CN218435915U - Mask plate - Google Patents
Mask plate Download PDFInfo
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- CN218435915U CN218435915U CN202222856673.XU CN202222856673U CN218435915U CN 218435915 U CN218435915 U CN 218435915U CN 202222856673 U CN202222856673 U CN 202222856673U CN 218435915 U CN218435915 U CN 218435915U
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- mask
- plane
- film forming
- side wall
- blind
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Abstract
The utility model discloses a mask version. The mask comprises a mask body, wherein the mask body comprises a shielding area and a film forming area, and a plurality of blind hole grooves are formed in the film forming surface of the shielding area; the blind hole groove comprises an opening and a bottom surface, wherein the opening is positioned on the same plane of a film forming surface, the bottom surface is positioned in the mask plate body, the vertical projection of the bottom surface on the first plane covers the vertical projection of the opening on the first plane, and the first plane is the plane of the film forming surface. The problem of the mask version produce deformation because of stress accumulation in the film forming course of working to the fish tail product is solved, the life of mask version has been increased, the quality of waiting to process the product has been guaranteed.
Description
Technical Field
The utility model relates to an evaporation plating and magnetron sputtering equipment technical field especially relate to a mask version.
Background
The film formation technology is an important process for the fabrication of organic light emitting display devices as a technology for generating a specific film.
Fig. 1 is a schematic structural diagram of a mask in the prior art, as shown in fig. 1, a thickness D of the mask is 100 μm, a surface of a film coating surface (B surface) is flat, and a Transparent Conductive Oxide (TCO) film continuously covers the surface of the film coating surface (B surface) during a film forming process.
In the prior art, when a film forming process is performed, such as evaporation film forming or physical vapor deposition film forming, part of a substance to be formed is deposited on a film coating surface (surface B) to form a deposited film layer, and the substance to be formed is accumulated to increase gravity, generate stress and further generate deformation. During continuous film forming, substances to be formed are accumulated, corresponding stress is accumulated, the mask is enabled to deform towards the direction of the substrate to be processed, during continuous film forming, after 8 films are formed on the substrate, the deposited film layer formed on the corresponding film coating surface (surface B) also reaches 8 layers, at the moment, the edge of the surface A of the film forming area can warp towards the substrate to be processed, and the film forming area is greatly deformed to contact with the substrate to be processed, so that the shadow is too large, and the substrate is scratched.
SUMMERY OF THE UTILITY MODEL
The utility model provides a mask version to solve in the film forming course of working stress accumulation and lead to mask version to produce deformation, thereby the problem of fish tail product.
In a first aspect, an embodiment of the present invention provides a mask, including a mask body, where the mask body includes a shielding region and a film forming region, and a film forming surface of the shielding region is provided with a plurality of blind hole grooves;
the blind hole groove comprises an opening and a bottom surface, wherein the opening is located on the same plane of a film forming surface, the bottom surface is located in the mask plate body, the vertical projection of the bottom surface on a first plane covers the vertical projection of the opening on the first plane, and the first plane is the plane where the film forming surface is located.
Optionally, a vertical projection of the blind hole groove on the first plane is in a bar shape, a rectangle or a circle.
Optionally, the opening and the bottom surface have the same shape and different sizes.
Optionally, the plurality of blind holes are uniformly arranged along a first direction and a second direction, the first direction and the second direction are both parallel to the first plane, and the first direction intersects with the second direction.
Optionally, the blind hole groove includes an upper hole portion and a lower hole portion that are communicated with each other, and the lower hole portion is located on one side of the upper hole portion away from the film forming surface;
relative to the first plane, the side wall of the upper hole part is a vertical side wall or an inclined side wall, and the side wall of the lower hole part comprises at least one of the vertical side wall, the inclined side wall, an inner concave arc-shaped side wall or an outer convex arc-shaped side wall.
Optionally, the ratio of the depth of the lower hole part to the depth of the blind hole groove is greater than or equal to 50%.
Optionally, a ratio of the maximum aperture of the lower hole portion to the aperture of the upper hole portion is 1.25 to 1.5.
Optionally, the ratio of the distance between adjacent blind hole grooves to the aperture of the upper hole portion is 2 to 2.5.
Optionally, the thickness of the mask body is 150 to 00 μm, and the depth of the blind hole groove is 50 to 100 μm.
Optionally, the ratio of the depth of the blind hole groove to the thickness of the mask plate body is 1/3-1/2.
