CN218461956U

CN218461956U - Ion implantation clamp

Info

Publication number: CN218461956U
Application number: CN202222311610.6U
Authority: CN
Inventors: 王军委; 曹将栋; 胡成龙; 刘思佳; 刘硕
Original assignee: Jiangsu Vocational and Technical Shipping College
Current assignee: Jiangsu Vocational and Technical Shipping College
Priority date: 2022-08-31
Filing date: 2022-08-31
Publication date: 2023-02-10
Anticipated expiration: 2032-08-31

Abstract

The utility model discloses an ion implantation clamp, which comprises a base plate, stand group and fixture group, stand group comprises N stands that are circular array distribution, the lower extreme of each stand is fixed on the base plate, fixture group comprises N fixture, N fixture corresponds respectively and installs on N stands, each fixture includes the first spout that forms on the stand that corresponds towards the stand group center and vertical setting, the first slider of slidable mounting in the first spout, the first vertical lead screw that rotationally installs in the first spout and with first slider threaded connection and one end fix on the first slider and the other end towards the grip block of stand group center, the roof of first spout is stretched out to the upper end of first vertical lead screw; the utility model discloses an ion implantation anchor clamps can adopt mechanical mode to carry out the centre gripping to the invalid area of wafer, and the centre gripping is stable, and is with low costs, can the wafer of the multiple specification of centre gripping.

Description

Ion implantation clamp

Technical Field

The utility model relates to an ion implantation technical field, in particular to ion implantation anchor clamps.

Background

A wafer chuck is one of important components of an ion implanter for supporting a wafer (e.g., an IGBT wafer) during an ion implantation process of the wafer.

Most of the existing ion implantation slide systems adopt an electrostatic chuck. The electrostatic chuck is a device for generating induced charges to suck the wafer by an electrostatic induction principle. The working principle is as follows: when the electrode is electrified, the dielectric layer generates induced charges, the charges induce the wafer to induce equivalent corresponding charges, and the two charges attract each other, so that the wafer is firmly attracted; when the electrode is powered off, the induced charges disappear, and the wafer can be taken away by the manipulator.

When the electrode is powered off, residual charges are still present on the back surface of the wafer, and the wafer is still adsorbed on the electrostatic chuck due to the residual charges, so that the wafer is inconvenient to take. In this regard, a small amount of gas is introduced between the electrostatic chuck and the wafer, but this causes the wafer to bounce upward, shift its position, and even fall. If the wafer is detached from the wafer holder, the wafer is broken. The adoption of the electrostatic chuck has the defects of high equipment cost, unstable slide and the like.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to overcome foretell not enough, the utility model provides an ion implantation anchor clamps can adopt mechanical mode to carry out the centre gripping to the wafer.

The utility model provides a pair of ion implantation anchor clamps, which comprises a base plate, stand group and fixture group, stand group comprises N stands that are circular array distribution, the lower extreme of every stand is fixed on the base plate, fixture group comprises N fixture, N fixture corresponds respectively and installs on N stands, every fixture is including forming on one side at corresponding stand orientation stand group center and the first spout of vertical setting, slidable mounting is at first slider in first spout, rotationally install in first spout and fix on first slider and the other end towards the grip block at stand group center with first vertical lead screw and the one end of first slider threaded connection, the roof of first spout is stretched out to the upper end of first vertical lead screw.

The limiting driving mechanism comprises longitudinal guide rails fixed on the lower sides of the N substrates, third slide blocks slidably mounted in the longitudinal guide rails, third longitudinal lead screws rotatably mounted in the longitudinal guide rails and in threaded connection with the third slide blocks, and the other ends of the stay ropes are fixedly connected with the third slide blocks.

Further, spacing actuating mechanism still includes spacing locking part, and spacing locking part is including forming on the third slider and the third screw thread fastening through-hole that transversely sets up, forming the third longitudinal groove on the diapire of guide rail and one end and third screw thread fastening through-hole threaded connection back and the third fastening bolt of the tank bottom butt in third longitudinal groove.

Further, the elastic restoring member is a spring.

