CN218306209U - Vacuum buffer device for rectifying high-melting-point materials - Google Patents
Vacuum buffer device for rectifying high-melting-point materials Download PDFInfo
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- CN218306209U CN218306209U CN202222286090.8U CN202222286090U CN218306209U CN 218306209 U CN218306209 U CN 218306209U CN 202222286090 U CN202222286090 U CN 202222286090U CN 218306209 U CN218306209 U CN 218306209U
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Abstract
The utility model provides a vacuum buffer device for high melting point material rectification, including first absorption unit, second absorption unit and third absorption unit. The first absorption unit is used for absorbing hydrogen chloride gas carried in the first vacuum pipeline; the second absorption unit is used for absorbing and dissolving the gaseous high-melting-point material in the second vacuum pipeline transferred by the first absorption unit; and the third absorption unit is used for condensing and adsorbing the solvent in the third vacuum pipeline transferred by the second absorption unit, and a third gas outlet of the third absorption unit is communicated with the screw vacuum system for rectifying the high-melting-point material. The utility model provides a vacuum buffer for high melting point material rectification aims at solving among the prior art when carrying out the rectification to high melting point material, and high melting point material pile in the vacuum pipeline leads to the vacuum pipeline to block up, and then influences the problem of rectification system stability.
Description
Technical Field
The utility model belongs to the technical field of high melting point material rectification vacuum apparatus, concretely relates to a vacuum buffer for high melting point material rectification.
Background
The boiling point of the o-chlorobenzene acetonitrile and the p-chlorobenzene acetonitrile is high, and the o-chlorobenzene acetonitrile and the p-chlorobenzene acetonitrile are required to be rectified and purified by utilizing high vacuum degree in order to obtain the o-chlorobenzene acetonitrile and the p-chlorobenzene acetonitrile with high purity and high quality. The general vacuum system can not meet the requirements of cleanness, no oil, corrosion resistance and high vacuum degree. In recent years, screw vacuum pumps have been widely used due to their advantages of wide pumping speed range, simple and compact structure, no friction of pumping cavity elements, long service life, low energy consumption, no oil pollution, etc.
An authority bulletin number is CN214598232U discloses a screw rod vacuum buffer, be equipped with alkali lye absorption tank and filler absorption tank, the import of alkali lye absorption tank is through the pipeline intercommunication rectification reaction system who has the check valve, the export is through the import of pipeline intercommunication filler absorption tank, the export of filler absorption tank communicates outside screw vacuum pump, the external cover that is equipped with of jar of filler absorption tank is used for circulating low temperature salt solution in order to appear out the material that easily crystallizes in the filler absorption tank, the top is equipped with the steam washing mouth that is used for connecting the outside steam source of intercommunication. This utility model has solved current screw vacuum pump acid resistance material to a certain extent, the evacuation material can not crystallize, can not contain mechanical impurity scheduling problem, but only reduced the volume of high melting point material in the vacuum line that switches on from packing retort export and screw vacuum pump, can't thoroughly avoid smuggleing secretly of high melting point material, and along with constantly appearing of packing layer high melting point material, the area that the packing layer blockked up constantly increases, whole vacuum system's vacuum air exhaust volume can receive certain influence, thereby influence the vacuum of whole rectification system.
In the prior art, when the o-chlorobenzonitrile and the p-chlorobenzonitrile are rectified and purified by a screw vacuum pump, because the o-chlorobenzonitrile and the p-chlorobenzonitrile have higher boiling points, trace o-chlorobenzyl chloride and p-chlorobenzyl chloride carried in crude nitrile are inevitably decomposed to generate hydrogen chloride in the high-temperature rectification and purification process, and the hydrogen chloride carrying water vapor is very easy to corrode a vacuum pipeline and the screw vacuum pump. Simultaneously, inevitable clamp has a small amount of with the gaseous form in the vacuum line that the rectification system top of the tower cooler is connected adjacent chlorobenzene acetonitrile and p-chlorobenzene acetonitrile material, because both melting points are higher relatively, along with going on continuously of rectification process, the continuous accumulation of adjacent chlorobenzene acetonitrile and p-chlorobenzene acetonitrile material in the vacuum line, crystallization leads to the vacuum line to block up, still can lead to screw vacuum pump's rotor jamming, coating wearing and tearing etc. when serious, cause the unable continuous steady operation of rectification system, the practicality is relatively poor.
