CN218232568U

CN218232568U - Promote radiating effect's chemical vapor deposition stove

Info

Publication number: CN218232568U
Application number: CN202222085668.3U
Authority: CN
Inventors: 周明; 贺鹏博
Original assignee: Suzhou Kaixin Semiconductor Technology Co ltd
Current assignee: Suzhou Kaixin Semiconductor Technology Co ltd
Priority date: 2022-08-09
Filing date: 2022-08-09
Publication date: 2023-01-06
Anticipated expiration: 2032-08-09

Abstract

The utility model provides a promote radiating effect's chemical vapor deposition stove, include: the furnace comprises a furnace body, wherein a storage groove is formed in the furnace body, the inner wall of the storage groove is fixedly connected with an electric telescopic rod, and the movable end of the electric telescopic rod is fixedly connected with a material storage pipe; the fixed box is fixedly connected with the same side of the opening of the storage groove, and the middle part of the fixed box is fixedly connected with the fixed cylinder. The utility model provides a promote radiating effect's chemical vapor deposition stove, through being provided with the spiral circulation pipe, can prevent workman's storage cylinder, guarantee workman's safety and health, and when opening the circulating pump, can make the coolant liquid flow in the spiral circulation pipe, cool down to the air around the spiral circulation pipe, accelerate the heat dissipation to the material storage pipe, and cooperate with the air extractor, accelerate air flow rate around spiral circulation pipe and the material storage pipe, further dispel the heat to the material storage pipe, can effectively make material storage pipe rapid cooling through dual heat dissipation.

Description

Chemical vapor deposition furnace capable of improving heat dissipation effect

Technical Field

The utility model relates to a deposition furnace technical field especially relates to a promote radiating effect's chemical vapor deposition stove.

Background

Chemical vapor deposition is a chemical technology, and chemical vapor deposition is a new technology for preparing inorganic materials developed in recent decades, and the chemical vapor deposition method is widely used in the fields of developing new crystals, purifying substances, depositing various polycrystalline, single-crystal or glassy inorganic thin film materials and the like.

At present, a vapor deposition furnace is often used in chemical vapor deposition, a material storage pipe is arranged in the vapor deposition furnace, then various materials and gases which need to participate in chemical reaction are placed in the material storage pipe, and finally the material storage pipe is heated, so that the materials and the gases in the material storage pipe are subjected to chemical reaction to finally obtain new materials.

Although the heat dissipation of the material storage tube can be accelerated, and the heat dissipation of the material storage tube is accelerated by the heat dissipation assembly, so that materials formed after people take chemical reactions cannot be scalded, the chemical vapor deposition furnace still has partial defects, only the material storage tube is exposed in the air for heat dissipation, the natural cooling has poor heat dissipation effect on the material storage tube, and meanwhile, the chemical vapor deposition furnace does not have a protection structure, and the life health of workers can be affected if the workers touch the material storage tube carelessly and mistakenly, so that the chemical vapor deposition furnace with the improved heat dissipation effect is necessary to solve the technical problems.

SUMMERY OF THE UTILITY MODEL

The utility model provides a promote radiating effect's chemical vapor deposition stove has solved and has only exposed the material storage pipe in the air and dispel the heat, and natural cooling is relatively poor to the radiating effect of material storage pipe, does not have protective structure simultaneously, if the workman is careless mistake and touches the problem that material storage pipe then can influence workman's life health.

In order to solve the technical problem, the utility model provides a promote radiating effect's chemical vapor deposition stove, include: the furnace comprises a furnace body, wherein a storage tank is formed in the furnace body, the inner wall of the storage tank is fixedly connected with an electric telescopic rod, and the movable end of the electric telescopic rod is fixedly connected with a storage pipe;

fixed case, fixed case fixed connection in same one side of storage tank open-ended, the fixed section of thick bamboo of middle part fixedly connected with of fixed case, the top fixedly connected with filter screen of fixed section of thick bamboo, the inner wall fixedly connected with air exhauster of fixed section of thick bamboo, the fixed surface of fixed case is connected with the circulating pump, the end of drawing water of circulating pump extends to the bottom of fixed case, the play water end fixedly connected with spiral circulation pipe of circulating pump, the play water end of spiral circulation pipe runs through and extends to in the fixed case, the air vent has been seted up to one side of fixed case.

Preferably, the surface of the storage pipe is fixedly connected with a sliding ring, and the inner wall of the storage groove is provided with a sliding groove.

Preferably, the both sides of fixed case all are provided with rabbling mechanism, rabbling mechanism includes agitator motor, agitator motor's output shaft fixedly connected with (mixing) shaft, the fixed surface of (mixing) shaft is connected with the stirring leaf.

Preferably, a semiconductor refrigerator is fixedly connected to one side of the fixing box.

Preferably, the bottom of the fixed cylinder is fixedly connected with an air distribution disc, and a plurality of air outlets are uniformly formed in the surface of the air distribution disc.

