CN2184223Y

CN2184223Y - Dual-chip phototransistor index input device

Info

Publication number: CN2184223Y
Application number: CN94202143U
Authority: CN
Inventors: 孙志成
Original assignee: Zhishen Industrial Co ltd
Current assignee: Zhishen Industrial Co ltd
Priority date: 1994-01-20
Filing date: 1994-01-20
Publication date: 1994-11-30
Anticipated expiration: 2004-01-20

Abstract

A kind of bimorph phototransistor index input device, its characteristic is: the prior parallel light source is changed into a point radiation light source, and the purpose of improving the resolution can be achieved by matching the distance proportion between the point radiation light source and the receiving chip of the grating wheel.

Description

Photo-electric double crystal transistor index input installation

The utility model relates to a kind of index input media (index input device), particularly relate to a kind of mechanical light word formula slide-mouse (mouse) that is used for, the more double crystal wafer photoelectric crystal pipe of high-res (dual chip photo transistor) index input media can be provided.

Mechano optical type index input media in the past is to utilize X-axis and two groups of photoelectricity groups of Y-axis, to judge the component displacement of X-axis and Y-axis, every group of photoelectricity group comprises two light emitting diodes and two phototransistors, see also Fig. 1, it is the synoptic diagram of one group of photoelectricity group in a kind of slide-mouse of single-chip in the past, photoelectricity group 1 comprises: a grating wheel (raster) 11, two light emitting diodes 12,13 and two phototransistors 14,15, it mainly is the rotation that utilizes grating wheel 11, make phototransistor 14,15 can receive light emitting diode 12 intermittently, 13 light that sent, and be intermittent conducting, the height potential change that is produced through two phototransistors, judging the angle of grating wheel 11 rotations, also is the displacement of slide-mouse in X-axis or Y direction.

The structure of above-mentioned slide-mouse has a great shortcoming, and promptly employed part is many, and assembling is complicated, and must calculate the appropriate location and the distance of two phototransistors and light emitting diode during assembling, causes great inconvenience.Development through industry member, a kind of appearance of twin lamella slide-mouse is arranged again, No. 79208173 " the combined improved device of mechano optical type slide-mouse photoelectricity " a case of the novel application case that this visible Sysgration Ltd proposes in the period of 79, its main contents please cooperate consults Fig. 2, it is the synoptic diagram of one group of photoelectricity group in the twin lamella slide-mouse, photoelectricity group 2 comprises: a grating wheel 21, one light emitting diode 23 and a wafer phototransistor 23, its principle and single-chip slide-mouse are similar, main differentiation is the number that is to receive in the phototransistor wafer, become two by one, change through the photoelectric crystal element, improved a lot of shortcoming of single-chip slide-mouse element in the past, and to receive wafer positions all fixing because of two, so save the trouble that many assemblings are located.

But, the technician is in the manufacturing and designing of twin lamella slide-mouse, meet with another new difficulty again, it is the problem that resolution can't promote, please cooperate and consult circle 3, it is the synoptic diagram of phototransistor in the twin lamella slide-mouse, phototransistor 3 comprises: a base 31, one transparency cover 33 and two receives

wafer

35,37, principle of work because of the twin lamella slide-mouse, it is " 00 " that utilizes two reception wafers, " 01 ", " 11 " reach the order pulse wave of " 10 ", judge the displacement of slide-mouse, wherein " 00 " state table two receives wafers and is grating wheel and covers, and " 11 " promptly two receive the breach that wafer all is arranged in grating wheel, suppose that two width that receive

wafer

35 and 37 are W in the circle, then the lattice of grating wheel 39 are apart from being necessary for 2W, the lattice of grating wheel are apart from the resolution that directly has influence on slide-mouse, in the slide-mouse of this kind structure, can't reduce again at two width that receive wafer, avoiding causing under the prerequisite that receives mistake, desire improves unique way of its resolution, can only increase the diameter of grating wheel, and obtain more raster grid number (number of slots on theraster) yet, will increase the volume of slide-mouse thus, so it is a method of attending to one thing and lose sight of another only.

Fundamental purpose of the present utility model is to provide a kind of double crystal wafer photoelectric crystal pipe index input media, and it can improve resolution.

For reaching above-mentioned purpose, the utility model double crystal wafer photoelectric crystal pipe index input media is characterised in that it by run-in index light source in the past, changes into using a some radiating light source, and cooperate grating wheel at a distance of the distance proportion between a radiating light source and reception wafer, can reach the purpose that improves resolution.

Below by most preferred embodiment and accompanying drawing double crystal wafer photoelectric crystal pipe index input media of the present utility model is elaborated, in the accompanying drawing:

Fig. 1 is the synoptic diagram of one group of photoelectricity group in a kind of slide-mouse of single-chip in the past.