SUMMERY OF THE UTILITY MODEL
The utility model provides a vacuum buffer for high melting point material rectification aims at solving among the prior art when carrying out the rectification to high melting point material, and high melting point material pile in the vacuum pipeline leads to the vacuum pipeline to block up, and then influences the problem of rectification system stability.
In order to achieve the purpose, the utility model adopts the technical proposal that: a vacuum buffer device for rectifying high-melting-point materials is provided, which comprises:
the first absorption unit is communicated with the rectifying tower top cooler through a first vacuum pipeline and is used for absorbing hydrogen chloride gas carried in the first vacuum pipeline;
the second absorption unit is communicated with the first air outlet of the first absorption unit through a second vacuum pipeline and is used for absorbing and dissolving the gaseous high-melting-point material in the second vacuum pipeline transferred by the first absorption unit;
and the third absorption unit is communicated with a second gas outlet of the second absorption unit through a third vacuum pipeline and is used for condensing and adsorbing the solvent in the third vacuum pipeline transferred by the second absorption unit, and a third gas outlet of the third absorption unit is communicated with the screw vacuum system for rectifying the high-melting-point material.
In a possible implementation manner, the first absorption unit includes a first reaction vessel and a first communication pipe, the first reaction vessel has a first gas inlet, the first gas inlet is communicated with the first vacuum pipe, and the first gas outlet is disposed on the first reaction vessel; first communicating pipe with first air inlet intercommunication, just first communicating pipe is located among the first reation kettle, be used for with gas among the vacuum line is leading-in to among the first reation kettle.
In a possible implementation manner, a first support rod is further arranged in the first reaction kettle, and the first support rod comprises a first rod body and a second rod body; the first rod bodies are uniformly arranged along the vertical direction, one end of each first rod body is fixedly connected with the inner side wall surface of the first reaction kettle, the other end of each first rod body is fixedly connected with the first communicating pipe, and each first rod body is used for fixing the first communicating pipe; the second rod body is provided with a plurality of second rod bodies, one end of each second rod body is fixedly connected with the bottom of the first reaction kettle, the other end of each second rod body is connected with the first communicating pipe in an included angle mode, and each second rod body is used for fixing the first communicating pipe.
In a possible implementation manner, the second absorption unit includes a second reaction kettle and a second communicating pipe, the second reaction kettle has a second gas inlet, the second gas inlet is communicated with the first gas outlet, and the second gas outlet is arranged on the second reaction kettle; and the second communicating pipe is communicated with the second air inlet and positioned in the second reaction kettle and used for guiding the gaseous high-melting-point material in the second vacuum pipeline into the second reaction kettle.
In a possible implementation manner, the second absorption unit further includes a second support bar, and the second support bar includes a third bar body and a fourth bar body; a plurality of third rod bodies are arranged, each third rod body is uniformly arranged along the vertical direction, one end of each third rod body is fixedly connected with the inner side wall surface of the second reaction kettle, the other end of each third rod body is fixedly connected with the second communicating pipe, and each third rod body is used for fixing the second communicating pipe; the fourth rod bodies are provided with a plurality of rod bodies, one end of each fourth rod body is fixedly connected with the bottom of the second reaction kettle, the other end of each fourth rod body is connected with the second communicating pipe in an included angle mode, and each fourth rod body is used for fixing the second communicating pipe.
In one possible implementation manner, the third absorption unit comprises a third reaction kettle, a packing layer and an adsorption layer; the third reaction kettle is provided with a third air inlet, the third air inlet is positioned at the bottom of the third reaction kettle, the third air outlet is arranged at the top of the third reaction kettle, the third air inlet is connected with the second air outlet, and the packing layer is arranged in the third reaction kettle and is used for condensing condensable substances in the gas in the third vacuum pipeline; the adsorption layer is arranged in the third reaction kettle, is positioned above the packing layer and is used for adsorbing the high-boiling-point solvent in the gas in the third vacuum pipeline.
In one possible implementation, the adsorption layer is an adsorption resin.