The utility model provides a mask, which comprises a mask body, wherein the mask body comprises a shielding area and a film forming area, and the film forming surface of the shielding area is provided with a plurality of blind hole grooves; the blind hole groove comprises an opening and a bottom surface, wherein the opening is positioned on the same plane of a film forming surface, the bottom surface is positioned in the mask plate body, the vertical projection of the bottom surface on the first plane covers the vertical projection of the opening on the first plane, and the first plane is the plane of the film forming surface. The utility model discloses well mask version shelters from the blind hole groove that the film forming face in district set up, can break the continuity of deposit rete, offsets whole rete stress to can avoid mask version deformation, and then can avoid mask version edge warpage and treat that processing substrate distance leads to the fish tail near excessively, increased the life of mask version, guaranteed the quality of treating the processing product.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings used in the description of the embodiments will be briefly described below, and it is obvious that the drawings in the description are only some embodiments of the present invention, and it is obvious for those skilled in the art that other drawings can be obtained without creative efforts.
FIG. 1 is a schematic structural diagram of a mask in the prior art;
fig. 2 is a schematic structural diagram of a mask according to an embodiment of the present invention;
fig. 3 is a schematic view illustrating an arrangement of blind holes and grooves according to an embodiment of the present invention;
fig. 4 is a schematic view illustrating another arrangement of blind holes and slots according to an embodiment of the present invention;
fig. 5 is a schematic view illustrating another arrangement of blind holes and grooves according to an embodiment of the present invention;
fig. 6 is a schematic structural view of a blind hole groove according to an embodiment of the present invention;
fig. 7 to fig. 12 are schematic structural views of another five types of masks provided by the embodiment of the present invention.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not to be construed as limiting the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.
It should be noted that the terms "first," "second," and the like in the description and claims of the present invention and in the drawings described above are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used is interchangeable under appropriate circumstances such that the embodiments of the invention described herein are capable of operation in sequences other than those illustrated or otherwise described herein. Furthermore, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed, but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.
Fig. 2 is a schematic structural diagram of a mask according to an embodiment of the present invention; as shown in fig. 2, the mask comprises a mask body 10, the mask body 10 comprises a shielding region 20 and a film forming region (not shown in the figure), the film forming region B of the shielding region 20 is provided with a plurality of blind hole grooves 40;
the blind hole groove 40 comprises an opening 41 positioned on the same plane of the film forming surface B and a bottom surface 42 positioned inside the mask plate body 10, and the vertical projection of the bottom surface 42 on a first plane covers the vertical projection of the opening on the first plane, wherein the first plane is the plane of the film forming surface B.
The shielding region can be understood as a region for shielding the substance to be formed into a film so that the substance to be formed into a film cannot form a film on the substrate to be processed; the film forming area can be understood as an area through which a substance to be formed into a film can penetrate and further form a film on the substrate to be processed; the film forming surface of the shielding region can be understood as a surface on which a part of a substance to be formed into a film is formed on the shielding region after being shielded by the shielding region in the film forming process.
Specifically, during film forming, a substance to be formed into a film passes through the mask film forming area to form a film on the substrate to be processed, a part of the substance to be formed into a film is shielded by the mask film shielding area, and a film is formed on the film forming surface B of the shielding area, the film forming surface B of the shielding area 20 is provided with a plurality of blind hole grooves 40, and a part of the substance to be formed into a film enters the blind hole grooves 40 through the openings 41 to form a film on the bottom surface 42 and the side walls of the blind hole grooves. The material to be formed is accumulated in the blind hole groove 40, so that the film is broken and cannot form integral stress, and further the stress is offset. At the same time, even if deposited many times, the blind hole groove can achieve this effect until the substance to be film-formed does not fill the blind hole groove.
The utility model provides a mask, which comprises a mask body, wherein the mask body comprises a shielding area and a film forming area, and the film forming surface of the shielding area is provided with a plurality of blind hole grooves; the blind hole groove comprises an opening and a bottom surface, wherein the opening is positioned on the same plane of a film forming surface, the bottom surface is positioned in the mask plate body, the vertical projection of the bottom surface on the first plane covers the vertical projection of the opening on the first plane, and the first plane is the plane of the film forming surface. The utility model discloses well mask version shelters from the blind hole groove that the film forming face in district set up, can break the continuity of deposit rete, offsets whole rete stress to can avoid mask version deformation, and then can avoid mask version edge warpage and wait to process the substrate distance and lead to the fish tail near excessively, increase the life of mask version, guarantee the quality of waiting to process the product.
