating.
The application provides an open cistern structure suitable for gravure coating adopts following technical scheme:
an open type liquid groove structure suitable for gravure coating comprises an arc-shaped bottom structure, wherein the arc-shaped bottom structure is a bottom groove with an arc-shaped bottom surface;
the liquid tank expansion structure comprises expansion parts arranged on two sides of the width direction of the notch of the bottom tank and end plates fixed on two ends of the expansion parts in the length direction, wherein the expansion parts and the end plates are mutually matched to enclose an expansion area arranged above the bottom tank.
By adopting the technical scheme, the bottom groove is arc-shaped, when the gravure printing device is used, the gravure roller is soaked into the slurry in the bottom groove and the expansion area, the contact distance between the bottom groove and the gravure roller is short, a small amount of slurry can be coated, the slurry waste caused by slurry debugging and the bottom slurry precipitation in the production process are reduced, and the production efficiency and the product quality are improved; secondly, the arrangement of the liquid tank expansion structure can prevent the slurry from overflowing, and the other convenience can contain more slurry, thereby shortening the slurry adding frequency and reducing the operation of workers.
Preferably, the diameter of the circular arc on the bottom surface of the bottom groove is 20mm larger than that of the plate roller.
By adopting the technical scheme, the diameter of the circular arc of the bottom surface of the bottom groove is larger than that of the printing roller, so that the printing roller can fully soak the slurry.
Preferably, the end of the bottom groove is integrally formed with the end plate.
By adopting the technical scheme, the end part of the bottom groove and the end plate are integrally formed, and the structure is simple and easy to process; meanwhile, the firmness of the integrated forming is higher, and the sealing performance of the liquid slurry is better.
Preferably, the expansion part comprises an edge chamfer structure, and the edge chamfer structure is a chamfer arranged at the bottom of the expansion part.
Through adopting above-mentioned technical scheme, the chamfer sets up in order to reduce safety and clean problem, reduces the potential safety hazard.
Preferably, the structure comprises a gravure shaft hole structure, the gravure shaft hole structure is provided with abdicating holes respectively arranged on the two end plates, and the two abdicating holes are symmetrically arranged relative to the midpoint of the bottom groove.
By adopting the technical scheme, the abdicating hole is used for placing the roller shaft of the gravure roller when in use, so that the positioning effect is achieved, and the matching of the gravure roller and the bottom groove is ensured.
Preferably, the abdicating hole is a semicircular hole.
Through adopting above-mentioned technical scheme, the hole of stepping down is the semicircle orifice, and its diapire is laminated with the outer wall of gravure roller more.
Preferably, the circle center of the abdicating hole and the circle center of the end face of the bottom groove are on the same axis.
By adopting the technical scheme, the circle center of the abdicating hole and the circle center of the end face of the bottom groove are positioned on the same axis, so that the matching of the gravure roller and the bottom groove is further ensured.
Preferably, the expansion part comprises a bottom plate and a side plate, wherein the bottom plate is connected with the edge of the notch of the bottom groove, and the bottom plate is obliquely and downwards arranged towards one side close to the direction of the bottom groove; the side plate is fixed on one side of the bottom plate far away from the bottom groove.
Through adopting above-mentioned technical scheme, the extension includes bottom plate and curb plate, and wherein the bottom plate slope sets up to be favorable to reducing the accumulation of thick liquids deposit on the bottom plate.
Preferably, the bottom groove is communicated with a liquid inlet pipe and a liquid outlet pipe; the bottom surface of the bottom groove is fixedly provided with an inverted U-shaped shielding block, and the U-shaped opening of the shielding block faces the pipe orifice of the liquid inlet pipe.
By adopting the technical scheme, when liquid is fed, the flow speed is too high, and the slurry is sprayed out from the feeding pipe and is easy to impact on the plate roller to damage the plate roller, so that the blocking block is arranged to block the sprayed slurry, and the slurry flows into the groove from two ends of the opening of the blocking block; thereby protecting the plate roller.
In summary, the present application includes at least one of the following beneficial technical effects:
1. when the gravure roll is used, the gravure roll is soaked into the slurry in the bottom groove and the expansion area, the contact distance between the bottom groove and the gravure roll is short, coating operation can be performed on a small amount of slurry, slurry waste caused by slurry debugging and bottom slurry precipitation in the production process are reduced, and the production efficiency and the product quality are improved;
2. the structure of the application is easy to process, and convenient and fast to detach and install.
Drawings
FIG. 1 is a schematic overall view of an open type liquid bath structure suitable for gravure coating in an embodiment of the present application.
FIG. 2 is a schematic diagram of an embodiment of the present invention for showing the structure of liquid inlet pipe and liquid outlet pipe.
Description of reference numerals: 1. a circular arc-shaped bottom structure; 11. a bottom groove; 111. a liquid inlet pipe; 112. a liquid outlet pipe; 2. a liquid tank expansion structure; 21. an expansion unit; 211. a base plate; 212. a side plate; 22. an end plate; 3. an edge chamfering structure; 31. chamfering; 4. a gravure shaft hole structure; 41. a hole of abdication; 5. and (6) blocking the blocks.
Detailed Description
The present application is described in further detail below with reference to figures 1-2.
The embodiment of the application discloses an open type liquid tank structure suitable for gravure coating. Referring to fig. 1, the liquid tank structure comprises a circular arc bottom structure 1, a liquid tank expansion structure 2, an edge chamfer structure 3 and a gravure shaft hole structure 4.