In a possible implementation manner, outer sleeve members are sleeved on outer sides of the first absorption unit, the second absorption unit and the third absorption unit, each outer sleeve member and outer side wall surfaces of the first absorption unit, the second absorption unit and the third absorption unit respectively enclose a cavity, and each cavity is used for circulation of a refrigerant medium.
The utility model provides a vacuum buffer for high melting point material rectification's beneficial effect lies in: compared with the prior art, the first absorption unit is communicated with the rectifying tower top cooler through the first vacuum pipeline, so that the hydrogen chloride gas transferred from the rectifying tower top cooler through the first vacuum pipeline is absorbed. The second absorption unit is communicated with the first absorption unit through a second vacuum pipeline, so that the gaseous high-melting-point material in the second vacuum pipeline transferred by the first absorption unit is absorbed and dissolved. The third absorption unit is communicated with the second absorption unit through a third vacuum pipeline, so that the solvent in the third vacuum pipeline transferred by the second absorption unit is condensed and adsorbed. The hydrogen chloride gas, the gaseous high-melting-point material and the solvent transferred from the cooler on the top of the rectifying tower are respectively absorbed, dissolved and adsorbed by the first absorption unit, the second absorption unit and the third absorption unit, so that the accumulation of the materials in the first vacuum pipeline, the second vacuum pipeline and the third vacuum pipeline is avoided, and the smoothness of the first vacuum pipeline, the second vacuum pipeline and the third vacuum pipeline is kept. Meanwhile, a discharge port of the third absorption unit is communicated with the high-melting-point material rectification screw vacuum system, so that the corrosion of hydrogen cyanide carrying water vapor to the first vacuum pipeline, the second vacuum pipeline, the third vacuum pipeline and the high-melting-point material rectification screw vacuum system is avoided, the stable operation of a rectifier tower top cooler and the high-melting-point material rectification screw vacuum system is ensured, and the practicability is good.
Drawings
Fig. 1 is a schematic structural diagram of a vacuum buffer device for rectifying high-melting-point materials according to an embodiment of the present invention.
Description of reference numerals:
10. a first absorption unit; 11. a first reaction kettle; 111. a first air outlet; 12. a first communication pipe; 13. a first rod body; 14. a second rod body; 20. a second absorption unit; 21. a second reaction kettle; 211. a second air outlet; 22. a second communicating pipe; 23. a third rod body; 24. a fourth rod body; 30. a third absorption unit; 31. a third reaction kettle; 311. a third air inlet; 312. a third air outlet; 32. a filler layer; 33. an adsorption layer; 40. a first vacuum line; 50. a second vacuum line; 60. a third vacuum line.
Detailed Description
In order to make the technical problem, technical solution and advantageous effects to be solved by the present invention more clearly understood, the following description is given in conjunction with the accompanying drawings and embodiments to illustrate the present invention in further detail. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
It should be noted that the terms "length", "width", "height", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "head", "tail", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are merely for convenience of description and simplicity of description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the invention.
It is also noted that, unless expressly stated or limited otherwise, the terms "mounted," "connected," "secured," "disposed," and the like are intended to be inclusive and mean, for example, that they may be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other suitable relationship. The specific meaning of the above terms in the present invention can be understood according to specific situations by those skilled in the art.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. Further, "plurality" or "a plurality" means two or more unless specifically limited otherwise.
Referring to fig. 1, a vacuum buffer device for rectifying a high melting point material according to the present invention will now be described. The vacuum buffer device for rectifying the high-melting-point material comprises a first absorption unit 10, a second absorption unit 20 and a third absorption unit 30. The first absorption unit 10 is communicated with the rectifying tower top cooler through a first vacuum pipeline 40 and is used for absorbing hydrogen chloride gas carried in the first vacuum pipeline 40. The second absorption unit 20 is communicated with the first air outlet 111 of the first absorption unit 10 through the second vacuum pipeline 50, and is used for absorbing and dissolving the gaseous high-melting-point material in the second vacuum pipeline 50 transferred through the first absorption unit 10. The third absorption unit 30 is communicated with the second gas outlet 211 of the second absorption unit 20 through the third vacuum pipeline 60, and is used for condensing and adsorbing the solvent in the third vacuum pipeline 60 transferred through the second absorption unit 20. The third gas outlet 312 of the third absorption unit 30 is communicated with a screw vacuum system for rectifying the high-melting point material.
