CN218068469U - Light beam projection system and photoetching equipment - Google Patents

Abstract

The utility model relates to the technical field of photoetching, in particular to a light beam projection system and photoetching equipment, wherein the light beam projection system comprises a light beam emitting device, at least one light splitting part and at least two light beam zooming devices, the light beam emitting device can emit functional light beams, and the light beam zooming devices are arranged in one-to-one correspondence with projection paths of the functional light beams; at least one light splitting piece is arranged on a projection path between the light beam emitting device and the light beam zooming device, and the light splitting piece can transmit part of the received functional light beams and reflect part of the received functional light beams; after being transmitted and reflected by the same light splitting piece, the functional light beams respectively emit to the light beam zooming devices corresponding to the projection paths through different projection paths and are emitted to the imaging area through the light beam zooming devices. The technical scheme can effectively improve the photoetching efficiency and the photoetching precision.

Description

Light beam projection system and photoetching equipment

Technical Field

The utility model relates to a lithography technique field, in particular to light beam projection system and lithography apparatus.

Background

The photoetching process is an important step in the manufacture of semiconductor devices, mainly utilizes the modes of exposure, development and the like to carve a geometric figure structure on a photoresist layer, further carries out figure transfer through etching, realizes the high-precision processing of the devices, and is a core processing process of transistors, integrated circuits and the like.

The beam projection system is a core component in the photoetching equipment, when different sub-image areas in photoetching patterns are processed, the conventional beam projection system needs to return to a photoetching operation area for continuously operating after exchanging a beam scaling device and system calibration, and positioning and vibration errors are introduced, so that the photoetching precision and the photoetching efficiency are reduced. Based on the above existing drawbacks, it is desirable to provide an improved beam projection system to overcome the above drawbacks.

SUMMERY OF THE UTILITY MODEL

In order to solve the technical problem, the utility model provides a light beam projection system and lithography apparatus can effectively improve photoetching efficiency and photoetching precision.

One aspect of the present invention provides a light beam projection system, which includes a light beam emitting device, at least one beam splitter, and at least two light beam zooming devices, wherein the light beam emitting device can emit functional light beams, and the light beam zooming devices are disposed corresponding to projection paths of the functional light beams one to one;

the at least one light splitting piece is arranged on a projection path between the light beam emitting device and the light beam zooming device, and the light splitting piece can transmit part of the received functional light beams and reflect part of the received functional light beams;

after being transmitted and reflected by the same light splitting piece, the functional light beams are respectively emitted to the light beam scaling devices corresponding to the projection paths through different projection paths and are emitted to the imaging area through the light beam scaling devices.

The optical beam zooming device comprises a light beam emitting device, a light beam zooming device, a light splitting device and a light beam zooming device, wherein the light beam zooming device is arranged on a projection path between the light beam emitting device and the light beam zooming device;

the functional reflecting piece can receive a light splitting beam transmitted or reflected by the light splitting piece and reflect the received light splitting beam to the light beam scaling device or another light splitting piece.

Specifically, the light beam projection system comprises N light splitting pieces, wherein N is an integer greater than or equal to 1, and the same functional light beam is projected by the N light splitting pieces to form N +1 light splitting light beams.

Specifically, the at least two optical beam scaling devices include at least a first scaling factor and a second scaling factor, and the first scaling factor is different from the second scaling factor.

In particular, the at least two beam scaling devices are fixedly arranged relative to each other, and of the at least two beam scaling devices, the corresponding projection areas of different beam scaling devices in the imaging area are different from each other.

The device comprises a light beam emitting device, a first moving mechanism and a second moving mechanism, wherein the light beam emitting device is arranged on the light beam emitting device;

the first moving mechanism can drive the light beam emitting device to move so as to enable the light beam emitting device to move relative to the at least one light splitting piece.

The device comprises a light beam emitting device, at least one light splitting piece and a light beam scaling device, wherein the light beam emitting device is arranged on the light beam splitting piece;

the second moving mechanism can drive the light beam emitting device, the at least one light splitting piece and the light beam zooming device to cooperatively move relative to the imaging area.

Specifically, the optical beam zooming device comprises a mounting shell and at least one time mirror arranged on the mounting shell;

if the light beam zooming device comprises two or more than two times of mirrors, the times of mirrors are rotationally connected with the mounting shell.

