CN218240090U - Test structure and test board for testing friction performance of sliding block - Google Patents
Test structure and test board for testing friction performance of sliding block Download PDFInfo
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- CN218240090U CN218240090U CN202222338667.5U CN202222338667U CN218240090U CN 218240090 U CN218240090 U CN 218240090U CN 202222338667 U CN202222338667 U CN 202222338667U CN 218240090 U CN218240090 U CN 218240090U
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Abstract
The utility model provides a test structure for testing slider frictional behavior, test structure includes the basement, the basement surface is provided with at least one recess, the inside cylinder that awaits measuring that is provided with of recess, the size of the top surface of the cylinder that awaits measuring is less than the size on the surface that awaits measuring of slider, the size of recess is greater than the size on the surface that awaits measuring of slider, the cylinder that awaits measuring with recess bottom fixed connection or integrated into one piece. The test structure can be used for respectively testing the friction performance of different areas of the slide block to be tested under the pushing of the needle point of the atomic force microscope.
Description
Technical Field
The utility model belongs to friction properties test field relates to a test structure for testing slider friction properties.
Background
In the process of researching the super-slip property of graphite, when the sliding friction force between a graphite island and a certain material is tested, the graphite island needs to be transferred to the surface of the material to be tested. Taking the friction force between silicon and graphite as an example, 10 μm by 10 μm graphite islands are transferred to the surface of a silicon wafer, and the graphite islands are pressed by the tip of an atomic force microscope to rub on the surface of the silicon wafer. The researches in the field find that the main contribution of the friction force between the graphite island and the silicon wafer is from the edge of the graphite island, so that when an atomic force microscope is used for testing, the friction force result obtained by the test is the sum of the friction force at the edge of the graphite island and the friction force at the center of the graphite island, when the size of the graphite island is increased, the friction force is increased, the graphite island cannot be normally pushed, the friction force is difficult to measure, and if the friction force is reduced by directly processing the surface or the material of the silicon wafer, so that the pushing is convenient, the accuracy of the measurement result can be influenced. Therefore, the development of a new test structure for the friction performance test of graphite islands is urgently needed in the art.
SUMMERY OF THE UTILITY MODEL
For solving the technical problem that exists among the prior art, the utility model provides a test structure for testing slider frictional behavior, test structure can realize under atomic force microscope's needle point promotes, tests the frictional behavior of the subregion of the slider that awaits measuring respectively.
In order to achieve the technical effects, the utility model adopts the following technical scheme:
an object of the utility model is to provide a test structure for testing slider frictional behavior, test structure includes the basement, the basement surface is provided with at least one recess, the inside cylinder that awaits measuring that is provided with of recess, the size of the top surface of the cylinder that awaits measuring is less than the size on the surface that awaits measuring of slider, the size of recess is greater than the size on the surface that awaits measuring of slider, the cylinder that awaits measuring with bottom of the groove fixed connection or integrated into one piece.
The utility model discloses in, the cylinder that awaits measuring is prepared into to the material of the bottom surface that awaits measuring, and the cylinder top surface that awaits measuring is the face of awaiting measuring, and the area of the face of awaiting measuring is less than the area of the slider bottom surface that awaits measuring, sets up the chamfer at the edge of the face of awaiting measuring simultaneously, and the cylinder can not contact the bottom edge of slider when the slider slides on the cylinder, and the marginal effect that can avoid the cylinder that awaits measuring influences the frictional force of slider and detects, and the accuracy that leads to the frictional force test is not high.
As the existing research shows that the friction force contribution between the slide block to be tested and the surface to be tested is mainly from the edge of the slide block to be tested, the contact between the edge of the slide block to be tested and the surface to be tested is avoided through the silicon column design, the edge area and the middle area of the slide block to be tested can be separately measured, the accuracy of the friction force is higher, and the area analysis of the friction force is facilitated.
In practical use, the sliding block can be translated to the adjacent plane and then pushed onto the column for testing.
As the utility model discloses preferred technical scheme, the top surface edge of the cylinder that awaits measuring is provided with the chamfer.
As the utility model discloses preferred technical scheme, the height of the cylinder that awaits measuring equals the degree of depth of recess.
As the utility model discloses preferred technical scheme, the cylinder that awaits measuring is located the central point of recess puts as the utility model discloses preferred technical scheme, the shape of the cylinder that awaits measuring is prism or cylinder.