The embodiment of the utility model provides a vacuum buffer for high melting point material rectification compares with prior art, and first absorption unit 10 and rectifying column top cooler are through first vacuum pipeline 40 intercommunication to absorb the hydrogen chloride gas that comes in the transmission of first vacuum pipeline 40 in rectifying column top cooler. The second absorption unit 20 is communicated with the first absorption unit 10 through the second vacuum line 50, so as to absorb and dissolve the gaseous high melting point material in the second vacuum line 50 transferred through the first absorption unit 10. The third absorption unit 30 is communicated with the second absorption unit 20 through the third vacuum line 60, thereby condensing and adsorbing the solvent in the third vacuum line 60 transferred through the second absorption unit 20. The hydrogen chloride gas, the gaseous high-melting-point materials and the solvent transferred from the top cooler of the rectification tower are respectively absorbed, dissolved and adsorbed by the first absorption unit 10, the second absorption unit 20 and the third absorption unit 30, so that the accumulation of the materials in the first vacuum pipeline 40, the second vacuum pipeline 50 and the third vacuum pipeline 60 is avoided, and the smoothness of the first vacuum pipeline 40, the second vacuum pipeline 50 and the third vacuum pipeline 60 is kept. Meanwhile, the discharge port of the third absorption unit 30 is communicated with the high-melting-point material rectification screw vacuum system, so that the corrosion of hydrogen cyanide carrying water vapor to the first vacuum pipeline 40, the second vacuum pipeline 50, the third vacuum pipeline 60 and the high-melting-point material rectification screw vacuum system is avoided, the stable operation of a rectifier tower top cooler and the high-melting-point material rectification screw vacuum system is ensured, and the practicability is good.
In some embodiments, referring to fig. 1, the first absorption unit 10 includes a first reaction vessel 11 and a first communication pipe 12, and the first reaction vessel 11 has a first air inlet. The first air inlet is communicated with the first vacuum pipeline 40, and the first air outlet 111 is arranged on the first reaction kettle 11. The first communicating pipe 12 is communicated with the first gas inlet, and the first communicating pipe 12 is located in the first reaction vessel 11 and is used for guiding the gas in the vacuum pipeline into the first reaction vessel 11. In this embodiment, the first gas inlet of the first reaction vessel 11 is communicated with the first vacuum pipeline 40, and the first communicating pipe 12 is communicated with the first gas inlet, so that the hydrogen cyanide gas in the top cooler of the rectification column is introduced into the first reaction vessel 11 through the first communicating pipe 12 for absorption.
In the above embodiment, the first reaction kettle 11 may be a sodium hydroxide solution to absorb and remove hydrogen chloride, so as to ensure the removal rate of hydrogen chloride.
In some embodiments, referring to fig. 1, the first reaction vessel 11 is further provided with a first support rod. The first support bar includes a first bar body 13 and a second bar body 14. The first rod bodies 13 are provided with a plurality of first rod bodies 13, each first rod body 13 is uniformly arranged along the vertical direction, one end of each first rod body 13 is fixedly connected with the inner side wall surface of the first reaction kettle 11, and the other end of each first rod body is fixedly connected with the first communicating pipe 12 and used for fixing the first communicating pipe 12. The second rod bodies 14 are provided with a plurality of second rod bodies 14, one end of each second rod body 14 is fixedly connected with the bottom of the first reaction kettle 11, the other end of each second rod body is connected with the first communicating pipe 12 in an included angle mode, and each second rod body 14 is used for fixing the first communicating pipe 12. Alternatively, each first rod 13 is connected to a portion of the first communication pipe 12 that is located in a middle portion thereof. In this embodiment, a plurality of first rod bodies 13 and a plurality of second rod bodies 14 are disposed in the first reaction kettle 11, each first rod body 13 is uniformly disposed along the vertical direction, one end of each first rod body 13 is fixedly connected to the inner side wall of the first reaction kettle 11, and the other end of each first rod body 13 is fixedly connected to the first communication pipe 12, so as to fix the first communication pipe 12 in the first reaction kettle 11, meanwhile, one end of each second rod body 14 is fixedly connected to the bottom of the first reaction kettle 11, and the other end of each second rod body is connected to the first communication pipe 12 at an included angle, so that the first communication pipe 12 is more stably fixed.
