CN218470109U - Gas treatment equipment - Google Patents

Gas treatment equipment Download PDF

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Publication number
CN218470109U
CN218470109U CN202222452236.1U CN202222452236U CN218470109U CN 218470109 U CN218470109 U CN 218470109U CN 202222452236 U CN202222452236 U CN 202222452236U CN 218470109 U CN218470109 U CN 218470109U
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Prior art keywords
shell
gas
manometer
gas treatment
handle
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CN202222452236.1U
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Chinese (zh)
Inventor
周国忠
孙中丰
刘洋
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Suzhou Langdao Energy Saving Technology Co ltd
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Suzhou Langdao Energy Saving Technology Co ltd
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Abstract

The utility model belongs to the technical field of gaseous processing, leakage maintenance, specifically be a gaseous treatment facility, which comprises a housin, casing top threaded connection has a shell, the intake pipe has been seted up at top shell middle part, the reservation jar of no top form is installed at the casing top, reserve the inner wall of jar and install the manometer, the sealing ring has been seted up to top shell bottom, the tank deck portion is reserved through sealed pad meshing to the sealing ring bottom, reserve the tank bottoms and handle the shell through the valve correspondence and communicate mutually, it is connected with the pump body through the siphunculus to handle the shell bottom, siphunculus internally mounted has down the manometer, the signal output part of going up manometer and manometer down corresponds warning module signal input part and is connected. The utility model discloses be favorable to confirming the position of leaking fast when gas leakage, be favorable to examining whether gas treatment equipment's intake pipe leaks, guarantee simultaneously that gas treatment equipment self leaks the quick feedback.