The utility model discloses in, the shape of the cylinder that awaits measuring is not limited to the prism or the cylinder that the above-mentioned lists only, and the shape of the cylinder that awaits measuring can carry out specific selection according to the shape of slider, does not enumerate here.
As the utility model discloses preferred technical scheme, the top surface of the cylinder that awaits measuring is the smooth plane of atomic level.
The utility model discloses in, the top surface processing of the cylinder that awaits measuring is the atomic level and levelly and smoothly can avoid the roughness of the cylinder that awaits measuring to cause the influence to the frictional force detection on the surface that awaits measuring, and the measuring accuracy is higher.
In the present invention, taking silicon pillars as an example, the processing method for achieving atomic-level planarization includes chemical cleaning, CMP polishing, etc., and the method for preparing an atomic-level planarized surface is a common method in the field, and therefore, it is not limited herein.
In a preferred embodiment of the present invention, the top surface of the pillar to be measured has a size smaller than the bottom surface of the slider by 1 to 2 μm, such as 1.1 μm, 1.2 μm, 1.3 μm, 1.4 μm, 1.5 μm, 1.6 μm, 1.7 μm, 1.8 μm, or 1.9 μm, but not limited to the above-mentioned values, and other values not listed in the above-mentioned range of values are also applicable.
As the preferable technical proposal of the utility model, the substrate comprises a silicon wafer substrate.
The utility model discloses in, the preferred silicon chip of basement, the preferred graphite island of slider, but not limited to above-mentioned material only, other basement and slider material also are applicable to the utility model provides a structure.
As the preferred technical scheme of the utility model, the top surface of the cylinder that awaits measuring is connected with any one in metal film, silicon oxide film, silicon nitride film or the DLC film.
The metal thin film may be a titanium thin film, a chromium thin film, a nickel thin film, a copper thin film, a gold thin film, a platinum thin film, a silver thin film, or the like.
The utility model discloses in, can adopt methods such as deposit or sputtering to prepare different films at the cylinder top surface that awaits measuring to realize the test of the frictional behavior between slider that awaits measuring and other planes.
The utility model discloses in, the top surface of the cylinder that awaits measuring with the upper surface of basement is in the coplanar.
The utility model discloses a second aim at provides a survey test panel for testing slider frictional behavior, survey test panel including at least not unidimensional two like foretell test structure.
As the preferable technical proposal of the utility model, the test structures are arranged in an array shape.
The utility model discloses in, preferably the main part with the basement is whole, promptly the recess does the basement produces after the etching, recess center department is not etched after the mask is handled, so form the cylinder structure that awaits measuring. Taking a silicon wafer substrate as an example, the specific method can be as follows: cleaning the surface of the silicon wafer, and spin-coating a photoresist on the surface of the silicon wafer; utilizing the designed layout file to perform laser direct writing exposure, developing by using a photoresist developing solution, and then cleaning and drying the developing solution; forming silicon columns with different sizes by using the formed photoresist pattern as a mask and etching by using Inductively Coupled Plasma (ICP), wherein in the etching process, partial etching is usually carried out on the edge in addition to the expected etching, so that a chamfer is formed; and removing the photoresist by utilizing the piranha solution.
The utility model discloses in, the method of using this test structure to carry out the test of sliding friction force includes: the slide block to be tested is placed on a cylinder to be tested of the test structure by using transfer equipment (the proper size of the cylinder to be tested is selected according to the size of the slide block to be tested), and then an atomic force microscope probe is pressed on the slide block to be tested to test the sliding friction force within the moving range.
Compared with the prior art, the utility model discloses following beneficial effect has at least:
the utility model provides a test structure for testing slider frictional behavior realizes producing relative slip between slider and the bottom surface that awaits measuring under atomic force microscope's needle point promotes, accomplishes the test of frictional behavior. And the sliding block can be transferred to a near plane and then is translated and pushed onto the column body for testing, so that the sliding block is convenient to place and transfer.
Drawings
Fig. 1a and fig. 1b are a top view and a cross-sectional view (a direction) of a test structure for testing a sliding block friction performance provided in embodiment 1 of the present invention;
fig. 2 is an atomic force microscope image of the top surface of the cylinder to be tested of the test structure for testing the friction performance of the slider provided in embodiment 1 of the present invention;
fig. 3 is a top view of a test structure for testing the friction performance of a slider according to embodiment 2 of the present invention;
fig. 4 is a schematic diagram of the position relationship between the slider to be tested and the test structure in the application example of the present invention.