Furthermore, the rope passage is 7 characters, and the limiting mechanism further comprises a fixed pulley which is rotatably arranged at the corner of the rope passage.

Further, the cross section of the upright post is square.

Further, fixture still wraps the centre gripping locking part, and centre gripping locking part is including forming on first slider and the first screw fastening through-hole that transversely sets up, forming on the diapire of first spout first vertical groove and one end and the first fastening bolt of the tank bottom butt in first vertical groove behind the screw thread connection of first screw fastening through-hole.

Further, a first knob is fixedly arranged at the upper end of the first longitudinal screw rod.

Further, N is 3.

The beneficial effects of the utility model are that: the utility model discloses an ion implantation anchor clamps can adopt mechanical mode to carry out the centre gripping to the invalid area of wafer, and the centre gripping is stable, and is with low costs, and through adjusting stop gear and fixture, can the multiple diameter of centre gripping, the wafer of thickness.

Drawings

Fig. 1 is a schematic structural diagram of an ion implantation clamp according to an embodiment of the present invention;

fig. 2 is a cross-sectional view of an ion implantation clamp in an embodiment of the present invention;

FIG. 3 is an enlarged view of a portion A of FIG. 1;

fig. 4 is a partially enlarged view of a portion B in fig. 1.

In the figure, 1 is a column, 2 is a second sliding groove, 3 is a second sliding block, 4 is an elastic restoring piece, 5 is a rope channel, 6 is a fixed pulley, 7 is a pull rope, 8 is a longitudinal guide rail, 9 is a third sliding block, 10 is a third longitudinal screw rod, 11 is a third longitudinal groove, 12 is a third fastening bolt, 13 is a first sliding groove, 14 is a first sliding block, 15 is a first longitudinal screw rod, 16 is a clamping block, 17 is a first longitudinal groove, 18 is a first fastening bolt, 19 is a base plate, and 20 is a first knob.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be obtained by a person skilled in the art without making any creative effort based on the embodiments in the present invention, belong to the protection scope of the present invention.

Fig. 1 is a schematic structural diagram of an ion implantation clamp according to an embodiment of the present invention; fig. 2 is a cross-sectional view of an ion implantation clamp in an embodiment of the present invention.

As shown in fig. 1 and fig. 2, an ion implantation clamp in the present embodiment includes a substrate 19, a limiting mechanism set, a limiting driving mechanism, and a clamping mechanism set.

The limiting mechanism group comprises N limiting mechanisms, and each limiting mechanism comprises an upright post 1, a second sliding groove 2, a second sliding block 3, an elastic restoring piece 4, a rope channel 5, a fixed pulley 6 and a pull rope 7.

The second runner 2 is formed on the base plate 19 with one end of the second runner 2 facing the center of the set of uprights 1.

The second slider 3 is slidably mounted on the second runner 2.

The lower end of the upright post 1 is fixedly arranged on the second sliding block 3. The cross section of the upright post 1 is square. N stand 1 is the circular array distribution, constitutes 1 groups of stand jointly. In the present embodiment, N is 3.

The both ends of elasticity restoring member 4 are connected with the diapire of second slider 3 and second spout 2 respectively, and elasticity restoring member 4 is the spring.

The rope passage 5 is formed in the base plate 19 as a 7-shaped passage composed of a transverse passage and a longitudinal passage, wherein one end of the transverse passage away from the center of the upright post 1 group is communicated with the second chute 2, the other end of the transverse passage points to the center of the upright post 1 group, the upper end of the longitudinal passage is connected with one end of the transverse passage, and the lower end of the longitudinal passage is communicated with a longitudinal guide rail 8 which is described below.

A fixed pulley 6 is rotatably mounted at the junction of the transverse and longitudinal channels.

One end of the pull rope 7 is fixedly connected with the second sliding block 3, and the other end of the pull rope extends out of the lower end of the rope channel 5 after passing around the fixed pulley 6.

Fig. 3 is a partially enlarged view of a portion a in fig. 1.