Description

Gas treatment equipment
Technical Field
The utility model relates to a gas treatment, leakage maintenance technical field specifically are a gas treatment equipment.
Background
The industrial waste gas treatment refers to the work of pre-treating waste gas generated in industrial places such as factories and workshops before the waste gas is discharged to the outside so as to reach the national standard of the external discharge of the waste gas.
The prior Chinese patent (with the publication number of CN 215654282U) and a gas processing mechanism for semiconductor manufacturing process are disclosed, when gas to be processed needs to be filtered, a worker can put the filtered substance needed by the gas into a filtering pipeline, then connecting seats of a transmission gas pipe and a transit pipe are respectively fixed with connecting seats at two sides of the filtering pipeline through bolts, the gas can be filtered by the filtered substance in the filtering pipeline after passing through the filtering pipeline, if the gas needs to be diluted, the worker firstly detaches connecting seats of the transmission gas pipe and the transit pipe from the connecting seats at two sides of the filtering pipeline, then rotates a dilution pipe to a position between the connecting seat of the transmission gas pipe and the connecting seat of the transit pipe through a rotating rod and fixedly communicates the dilution pipe, then open miniature air pump and to the inside injected gas of dilutent pipe, gas that can be injected by miniature air pump after getting into dilutent pipe inside that semiconductor system is used dilutes, reached and made things convenient for the gas to different characteristics to filter or dilute the effect of handling, however, in the tail gas treatment process of semiconductor, because its gas is comparatively complicated, gas needs complete prestoring in the device, and gas corrodes the metal of device along with the time lapse, lead to the problem of device leakage easily, the tradition mode needs to set up the detection head in the inside of device, detect gas, and the leakage point position is difficult to confirm, and simultaneously and partial gas diffusivity is very fast, make the detection head be difficult to reach to composition detection content time, lead to the unable discovery of leakage short time.
Therefore, the gas treatment equipment is beneficial to quickly determining the leakage position when gas leaks, is beneficial to checking whether the gas inlet pipe of the gas treatment equipment leaks or not, and simultaneously ensures quick feedback of the leakage of the gas treatment equipment.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a gas treatment equipment, in order to solve the tail gas treatment process of the semiconductor that proposes in the above-mentioned background art, because its gas is comparatively complicated, gas needs complete prestoring in the device, and gaseous metal corrosion to the device along with time lapse, lead to the problem of device leakage easily, traditional mode needs to set up the detection head in the inside of device, detect gas, and the leakage point position is difficult to confirm, and the diffusivity of partial gas is very fast simultaneously, make the detection head be difficult to reach composition detection content very much, lead to leaking the unable problem of discovering of short time.
In order to achieve the above object, the utility model provides a following technical scheme: the utility model provides a gas treatment equipment, which comprises a housin, casing top threaded connection has a top shell, the intake pipe has been seted up at top shell middle part, the reservation jar of no top form is installed at the casing top, reserve the inner wall of jar and install the manometer, the sealing ring has been seted up to top shell bottom, the tank deck portion is reserved through sealed pad meshing in sealing ring bottom, it corresponds through the valve to reserve the tank bottoms portion and handles the shell and communicate mutually, it is connected with the pump body through the siphunculus to handle the shell bottom, siphunculus internally mounted has down the manometer, the signal output part who goes up manometer and manometer down corresponds warning module signal input part and is connected.
Preferably, the bottom of the air inlet pipe is communicated with the reserved tank correspondingly, and the valve is an electric control valve body.
Preferably, install in the processing shell and handle a section of thick bamboo, and handle a section of thick bamboo and correspond valve and siphunculus respectively from top to bottom and be linked together, handle a section of thick bamboo surface and be the filter screen structure, handle shell internally mounted and have gas treater.
Preferably, the left end of the pump body is communicated with an air outlet pipe, and the air outlet pipe penetrates through the shell.
Preferably, the pump body is connected with a control valve through a not-gate switch, and the pump body starts the control valve to open.
Compared with the prior art, the beneficial effects of the utility model are that:
the utility model discloses a gas treatment equipment, through last manometer, lower manometer, the setting of the valve and the pump body, be located and reserve the jar through last manometer, pressure formation including the channel pipe of connecting the intake pipe detects when the intake pipe, the index gliding appears in the detection pressure when last manometer, explain that the pipeline more than reserving the jar appears leaking the problem, and the tail end in the gas treatment link is located to the lower pressure meter, the index gliding appears in the detection pressure in the manometer down, then explain the problem of leaking appears in the gas treatment device, be favorable to the position of short-term determination leakage when gas leakage, be favorable to examining whether the intake pipe of gas treatment equipment leaks, guarantee gas treatment equipment self simultaneously and leak quick feedback.
Drawings
FIG. 1 is a schematic view of the overall structure of the gas treatment apparatus of the present invention;
FIG. 2 is a schematic sectional view of the whole internal structure of the gas treatment apparatus of the present invention;
fig. 3 is a schematic view of the top shell structure of the gas processing device of the present invention.
In the figure: 1. a housing; 2. a top shell; 3. an air inlet pipe; 4. an air outlet pipe; 5. treating the shell; 6. a valve; 7. reserving a tank; 8. a pressure gauge is arranged; 9. a treatment cylinder; 10. a gas processor; 11. a lower pressure gauge; 12. a pump body; 13. pipe passing; 14. and (4) a sealing ring.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
In the description of the present invention, it is to be understood that the terms "upper", "lower", "front", "rear", "left", "right", "top", "bottom", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention.
Example (b):
referring to fig. 1-3, the present invention provides a technical solution: a gas treatment device comprises a shell 1, wherein the top of the shell 1 is in threaded connection with a top shell 2, an air inlet pipe 3 is arranged in the middle of the top shell 2, a top-free reserved tank 7 is arranged at the top of the shell 1, an upper pressure gauge 8 is arranged on the inner wall of the reserved tank 7, a sealing ring 14 is arranged at the bottom of the top shell 2, the bottom of the sealing ring 14 is meshed with the top of the reserved tank 7 through a sealing gasket, the bottom of the reserved tank 7 is communicated with a treatment shell 5 through a valve 6, the bottom of the treatment shell 5 is connected with a pump body 12 through a through pipe 13, a lower pressure gauge 11 is arranged inside the through pipe 13, and signal output ends of the upper pressure gauge 8 and the lower pressure gauge 11 are connected with a signal input end of a warning module 15;
in the gas treatment process of a semiconductor processing or industrial system, the gas content is relatively complex, and the component content is not fixed, so that a pipeline for transporting gas has certain corrosivity to the pipeline and the gas treatment in the long-term use process, in order to ensure the sealing property, a plurality of sealing materials are adopted in the internal structure, the sealing property is improved by sealing rubber gaskets and the like, the problem of leakage is avoided due to the fact that the sealing materials are limited by the materials, the pipeline and the gas treatment are aged and corroded by the aid of the sealing materials, initial leakage is random in position, partial industrial gas is diffused fast, a detection head cannot receive high-content gas right, the gas enters a treatment shell 5 through a valve 6 by positioning an upper pressure gauge 8 in a reserved tank 7, when a gas inlet pipe 3 comprises a channel pipe connected with the gas inlet pipe 3 to form detection, when the detection pressure in the upper pressure gauge 8 slides down exponentially, the warning module 15 for indicating that the pipeline above the reserved tank 7 has a leakage problem is started, when no leakage problem exists at the upper end, the gas enters a treatment shell 5 through the valve 6, impurities in the gas and the gas enters a treatment shell 10, the gas treatment shell 11 is started when the pressure of the lower pressure detection device 11 starts, the lower pressure detection module 11, the lower pressure of the gas treatment device 11, and the gas treatment device 11 does not change.
The bottom of the air inlet pipe 3 is communicated with a reserved tank 7 correspondingly, and the valve 6 is an electric control valve body;
the gas of semiconductor processing or industry system corresponds intake pipe 3 through the connecting pipe and is linked together, and valve 6 is automatically controlled valve 6, and when valve 6 closed, and outside gas lasts to flow in, goes up 8 exponential straight-lines of manometer and rises.
Wherein, a treatment barrel 9 is arranged in the treatment shell 5, the upper part and the lower part of the treatment barrel 9 are respectively communicated with a through pipe 13 corresponding to a valve 6, the surface of the treatment barrel 9 is of a filter screen structure, and a gas processor 10 is arranged in the treatment shell 5;
can filter the graininess impurity that contains in the gas through the filter screen structure who handles a section of thick bamboo 9 surface, the ware filter screen needs regularly clear up, carries out purification treatment to gas through gas processor 10, needs to notice, and it needs adopt different gas processors 10 to accomplish corresponding processing to produced different composition gas according to specific application process, therefore gas processor 10 need adopt different models according to making its purification gas cost difference.
The left end of the pump body 12 is communicated with an air outlet pipe 4, and the air outlet pipe 4 penetrates through the shell 1;
the finished gas is discharged from the gas outlet pipe 4 through the pump body 12, the tail end of the gas outlet pipe 4 is communicated with an external connecting pipe, and a pressurizing sealing gasket is needed at the joint.
The pump body 12 is connected with a control valve through a not-gate switch, and the pump body 12 starts the control valve to open;
when the pump body 12 is not in standby, the control valve is in a closed state, and when the pump body 12 is activated, the control valve is in an open state.
The working principle is as follows: the gas of semiconductor processing or industrial system is communicated with gas inlet pipe 3 through connecting pipe, valve 6 is electric control valve 6, through last manometer 8 is located in reserve jar 7, when valve 6 is closed, and the external gas continuously flows in, go up manometer 8 index straight line and rise, when gas inlet pipe 3 includes the pressure formation detection of the channel pipe of connecting intake pipe 3, when valve 6 is closed, the index gliding appears when the detection pressure in last manometer 8, indicate that pipeline above reserve jar 7 appears the leakage problem warning module 15 and starts, when there is no leakage problem in the upper end, the gas passes through valve 6 and enters into processing shell 5, the impurity in the gas filters through the filter screen of processing barrel 9, the filter screen needs to be regularly cleared, purify the gas through gas processor 10, it needs to pay attention, it needs to be according to specific application process, adopt different gas processors 10 to accomplish corresponding processing to the produced different composition gas, therefore gas processor 10 need to adopt different models according to make its purified gas cost, and enter pump body 12 through siphunculus 13, and down manometer 11 is located in tail end of gas processing link, when valve 6 and the pressure control valve 15 in the lower end of controlling and start the leak out of the connection pipe, the leak detection of the sealed pipe 15 and start the gas processor and start the pressure detection device appears.
Having shown and described the basic principles and principal features of the invention and advantages thereof, it will be apparent to those skilled in the art that the invention is not limited to the details of the foregoing exemplary embodiments, but is capable of other specific forms without departing from the spirit or essential characteristics thereof; the present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein, and any reference signs in the claims are not to be construed as limiting the claim concerned.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims (5)