Fig. 2 is the synoptic diagram of one group of photoelectricity group in the twin lamella slide-mouse in the past.

Fig. 3 is the synoptic diagram of phototransistor in the twin lamella slide-mouse in the past.

Fig. 4 is the stereographic map of the utility model double crystal wafer photoelectric crystal pipe index input media.

Fig. 5-the 8th, the relevant position synoptic diagram of light emission and receiving element cataloged procedure in the utility model double crystal wafer photoelectric crystal pipe index input media.

Fig. 9 receives the bad oscillogram that wafer produces.

Figure 10 is the compensation system circuit diagram.

At first, see also Fig. 4, it is the stereographic map of the utility model double crystal wafer photoelectric crystal pipe index input media, one photocell 41 is as the light source that sends light signal, after utilizing passing through of light and capture-effect coding via a code device 42,, and change light signal into high low-potential signal and send out by the light coded signal behind a light receiving element 43 received codes, through the signal of height potential change, judge the actual displacement of index input media.

Then, see also Fig. 5-8, be the emission and the relevant position synoptic diagram of receiving element cataloged procedure in the utility model double crystal wafer photoelectric crystal pipe index input media, wherein above-mentioned photocell is some radiating light sources 51, and light receiving element can be a phototransistor 53, as for code device then is a grating wheel 55, phototransistor 53 comprises that two receive

wafer

57,59, shown in Fig. 5-8(a)-(d), represent two reception wafers to be " 11 " respectively, " 01 ", " 00 ", four kinds of situations of " 10 ", suppose that two receive

wafer

57,59 width is W, point radiating light source 51 is D1 with the distance of grating wheel 55, grating wheel 55 is D2 with the distance of photoelectric crystal 53, then as can be known:

Grating aperture widths X(grating shelter width Y)=2W*D1/(D1+D2) fix because of the wafer width W, so, adjust distance D 1, the D2 of grating wheel 55, can make the density of grating wheel improve, and improve resolution to a radiating light source 51 and phototransistor 53.

The installation position of above-mentioned grating wheel 55, and the size of grating aperture widths X, must make and send by a radiating light source 51, see through the light of grating perforate, be able to receive

wafer

57,59 by two and receive, make the rotation of grating wheel 55, receive

wafer

57,59 two, produce the signal of " 11 ", " 01 ", " 00 ", " 10 " in regular turn,, judge the displacement of index input media by this high low-potential signal.Yet in the process of actual volume production assembling, grating wheel 55 and light emitted receive the distance at two ends, can't accurately control, and cause still having light leakage phenomena, and causing the problem of wafing on the waveform when shielding status.See also Fig. 9, it is to receive the bad oscillogram that wafer produces, at the puzzlement of wafing on the waveform, can solve in two ways, first kind is by the input threshold voltage of setting integrated circuit, can make high electronegative potential correct judgment, and keeps normal work, second method is to make level compensation, sets up a compensation system.Please cooperate and consult Figure 10, it is the compensation system circuit diagram, because float on the waveform, so can be at the receiving end of phototransistor T1, configuration one is drawn to (pull-down) bias resistance R1, and the voltage level of index input media control IC7, the normal input action of the system that keeps are sent in compensation.

By above-mentioned exposure, the utility model has following advantage really;

1. by the distance that changes between grating wheel and some radiating light source and reception wafer, can increase grating wheel density, and improve the resolution of index input unit.

2. by a little deviation of loading onto, the accurate drift in the position of causing can be by the input threshold voltage of setup control IC, or dragging down bias resistance, and reach easily best adjustment.

In sum, but the true disclosed idea of mat of the utility model, through doing really to reach its intended purposes in fact.

Claims

1. A dual-chip phototransistor index input device is characterized in that it includes:

A light-emitting element, which includes a point of radiation source, which can emit light signals;

An encoding device, which includes a grating wheel, receives an optical signal from a point radiation source, rotates and encodes the grating wheel, and outputs an optical encoding signal; and

A light receiving element, which includes two receiving chips, which receive the light encoding signal sent by the encoding device, and convert it into a high and low potential signal for output;

By means of the dual-chip phototransistor index input device, the high and low potential signals output by the light receiving element are sent to the control integrated circuit, and the displacement of the index input system can be judged. It uses a point radiation light source to adjust the grating The distance between the wheel and the light-emitting and light-receiving elements enables the density of the grating wheel to be increased.

2. The dual chip phototransistor index input device as claimed in claim 1, further comprising a compensating device.

3. The dual chip phototransistor index input device as claimed in claim 2, wherein the compensating means is a bias resistor.