Specifically, the device also comprises a base, wherein the light beam zooming device is fixedly connected with the base; and at least one side surface of the base is provided with a light absorption layer.

The present invention also provides a lithographic apparatus comprising a beam projection system as described above.

Implement the embodiment of the utility model provides a, following beneficial effect has:

the utility model discloses a set up light beam emitter, at least one beam splitter cooperates with the light beam zoom device that corresponds the setting with the projection route, the function light beam of light beam emitter outgoing is split through at least one beam splitter, and throw to the formation of image district via the light beam zoom device that corresponds, make the function light beam separation be two bundle at least beam splitting light beams, once fix a position the back, can realize two at least subgraph regional processing in the target photoetching pattern, effectively improve photoetching efficiency, and need not to carry out return stroke timing and repositioning, reduce mechanical error, show and improve the photoetching precision.

Drawings

In order to more clearly illustrate the technical solution of the present invention, the drawings used in the embodiments or the prior art descriptions will be briefly described below. It is obvious that the drawings in the following description are only some embodiments of the invention, and that for a person skilled in the art, other drawings can be derived from them without inventive effort.

Fig. 1 is a schematic structural diagram of a light beam projection system according to an embodiment of the present invention;

fig. 2 is a schematic structural diagram of another light beam projection system according to an embodiment of the present invention;

fig. 3 is a schematic structural diagram of another light beam projection system according to an embodiment of the present invention;

fig. 4 is a schematic structural diagram of another light beam projection system according to an embodiment of the present invention.

Wherein the reference numerals in the figures correspond to:

1-a light beam emitting device, 2-a light splitting component, 3-an imaging area, 21-a first light splitting element, 22-a first functional reflecting element, 23-a second light splitting element, 24-a second functional reflecting element, 25-a third light splitting element, 26-a third functional reflecting element and 27-a fourth light splitting element.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by a person skilled in the art without creative efforts belong to the protection scope of the present invention.

It should be noted that the terms "first," "second," and the like in the description and claims of the present invention and in the drawings described above are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used is interchangeable under appropriate circumstances such that the embodiments of the invention described herein are capable of operation in other sequences than those illustrated or described herein. Furthermore, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed, but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.

The following describes a light beam projection system provided by an embodiment of the present invention with reference to the accompanying drawings, which includes a light beam emitting device 1, at least one beam splitter and at least two light beam zooming devices, wherein the light beam emitting device 1 can emit functional light beams, and the light beam zooming devices are arranged in one-to-one correspondence with projection paths of the functional light beams; at least one beam splitter is arranged on a projection path between the light beam emitting device 1 and the light beam zooming device, and the beam splitter can transmit part of the received functional light beams and reflect part of the received functional light beams; after being transmitted and reflected by the same light splitting piece, the functional light beams respectively emit to the light beam scaling devices corresponding to the projection paths through different projection paths and are emitted to the imaging area 3 through the light beam scaling devices. Therefore, the utility model discloses a set up light beam emitter, at least one beam split spare and with throw the light beam zoom device that the route corresponds the setting and cooperate, carry out the beam split through at least one beam split spare to the functional light beam of light beam emitter outgoing, and throw to the formation of image district via the light beam zoom device that corresponds, make the functional light beam separation be two bundle at least beam split light beams, once fix a position the back, can realize two at least subgraphs regional processing in the target photoetching pattern, effectively improve photoetching efficiency, and need not to return journey timing and reposition, reduce mechanical error, show improvement photoetching precision.

Specifically, the functional light beam emitted by the light beam emitting device 1 may be a single wavelength band light, or may include two or more wavelength bands of light. In one embodiment, the light beam emitting Device 1 may include, but is not limited to, a spatial light modulator, such as a Digital Micromirror Device (DMD), and the like.

In some embodiments, the at least one light splitter may include, but is not limited to, one or more of a polarization splitter, a dielectric film splitter, a lattice metal film, and the like. When the light splitting piece is one, the same functional light beam partially transmits to form a transmission light beam after passing through the light splitting piece, and the other part is reflected to form a reflection light beam so as to separate the target photoetching pattern into sub-patterns. Through the light splitting treatment of the light splitting piece, the resolution ratios of the band patterns carried by the reflected light beams and the transmitted light beams emitted by the light splitting piece are the same as the resolution ratios of the target photoetching patterns carried by the light beams received by the light splitting piece, the light intensity of the split beams is weakened, the total light intensity is unchanged, and the corresponding projection area is doubled. Under the condition that the light splitting piece is semi-reflecting and semi-transmitting, the light intensity of the reflected light beam and the transmitted light beam is respectively half of the light intensity of the incident functional light beam.