In some embodiments, referring to fig. 1, the second absorption unit 20 includes a second reaction vessel 21 and a second communicating tube 22. The second reaction vessel 21 has a second gas inlet, and a second gas outlet 211 is provided on the second reaction vessel 21. The second air inlet port communicates with the first air outlet port 111. The second communicating pipe 22 is communicated with the second gas inlet, and the second communicating pipe 22 is located in the second reaction vessel 21, and is used for introducing the gaseous high-melting-point material in the second vacuum pipeline 50 into the second reaction vessel 21. In this embodiment, the second communicating pipe 22 is disposed in the second reaction vessel 21, so that the gaseous high-melting-point material in the second vacuum pipeline 50 is introduced into the second reaction vessel 21 through the second communicating pipe 22, and is absorbed by the second reaction vessel 21, thereby avoiding the high-melting-point material from accumulating in the second vacuum pipeline 50.
In the above embodiment, the second reaction vessel 21 may be a high boiling point solvent to dissolve and absorb the high boiling point material.
In some embodiments, referring to fig. 1, the second absorption unit 20 further includes a second supporting rod. The second support bar includes a third bar body 23 and a fourth bar body 24. The third body of rod 23 is equipped with a plurality ofly, and each third body of rod 23 evenly sets up along vertical direction, and 23 one end of each third body of rod and second reation kettle 21's inside wall face rigid coupling, the other end and second communicating pipe 22 rigid coupling, each third body of rod 23 is used for fixed second communicating pipe 22. The number of the fourth rod 24 is multiple, one end of each fourth rod 24 is fixedly connected with the bottom of the second reaction kettle 21, the other end of each fourth rod 24 is connected with the second communicating pipe 22 in an included angle, and each fourth rod 24 is used for fixing the second communicating pipe 22. Alternatively, each third rod 23 is connected to a position of the second communication pipe 22 at a position closer to the middle thereof. In this embodiment, set up a plurality of third body of rods 23 and a plurality of fourth body of rods 24 in second reation kettle 21, each third body of rod 23 evenly sets up along vertical direction, and each third body of rod 23 one end and second reation kettle 21's inside wall face rigid coupling, the other end and second communicating pipe 22 rigid coupling, thereby fix second communicating pipe 22 in second reation kettle 21, the one end of each fourth body of rod 24 and second reation kettle 21's bottom rigid coupling simultaneously, the other end is the contained angle with second communicating pipe 22 and links to each other, thereby make the fixed more firm of second communicating pipe 22.
It should be noted that, because the first absorption unit 10 and the second absorption unit 20 are submerged absorption, when the system operates normally, the first communicating pipe 12 and the second communicating pipe 22 inevitably vibrate greatly, and the first supporting rod and the second supporting rod are used to fix the first communicating pipe 12 and the second communicating pipe 22 with the corresponding first reaction kettle 11 and the second reaction kettle 21, respectively, so as to ensure the firmness of the system, reduce the vibration amplitude of the system, and achieve good practicability.
In some embodiments, referring to fig. 1, the third absorption unit 30 includes a third reaction vessel 31, a packing layer 32 and an adsorption layer 33. Third reaction vessel 31 has third gas inlet 311. The third gas inlet 311 is located at the bottom of the third reaction vessel 31, and the third gas outlet 312 is arranged at the top of the third reaction vessel 31. The third air inlet 311 is connected to the second air outlet 211. A packing layer 32 is provided in the third reaction vessel 31 for condensing condensable substances in the gas in the third vacuum line 60. The adsorption layer 33 is disposed in the third reaction vessel 31 and above the packing layer 32, and is used for adsorbing the high boiling point solvent in the gas in the third vacuum pipeline 60. In this embodiment, the packing layer 32 and the adsorption layer 33 are disposed in the third reaction vessel 31, the packing layer 32 condenses condensable substances in the gas in the third vacuum pipeline 60, and the adsorption layer 33 adsorbs high boiling point solvent in the gas in the third vacuum pipeline 60, so that the gas in the third vacuum pipeline 60 is completely purified.
In some embodiments, the adsorbent layer 33 is an adsorbent resin. The adsorption resin is used to adsorb a trace amount of high boiling point solvent carried in the gas in the third vacuum pipeline 60, so that the gas is thoroughly purified, and the gas purified by adsorption escapes from the top of the adsorption resin to the third gas outlet 312, and then enters the subsequent screw vacuum system for rectifying the high melting point material.
