CN218394955U

CN218394955U - Cleaning spray head suitable for wafer cleaning

Info

Publication number: CN218394955U
Application number: CN202222356403.2U
Authority: CN
Inventors: 范银波
Original assignee: Suzhou Peikai Technology Co ltd
Current assignee: Suzhou Peikai Technology Co ltd
Priority date: 2022-09-05
Filing date: 2022-09-05
Publication date: 2023-01-31
Anticipated expiration: 2032-09-05

Abstract

The utility model provides a washing shower nozzle suitable for wafer cleaning relates to general clean technical field, include: a liquid outlet pipe is movably mounted on one side of the inner wall of the cleaning chamber, a spray head is fixedly mounted at one end of the outer surface of the liquid outlet pipe, a protection ring is fixedly mounted at the other end of the outer surface of the liquid outlet pipe, a liquid inlet pipe is movably connected to one side of the outer surface of the protection ring, and a pressure pump is fixedly sleeved on the outer surface of the liquid inlet pipe. The utility model discloses, rotation through motor output shaft drives the rotation of a plurality of main shafts, the rotation of main shaft stimulates the secondary shaft back and forth movement, thereby the pulling changes the board with certain angle swing, the setting of pull rod and fixed axle simultaneously, make the protection ring make a round trip to rotate with changeing board pivoted angle equally, thereby drive the swing of the drain pipe of bottom, make the shower nozzle rotate and spray, spray area of contact when having increased clean, avoid traditional cleaning device to set up too much shower nozzle simultaneously, with the condition that external connection probably produces the pollution.

Description

Cleaning spray head suitable for wafer cleaning

Technical Field

The utility model relates to a general clean technical field especially relates to a washing shower nozzle suitable for wafer cleaning.

Background

The wafer is used as a manufacturing material of a semiconductor component and a chip, the surface cleaning is particularly important, and the processing process of the wafer has high requirement on the cleanliness, and all unexpected substances and pollutants which are in contact with the surface of the wafer can cause serious pollution to the wafer, so that cleaning equipment is inevitable in the production operation process, and the most common cleaning modes at present are jet cleaning and ultrasonic cleaning.

However, in the prior art, the injection cleaning device is often fixedly installed inside the cleaning tank, the cleaning nozzle cleans the surface of the wafer through side scouring, the side scouring at a certain angle avoids the damage to the wafer caused by overlarge impact force, however, the side scouring wafer avoids the damage to the surface of the wafer, but the cleaning nozzle at a plurality of different angles is often required to be installed, the equipment cost is increased, and the probability of leakage pollution of the cleaning tank is increased.

SUMMERY OF THE UTILITY MODEL

The utility model aims at solving the problem that the cleaning spray head in the prior art can not rotate at a smaller angle for cleaning and the cleaning depth of the single time is not enough.

In order to achieve the above purpose, the utility model adopts the following technical scheme: a cleaning showerhead suitable for wafer cleaning, comprising: clean room, one side movable mounting of clean room inner wall has the drain pipe, the one end fixed mounting of drain pipe surface has the shower nozzle, the other end fixed mounting of drain pipe surface has the protection ring, one side swing joint of protection ring surface has the inlet tube, the fixed cover of surface of inlet tube is equipped with the force pump, one side fixed mounting of clean outdoor surface has the backup pad, the top fixed mounting of backup pad surface has the motor, the output shaft fixed mounting of motor has the main shaft, the one end movable mounting of main shaft surface has the secondary shaft.

As a preferred embodiment, a rotating plate is movably mounted at one end of the outer surface of the secondary shaft, a fixing column is movably embedded in the rotating plate and fixedly mounted on one side of the outer surface of the supporting plate, and fixing blocks are fixedly mounted on two sides of the outer surface of the rotating plate.

The technical effect of adopting the further scheme is as follows: the arrangement of the fixed blocks can pull the pull rod to rotate in the same amplitude.

As a preferred embodiment, a pull rod is movably embedded in each of the fixing blocks, and a fixing shaft is movably embedded in the other end of the outer surface of each of the pull rods.

The technical effect of adopting the further scheme is as follows: the fixed shaft enables the rotation of one end of the pull rod to pull the two end points of the protection ring to rotate.

In a preferred embodiment, the plurality of fixed shafts are fixedly connected to the outer surface of the protection ring, and the other end of the outer surface of the liquid inlet pipe is fixedly connected to the cleaning liquid bin.