In some embodiments, the beam projection system includes N light-splitting elements, where N is an integer greater than or equal to 1, and the same functional beam is projected by the N light-splitting elements to form N +1 split beams. Exemplarily, if N is equal to 1, i.e. one light splitting element is arranged, two split light beams are formed and then emitted to two light beam scaling devices through two projection paths respectively to form two target light beams; if two light splitting pieces are arranged, three light splitting beams and three target beams are formed, and the like.

In some embodiments, the beam projection system further comprises at least one functional reflector disposed on the projection path between the beam emitting device 1 and the beam scaling device, and the beam splitter is disposed opposite to the functional reflector; the functional reflecting part can receive the light splitting beam transmitted or reflected by one light splitting part and reflect the received light splitting beam to the light beam scaling device or the other light splitting part. Therefore, the projection direction of the functional light beam is adjusted by arranging the functional reflecting piece, and the reasonable arrangement of the projection path is realized.

Specifically, if the functional reflector is used for receiving a transmitted light beam formed by the transmission of the light splitting member, the reflection surface of the functional reflector is arranged opposite to the transmission surface of the light splitting member, and if the functional reflector is used for receiving a reflected light beam formed by the reflection of the light splitting member, the reflection surface of the functional reflector is arranged opposite to the reflection surface of the light splitting member.

It is understood that the beam projection system may further include an adjusting reflector for adjusting the direction of the functional beam emitted from the beam emitting device 1, the splitting beam reflected from the functional reflector, or the target beam emitted from the beam scaling device, so as to adapt to the spatial arrangement and the lithography position requirement of the beam projection system.

In some embodiments, each projection path of the light beam projection system may emit a split light beam, a functional light beam emitted from the light beam emitting device 1 is split by each splitter in the light beam projection system to form a plurality of split light beams, and the split light beams are emitted to each light beam scaling device through different projection paths, and the light beam scaling device scales the received split light beams to form a corresponding number of target light beams. For example, if the beam projection system has three projection paths, each projection path is provided with a beam scaling device, that is, three beam scaling devices are correspondingly provided, so as to emit three target beams.

In some embodiments, the at least two beam scaling devices comprise at least two scaling powers. Therefore, the zoom processing with different multiplying powers can be carried out on the split beams, the photoetching precision and the photoetching speed can be realized, the photoetching requirements can be met, the double-lens exchange is not needed, and the photoetching efficiency and the photoetching precision can be effectively improved.

In some embodiments, the at least two optical beam scaling devices comprise at least a first scaling factor and a second scaling factor, the first scaling factor being different from the second scaling factor. Therefore, the zoom processing with two or more magnifications can be carried out on the functional light beams, so that the target light beams with different photoetching resolutions can be emitted through different projection paths, the switching of the zoom projection device is not needed, different photoetching precisions and photoetching rates can be cooperatively realized, the photoetching processing can be carried out on different imaging areas or different photoetching sub-patterns, and the requirements of two or more photoetching can be met.

It is understood that the at least two optical beam scaling devices may include a plurality of scaling factors, such as an optical beam scaling device including a third scaling factor, and the like, and may be determined based on actual requirements, and the number of kinds of scaling factors is not limited herein.

It can be understood that after the light beam is subjected to the scaling treatment with the high scaling factor, the formed light beam has a small light spot, and sub-image lithography with high resolution, namely high-precision lithography, can be realized, whereas, the light beam has a large light spot and a large lithography area in unit time, and further high-speed lithography can be realized. By arranging the light beam zooming devices with different zooming magnifications, the target light beam emitted by the light beam zooming device with higher zooming magnifications is subjected to high-precision photoetching, and the target light beam emitted by the light beam zooming device with lower zooming magnifications is subjected to high-speed photoetching, so that different photoetching requirements are met at the same time.

In some embodiments, the at least two beam scaling devices are fixedly disposed relative to each other, and the projection areas of different beam scaling devices in the at least two beam scaling devices in the imaging area are different from each other. Therefore, in the photoetching process, the relative positions of the light beam zooming devices on different projection paths are unchanged, the position of the light beam zooming device does not need to be adjusted, and the sub-image processing of different photoetching requirements in photoetching patterns can be completed at one time without switching, so that the precision deviation caused by mechanical piece replacement and vibration is avoided.