Preferably, the inner wall of the fixed box is rotatably connected with a fixed shaft, the surface of the fixed shaft is fixedly connected with a water wheel, and one end of the fixed shaft extends into the vent hole and is fixedly connected with a fan.

Preferably, the top and the bottom of one side of the fixed box are respectively and fixedly connected with a water inlet pipe and a water outlet pipe.

Compared with the prior art, the utility model provides a promote radiating effect's chemical vapor deposition stove has following beneficial effect:

the utility model provides a promote radiating effect's chemical vapor deposition stove, through being provided with the spiral circulation pipe, can prevent workman's storage cylinder, guarantee workman's safety and health, and when opening the circulating pump, can make the coolant liquid flow in the spiral circulation pipe, cool down to the air around the spiral circulation pipe, accelerate the heat dissipation to the material storage pipe, and cooperate with the air extractor, accelerate air flow rate around spiral circulation pipe and the material storage pipe, further dispel the heat to the material storage pipe, can effectively make material storage pipe rapid cooling through dual heat dissipation.

Drawings

FIG. 1 is a schematic structural view of a chemical vapor deposition furnace according to a first embodiment of the present invention for improving heat dissipation effect;

FIG. 2 is a cross-sectional view of the entirety shown in FIG. 1;

fig. 3 is a sectional view of the side of the stationary box shown in fig. 1.

The reference numbers in the figures: 1. furnace body, 2, storage tank, 3, electric telescopic rod, 4, sliding ring, 5, spout, 6, storage pipe, 7, fixed case, 8, rabbling mechanism, 81, agitator motor, 82, (mixing) shaft, 83, stirring leaf, 10, fixed cylinder, 11, air exhauster, 12, filter screen, 13, air distribution plate, 14, fixed axle, 15, water wheels, 16, air vent, 17, fan, 18, semiconductor refrigerator, 19, circulating pump, 20, spiral circulation pipe.

Detailed Description

The present invention will be further described with reference to the accompanying drawings and embodiments.

Please refer to fig. 1-3, wherein fig. 1 is a schematic structural diagram of a chemical vapor deposition furnace for improving heat dissipation effect according to a first embodiment of the present invention; FIG. 2 is a cross-sectional view of the entirety shown in FIG. 1; fig. 3 is a sectional view of the side of the stationary box shown in fig. 1. A chemical vapor deposition furnace for improving heat dissipation effect comprises: the furnace comprises a furnace body 1, wherein a storage tank 2 is arranged in the furnace body 1, the inner wall of the storage tank 2 is fixedly connected with an electric telescopic rod 3, and the movable end of the electric telescopic rod 3 is fixedly connected with a material storage pipe 6;

fixed case 7, fixed case 7 fixed connection in same one side of 2 open-ended of strorage trough, the fixed section of thick bamboo 10 of middle part fixedly connected with of fixed case 7, the top fixedly connected with filter screen 12 of fixed section of thick bamboo 10, the inner wall fixedly connected with air exhauster 11 of fixed section of thick bamboo 10, the fixed surface of fixed case 7 is connected with circulating pump 19, the end of drawing water of circulating pump 19 extends to the bottom of fixed case 7, the water outlet end fixedly connected with spiral circulation pipe 20 of circulating pump 19, circulative cooling pipe 20 is the copper pipe, the water outlet end of spiral circulation pipe 20 runs through and extends to in the fixed case 7, air vent 16 has been seted up to one side of fixed case 7.

The surface of the material storage pipe 6 is fixedly connected with a sliding ring 4, the inner wall of the material storage groove 2 is provided with a sliding groove 5, and the inner wall of the sliding groove 5 is in sliding connection with the surface of the sliding ring 4.

Through the cooperation use of spout 5, sliding ring 4, stability when improving deposit pipe 6 and remove.

The both sides of fixed box 7 all are provided with rabbling mechanism 8, rabbling mechanism 8 includes agitator motor 81, agitator motor 81's output shaft fixedly connected with (mixing) shaft 82, the fixed surface of (mixing) shaft 9 is connected with stirring leaf 83.

Through being provided with rabbling mechanism 8, during the use, open agitator motor 81, make (mixing) shaft 82 drive stirring leaf 83 rotatory, stir the coolant liquid in the fixed box 7 for the mobile speed of coolant liquid, accelerate the heat dissipation of coolant liquid.

And a semiconductor refrigerator 18 is fixedly connected to one side of the fixed box 7, and the semiconductor refrigerator 18 is started to refrigerate and cool the cooling liquid in the fixed box 7.

The bottom of the fixed cylinder 10 is fixedly connected with a gas distribution disc 13, and a plurality of gas outlet holes are uniformly formed in the surface of the gas distribution disc 13.

When the air cooling device works, air extracted by the air extractor 11 enters the air distribution disc 13, and then uniformly enters the cooling liquid through the air outlets to form a plurality of small air bubbles carrying the air, so that the contact area of the air and the cooling liquid is increased, the heat exchange efficiency between the air and the cooling liquid is improved, and the heat dissipation effect of the cooling liquid is improved.