The technical effect of adopting the further scheme is as follows: meanwhile, when the equipment needs to be used, the cleaning agent is filled into the cleaning liquid bin, when the height of the cleaning agent inside the cleaning liquid bin reaches a threshold value preset by the water level sensing device, the pressure pump and the motor start to work, meanwhile, the door shaft starts to rotate, the door is driven to close to rotate, the water inlet is opened, the cleaning agent enters the inside of the liquid inlet pipe through the connecting part of the liquid inlet pipe and the cleaning liquid bin, so that the whole device starts to operate, when the height of the cleaning agent inside the cleaning liquid bin reaches the threshold value preset by the water level sensing device, the pressure pump and the motor stop working, meanwhile, the door shaft stops rotating, the operation is stopped at the moment, the whole cleaning process is finished, only a certain amount of cleaning agent needs to be filled into the cleaning liquid bin when cleaning is needed, and the use is very convenient.

As a preferred embodiment, a water level sensing device is fixedly mounted on one side of the inner wall of the cleaning liquid bin, and a door shaft is movably mounted on one side of the inner wall of the cleaning liquid bin.

The technical effect of adopting the further scheme is as follows: when the detergent level reaches a predetermined threshold, the door shaft is rotated to open the water inlet as an operation opening means.

As a preferred embodiment, a closing door is fixedly sleeved on the outer surface of the door shaft, and the closing door is movably connected with the inner wall of the cleaning liquid bin.

The technical effect of adopting the further scheme is as follows: when the door is not opened, the door can resist the water inlet, and the cleaning agent is prevented from being remained in the pipeline for a long time to cause corrosion.

Compared with the prior art, the utility model has the advantages and positive effects that,

1. the utility model discloses, rotation through the motor output shaft drives the rotation of a plurality of main shafts in the use, the rotation pulling secondary shaft back and forth movement of main shaft, thereby the pulling changes the board with certain angle swing, the setting of pull rod and fixed axle simultaneously, make the protection ring make a round trip to rotate with commentaries on classics board pivoted angle equally, thereby drive the swing of the drain pipe of bottom, make the shower nozzle rotate and spray, spray area of contact when having increased cleanness, it needs additionally to set up a plurality of shower nozzles to have solved current wafer washing shower nozzle, wafer belt cleaning device shower nozzle probably produces the condition of pollution with external connection department simultaneously.

2. The utility model discloses, when wafer belt cleaning device began to use, only need pour into a certain amount of sanitizer into, when reaching water level induction system's the threshold value of predetermineeing, the door-hinge rotates, and motor and force pump begin work equally simultaneously to the drive is closed the door and is rotated, and the water inlet is opened, and the sanitizer begins to spray the cleanness through the admission pipe flow-down, and the course of work only need add quantitative sanitizer can, do not need extra operation, for traditional wafer belt cleaning device, it is more convenient to use.

Drawings

Fig. 1 is a right side perspective three-dimensional structure diagram of a cleaning nozzle suitable for wafer cleaning according to the present invention;

fig. 2 is a left side perspective three-dimensional structure diagram of a cleaning nozzle suitable for wafer cleaning according to the present invention;

fig. 3 is a three-dimensional structure diagram of a cleaning nozzle starting device suitable for wafer cleaning according to the present invention;

fig. 4 is an enlarged view of a portion a in fig. 2 of a cleaning showerhead suitable for wafer cleaning according to the present invention.

Illustration of the drawings:

1. a clean room; 2. a liquid outlet pipe; 3. cleaning the liquid bin; 4. a support plate; 5. a motor; 6. fixing a column; 7. a liquid inlet pipe; 201. a spray head; 202. a pressure pump; 301. a water level sensing device; 302. closing the door; 303. a door shaft; 501. a main shaft; 502. a secondary axis; 601. rotating the plate; 602. a fixed block; 603. a pull rod; 604. a fixed shaft; 605. a guard ring.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