In one embodiment, referring to fig. 1, the light beam projection system includes a light splitting element and a functional reflection element, the reflection surface of the functional reflection element is disposed opposite to the light splitting element, the functional light beam emitted from the light beam emitting device 1 passes through the light splitting element to form a transmitted light beam and a reflected light beam, one of the transmitted light beam and the reflected light beam is reflected by the functional reflection element and then enters the first light beam scaling device to form a first target light beam, and the other enters the second light beam scaling device to form a second target light beam.

In another embodiment, referring to fig. 2, the light beam projection system includes two light splitting elements and a functional reflection element, the reflection surface of the functional reflection element is disposed opposite to one of the light splitting elements, the functional light beam emitted from the light beam emitting device 1 passes through one light splitting element to form a first transmitted light beam and a first reflected light beam, one of the first transmitted light beam and the first reflected light beam is incident on the first light beam scaling device to form a first target light beam, the other is incident on the other light splitting element to form a second transmitted light beam and a second reflected light beam, one of the second transmitted light beam and the second reflected light beam is incident on the second light beam scaling device to form a second target light beam, and the other is incident on the functional reflection element to be reflected to the third light beam scaling device to form a third target light beam.

Further, by the arrangement of the beam splitter and the functional reflector, the beam splitting processing of dividing the functional light beam into two and three is realized, and by combining the mechanical arrangement of dividing the functional light beam into two and three, please refer to fig. 3-4, the beam splitting processing of dividing the functional light beam into four, five or six can be realized, and so on, and the corresponding number of target light beams are emitted.

In some embodiments, the beam projection system may further include a housing, and the reflecting member and the light splitting member are disposed in the housing. Specifically, the device can further comprise a base, wherein the base is detachably connected with the shell or integrally arranged with the shell, and is used for adjusting the height of the shell and facilitating photoetching operation.

In some embodiments, based on some or all of the above embodiments, the light beam projection system further includes a first moving mechanism, and the first moving mechanism is in transmission connection with the light beam emitting device 1; the first moving mechanism can drive the light beam emitting device 1 to move, so that the light beam emitting device 1 moves relative to at least one light splitting piece, the distance and the position of the light beam emitting device 1 relative to the light splitting piece are adjusted, accurate matching between the light beam emitting device 1 and the light splitting piece is achieved, and therefore the projection area of the light beam emitting device 1 on the light splitting piece is changed. Therefore, the position can be adjusted based on different photoetching pattern requirements, and photoetching flexibility and adaptability are improved.

In some embodiments, the beam projection system further comprises a second moving mechanism drivingly connected to the beam emitting device 1, the at least one beam splitter, and the beam scaling device; the second moving mechanism can drive the light beam emitting device 1, the at least one light splitting piece and the light beam zooming device to move in a coordinated manner relative to the imaging area 3. Therefore, the components in the light beam projection system are driven to move in a coordinated mode, the requirement for large-area photoetching can be met, relative displacement among the components is avoided when the area is required to be changed for photoetching, imaging errors are reduced, and photoetching precision is improved.

In one possible embodiment, the second moving mechanism comprises a fixed component, a moving component and an adjusting component; the movable assembly is respectively movably connected with the fixed assembly and the adjusting assembly, and the light beam emitting device 1, the light splitting piece and the reflecting piece are fixedly connected with the movable assembly; under the effect of the adjusting assembly, when the moving assembly moves relative to the fixing assembly, the light beam emitting device 1, the light splitting piece and the light beam zooming device move in a coordinated mode to be close to or far away from the imaging area 3, or move horizontally relative to the imaging area 3, and the photoetching definition and the photoetching area can be adjusted by adjusting the distance and the position between each part and the imaging area 3, so that the photoetching precision and the working area are improved.

In some embodiments, the beam projection system further comprises a stage on which the imaging region 3 is disposed; the beam projection system can further comprise a third moving mechanism, the third moving mechanism is in transmission connection with the object stage, and the third moving mechanism can drive the object stage to move relative to the beam scaling device, such as to move away from or close to the beam scaling device, or to translate relative to the beam scaling device. So, can roughly adjust distance and position between formation of image district 3 and the light beam device of zooming through third moving mechanism, rethread second moving mechanism finely adjusts distance and position between formation of image district 3 and the light beam device of zooming, realize adjusting step by step, promote the definition of light beam emission device 1 at 3 photoengravings in formation of image district in coordination, and then guarantee the photoetching precision, reduce second moving mechanism and third moving mechanism's single regulation stroke limit, increase control range, improve light beam projection system's position control flexibility and photoetching area.

