CN217979673U - Monocrystalline silicon piece drying equipment - Google Patents
Monocrystalline silicon piece drying equipment Download PDFInfo
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- CN217979673U CN217979673U CN202220747369.9U CN202220747369U CN217979673U CN 217979673 U CN217979673 U CN 217979673U CN 202220747369 U CN202220747369 U CN 202220747369U CN 217979673 U CN217979673 U CN 217979673U
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Abstract
The application discloses monocrystalline silicon wafer drying equipment which comprises a shell, a conveyor belt, a motor and a drying unit, wherein the conveyor belt, the motor and the drying unit are arranged in the shell; a housing having an inlet and an outlet formed in a side thereof; the conveying belt conveys the monocrystalline silicon wafers from the inlet to the outlet under the control of the motor, the conveying belt is S-shaped in the shell, and the length of the conveying belt in the shell is greater than the preset length; a plurality of drying units which are fixed on the inner wall of the shell and arranged around the conveyor belt; the drying unit comprises a box body, a fan and a heating plate; a box body, wherein a plurality of open holes are formed in the first side wall facing the conveyor belt; a heating plate is arranged on a second side wall in the box body, which is in contact with the first side wall, and a fan is arranged on a third side wall which is not in contact with the first side wall; the fan can blow to the trompil. The hot plate starts for the inside temperature of stoving unit rises, and the fan starts this moment, blows high-temperature gas to monocrystalline silicon piece, dries it, has effectively guaranteed drying efficiency.
Description
Technical Field
The application relates to the field of monocrystalline silicon wafers, in particular to monocrystalline silicon wafer drying equipment.
Background
In the production process of the monocrystalline silicon wafer, the cleaning machine is required to clean the silicon wafer, then the cleaned solar silicon wafer enters the sorting machine to be sorted, and before the separation, because the solar silicon wafer coming out of the cleaning machine is wet, the solar silicon wafer cannot directly enter the sorting machine to be sorted, the wet monocrystalline silicon wafer needs to be dried.
Some existing drying devices use ovens and some air outlet devices, but the devices are complex in structure and poor in drying effect on monocrystalline silicon wafers.
SUMMERY OF THE UTILITY MODEL
In order to solve the above problems, the present application provides a single crystal silicon wafer drying apparatus, comprising: the device comprises a shell, a conveyor belt, a motor and a drying unit, wherein the conveyor belt, the motor and the drying unit are arranged in the shell;
the side surface of the shell is provided with an inlet and an outlet;
the conveyor belt is used for conveying the monocrystalline silicon wafer from the inlet to the outlet under the control of the motor, the shape of the conveyor belt in the shell is S-shaped, and the length of the conveyor belt in the shell is greater than a preset length;
the drying units are fixed on the inner wall of the shell and arranged around the conveyor belt;
the drying unit comprises a box body, a fan and a heating plate;
the box body is provided with a plurality of open holes on a first side wall facing the conveyor belt;
a heating plate is arranged on a second side wall, which is in contact with the first side wall, in the box body, and a fan is arranged on a third side wall, which is not in contact with the first side wall;
the fan can blow to the opening.
In one example, further comprising: the control chip is arranged outside the shell;
the box body is provided with a through hole on the third side wall, the fan is embedded into the third side wall through the through hole, and the fan and the heating plate are electrically connected with the control chip;
the control chip can control the starting and stopping of the fan and the heating plate.
In one example, further comprising: a gravity sensor;
the gravity sensor is arranged at the inlet and used for collecting the weight of the monocrystalline silicon wafer placed on the conveyor belt;
the control chip is connected with the gravity sensor and the motor, controls the rotation rate of the motor according to the weight, and the rotation rate is slower when the weight is larger.
In one example, further comprising: an interactive display screen;
the interactive display screen is arranged on the outer side of the shell, is electrically connected with the control chip and can control the fan and the heating plate based on the operation of a user.
In one example, the outlet and the inlet are disposed on opposite sides of the housing, and the conveyor belt is provided with projections outwardly along both the outlet and the inlet, the projections being belt structures, and the projections disposed at the inlet being upwardly inclined.
In one example, the two drying units are a set of drying units, each set of drying units is respectively arranged on the top plate and the bottom plate of the shell, and the projections of the drying units on the conveyor belt are overlapped.
In one example, the conveyor belt is a wire mesh chain conveyor belt.
The scheme provided by the application can bring the following beneficial effects:
1. when the unit during operation of drying, the hot plate starts for the inside temperature rise of drying unit, the fan starts this moment, blows high-temperature gas to the trompil, because the trompil is towards the conveyer belt this moment, so high-temperature gas just also carries the monocrystalline silicon piece on the conveyer belt, dries it, has effectively guaranteed drying efficiency. The conveyor belt is arranged to be S-shaped, so that the conveying area of the conveyor belt in the shell can be effectively increased. And the length of the silicon wafer drying device is limited, so that the drying degree of the monocrystalline silicon wafer in the shell can be ensured.