Referring to fig. 1, the circular arc bottom structure 1 is a bottom groove 11 with an arc-shaped bottom surface and an arc-shaped end part; the diameter of the arc of the bottom surface of the bottom groove 11 is 20mm larger than that of the printing roller; the liquid tank expansion structure 2 is an expansion part 21 arranged at two sides of the width direction of the notch of the bottom tank 11 and an end plate 22 fixed at two ends of the length direction of the expansion part 21, and the expansion part 21 and the end plate 22 are mutually matched to enclose an expansion area arranged above the bottom tank 11; the ends of the bottom channel 11 are integrally formed with the end plate 22.
Referring to fig. 1, the edge chamfer structure 3 is a chamfer 31 provided at the bottom of the extension 21; the expansion part 21 comprises a bottom plate 211 and a side plate 212, wherein the bottom plate 211 is connected with the edge of the notch of the bottom groove 11 in a welding way, and the bottom plate 211 is arranged downwards in an inclined way towards one side close to the direction of the bottom groove 11; the side plate 212 is welded on one side of the bottom plate 211 far away from the bottom groove 11, and the chamfer 31 is arranged at the joint of the bottom plate 211 and the side plate 212.
Referring to fig. 1, the intaglio shaft hole structure 4 is provided with two yielding holes 41 respectively arranged on the two end plates 22, the two yielding holes 41 are symmetrically arranged relative to the center of the bottom groove 11, the yielding holes 41 are semicircular holes, and the center of the yielding holes 41 and the center of the end surface of the bottom groove 11 are on the same axis. In use, the roller shaft is placed in the abdicating hole 41 and the roller body is immersed in the slurry in the bottom tank 11.
Referring to fig. 1 and 2, the bottom tank 11 is communicated with liquid inlet pipes 111 and liquid outlet pipes 112, wherein three liquid inlet pipes 111 are provided, and one liquid outlet pipe 112 is provided; three inverted U-shaped shielding blocks 5 are fixed on the bottom surface of the bottom groove 11 through bolts, and U-shaped openings of the three shielding blocks 5 face the pipe orifices of the three liquid inlet pipes 111 respectively; during liquid inlet, slurry enters and is sprayed out from the liquid inlet pipe 111 under the action of a circulating pump (not shown in the figure), and under the shielding of the shielding block 5, the slurry flows into the groove from two ends of the U-shaped opening of the shielding block 5; and is discharged from outlet pipe 112 by the circulation pump.
The above embodiments are preferred embodiments of the present application, and the protection scope of the present application is not limited by the above embodiments, so: equivalent changes in structure, shape and principle of the present application shall be covered by the protection scope of the present application.
Claims (9)
1. An open type liquid groove structure suitable for gravure coating is characterized in that: the device comprises an arc-shaped bottom structure (1), wherein the arc-shaped bottom structure (1) is a bottom groove (11) with an arc-shaped bottom surface;
the liquid tank expansion structure (2) is characterized in that the liquid tank expansion structure (2) is an expansion part (21) arranged on two sides of the width direction of a notch of the bottom tank (11) and end plates (22) fixed on two ends of the expansion part (21) in the length direction, and the expansion part (21) and the end plates (22) are matched with each other to enclose an expansion area arranged above the bottom tank (11).
2. The open fluid bath structure suitable for gravure coating according to claim 1, wherein: the diameter of the arc diameter of the bottom surface of the bottom groove (11) is 20mm larger than that of the plate roller.
3. The open fluid bath structure suitable for gravure coating according to claim 1, wherein: the end part of the bottom groove (11) and the end plate (22) are integrally formed.
4. The open fluid bath structure suitable for gravure coating according to claim 1, wherein: the edge chamfering structure (3) is a chamfer (31) arranged at the bottom of the expansion part (21).
5. An open bath structure suitable for gravure coating according to claim 1, wherein: the structure comprises a gravure shaft hole structure (4), the gravure shaft hole structure (4) is provided with yielding holes (41) respectively arranged on two end plates (22), and the two yielding holes (41) are symmetrically arranged relative to the midpoint of a bottom groove (11).
6. An open fluid bath structure suitable for gravure coating according to claim 5, wherein: the abdicating hole (41) is a semicircular hole.
7. The open fluid bath structure suitable for gravure coating according to claim 6, wherein: the circle center of the abdicating hole (41) and the circle center of the end face of the bottom groove (11) are on the same axis.
8. The open fluid bath structure suitable for gravure coating according to claim 1, wherein: the expansion part (21) comprises a bottom plate (211) and a side plate (212), wherein the bottom plate (211) is connected with the edge of the notch of the bottom groove (11), and the bottom plate (211) is obliquely and downwards arranged towards one side close to the direction of the bottom groove (11); the side plate (212) is fixed on one side of the bottom plate (211) far away from the bottom groove (11).
9. The open fluid bath structure suitable for gravure coating according to claim 1, wherein: the bottom groove (11) is communicated with a liquid inlet pipe (111) and a liquid outlet pipe (112); the bottom surface of the bottom groove (11) is fixedly provided with an inverted U-shaped shielding block (5), and the U-shaped opening of the shielding block (5) faces to the pipe opening of the liquid inlet pipe (111).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202223138871.9U CN218574119U (en) | 2022-11-25 | 2022-11-25 | Open type liquid tank structure suitable for gravure coating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202223138871.9U CN218574119U (en) | 2022-11-25 | 2022-11-25 | Open type liquid tank structure suitable for gravure coating |
Publications (1)
Publication Number | Publication Date |
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CN218574119U true CN218574119U (en) | 2023-03-07 |
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ID=85378152
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN202223138871.9U Active CN218574119U (en) | 2022-11-25 | 2022-11-25 | Open type liquid tank structure suitable for gravure coating |
Country Status (1)
Country | Link |
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CN (1) | CN218574119U (en) |
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2022
- 2022-11-25 CN CN202223138871.9U patent/CN218574119U/en active Active
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