In some embodiments, the optical beam zooming apparatus includes a mounting housing and at least one multiplier mirror disposed on the mounting housing; if the beam scaling device comprises two or more than two double mirrors, the double mirrors are rotatably connected with the mounting shell.

Specifically, under the condition that the double mirror is rotatably connected with the installation shell, a rotating connecting piece can be arranged, the rotating connecting piece is fixedly connected with the double mirror and is rotatably connected with the installation shell, and the rotating connecting piece can rotate under the action of external force so as to drive the double mirror to rotate relative to the installation shell. Therefore, the light beam zooming device can be provided with two or more than two zooming magnifications, after one-time photoetching operation, the switching of the zooming lenses can be realized through rotation, the next photoetching operation is not needed to be carried out after the return stroke again, the repositioning is avoided, the operation precision of positioning and the like is improved, and the photoetching precision is further improved.

Illustratively, the beam projection system includes a first beam scaling device and a second beam scaling device, the scaling factor of the first beam scaling device may be 1x to 5x (lower scaling factor), and the scaling factor of the second beam scaling device may be 10x to 50x (higher scaling factor).

Based on some or all of the above embodiments, in some embodiments, the light beam zooming device further includes a base, and the light beam zooming device is fixedly connected to the base; a light absorbing layer is provided on at least one side of the base.

Specifically, at least two mounting windows can be arranged on the base, and the light beam zooming device is arranged in the mounting windows.

Specifically, the light absorbing layer is arranged on the side face of the base facing the emergent direction of the light beam scaling device, so that crosstalk of external light such as ambient light can be eliminated, and the photoetching precision is improved. It will be appreciated that the light absorbing layer may be provided on other sides of the base, as desired.

In some embodiments, a heat dissipation layer is further disposed in the base, the heat dissipation layer is disposed in the base and is close to the light absorption layer, the heat dissipation layer is used for dissipating heat of the light absorption layer and the base body, the light absorption layer absorbs interference light and then causes temperature rise of the light absorption layer and the base body, the base is prone to deformation, heat can be conducted timely through the heat dissipation layer, and deformation errors caused by local overheating are avoided. Preferably, both ends of the heat dissipation layer are higher than the middle portion, so that heat dissipation efficiency can be improved.

Another aspect of the present invention also provides a lithographic apparatus, comprising the above-mentioned beam projection system.

It should be noted that: the utility model discloses a light beam projection system and lithography apparatus can be applied to the photoetching and possess the repeatability photoetching pattern of periodicity or law, through utilizing light splitting piece beam split to with the light beam zoom device cooperation on the corresponding projection route, can once only accomplish the same or different a plurality of photoetching pattern processing of resolution ratio, effectively improve photoetching efficiency. The utility model discloses a light beam projection system can also be applied to the great pattern photoetching of size, through setting up foretell light beam projection system, has solved light beam emission device 1 because self width restriction, once only can scan the problem of the fixed width of photoetching, need not to operate repeatedly many times, and one shot forming is efficient, need not to set up the photoetching that a plurality of light beam emission device 1 realized the jumbo size pattern moreover, reduce cost.

Specific embodiments of the present invention will be described below with reference to fig. 1 to 4.

Example 1

Referring to fig. 1, the present embodiment provides a light beam projection system, which includes a light beam emitting device 1, a light splitting assembly 2, a first light beam zooming device and a second light beam zooming device, wherein the light beam emitting device 1 is capable of emitting functional light beams, and the light beam zooming devices are disposed in one-to-one correspondence with projection paths of the functional light beams.

The light splitting assembly 2 comprises a first light splitting part 21 and a first functional reflecting part 22 which are oppositely arranged and are arranged on a projection path between the light beam emitting device 1 and the light beam zooming device, wherein the first light splitting part 21 can transmit part of the received functional light beam to form a first transmitted light beam and reflect part of the received functional light beam to form a first reflected light beam so as to separate the target photoetching pattern into two sub-patterns; one of the first transmitted light beam and the first reflected light beam is emitted by the first functional reflector 22 and then emitted to the first light beam scaling device corresponding to the projection path, and the other one is emitted to the second light beam scaling device; the first beam scaling device and the second beam scaling device respectively scale the received split beams to obtain first target beams and second target beams carrying belt patterns respectively, so as to project the first target beams and the second target beams to different projection areas of the imaging area 3 respectively, and further realize photoetching processing of different areas.