2. Through setting up control chip, can improve equipment's degree of automation, effectively improve drying efficiency. Generally speaking, the heavier the monocrystalline silicon wafer on the conveyor belt, the denser the intervals between the whole monocrystalline silicon wafer, and the more time is required for drying, at this time, the rotation speed of the motor is controlled to be reduced, and although the drying time is increased, the drying degree can be effectively guaranteed.
3. The interactive degree between people and equipment is increased by setting the interactive display screen, the related drying setting can be changed based on the requirements of the user, and the user experience is guaranteed.
4. The metal mesh chain conveyer belt is selected for use to the conveyer belt, can select for use high temperature resistant metal material, can effectively increase the life of equipment. And in the transmission process, monocrystalline silicon piece one side is placed on the conveyer belt, is unfavorable for drying this face, chooses for use under the condition of metal mesh chain conveyer belt, is network structure on the conveyer belt, can guarantee that the heating gas can be dried below monocrystalline silicon piece, sets up drying unit from top to bottom in addition, can further increase its drying efficiency to monocrystalline silicon piece.
Drawings
The accompanying drawings, which are included to provide a further understanding of the application and are incorporated in and constitute a part of this application, illustrate embodiment(s) of the application and together with the description serve to explain the application and not to limit the application. In the drawings:
FIG. 1 is a top view of a single crystal silicon wafer drying apparatus in an embodiment of the present application;
FIG. 2 is a side sectional view of a single crystal silicon wafer drying apparatus in an embodiment of the present application;
the drying device comprises a shell 1, a shell 11, an inlet 12, an outlet 13, a top plate 14, a bottom plate 2, a conveyor belt 21, a protruding part 3, a drying unit 31, a box body 32, an opening 33, a heating plate 34, a fan 4 and an interactive display screen.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
It should be noted that the terms of orientation such as left, right, up, down, front and back in the embodiments of the present invention are only relative concepts or are based on the normal use state of the product, i.e. the traveling direction of the product, and should not be considered as limiting.
In addition, it should be noted that the dynamic terms such as "relative movement" mentioned in the embodiments of the present invention include not only a change in position but also a movement in which a state changes without a relative change in position such as rotation or rolling.
Finally, it is noted that when an element is referred to as being "on" or "disposed" to another element, it can be on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present.
As shown in fig. 1 and 2, the present application provides a single crystal silicon wafer drying apparatus, which includes a housing 1, and a conveyor 2, a motor (not shown), and a drying unit 3 disposed in the housing 1.
The shell 1 is provided with an inlet 11 and an outlet 12 on the side, the material of the shell can be related metal material, and the size can be set according to actual requirements.
And the conveyor belt 2 is used for conveying the monocrystalline silicon piece from the inlet 11 to the outlet 12 under the control of the motor, the shape of the conveyor belt 2 in the shell 1 is S-shaped, and the length of the conveyor belt 2 in the shell 1 is greater than the preset length. The conveyor belt 2 is arranged in an S-shape, which effectively increases its transport area within the housing 1. And the drying degree of the monocrystalline silicon wafer in the shell 1 can be ensured by limiting the length of the shell.
The drying units 3 are fixed on the inner wall of the shell 1 and arranged around the conveyor belt. The drying unit can dry the monocrystalline silicon piece on the conveyer belt, and a plurality of drying units are arranged to effectively guarantee the drying efficiency of the monocrystalline silicon piece.
The drying unit 3 includes a cabinet 31, a blower 34, and a heating plate 33.
The cabinet 31 is provided with a plurality of openings 32 on a first side wall facing the conveyor 2, and the first side wall provided with the openings 32 faces the conveyor regardless of the position where the drying unit 3 is placed.
A heating plate 33 is arranged on a second side wall of the box body 31, which is in contact with the first side wall, and a fan 34 is arranged on a third side wall of the box body, which is not in contact with the first side wall. And a fan 34 capable of blowing air to the opening 32. When the drying unit 3 during operation, hot plate 33 starts for the inside temperature rise of drying unit 3, fan 34 starts this moment, blows high-temperature gas to trompil 32, because trompil 32 is towards conveyer belt 2 this moment, so high-temperature gas also carries the monocrystalline silicon piece to on the conveyer belt 2, dries it, has effectively guaranteed drying efficiency.
In one embodiment, the apparatus further comprises: a control chip (not shown in the figure) disposed outside the housing 1. The box 1 is provided with the through-hole on the third lateral wall, and fan 34 passes through in the through-hole embedding third lateral wall, and fan 34, hot plate 33 and control chip electricity are connected. And the control chip can control the starting and stopping of the fan 34 and the heating plate 33. So can improve the automation degree of control of equipment, effectively improve drying efficiency.
Further, the device also comprises a gravity sensor (not shown in the figures). A gravity sensor is provided at the inlet 11, and the gravity sensor collects the weight of the single crystal silicon wafer placed on the conveyor 2. The control chip is connected with the gravity sensor and the motor, the rotation speed of the motor is controlled according to the weight, and the larger the weight is, the slower the rotation speed is. Generally speaking, the heavier the single crystal silicon wafer on the conveyor belt 2, the more the spacing between the whole single crystal silicon wafer is, the more time is required for drying, and at this time, the rotation speed of the motor is controlled to be reduced, so that although the drying time is increased, the drying degree can be effectively guaranteed.