The inner wall of the fixed box 7 is rotatably connected with a fixed shaft 14, the surface of the fixed shaft 14 is fixedly connected with a water wheel 15, and one end of the fixed shaft 14 extends into a vent hole 16 and is fixedly connected with a fan 17.

The coolant passing through the spiral circulation tube 20 is discharged from the water outlet end, and the coolant drives the water wheel 15 to rotate due to the action of gravity, so that the fan 17 at one end of the fixed shaft 14 rotates, and the air in the fixed box 7 can be rapidly discharged.

The top and the bottom of 7 one sides of fixed case are fixedly connected with inlet tube and outlet pipe respectively, the one end of inlet tube and outlet pipe all is provided with the tube cap, and inlet tube and outlet pipe are used for adding the coolant liquid and the coolant liquid of discharging respectively.

The utility model provides a promote radiating effect's chemical vapor deposition furnace's theory of operation as follows:

use the utility model discloses the time, when need get the material to material in the material storage pipe 6, open electric telescopic handle 3, stretch out the material storage pipe 6 outside the storage tank 2, make material storage pipe 6 insert in the spiral circulation pipe 20, this moment, start-up circulating pump 19, extract the coolant liquid from fixed case 7, make it through in the spiral circulation pipe 20, cool down to the air around the spiral circulation pipe 20, accelerate the heat dissipation to material storage pipe 6, and open air extractor 11, from external extraction air through filter screen 12 in filtering and getting into solid fixed cylinder 10, accelerate air flow rate around spiral circulation pipe 20 and the material storage pipe 6, further dispel the heat to material storage pipe 6, can effectively make material storage pipe 6 rapid cooling through dual heat dissipation, guarantee that the workman can not scalded when the material of taking.

the utility model provides a promote radiating effect's chemical vapor deposition stove, through being provided with spiral circulation pipe 20, can prevent workman's storage cylinder 6, guarantee workman's safety and health, and when opening circulating pump 19, can make the coolant liquid flow in spiral circulation pipe 20, cool down to the air around spiral circulation pipe 20, accelerate the heat dissipation to stock pipe 6, and cooperate with air extractor 11, accelerate spiral circulation pipe 20 and stock pipe 6 air velocity around, further dispel the heat to stock pipe 6, can effectively make stock pipe 6 rapid cooling through dual heat dissipation.

The above only is the embodiment of the present invention, not limiting the scope of the present invention, all the equivalent structures or equivalent processes of the present invention are used in the specification and the attached drawings, or directly or indirectly applied to other related technical fields, and the same principle is included in the protection scope of the present invention.

Claims

1. The utility model provides a promote chemical vapor deposition stove of radiating effect which characterized in that includes: the furnace comprises a furnace body, wherein a storage groove is formed in the furnace body, the inner wall of the storage groove is fixedly connected with an electric telescopic rod, and the movable end of the electric telescopic rod is fixedly connected with a material storage pipe;

the fixed case, fixed case fixed connection in same one side of storage tank open-ended, the fixed section of thick bamboo of middle part fixedly connected with of fixed case, the top fixedly connected with filter screen of fixed section of thick bamboo, the inner wall fixedly connected with air exhauster of fixed section of thick bamboo, the fixed surface of fixed case is connected with the circulating pump, the end of drawing water of circulating pump extends to the bottom of fixed case, the play water end fixedly connected with spiral circulation pipe of circulating pump, the play water end of spiral circulation pipe runs through and extends to in the fixed case, the air vent has been seted up to one side of fixed case.

2. The chemical vapor deposition furnace with the improved heat dissipation effect as recited in claim 1, wherein a slip ring is fixedly connected to the surface of the storage tube, and a sliding groove is formed in an inner wall of the storage groove.

3. The chemical vapor deposition furnace with the improved heat dissipation effect as recited in claim 1, wherein stirring mechanisms are disposed on both sides of the fixed box, each stirring mechanism comprises a stirring motor, an output shaft of the stirring motor is fixedly connected with a stirring shaft, and a surface of the stirring shaft is fixedly connected with stirring blades.

4. The CVD furnace according to claim 1, wherein a semiconductor cooler is fixedly connected to one side of the fixing box.

5. The chemical vapor deposition furnace with the improved heat dissipation effect as recited in claim 1, wherein a gas distribution plate is fixedly connected to the bottom of the fixed cylinder, and a plurality of gas outlets are uniformly formed in the surface of the gas distribution plate.

6. The chemical vapor deposition furnace with the improved heat dissipation effect as claimed in claim 1, wherein a fixed shaft is rotatably connected to an inner wall of the fixed box, a water wheel is fixedly connected to a surface of the fixed shaft, and a fan is fixedly connected to one end of the fixed shaft extending into the ventilation hole.

7. The CVD furnace according to claim 1, wherein a water inlet pipe and a water outlet pipe are respectively fixed to the top and the bottom of one side of the fixing box.