Specifically, the first beam scaling device and the second beam scaling device have different scaling factors, one is a high-power scaling device, and the other is a low-power scaling device, so that the sub-image lithography processing required by high-precision lithography and high-speed lithography can be realized simultaneously.

In one embodiment, each of the first light beam zooming device and the second light beam zooming device comprises a mounting shell and a double mirror, the double mirror is fixedly connected with the mounting shell, and the multiplying power of the double mirror on the first light beam zooming device is different from that of the double mirror on the second light beam zooming device, so that sub-pattern photoetching processing with two different photoetching precision and photoetching speed requirements is realized, the double mirror does not need to be replaced, and precision deviation caused by mechanical vibration is avoided.

In another embodiment, the first beam scaling device and/or the second beam scaling device comprises a mounting housing and two or more than two magnification mirrors disposed on the mounting housing; the double mirror is rotatably connected with the mounting shell. In the primary photoetching process, the combined processing of different photoetching precision and photoetching speed requirements can be realized by switching the double mirrors, the repositioning after the double mirrors are replaced in a return process is not needed, the photoetching efficiency is improved, and the positioning deviation is reduced.

Optionally, the light beam projection system further includes a base, and the first light beam zooming device and the second light beam zooming device are respectively and fixedly connected to the base, and the relative positions between the first light beam zooming device and the second light beam zooming device are fixedly set.

Optionally, a side surface of the base facing the light beam emitting direction is provided with a light absorbing layer, and the light absorbing layer is used for absorbing environmental interference light to avoid crosstalk errors. Optionally, still be equipped with the heat dissipation layer in the base, the heat dissipation layer is close to the light-absorbing layer setting for heat conduction, avoid local overheat to cause the base deformation, and then improve the photoetching precision.

Optionally, the light beam projection system is further provided with a first moving mechanism, and the first moving mechanism is in transmission connection with the light beam emitting device 1, and can drive the light beam emitting device 1 to move away from or towards the first light splitter 21, or to move in a translation manner relative to the first light splitter 21, so as to adjust a distance between the light beam emitting device 1 and the first light splitter 21 or adjust a relative translation position, so as to change a projection area of the light beam emitting device 1 on the first light splitter 21.

Optionally, the light beam projection system is further provided with a second moving mechanism, and the second moving mechanism is in transmission connection with the light beam emission device 1, the light splitting assembly 2, the first light beam scaling device and the second light beam scaling device, and can drive the light beam emission device 1, the light splitting assembly 2, the first light beam scaling device and the second light beam scaling device to move cooperatively relative to the imaging area 3 so as to move away from or close to the imaging area 3, or to move translationally relative to the imaging area 3.

Example 2

Referring to fig. 2, the present embodiment provides a light beam projection system, which has similar configuration to that of embodiment 1, except that:

in this embodiment, the light splitting assembly 2 of the light beam projection system further includes a second light splitting element 23 and a third light beam zooming device, the second light splitting element 23 is disposed opposite to the first light splitting element 21, and the first functional reflecting element 22 is disposed opposite to the second light splitting element 23.

The light beam emitting device 1 emits a functional light beam carrying a target photoetching pattern, and a first transmitted light beam carrying a first sub-pattern and a first reflected light beam carrying a second sub-pattern are formed after light splitting processing is carried out on the functional light beam by a first light splitting piece 21; one of the first transmitted beam and the first reflected beam is projected to the first beam scaling device, and the other is projected to the second beam splitter 23, and a second reflected beam and a second transmitted beam are formed after passing through the second beam splitter 23, so that the first sub-pattern or the second sub-pattern is separated into a third sub-pattern and a fourth sub-pattern; one of the second reflected light beam and the second transmitted light beam is projected to the second light beam zooming device, and the other is projected to the third light beam zooming device after being reflected by the first functional reflecting piece 22; the first beam scaling device, the second beam scaling device and the third beam scaling device respectively scale the received beams to obtain a first target beam, a second target beam and a third target beam which respectively carry the first sub-pattern or the second sub-pattern, and the third sub-pattern and the fourth sub-pattern, so as to respectively project the first target beam, the second target beam and the third target beam to different projection areas of the imaging area 3, thereby realizing the photoetching processing of different areas.