In some embodiments, the outer side of each of the first absorption unit 10, the second absorption unit 20, and the third absorption unit 30 is sleeved with an outer sleeve, each outer sleeve encloses a cavity with the outer side wall of each of the first absorption unit 10, the second absorption unit 20, and the third absorption unit 30, each cavity has a liquid inlet and a liquid outlet, and each cavity is used for the circulation of a refrigerant medium, so as to ensure the condensation absorption effect of the vacuum airflow.
The embodiment of the utility model provides a vacuum buffer for high melting point material rectification's a specific embodiment does: the first absorption unit 10 and the outer sleeve member enclose to form a cavity having a first liquid inlet and a first liquid outlet. The first cooling water with the temperature of 7 ℃ is introduced into the cavity from the first liquid inlet, and flows out from the first liquid outlet after exchanging heat with the sodium hydroxide absorption liquid in the first reaction kettle 11, so that the hydrogen chloride gas carried in the gas led out from the cooler at the top of the rectification tower can be completely reacted with the sodium hydroxide absorption liquid, and the removal effect of the hydrogen chloride is further ensured.
The cavity formed by the second absorption unit 20 and the outer sleeve member has a second liquid inlet and a second liquid outlet. And introducing second cooling water at the temperature of 23 ℃ below zero into the cavity from the second liquid inlet, exchanging heat with the high-boiling-point solvent absorption liquid in the second reaction kettle 21, and then enabling the second cooling water to flow out from the second liquid outlet, so that the gaseous high-melting-point material carried in the gas in the second vacuum pipeline 50 is absorbed in the largest amount on the premise of ensuring that the high-boiling-point solvent in the second reaction kettle 21 is not crystallized.
The third absorption unit 30 and the outer sleeve member enclose a cavity to form a cavity having a third liquid inlet and a third liquid outlet. And second cooling water at the temperature of 23 ℃ below zero is introduced into the cavity from the third liquid inlet, exchanges heat with gas entering the third reaction kettle 31 and then flows out from the third liquid outlet, so that the condensation effect and the adsorption effect of the gas in the third vacuum pipeline 60 are further ensured, and a large amount of non-condensable gas is prevented from entering a subsequent screw vacuum system for rectifying high-melting-point materials.
In some embodiments, a gas distributor is disposed below each of the first reaction vessel 11 and the second reaction vessel 21, so that the gas in the first reaction vessel 11 and the second reaction vessel 21 is uniformly distributed, which facilitates the sufficient reaction.
In some embodiments, the outer sides of the first vacuum pipeline 40 and the second vacuum pipeline 50 are both provided with heat-insulating jackets, and constant-temperature hot water at 28 ℃ is introduced into the heat-insulating jackets, so that the gas in the corresponding first vacuum pipeline 40 and the second vacuum pipeline 50 can be heated and insulated, and the high-melting-point materials in the first vacuum pipeline 40 and the second vacuum pipeline 50 are prevented from crystallizing in the first vacuum pipeline 40 and the second vacuum pipeline 50 due to too low temperature, so that the first vacuum pipeline 40 and the second vacuum pipeline 50 are blocked, and the stable operation of the screw vacuum system for rectifying the high-melting-point materials is influenced.
The above description is only exemplary of the present invention and should not be taken as limiting the scope of the present invention, as any modifications, equivalents, improvements and the like made within the spirit and principles of the present invention are intended to be included within the scope of the present invention.
Claims (8)
1. A vacuum buffer device for rectifying high melting point materials is characterized by comprising:
the first absorption unit is communicated with the rectifying tower top cooler through a first vacuum pipeline and is used for absorbing hydrogen chloride gas carried in the first vacuum pipeline;
the second absorption unit is communicated with the first air outlet of the first absorption unit through a second vacuum pipeline and is used for absorbing and dissolving the gaseous high-melting-point material in the second vacuum pipeline transmitted by the first absorption unit;
and the third absorption unit is communicated with a second gas outlet of the second absorption unit through a third vacuum pipeline and is used for condensing and adsorbing the solvent in the third vacuum pipeline transferred by the second absorption unit, and a third gas outlet of the third absorption unit is communicated with the screw vacuum system for rectifying the high-melting-point material.