As shown in fig. 1 to 3, the limit driving mechanism includes a longitudinal rail 8 fixed on the lower side of the N base plates 19, a third slider 9 slidably mounted in the longitudinal rail 8, a third longitudinal screw 10 rotatably mounted in the longitudinal rail 8 and in threaded connection with the third slider 9, and a limit locking part. A third internal thread through hole which is matched with the external thread of the third longitudinal screw rod 10 and is longitudinally arranged is formed on the third slide block 9. The other end of the pull rope 7 is fixedly connected with a third slide block 9. The wafer is placed on the substrate 19, the third longitudinal screw rod 10 is rotated, the third sliding block 9 moves downwards along the longitudinal guide rail 8, the second sliding block 3 is driven by the pull rope 7 to slide towards the center of the upright post 1, the three upright posts 1 move towards the center of the upright post 1 group, and therefore the wafer is limited by abutting against the periphery of the wafer.

The limiting locking part comprises a third threaded fastening through hole formed in the third sliding block 9 and transversely arranged, a third longitudinal groove 11 formed in the bottom wall of the guide rail, and a third fastening bolt 12 with one end connected with the third threaded fastening through hole in a threaded manner and then abutted against the bottom of the third longitudinal groove 11. Tightening the third fastening bolt 12 to press one end of the third fastening bolt 12 against the bottom of the third longitudinal groove 11, thereby fastening the third slider 9; and the third fastening bolt 12 is screwed out, so that the third longitudinal screw rod 10 can be rotated to drive the third slide block 9 to lift.

Fig. 4 is a partially enlarged view of a portion B in fig. 1.

As shown in fig. 1, 2 and 4, the clamping mechanism set is composed of N clamping mechanisms, the N clamping mechanisms are respectively and correspondingly installed on the N columns 1, and each clamping mechanism includes a first sliding chute 13, a first sliding block 14, a first longitudinal screw rod 15, a clamping block 16 and a clamping and locking portion.

The first runner 13 is formed on the side of the corresponding upright 1 facing the center of the group of uprights 1 and is arranged longitudinally.

The first slider 14 is slidably mounted in the first runner 13. A first internal thread through hole which is matched with the external thread of the first longitudinal screw rod 15 and is longitudinally arranged is formed on the first slide block 14.

The first longitudinal screw 15 is rotatably installed in the first sliding chute 13 and is in threaded connection with the first sliding block 14, and the upper end of the first longitudinal screw 15 extends out of the top wall of the first sliding chute 13. The upper end of the first longitudinal screw rod is fixedly provided with a first knob 20.

One end of the clamping block 16 is fixed on the first slide block 14, and the other end faces the center of the column 1 group and is used for pressing an invalid area at the edge of the wafer. When the column 1 moves to abut against the outer periphery of the wafer, the first knob 20 is rotated to lower the first slider 14, and the clamp block 16 is pressed against the upper inactive area of the wafer.

The clamping and locking part comprises a first thread fastening through hole formed on the first sliding block 14 and transversely arranged, a first longitudinal groove 17 formed on the bottom wall of the first sliding groove 13, and a first fastening bolt 18 with one end in threaded connection with the first thread fastening through hole and then abutted against the bottom of the first longitudinal groove 17. The first fastening bolt 18 is screwed tightly, so that one end of the first fastening bolt 18 is pressed against the bottom of the first longitudinal groove 17, the first slider 14 is fastened, and the first slider 14 is prevented from shaking relative to the first longitudinal screw 15; the first fastening bolt 18 is screwed out, so that the first longitudinal screw 15 can be rotated to drive the first slide block 14 to ascend and descend.

The clamping process of the ion implantation clamp of the embodiment comprises the following steps: placing a wafer on a substrate 19, screwing out a third fastening bolt 12, moving a third slide block 9 downwards along a longitudinal guide rail 8 by rotating a third longitudinal screw rod 10, driving a second slide block 3 to slide towards the center of an upright post 1 through a pull rope 7, so that the three upright posts 1 move towards the center of an upright post 1 group, and are abutted against the periphery of the wafer to limit the wafer, and meanwhile, respectively positioning three clamping blocks 16 right above the edge of the wafer and screwing the third fastening bolt 12; the first fastening bolt 18 is unscrewed, the first slider 14 is lowered by rotating the first knob 20, the clamping block 16 is pressed on the upper invalid area of the wafer, and the first fastening bolt 18 is screwed, so that the wafer is clamped.

