CN218330316U - Temperature detection device for magnetron sputtering coating - Google Patents
Temperature detection device for magnetron sputtering coating Download PDFInfo
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- CN218330316U CN218330316U CN202222174890.0U CN202222174890U CN218330316U CN 218330316 U CN218330316 U CN 218330316U CN 202222174890 U CN202222174890 U CN 202222174890U CN 218330316 U CN218330316 U CN 218330316U
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Abstract
The utility model discloses a temperature-detecting device for magnetron sputtering coating film, including rotary device, heating device and temperature detector, rotary device fixed connection is on real empty room's chamber wall, the last work piece dish that loads the substrate that is provided with of rotary device, the last substrate that loads of work piece dish, the relative substrate setting of heating device, the relative heating device setting of temperature detector, heating device arrives temperature detector's distance with heating device arrives there is a distance difference in the distance of substrate, the distance difference is less than 30cm. The distance between the temperature detector and the heating device is limited, namely, the difference between the distance from the temperature detector to the heating device and the distance from the substrate to the heating device is limited within a smaller range, so that the difference between the temperature radiated by the heating device to the temperature detector and the temperature radiated by the substrate can be effectively reduced, and the accuracy of substrate temperature detection is improved.
Description
Technical Field
The utility model relates to a magnetron sputtering coating device field, concretely relates to temperature-detecting device for magnetron sputtering coating.
Background
The magnetron sputtering technology is one of physical vapor deposition technologies, and has the advantages of high film forming rate, good film-substrate adhesion, large-area film coating and the like. Since the last 70 s, magnetron sputtering technology has been developed into various types and is widely applied to the fields of semiconductor microelectronics, optical films, material surface treatment and the like. Reactive sputtering is one of magnetron sputtering, and is to introduce reactive gases such as oxygen, nitrogen and the like into a sputtering process to react with sputtered target atoms so as to deposit a compound film. Unlike conventional magnetron sputtering, reactive sputtering generally requires the substrate to be at a higher temperature due to the need for chemical reactions to occur, and the substrate temperature has a significant effect on the composition of the resulting compound.
In the existing temperature detection device for magnetron sputtering coating, a temperature detector is usually arranged at a certain fixed position in a coating chamber, and the temperature of a substrate can be obtained by measuring the temperature at the fixed position. However, the temperature of the substrate measured is not accurate because the temperature distribution around the substrate is not uniform during the coating process. For example, CN202021512772.0 discloses a magnetron sputtering apparatus, in which a thermometer is directly inserted into the wall, and the actual coating temperature is obtained by measuring the temperature inside the chamber. In fact, because a certain distance exists between the heating device and the substrate, temperature diffusion can be caused, so that the temperature of the sample substrate is different from the temperature of other positions in the cavity, and the temperature of the substrate can not be accurately reflected by testing the temperature of other positions in the cavity, thereby causing poor film coating effect.
Disclosure of Invention
An object of the utility model is to overcome the defect that prior art exists, provide a temperature-detecting device for magnetron sputtering coating film, aim at solving among the current magnetron sputtering coating film device that the inaccurate scheduling problem that leads to the coating film effect relatively poor of substrate temperature detection.
In order to realize the above-mentioned purpose, the utility model provides a temperature-detecting device for magnetron sputtering coating film, a serial communication port, including rotary device, heating device and temperature detector, rotary device fixed connection is on real empty room's chamber wall, the last work piece dish that loads the substrate that is provided with of rotary device, the work piece dish is loaded with the substrate, temperature detector with the substrate sets up in heating device's same one side to set up for heating device, heating device arrives temperature detector's distance with heating device arrives there is a distance difference in the distance of substrate, the distance difference is less than 30cm.