1. The utility model provides a gas treatment equipment, includes casing (1), casing (1) top threaded connection has top shell (2), intake pipe (3), its characterized in that have been seted up at top shell (2) middle part: casing (1) top is installed and is had reservation jar (7) of form of top, reserve jar (7) inner wall and install manometer (8), sealing ring (14) have been seted up to top shell (2) bottom, sealing ring (14) bottom is reserved jar (7) top through sealed the meshing, it corresponds through valve (6) to reserve jar (7) bottom and handles shell (5) and be linked together, it is connected with pump body (12) through siphunculus (13) to handle shell (5) bottom, siphunculus (13) internally mounted has manometer (11) down, the signal output part who goes up manometer (8) and holding down force meter (11) corresponds warning module (15) signal input part and is connected.
2. A gas treatment plant according to claim 1, characterized in that: the bottom of the air inlet pipe (3) is communicated with the reserved tank (7), and the valve (6) is an electric control valve body.
3. A gas treatment plant according to claim 1, characterized in that: install in handling shell (5) and handle a section of thick bamboo (9), and handle a section of thick bamboo (9) and correspond valve (6) and siphunculus (13) respectively from top to bottom and be linked together, it is filter screen structure to handle a section of thick bamboo (9) surface, it has gaseous treater (10) to handle shell (5) internally mounted.
4. A gas treatment plant according to claim 1, characterized in that: the left end of the pump body (12) is communicated with an air outlet pipe (4), and the air outlet pipe (4) penetrates through the shell (1).
5. A gas treatment plant according to claim 1, characterized in that: the pump body (12) is connected with a control valve through a NOT gate switch, and the pump body (12) starts the control valve to open.
CN202222452236.1U 2022-09-16 2022-09-16 Gas treatment equipment Active CN218470109U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202222452236.1U CN218470109U (en) 2022-09-16 2022-09-16 Gas treatment equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202222452236.1U CN218470109U (en) 2022-09-16 2022-09-16 Gas treatment equipment

Publications (1)

Publication Number Publication Date
CN218470109U true CN218470109U (en) 2023-02-10

Family

ID=85142826

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202222452236.1U Active CN218470109U (en) 2022-09-16 2022-09-16 Gas treatment equipment

Country Status (1)

Country Link
CN (1) CN218470109U (en)

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