Example 3

Referring to fig. 3, the present embodiment provides a light beam projection system, which has similar configuration to that of embodiment 1, except that:

in this embodiment, the light splitting assembly 2 of the light beam projection system further comprises a second light splitting element 23, a third light splitting element 25, a fourth light splitting element 27, a second functional reflecting element 24, a third functional reflecting element 26, a third beam scaling device, a fourth beam scaling device, and a fifth beam scaling device.

In one embodiment, as shown in fig. 3, the first light splitting member 21 is disposed opposite to the first functional reflecting member 22, the second light splitting member 23 is disposed opposite to the second functional reflecting member 24, and the third light splitting member 25 is disposed opposite to the third functional reflecting member 26; the light beam emitting device 1 emits a functional light beam carrying a target photoetching pattern, and forms a first transmission light beam carrying a first sub-pattern and a first reflection light beam carrying a second sub-pattern after light splitting treatment by the first light splitting part 21; the first transmitted beam is projected to the second beam splitter 23, and forms a second transmitted beam carrying a third sub-pattern and a second reflected beam carrying a fourth sub-pattern after passing through the second beam splitter 23, wherein the third sub-pattern and the fourth sub-pattern are obtained by separating the first sub-pattern, the second transmitted beam is emitted to the first beam scaling device, and the second reflected beam is emitted to the second beam scaling device after being reflected by the second functional reflector 24.

Further, the first reflected beam is reflected by the first functional reflector 22 and then emitted to the third light splitter 25, and is processed by the third light splitter 25 to form a third reflected beam carrying a fifth sub-pattern and a third transmitted beam carrying a sixth sub-pattern, where the fifth sub-pattern and the sixth sub-pattern are separated from each other by the second sub-pattern, the third reflected beam is reflected by the third functional reflector 26 and then emitted to the third beam scaling device, and the third transmitted beam is projected to the fourth beam scaling device.

The first light beam zooming device, the second light beam zooming device, the third light beam zooming device and the fourth light beam zooming device respectively zoom the received light beams to obtain a first target light beam carrying a third sub-pattern, a second target light beam carrying a fourth sub-pattern, a third target light beam carrying a fifth sub-pattern and a fourth target light beam carrying a sixth sub-pattern, so as to respectively project the third target light beam and the fourth target light beam to different projection areas of the imaging area 3, thereby realizing the photoetching processing of different areas.

Example 4

Referring to fig. 4, the present embodiment provides a light beam projection system, which has similar configuration to that of embodiment 1, except that:

in this embodiment, the light splitting assembly 2 of the light beam projection system further comprises a second light splitting element 23, a second functional reflecting element 24, a third light splitting element 25, a third functional reflecting element 26, a third light beam zooming device, a fourth light beam zooming device and a fifth light beam zooming device.

In one embodiment, as shown in fig. 4, the first light splitting member 21 is disposed opposite to the first functional reflecting member 22, the second light splitting member 23 is disposed opposite to the third light splitting member 25, the third light splitting member 25 is disposed opposite to the second functional reflecting member 24, and the fourth light splitting member 27 is disposed opposite to the third functional reflecting member 26.

The light beam emitting device 1 emits a functional light beam carrying a target photoetching pattern, and a first transmitted light beam carrying a first sub-pattern and a first reflected light beam carrying a second sub-pattern are formed after light splitting processing is carried out on the functional light beam by a first light splitting piece 21; the first transmitted beam is projected to a second beam splitter 23, and forms a second transmitted beam carrying a third sub-pattern and a second reflected beam carrying a fourth sub-pattern after passing through the second beam splitter 23, wherein the third sub-pattern and the fourth sub-pattern are obtained by separating the first sub-pattern, the second transmitted beam is emitted to the first beam scaling device, the second reflected beam is projected to a third beam splitter 25, and forms a third reflected beam carrying a fifth sub-pattern and a third transmitted beam carrying a sixth sub-pattern after passing through the third beam splitter 25, and the fifth sub-pattern and the sixth sub-pattern are obtained by separating the fourth sub-pattern; the third reflected beam is directed to the second beam scaling device and the third transmitted beam is reflected by the second functional reflector 24 and directed to the third beam scaling device.