In order to more accurately measure the temperature of the substrate during film coating, the utility model adopts the technical scheme that the temperature detector is arranged at a proper position, and the distance between the temperature detector and the heating device and the distance between the heating device and the substrate are close to each other at the position. Specifically, a workpiece disc rotating device is arranged in a vacuum chamber where the temperature detector is arranged, a workpiece disc for loading the substrate is arranged on the rotating device, the substrate is loaded on the workpiece disc, and a heating device is arranged at a position opposite to the substrate and used for providing proper temperature for coating the substrate. The temperature detector is arranged opposite to the heating device, the temperature detector can detect the temperature radiated by the heating device, and the temperature detector comprises a thermocouple, a thermal resistor and the like. Because the temperature of the substrate mainly comes from the temperature radiated by the heating device and the heat carried by sputtering atoms in the coating process, in order to more accurately detect the temperature of the substrate, the utility model limits the distance between the temperature detector and the heating device, namely, the difference between the distance from the temperature detector to the heating device and the distance from the substrate to the heating device is limited in a smaller range, thus effectively reducing the difference between the temperature radiated by the heating device to the temperature detector and the temperature on the substrate, thereby improving the accuracy of temperature detection, the utility model limits the difference within 30cm, which can be 25cm,20cm,15cm,10cm,5cm, or the distance from the temperature detector to the heating device is equal to the distance from the substrate to the heating device.
According to a further preferred technical scheme, the temperature detector comprises a detection probe, and a protective sleeve is wrapped outside the detection probe. In order to prevent the atom that the coating process sputtered from depositing on temperature detector's the probe, produce the pollution to the probe, the utility model discloses among the preferred technical scheme, be provided with the protective sheath in the periphery of test probe. The temperature of the substrate can be indirectly measured by the detection probe through measuring the temperature of the protective sleeve.
According to a further preferable technical scheme, the thickness of the protective sleeve is the same as that of the substrate, and the material of the protective sleeve is the same as that of the substrate.
In order to more accurately test the temperature of the substrate, in a further preferred scheme, the material and the wall thickness of the protective sleeve are further limited, the protective sleeve made of the same material as the substrate is sleeved on the detection probe, and the heating coefficient of the protective sleeve can be kept consistent with that of the substrate, so that the difference between the temperature of the protective sleeve and the temperature of the substrate can be further reduced. Similarly, the thickness of the protective sleeve is set to be consistent with the thickness of the substrate, so that the difference between the temperature of the protective sleeve and the temperature of the substrate can be further reduced, and the accuracy of detecting the temperature of the substrate is further improved.
Further preferably, the detection probe is located in a plane where the substrate is located. According to the characteristics of the coating product, the rotating device, the workpiece disc and the substrate can be arranged longitudinally or transversely, namely, the rotating device can be fixed on the side wall of the vacuum chamber and also can be arranged at the top or the bottom of the vacuum chamber, and the distance between the heating device and the substrate is also arranged according to the requirement of the coating product. In order to more conveniently control the position of the detection probe, in a further preferable technical scheme, the detection probe and the substrate are arranged in the same plane, and the detection probe is arranged close to the substrate, so that the difference between the temperature detected by the detection probe and the temperature of the substrate can be reduced, and the installation design of the detection device can be simplified.
The further preferred technical scheme is that the temperature detector is connected in the vacuum chamber through a fixed support.
According to a further preferred technical scheme, one end of the fixing support is fixed on the cavity wall of the vacuum chamber through a bolt, and the other end of the fixing support is provided with a protective sleeve fixing part.
According to a further preferred technical scheme, the temperature detector is electrically connected with a temperature controller, and the temperature controller is electrically connected with the heating device. The temperature detector converts the received temperature signal into an electric signal and transmits the electric signal to the temperature controller, and the temperature controller adjusts the temperature of the heating device according to the fed back temperature, so that the temperature finally detected by the temperature detector is consistent with the set temperature.
The utility model has the advantages and beneficial effects that:
1. the distance between the temperature detector and the heating device is limited, namely the difference between the distance from the temperature detector to the heating device and the distance from the substrate to the heating device is limited in a smaller range, so that the difference between the temperature radiated by the heating device to the temperature detector and the temperature radiated by the substrate can be effectively reduced, and the accuracy of substrate temperature detection is improved.
2. The protective sleeve made of the same material as the substrate is sleeved on the detection probe, the heating coefficient of the protective sleeve can be consistent with that of the substrate, and therefore the difference between the temperature of the protective sleeve and the temperature of the substrate can be further reduced. The thickness of the protective sleeve is set to be consistent with the thickness of the substrate, so that the difference between the temperature of the protective sleeve and the temperature of the substrate can be further reduced, and the accuracy of detecting the temperature of the substrate is further improved.