In the figure: 1-substrate, 2-cylinder to be tested, 3-groove and 4-slide block to be tested.
The present invention will be described in further detail below. However, the following examples are only simple examples of the present invention, and do not represent or limit the scope of the present invention, which is defined by the appended claims.
Detailed Description
To better illustrate the present invention, facilitating the understanding of the technical solutions of the present invention, typical but not limiting embodiments of the present invention are as follows:
example 1
<xnotran> , 1a 1b , 1 , 1 6 3, 3 2 ( 2 , 2 μm *2 μm,3 μm *3 μm,4 μm *4 μm,5 μm *5 μm,6 μm *6 μm,8 μm *8 μm), 2 3 , 2 ( 2 ), Ra 0.2nm, 2 1 ～ 2 μm, 2 , , 3 2 , 2 1 . </xnotran>
In this embodiment, the preparation method of the test structure includes:
cleaning the surface of a silicon wafer, spin-coating photoresist AZ1500 on the surface of the silicon wafer by a spin coater at the rotation speed of 4000 rpm for 40s, and baking for 1 min at the temperature of 100 ℃ by a heating platform;
performing laser direct writing exposure by using a designed layout file, developing by using an AZ photoresist developing solution for 50s, and drying by using an air gun after water washing is completed;
using the formed photoresist pattern as a mask, etching silicon with the depth of 1um by using Inductively Coupled Plasma (ICP) to form silicon columns with different sizes, wherein in the etching process, the edge is usually etched away more materials than expected, so that a chamfer is formed;
removing photoresist by using a piranha solution, cutting a larger silicon wafer into silicon wafers with the strip of 1cm x 1cm by using a slicer, and cleaning by using a DHF solution to remove a natural oxide film on the surface of the silicon wafer and relieve the formation of the oxide film; the metals such as Al, fe, zn, ni and the like on the silicon surface can be easily removed, and the hydroxide on the natural oxide film can also be removed;
then the silicon wafer is treated by using a mixed solution containing ammonia water, hydrogen peroxide and water, and because a natural oxidation layer on the surface of the silicon wafer and Si on the surface of the silicon wafer are NH 4 OH is corroded, so that particles attached to the surface of the silicon wafer fall into the cleaning solution, the purpose of removing the particles is achieved, and the top surface of the silicon column can be leveled and cleaned at an atomic level.
Example 2
This embodiment provides a test structure for testing slider frictional behavior, and its structure is shown in fig. 3, basement 1 is the silicon chip basement, 1 surface of basement is provided with 4 kinds of recesses 3, 3 inside cylinders 2 that await measuring that are provided with of recess (2 are cylindrical, and the circular diameter of the top surface of the cylinder 2 that awaits measuring is 4 μm,5 μm,6 μm,8 μm), the cylinder 2 that awaits measuring is located the central point of recess 3 puts, the top surface of the cylinder 2 that awaits measuring is the smooth plane of atomic level, and roughness Ra is about 0.2nm, the size of the top surface of the cylinder 2 that awaits measuring is less than the size 1 ~ 2 μm of slider bottom surface, the top surface edge of the cylinder 2 that awaits measuring is provided with the chamfer, the chamfer is the circular arc chamfer, recess 3 with the cylinder 2 that awaits measuring becomes array form and arranges, the cylinder 2 that awaits measuring with basement 1 is whole.
The test structures described in this example were prepared in the same manner as in example 1.
Application example 1
In this application example, 10 μm by 10 μm graphite islands were transferred to 8 μm by 8 μm silicon columns in the test structure provided in example 1 using a rotary island device (as shown in fig. 4), and then sliding friction force testing was performed over a 1 μm range of motion using an atomic force microscope probe pressed against the graphite islands.
Application example 2
In this application, a silicon nitride film (100 nm thick) was deposited on the top surface of a 8 μm by 8 μm silicon column in the test structure provided in example 1, and 10 μm by 10 μm graphite islands were transferred to the silicon column using a rotary island device, and then an atomic force microscope probe was pressed against the graphite islands to perform a sliding friction test within a movement range of 1 μm.