Further, the first reflected light beam is reflected by the first functional reflector 22 and then emitted to the fourth light splitter 27, and is processed by the fourth light splitter 27 to form a fourth reflected light beam carrying a seventh sub-pattern and a fourth transmitted light beam carrying an eighth sub-pattern, wherein the seventh sub-pattern and the eighth sub-pattern are separated from each other by the second sub-pattern, the fourth reflected light beam is reflected by the third functional reflector 26 and then emitted to the fourth beam scaling device, and the third transmitted light beam is projected to the fifth beam scaling device.

The first light beam zooming device, the second light beam zooming device, the third light beam zooming device, the fourth light beam zooming device and the fifth light beam zooming device respectively zoom the received light beams to obtain a first target light beam carrying a third sub-pattern, a second target light beam carrying a fifth sub-pattern, a third target light beam carrying a sixth sub-pattern, a fourth target light beam carrying a seventh sub-pattern and a fifth target light beam carrying an eighth sub-pattern, so as to respectively project the light beams to different projection areas of the imaging area 3, thereby realizing the photoetching processing of different areas.

Although the present invention has been described in connection with the preferred embodiments, it is not intended to limit the invention to the embodiments described herein, but rather, to include various changes and modifications without departing from the scope of the invention.

In this document, the terms front, back, upper, lower and the like in the drawings are used for the sake of clarity and convenience only for the components are located in the drawings and the positions of the components relative to each other. It is to be understood that the use of the directional terms should not be taken to limit the scope of the claims.

The embodiments and features of the embodiments described herein above can be combined with each other without conflict.

The above disclosure is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the scope of the invention, which is defined by the appended claims.

Claims (10)

1. A beam projection system, characterized by comprising a beam emitting device (1), at least one beam splitter and at least two beam scaling devices, wherein the beam emitting device (1) can emit functional beams, and the beam scaling devices are arranged in one-to-one correspondence with projection paths of the functional beams;

the at least one light splitting piece is arranged on a projection path between the light beam emitting device (1) and the light beam zooming device, and the light splitting piece can transmit part of the received functional light beams and reflect part of the received functional light beams;

the functional light beams are transmitted and reflected by the same light splitting piece, are respectively emitted to the light beam scaling devices corresponding to the projection paths through different projection paths, and are emitted to the imaging area (3) through the light beam scaling devices.

2. A beam projection system according to claim 1, characterized in that it further comprises at least one functional reflector arranged in the projection path between the beam emission device (1) and the beam scaling device, the beam splitter being arranged opposite the functional reflector;

the functional reflecting piece can receive a light splitting beam transmitted or reflected by the light splitting piece and reflect the received light splitting beam to the light beam scaling device or another light splitting piece.

3. The beam projection system of claim 1, wherein the beam projection system comprises N beam splitters, N is an integer greater than or equal to 1, and the same functional beam is projected by the N beam splitters to form N +1 split beams.

4. A beam projection system according to claim 1, wherein the at least two beam scaling means comprise at least a first scaling factor and a second scaling factor, the first scaling factor being different from the second scaling factor.

5. A beam projection system according to claim 1, wherein the at least two beam scaling means are fixedly arranged in relation to each other, and wherein the corresponding projection areas of different beam scaling means in the imaging zone (3) are different from each other.

6. Light beam projection system according to any of claims 1 to 5, further comprising a first movement mechanism in driving connection with the light beam emitting device (1);

the first moving mechanism can drive the light beam emitting device (1) to move so that the light beam emitting device (1) moves relative to the at least one light splitting piece.

7. A beam projection system according to any of claims 1-5, further comprising a second movement mechanism in driving connection with the beam emitting device (1), the at least one beam splitter and the beam scaling device;

the second moving mechanism can drive the light beam emitting device (1), the at least one light splitting piece and the light beam zooming device to move cooperatively relative to the imaging area (3).

8. The beam projection system of any of claims 1-5, wherein the beam scaling device comprises a mounting housing and at least one fold mirror disposed on the mounting housing;

if the light beam zooming device comprises two or more than two times of mirrors, the times of mirrors are rotatably connected with the mounting shell.

9. A beam projection system according to any of claims 1-5, wherein the beam scaling device further comprises a base, the beam scaling device being fixedly connected to the base; and at least one side surface of the base is provided with a light absorption layer.

10. A lithographic apparatus comprising a beam projection system according to any one of claims 1 to 9.

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