2. The vacuum buffer device for rectifying the high-melting-point material according to claim 1, wherein the first absorption unit comprises a first reaction kettle and a first communication pipe, the first reaction kettle is provided with a first gas inlet, the first gas inlet is communicated with the first vacuum pipe, and the first gas outlet is arranged on the first reaction kettle; first communicating pipe with first air inlet intercommunication, just first communicating pipe is located among the first reation kettle, be used for with gas among the vacuum line is leading-in to among the first reation kettle.
3. The vacuum buffer device for rectifying the high-melting-point material according to claim 2, wherein a first support rod is further arranged in the first reaction kettle, and the first support rod comprises a first rod body and a second rod body; the first rod bodies are uniformly arranged along the vertical direction, one end of each first rod body is fixedly connected with the inner side wall surface of the first reaction kettle, the other end of each first rod body is fixedly connected with the first communicating pipe, and each first rod body is used for fixing the first communicating pipe; the second rod body is provided with a plurality of second rod bodies, one end of each second rod body is fixedly connected with the bottom of the first reaction kettle, the other end of each second rod body is connected with the first communicating pipe in an included angle mode, and each second rod body is used for fixing the first communicating pipe.
4. The vacuum buffer device for rectifying the high-melting-point material according to claim 2, wherein the second absorption unit comprises a second reaction kettle and a second communicating pipe, the second reaction kettle is provided with a second gas inlet, the second gas inlet is communicated with the first gas outlet, and the second gas outlet is arranged on the second reaction kettle; the second communicating pipe is communicated with the second air inlet and positioned in the second reaction kettle and used for guiding the gaseous high-melting-point material in the second vacuum pipeline into the second reaction kettle.
5. The vacuum buffer apparatus for rectification of high melting point material according to claim 4, wherein the second absorption unit further comprises a second support rod, the second support rod comprises a third rod body and a fourth rod body; the number of the third rod bodies is multiple, each third rod body is uniformly arranged along the vertical direction, one end of each third rod body is fixedly connected with the inner side wall surface of the second reaction kettle, the other end of each third rod body is fixedly connected with the second communicating pipe, and each third rod body is used for fixing the second communicating pipe; the fourth rod bodies are provided with a plurality of rod bodies, one end of each fourth rod body is fixedly connected with the bottom of the second reaction kettle, the other end of each fourth rod body is connected with the second communicating pipe in an included angle mode, and each fourth rod body is used for fixing the second communicating pipe.
6. The vacuum buffer device for rectifying the high-melting-point material according to claim 1, wherein the third absorption unit comprises a third reaction kettle, a packing layer and an adsorption layer; the third reaction kettle is provided with a third air inlet, the third air inlet is positioned at the bottom of the third reaction kettle, the third air outlet is arranged at the top of the third reaction kettle, the third air inlet is connected with the second air outlet, and the packing layer is arranged in the third reaction kettle and used for condensing condensable substances in the gas in the third vacuum pipeline; the adsorption layer is arranged in the third reaction kettle, is positioned above the packing layer and is used for adsorbing the high-boiling-point solvent in the gas in the third vacuum pipeline.
7. The vacuum buffer device for rectifying the high-melting-point material according to claim 6, wherein the adsorption layer is adsorption resin.
8. The vacuum buffer device for rectifying high-melting-point materials according to claim 1, wherein outer sides of the first absorption unit, the second absorption unit and the third absorption unit are sleeved with outer sleeve members, each outer sleeve member and outer side wall surfaces of the first absorption unit, the second absorption unit and the third absorption unit respectively enclose a cavity, and each cavity is used for circulation of refrigerant media.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222286090.8U CN218306209U (en) | 2022-08-29 | 2022-08-29 | Vacuum buffer device for rectifying high-melting-point materials |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222286090.8U CN218306209U (en) | 2022-08-29 | 2022-08-29 | Vacuum buffer device for rectifying high-melting-point materials |
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| CN218306209U true CN218306209U (en) | 2023-01-17 |
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| CN202222286090.8U Active CN218306209U (en) | 2022-08-29 | 2022-08-29 | Vacuum buffer device for rectifying high-melting-point materials |
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2022
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