Drawings
FIG. 1 is a schematic structural view of a temperature detection device according to an embodiment;
fig. 2 is an enlarged view of a portion a of the structure of fig. 1.
In the figure: 1. a rotating device; 2. a heating device; 3. a thermocouple; 31. detecting a probe; 4. a vacuum chamber; 5. a substrate; 6. a workpiece tray; 7. a protective sleeve; 8. fixing a bracket; 9. a bolt; 10. a protective cover fixing part; 11. a temperature controller.
Detailed Description
The following description will further describe embodiments of the present invention with reference to the accompanying drawings and examples. The following examples are only for illustrating the technical solutions of the present invention more clearly, and the protection scope of the present invention is not limited thereby.
Examples
As shown in fig. 1 and 2, the temperature detection device for magnetron sputtering coating comprises a rotating device 1, a heating device 2 and a thermocouple 3, wherein the rotating device 1 is fixedly connected to the top of a vacuum chamber 4, a workpiece tray 6 for loading a substrate 5 is arranged on the rotating device 1, and the substrate 5 is loaded on the workpiece tray 6. The thermocouple 3 comprises a detection probe 31, a protective sleeve 7 is wrapped outside the detection probe 31, the material of the protective sleeve 7 is the same as that of the substrate 5, and the wall thickness of the protective sleeve 7 is also the same as that of the substrate 5. The heating device 2 is arranged opposite to the substrate 5, the thermocouple 3 is arranged opposite to the heating device 2, the detection probe 31 of the thermocouple 3 and the substrate 5 are in the same plane and at the same height, and the detection probe 31 is arranged next to the substrate 5. The thermocouple 3 is connected in the vacuum chamber 4 through a fixing support 8, one end of the fixing support 8 is fixed at the top of the vacuum chamber 4 through a bolt 9, and the other end of the fixing support is provided with a protective sleeve fixing part 10. The thermocouple 3 is electrically connected with a temperature controller 11, and the temperature controller 11 is electrically connected with the heating device 2.
The above description is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, many modifications and decorations can be made without departing from the technical principle of the present invention, and these modifications and decorations are also regarded as the protection scope of the present invention.
Claims (7)
1. The temperature detection device for magnetron sputtering coating is characterized by comprising a rotating device, a heating device and a temperature detector, wherein the rotating device is fixedly connected to the wall of a vacuum chamber, a workpiece disc for loading a substrate is arranged on the rotating device, the substrate is loaded on the workpiece disc, the temperature detector and the substrate are arranged on the same side of the heating device and are arranged relative to the heating device, a distance difference exists between the heating device and the temperature detector and between the heating device and the substrate, and the distance difference is smaller than 30cm.
2. The temperature sensing device of claim 1, wherein the temperature probe comprises a sensing probe that is surrounded by a protective sheath.
3. The temperature sensing device of claim 2, wherein the protective sheath has a wall thickness that is the same as a thickness of the substrate.
4. The apparatus according to claim 2, wherein said sensing probe is located in a plane of said substrate.
5. The temperature sensing device of any one of claims 1-4, wherein the temperature probe is attached within the vacuum chamber by a fixed bracket.
6. The temperature detecting device according to claim 5, wherein one end of the fixing bracket is fixed on a wall of the vacuum chamber by a bolt, and the other end is provided with a protective sheath fixing portion.
7. The temperature sensing device of claim 1, wherein the temperature probe is electrically connected to a temperature controller, the temperature controller being electrically connected to the heating device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222174890.0U CN218330316U (en) | 2022-08-18 | 2022-08-18 | Temperature detection device for magnetron sputtering coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222174890.0U CN218330316U (en) | 2022-08-18 | 2022-08-18 | Temperature detection device for magnetron sputtering coating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN218330316U true CN218330316U (en) | 2023-01-17 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202222174890.0U Active CN218330316U (en) | 2022-08-18 | 2022-08-18 | Temperature detection device for magnetron sputtering coating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN218330316U (en) |
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2022
- 2022-08-18 CN CN202222174890.0U patent/CN218330316U/en active Active
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