Application example 3
In this application, a silicon oxide film (100 nm thick) was deposited on the top surface of a 8 μm by 8 μm silicon column in the test structure provided in example 1, 10 μm by 10 μm graphite islands were transferred to the silicon column using a rotary island device, and then a sliding friction test was performed within a movement range of 1 μm by pressing the graphite islands with an atomic force microscope probe.
Application example 4
In this application, a thin gold film (100 nm thick) was deposited on the top surface of a 8 μm by 8 μm silicon column in the test structure provided in example 1, and 10 μm by 10 μm graphite islands were transferred to the silicon column using a rotary island device, and then an atomic force microscope probe was pressed against the graphite islands to perform a sliding friction test within a movement range of 1 μm.
Application example 5
In this application example, a DLC film (100 nm thick) was deposited on the top surface of a 8 μm by 8 μm sized silicon column in the test structure provided in example 1, 10 μm by 10 μm sized graphite islands were transferred to the silicon column using a rotary island device, and then a sliding friction test was performed within a 1 μm movement range by pressing the graphite islands using an atomic force microscope probe.
The test result shows that the friction force of the graphite island is reduced by more than two thirds compared with the friction force of application examples 1-5 without adopting the silicon column design, namely the friction force of the graphite island is reduced by a flat silicon wafer or the friction force of the graphite island is reduced by plating silicon nitride, silicon oxide, metal and DLC on the flat silicon wafer.
The applicant states that the present invention is described by the above embodiments, but the present invention is not limited to the above detailed structural features, i.e. the present invention can be implemented only by relying on the above detailed structural features. It should be clear to those skilled in the art that any modifications to the present invention, to the equivalent replacement of selected parts and the addition of auxiliary parts, the selection of specific modes, etc., all fall within the scope of protection and disclosure of the present invention.
The above detailed description describes the preferred embodiments of the present invention, but the present invention is not limited to the details of the above embodiments, and the technical idea of the present invention can be within the scope of the present invention, and can be right to the technical solution of the present invention, and these simple modifications all belong to the protection scope of the present invention.
It should be noted that the various technical features described in the above embodiments can be combined in any suitable manner without contradiction, and in order to avoid unnecessary repetition, the present invention does not separately describe various possible combinations.
In addition, various embodiments of the present invention can be combined arbitrarily, and the disclosed content should be regarded as the present invention as long as it does not violate the idea of the present invention.
Claims (10)
1. The utility model provides a test structure for testing slider frictional behavior, a serial communication port, test structure includes the basement, the basement surface is provided with at least one recess, the inside cylinder that awaits measuring that is provided with of recess, the size of the top surface of the cylinder that awaits measuring is less than the size on the surface that awaits measuring of slider, the size of recess is greater than the size on the surface that awaits measuring of slider, the cylinder that awaits measuring with recess bottom fixed connection or integrated into one piece.
2. The test structure of claim 1, wherein the top surface edge of the pillar under test is provided with a chamfer.
3. The test structure of claim 1, wherein a height of the pillars to be tested is equal to a depth of the grooves.
4. The test structure as claimed in claim 1, wherein the pillar under test is located at a center of the recess.
5. The test structure of claim 1, wherein the shape of the cylinder under test comprises a prism or a cylinder.
6. The test structure of claim 1, wherein the top surface of the pillar under test is atomically flat.
7. The test structure of claim 1, wherein the top surface of the pillar under test has a dimension 1-2 μm smaller than the bottom surface of the slider.
8. The test structure of claim 1, wherein the top surface of the pillar under test is connected with any one of a metal film, a silicon oxide film, a silicon nitride film or a DLC film.
9. A test board for testing the friction properties of sliders, characterized in that it comprises at least two test structures of different sizes according to any one of claims 1 to 8.
10. The test plate of claim 9, wherein the test structures form an array-like arrangement.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222338667.5U CN218240090U (en) | 2022-09-02 | 2022-09-02 | Test structure and test board for testing friction performance of sliding block |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222338667.5U CN218240090U (en) | 2022-09-02 | 2022-09-02 | Test structure and test board for testing friction performance of sliding block |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN218240090U true CN218240090U (en) | 2023-01-06 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202222338667.5U Active CN218240090U (en) | 2022-09-02 | 2022-09-02 | Test structure and test board for testing friction performance of sliding block |
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| CN (1) | CN218240090U (en) |
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- 2022-09-02 CN CN202222338667.5U patent/CN218240090U/en active Active
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