Referring to fig. 1-4, the present invention provides a technical solution: a cleaning showerhead suitable for wafer cleaning, comprising: cleaning chamber 1, one side of the inner wall of cleaning chamber 1 is movably installed with liquid outlet pipe 2, one end of the outer surface of liquid outlet pipe 2 is fixedly installed with spray head 201, the other end of the outer surface of liquid outlet pipe 2 is fixedly installed with protective ring 605, one side of the outer surface of protective ring 605 is movably connected with liquid inlet pipe 7, the outer surface of liquid inlet pipe 7 is fixedly sleeved with pressure pump 202, one side of the outer surface of cleaning chamber 1 is fixedly installed with support plate 4, top of the outer surface of support plate 4 is fixedly installed with motor 5, output shaft of motor 5 is fixedly installed with main shaft 501, one end of the outer surface of main shaft 501 is movably installed with secondary shaft 502, when the device is used, the output shaft of motor 5 drives main shaft 501 to rotate, main shaft 501 makes circular motion with the output shaft of motor 5 as the shaft, secondary shaft 502 movably installed at the other end of main shaft 501 is pulled under the rotation of main shaft 501, push and pull one end of the outer surface of rotating plate 601, rotating plate 601 is movably sleeved with the outer surface of fixed column 6, can be rotated at a fixed height, rotating of rotating plate 601, pulling the same pull rod 603, the swinging of rotating rod 603, the rotating rod 603 is pulled to swing the same, thereby the protective ring 605 is connected with protective ring 2, the spray head, thereby realizing the swinging of the fixed shaft 201 which is connected with the fixed shaft, the rotating of the spray head.

Referring to fig. 1 to 4, a rotating plate 601 is movably mounted at one end of the outer surface of the secondary shaft 502, a fixing post 6 is movably embedded in the rotating plate 601, the fixing post 6 is fixedly mounted at one side of the outer surface of the supporting plate 4, fixing blocks 602 are fixedly mounted at both sides of the outer surface of the rotating plate 601, and the plurality of fixing blocks 602 are arranged so as to pull the pull rod 603 to rotate in the same amplitude.

Referring to fig. 1-4, a plurality of fixed blocks 602 are movably embedded with a pull rod 603, and a fixed shaft 604 is movably embedded at the other end of the outer surface of the plurality of pull rods 603, and the fixed shaft 604 is fixed such that the rotation of one end of the pull rod 603 can pull the two end points of the protection ring 605 to rotate.

Referring to fig. 1-4, a plurality of fixed shafts 604 are fixedly connected to an outer surface of the protection ring 605, the other end of the outer surface of the liquid inlet pipe 7 is fixedly connected to the cleaning liquid bin 3, when the device needs to be used, a cleaning agent is filled into the cleaning liquid bin 3, when the height of the cleaning agent in the cleaning liquid bin 3 reaches a threshold preset by the water level sensing device 301, the pressure pump 202 and the motor 5 start to work, and the door shaft 303 starts to rotate, so as to drive the door 302 to rotate, open the water inlet, and the cleaning agent enters the liquid inlet pipe 7 through the connection between the liquid inlet pipe 7 and the cleaning liquid bin 3, so that the whole device starts to operate, when the height of the cleaning agent in the cleaning liquid bin 3 does not reach the threshold preset by the water level sensing device 301, the pressure pump 202 and the motor 5 stop working, and the door shaft 303 stops rotating at the same time, so that the whole cleaning process is completed, and only a certain amount of cleaning agent needs to be filled into the cleaning liquid bin 3, which is more convenient to use.

Referring to fig. 1 to 4, a water level sensing device 301 is fixedly installed at one side of the inner wall of the cleaning liquid tank 3, a door shaft 303 is movably installed at one side of the inner wall of the cleaning liquid tank 3, and when the height of the cleaning agent reaches a preset threshold value, the door shaft 303 rotates to open the water inlet to serve as an operation opening device.

Referring to fig. 1-4, a door 302 is fixedly sleeved on the outer surface of the door shaft 303, the door 302 is movably connected with the inner wall of the cleaning solution chamber 3, and the door 302 resists against the water inlet when not opened, so as to prevent the cleaning agent from being left in the pipeline for a long time and causing corrosion.