Optionally, fig. 3 is a schematic diagram of an arrangement manner of blind holes provided in an embodiment of the present invention, fig. 4 is a schematic diagram of an arrangement manner of another blind holes provided in an embodiment of the present invention, and fig. 5 is a schematic diagram of an arrangement manner of another blind holes provided in an embodiment of the present invention, as shown in fig. 3, a vertical projection of the blind hole groove 40 on the first plane is a bar shape; as shown in fig. 4, the perpendicular projection of the blind hole groove 40 on the first plane is rectangular; as shown in fig. 5, the blind hole groove 40 has a circular vertical projection on the first plane.
Optionally, the opening and the bottom surface have the same shape and different sizes.
For example, fig. 6 is a schematic diagram of a blind via structure provided by an embodiment of the present invention, as shown in fig. 6, vertical projections of an opening 41 and a bottom surface 42 of a blind via slot 40 are both rectangular, but the sizes thereof are different, and it can be understood that when the vertical projections of the opening 41 and the bottom surface 42 of the blind via slot 40 are both circular or bar-shaped, the sizes thereof are different.
Alternatively, referring to fig. 4 and 5, the blind holes 40 are uniformly arranged along a first direction and a second direction, respectively, both the first direction and the second direction are parallel to the first plane, and the first direction intersects with the second direction.
Here, the first direction may be understood as a row direction, and the second direction may be understood as a column direction.
Specifically, in fig. 4 and 5, the blind hole grooves 40 are uniformly arranged along the first direction and the second direction, respectively, and in the film forming operation, the substance to be formed into a film is accumulated in the uniformly arranged blind hole grooves 40, and by the arrangement structure, the stress caused by accumulation of the substance to be formed into a film can be more uniformly relieved.
Optionally, fig. 7 to 12 are schematic structural views of five other masks provided in an embodiment of the present invention, as shown in fig. 7 to 12, optionally, the blind hole slot 40 includes an upper hole portion 43 and a lower hole portion 44 that are communicated with each other, and the lower hole portion 44 is located on a side of the upper hole portion 43 away from the film forming surface B;
with respect to the first plane, the side wall of the upper hole portion 43 is a vertical side wall or an inclined side wall, and the side wall of the lower hole portion 44 includes at least one of a vertical side wall, an inclined side wall, an inwardly concave arc-shaped side wall, or an outwardly convex arc-shaped side wall.
For example, in the mask shown in fig. 7, the sidewall of the upper hole portion 43 is a vertical sidewall, and the sidewall of the lower hole portion 44 is an inclined sidewall; in the mask shown in fig. 8, the sidewall of the upper hole portion 43 is a vertical sidewall, and the sidewall of the lower hole portion 44 is a concave arc sidewall; in the mask shown in fig. 9, the sidewall of the upper hole portion 43 is a vertical sidewall, and the sidewall of the lower hole portion 44 is a concave arc sidewall; in the mask shown in fig. 10, the sidewall of the upper hole portion 43 is an inclined sidewall, and the sidewall of the lower hole portion 44 is a vertical sidewall; in the mask shown in fig. 11, the sidewall of the upper hole portion 43 is a vertical sidewall, and the sidewall of the lower hole portion 44 is a vertical sidewall; in the mask shown in fig. 12, the side wall of the upper hole portion 43 is a vertical side wall, and the side wall of the hole portion 44 is a concave arc side wall.
Specifically, during film forming, after a part of substances to be film-formed enter the blind hole groove 40, films are formed on the side walls and the bottoms of the upper hole portion 43 and the lower hole portion 44 of the blind hole groove 40, and the deposited film layer formed on the film forming surface B of the shielding region is broken due to the structure of the blind hole groove, so that the overall stress cannot be formed, and the stress can be offset.
Alternatively, referring to fig. 2, the ratio of the depth D1 of the lower hole portion 44 to the depth D2 of the blind hole groove 40 is greater than or equal to 50%.
Alternatively, referring to fig. 2, the ratio of the maximum aperture R1 of the lower hole portion 44 to the aperture R2 of the upper hole portion 43 is 1.25 to 1.5.
For example, when the maximum diameter R1 of the mask lower hole 44 is in the range of 100 μm to 120 μm and the diameter R2 of the upper hole 43 is 80 μm, the ratio of the maximum diameter R1 of the lower hole 44 to the diameter R2 of the upper hole 43 is 100 to 80, that is, 1.25 to 1.5.
Optionally, referring to fig. 2, the ratio of the distance D3 between adjacent blind hole grooves 40 to the aperture R1 of the upper hole portion 43 is 2 to 2.5.