In one embodiment, the device further comprises an interactive display screen 4, wherein the interactive display screen 4 is arranged on the outer side of the shell 1, is electrically connected with the control chip and can control the fan 34 and the heating plate 33 based on the operation of a user. Therefore, the interaction degree between the person and the equipment is increased, the related drying setting can be changed based on the requirement of the user, and the user experience is guaranteed.
In one embodiment, the outlet 12 and the inlet 11 are arranged on opposite sides of the housing 1, and the conveyor belt 2 is provided with protrusions 21 outwardly along both the outlet 12 and the inlet 11, the protrusions 21 being both conveyor belt structures, and the protrusions 21 arranged at the inlet 11 are inclined upwardly. This ensures that the user has a sufficient buffer area for placing the silicon single crystal wafer when preventing the silicon single crystal wafer, and the protrusion 21 inclined upward ensures that the silicon single crystal wafer smoothly enters the inside of the housing 1.
In one embodiment, two drying units 3 are a set of drying units 3, each set of drying units 3 is respectively disposed on the top plate 13 and the bottom plate 14 of the housing 1, and the projections of each set of drying units 3 on the conveyor belt 2 coincide. And the conveyor belt 2 is a wire mesh chain conveyor belt. The metal mesh chain conveyer belt is selected for use to the conveyer belt, can select for use high temperature resistant metal material, can effectively increase the life of equipment. And in the transmission course, monocrystalline silicon piece one side is placed on conveyer belt 2, is unfavorable for drying this face, chooses for use under the condition of metal mesh chain conveyer belt, is network structure on the conveyer belt 2, can guarantee that the heating gas can be dried below monocrystalline silicon piece, sets up drying unit 3 from top to bottom in addition, can further increase its drying efficiency to monocrystalline silicon piece.
The above description is only an example of the present application and is not intended to limit the present application. Various modifications and changes may occur to those skilled in the art. Any modification, equivalent replacement, improvement or the like made within the spirit and principle of the present application shall be included in the scope of the claims of the present application.
Claims (7)
1. The monocrystalline silicon wafer drying equipment is characterized by comprising a shell, a conveyor belt, a motor and a drying unit, wherein the conveyor belt, the motor and the drying unit are arranged in the shell;
the side surface of the shell is provided with an inlet and an outlet;
the conveyor belt is used for conveying the monocrystalline silicon wafer from the inlet to the outlet under the control of the motor, the shape of the conveyor belt in the shell is S-shaped, and the length of the conveyor belt in the shell is greater than a preset length;
the drying units are fixed on the inner wall of the shell and arranged around the conveyor belt;
the drying unit comprises a box body, a fan and a heating plate;
the box body is provided with a plurality of open holes on a first side wall facing the conveyor belt;
a heating plate is arranged on a second side wall, which is in contact with the first side wall, in the box body, and a fan is arranged on a third side wall, which is not in contact with the first side wall;
the fan can blow to the opening.
2. The drying apparatus of claim 1, further comprising: a control chip disposed outside the housing;
the box body is provided with a through hole on the third side wall, the fan is embedded into the third side wall through the through hole, and the fan and the heating plate are electrically connected with the control chip;
the control chip can control the starting and stopping of the fan and the heating plate.
3. The drying apparatus of claim 2, further comprising: a gravity sensor;
the gravity sensor is arranged at the inlet and used for collecting the weight of the monocrystalline silicon wafer placed on the conveyor belt;
the control chip is connected with the gravity sensor and the motor, controls the rotation rate of the motor according to the weight, and the rotation rate is slower when the weight is larger.
4. The drying apparatus of claim 2, further comprising: an interactive display screen;
the interactive display screen is arranged on the outer side of the shell, is electrically connected with the control chip and can control the fan and the heating plate based on the operation of a user.
5. The drying apparatus of claim 1, wherein said outlet and said inlet are disposed on opposite sides of said housing, and said conveyor belt has projections outwardly disposed along both said outlet and said inlet, said projections being each conveyor belt structure, and the projections disposed at said inlet being upwardly inclined.
6. The drying apparatus of claim 1, wherein two of said drying units are a set of drying units, each set of drying units being disposed on a top plate and a bottom plate of said housing, respectively, and projections of each set of said drying units on said conveyor belt coincide.
7. Drying apparatus according to claim 6 in which the conveyor is a wire mesh chain conveyor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220747369.9U CN217979673U (en) | 2022-04-01 | 2022-04-01 | Monocrystalline silicon piece drying equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220747369.9U CN217979673U (en) | 2022-04-01 | 2022-04-01 | Monocrystalline silicon piece drying equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217979673U true CN217979673U (en) | 2022-12-06 |
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ID=84266784
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202220747369.9U Active CN217979673U (en) | 2022-04-01 | 2022-04-01 | Monocrystalline silicon piece drying equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN217979673U (en) |
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2022
- 2022-04-01 CN CN202220747369.9U patent/CN217979673U/en active Active
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