When ion implantation is completed, the first fastening bolt 18 is unscrewed, and the first slider 14 is lifted by rotating the first knob 20, so that the clamping block 16 is far away from the wafer; and a third fastening bolt 12 is screwed out, the third slide block 9 moves upwards along the longitudinal guide rail 8 by rotating the third longitudinal screw rod 10, and the second slide block 3 slides towards the direction far away from the center of the stand column 1 by stretching under the action of the tensile force of the spring, so that the three stand columns 1 move towards the direction far away from the centers of the stand column 1 groups.

To sum up, it is the utility model discloses a concrete application example, right the utility model discloses the protection scope does not constitute the restriction, adopts the technical scheme of equivalent replacement all to fall within the utility model discloses within the protection scope.

Claims

1. The utility model provides an ion implantation anchor clamps, its characterized in that includes base plate, stand group and fixture group, the stand group comprises N stands that are circular array distribution, every the lower extreme of stand is fixed on the base plate, fixture group comprises N fixture, and N fixture corresponds respectively and installs on N the stand, every fixture including form corresponding stand orientation on one side of stand group center and the first spout that vertically sets up, slidable mounting in first spout, rotationally install in first spout and with first slider threaded connection's first vertical lead screw and one end are fixed on the first slider and the other end orientation the grip block at stand group center, the upper end of first vertical lead screw stretches out the roof of first spout.

2. The ion implantation clamp according to claim 1, further comprising a limiting mechanism set and a limiting driving mechanism, wherein the limiting mechanism set comprises N limiting mechanisms, each limiting mechanism comprises the column, a second sliding chute, a second sliding block, an elastic restoring member, a rope channel and a pull rope, the second sliding chute is formed on the base plate, one end of the second sliding chute faces to the center of the column set, the second sliding block is slidably mounted on the second sliding chute, the lower end of the column is fixedly arranged on the second sliding block, two ends of the elastic restoring member are respectively connected with the second sliding block and the bottom wall of the second sliding chute, the rope channel is formed in the base plate, one end of the rope channel is communicated with the second sliding chute, the other end of the rope channel points to the center of the column set, one end of the pull rope is fixedly connected with the second sliding block, the other end of the pull rope extends out from the other end of the rope channel, the limiting driving mechanism comprises a longitudinal guide rail fixed on the lower side of the N base plates, a third sliding block slidably mounted in the longitudinal guide rail, a third sliding block rotatably mounted in the longitudinal guide rail, and a third sliding block is fixedly connected with the pull rope.

3. The ion implantation jig of claim 2, wherein the limit driving mechanism further comprises a limit locking portion, and the limit locking portion comprises a third threaded fastening through hole formed in the third slider and disposed laterally, a third longitudinal groove formed in the bottom wall of the guide rail, and a third fastening bolt having one end in threaded connection with the third threaded fastening through hole and abutting against a groove bottom of the third longitudinal groove.

4. An ion implantation fixture as claimed in claim 2, wherein said resilient return member is a spring.

5. The ion implantation clamp of claim 2, wherein said string channel is 7-shaped, and said limiting mechanism further comprises a fixed pulley rotatably mounted at a corner of said string channel.

6. The ion implantation fixture of claim 2, wherein the cross-section of said posts is square.

7. The ion implantation jig of claim 1, wherein the clamping mechanism further comprises a clamping and locking portion, and the clamping and locking portion comprises a first threaded fastening through hole formed in the first slider and arranged transversely, a first longitudinal groove formed in a bottom wall of the first sliding groove, and a first fastening bolt having one end in threaded connection with the first threaded fastening through hole and then abutting against a groove bottom of the first longitudinal groove.

8. The ion implantation fixture of claim 1, wherein a first knob is fixedly disposed at an upper end of the first longitudinal screw.

9. The ion implantation fixture of claim 1, wherein N is 3.