Principle of operation

When the device is used, an output shaft of the motor 5 drives the main shaft 501 to rotate, the main shaft 501 makes circular motion by taking the output shaft of the motor 5 as a shaft, a secondary shaft 502 movably mounted at the other end of the outer surface of the main shaft 501 is pulled under the rotation of the main shaft 501, one end of the outer surface of the rotating plate 601 is pushed and pulled, the rotating plate 601 is movably sleeved on the outer surface of the fixed column 6 and can rotate at a fixed height, the rotating plate 601 swings, a pull rod 603 connected with two ends of the rotating plate 501 pulls a fixed shaft 604 to swing, the fixed shaft 604 is rotatably connected with the pull rod 603, the other end of the fixed shaft 604 is fixedly mounted on the outer surface of a protection ring 605 to drive the protection ring 605 to rotate, as the protection ring 605 is fixedly connected with the liquid outlet pipe 2, the liquid outlet pipe 2 is also driven to rotate, the rotation of the liquid outlet pipe 2 enables the spray head 201 to swing back and forth at a certain angle, the cleaning agent is poured into the cleaning liquid bin 3, when the cleaning agent in the cleaning liquid bin 3 reaches a preset threshold value of the water level induction device 301, the pressure pump 202 and the motor 5 and the cleaning agent inlet pipe is connected with the door 302, the cleaning liquid inlet of the cleaning liquid bin 3, the cleaning agent inlet pipe is stopped when the cleaning liquid inlet 7, the cleaning agent inlet of the cleaning liquid inlet pipe is stopped, the cleaning liquid inlet of the cleaning liquid tank 3, the cleaning liquid inlet pipe, and the cleaning agent inlet of the cleaning liquid inlet pipe is stopped, and the cleaning device, and the cleaning liquid inlet of the cleaning liquid inlet pipe is stopped, and the cleaning liquid inlet of the cleaning liquid tank 3, and the cleaning liquid inlet pipe is stopped when the cleaning device, the cleaning agent inlet of the cleaning device, the cleaning liquid inlet pipe is stopped, and the cleaning device, and the cleaning liquid inlet of the cleaning device is stopped, the cleaning device, and the cleaning device is stopped.

The above description is only a preferred embodiment of the present invention, and is not intended to limit the present invention in other forms, and any person skilled in the art may use the above-mentioned technical contents to change or modify the equivalent embodiment into equivalent changes and apply to other fields, but any simple modification, equivalent change and modification made to the above embodiments according to the technical matters of the present invention will still fall within the protection scope of the technical solution of the present invention.

Claims

1. A cleaning showerhead suitable for wafer cleaning, comprising: cleaning chamber (1), characterized in that: clean room (1) one side movable mounting of inner wall has drain pipe (2), the one end fixed mounting of drain pipe (2) surface has shower nozzle (201), the other end fixed mounting of drain pipe (2) surface has protection ring (605), one side swing joint of protection ring (605) surface has inlet tube (7), the outer fixed cover of inlet tube (7) is equipped with force pump (202), one side fixed mounting of clean room (1) surface has backup pad (4), the top fixed mounting of backup pad (4) surface has motor (5), the output shaft fixed mounting of motor (5) has main shaft (501), the one end movable mounting of main shaft (501) surface has secondary shaft (502).

2. A cleaning showerhead suitable for wafer cleaning as claimed in claim 1, wherein: one end of the outer surface of the secondary shaft (502) is movably provided with a rotating plate (601), a fixing column (6) is movably embedded in the rotating plate (601), the fixing column (6) is fixedly arranged on one side of the outer surface of the supporting plate (4), and fixing blocks (602) are fixedly arranged on two sides of the outer surface of the rotating plate (601).

3. A cleaning showerhead suitable for wafer cleaning as claimed in claim 2, wherein: a plurality of fixed block (602) inside all activity inlays and is equipped with pull rod (603), and is a plurality of the other end of pull rod (603) surface all activity inlays and is equipped with fixed axle (604).

4. A cleaning showerhead suitable for wafer cleaning as claimed in claim 3, wherein: the fixed shafts (604) are fixedly connected to the outer surface of the protection ring (605), and the other end of the outer surface of the liquid inlet pipe (7) is fixedly connected with the cleaning liquid bin (3).

5. A cleaning showerhead suitable for wafer cleaning as claimed in claim 4, wherein: one side fixed mounting of cleaning fluid storehouse (3) inner wall has water level induction system (301), one side movable mounting of cleaning fluid storehouse (3) inner wall has door-hinge (303).

6. A cleaning showerhead suitable for wafer cleaning as claimed in claim 5, wherein: the outer surface of the door shaft (303) is fixedly sleeved with a closing door (302), and the closing door (302) is movably connected with the inner wall of the cleaning liquid bin (3).