Illustratively, if the pitch D3 of the adjacent blind holes 40 is in the range of 160 μm to 200 μm and the diameter R2 of the upper hole portion 43 is 80 μm, the ratio of the pitch D3 of the adjacent blind holes 40 to the diameter R1 of the upper hole portion 43 is 160 to 200.
Specifically, referring to the mask shown in fig. 2, in the film forming process, a part of the material to be formed, which is blocked by the blocking area 20, is accumulated in the blind hole trench 40, and when the material to be formed completely seals the opening 41 of the blind hole trench 40, compared with the mask shown in fig. 1, the mask shown in the embodiment shown in fig. 2 can be deposited for multiple times without being replaced and cleaned, and the mask still has an opening before the material to be formed fills and seals the blind hole trench 40, so that the stress of the mask can be released. The mask plate of the embodiment can bear the great increase of the number of the deposited film layers, namely the great increase of the number of the film forming substrates, the frequent replacement and the clear mask plate are not needed, the damage to the substrates is avoided, the film coating time can be saved, and the film forming efficiency is improved.
Optionally, the thickness H of the mask version body is 150 to 200 μm, and the depth D2 of the blind hole groove is 50 to 100 μm.
Optionally, the ratio of the depth D2 of the blind hole trench to the thickness H of the mask version body is 1/3 to 1/2.
Specifically, referring to fig. 1 and 2, after the thickness of the mask and the structure of the blind hole groove 40 are doubled, the elasticity of the mask is increased along with the increase of the thickness, so that the mask can resist greater film stress during film forming operation; meanwhile, the structure of the blind hole groove 40 enables the deposited film layer formed on the film forming surface B of the shielding area to be broken, so that the overall stress cannot be formed, and the stress can be offset.
It should be noted that the foregoing is only illustrative of the preferred embodiments of the present invention and the technical principles applied thereto. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious modifications, rearrangements, combinations and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail with reference to the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the scope of the present invention.
Claims (10)
1. The mask is characterized by comprising a mask body, wherein the mask body comprises a shielding area and a film forming area, and the film forming surface of the shielding area is provided with a plurality of blind hole grooves;
the blind hole groove comprises an opening and a bottom surface, the opening is located on the same plane of a film forming surface, the bottom surface is located inside the mask plate body, the vertical projection of the bottom surface on a first plane covers the vertical projection of the opening on the first plane, and the first plane is the plane where the film forming surface is located.
2. The reticle of claim 1, wherein a perpendicular projection of the blind slot on the first plane is in the shape of a bar, a rectangle, or a circle.
3. The reticle of claim 1, wherein the opening and the bottom surface are the same shape and different sizes.
4. The mask according to claim 1, wherein the plurality of blind slots are uniformly arranged along a first direction and a second direction, respectively, the first direction and the second direction are both parallel to the first plane, and the first direction intersects the second direction.
5. The reticle of claim 1, wherein the blind-hole trench includes an upper hole portion and a lower hole portion that communicate with each other, the lower hole portion being located on a side of the upper hole portion that is away from the deposition surface;
relative to the first plane, the side wall of the upper hole part is a vertical side wall or an inclined side wall, and the side wall of the lower hole part comprises at least one of the vertical side wall, the inclined side wall, an inner concave arc-shaped side wall or an outer convex arc-shaped side wall.
6. The reticle of claim 5, wherein a ratio of the depth of the lower aperture portion to the depth of the blind via slot is greater than or equal to 50%.
7. The mask as set forth in claim 5, wherein a ratio of a maximum diameter of the lower hole portion to a diameter of the upper hole portion is 1.25 to 1.5.
8. The mask according to claim 5, wherein the ratio of the distance between adjacent blind hole grooves to the diameter of the upper hole portion is 2-2.5.
9. The mask as set forth in claim 1, wherein the thickness of the mask body is 150 to 200 μm, and the depth of the blind hole groove is 50 to 100 μm.
10. The reticle of claim 1, wherein a ratio of the depth of the blind hole trench to the thickness of the reticle body is 1/3 to 1/2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222856673.XU CN218435915U (en) | 2022-10-28 | 2022-10-28 | Mask plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222856673.XU CN218435915U (en) | 2022-10-28 | 2022-10-28 | Mask plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN218435915U true CN218435915U (en) | 2023-02-03 |
Family
ID=85072179
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202222856673.XU Active CN218435915U (en) | 2022-10-28 | 2022-10-28 | Mask plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN218435915U (en) |
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2022
- 2022-10-28 CN CN202222856673.XU patent/CN218435915U/en active Active
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