CN217948238U

CN217948238U - Metal surface reinforcing structure with PVD nanometer cladding material

Info

Publication number: CN217948238U
Application number: CN202221065942.4U
Authority: CN
Inventors: 徐忠堂; 胡大纲; 郭少华
Original assignee: Jiangsu Zhongyuan Rare Earth New Material Co ltd
Current assignee: Jiangsu Zhongyuan Rare Earth New Material Co ltd
Priority date: 2022-05-06
Filing date: 2022-05-06
Publication date: 2022-12-02
Anticipated expiration: 2032-05-06

Abstract

The utility model relates to the technical field of metal structure, and a metal surface reinforcing structure with PVD nanometer cladding material is disclosed, has solved the problem that current PVD nanometer cladding material is not strong with metal surface adhesion, and it includes the metal body, the surface of metal body is provided with the physics and etches the layer, and the surface that the physics was etched the layer is provided with the chemical etching layer, and the surface that the chemical etching layer was provided with PVD nanometer cladding material, and the inside that the physics was etched the layer is provided with a plurality of physics and etches the hole, and the inside that the chemical etching layer was etched the layer is provided with a plurality of chemical etching lines, and chemical etching line and physics etch the hole and be the intercommunication formula structure; the metal surface reinforcing structure can improve the adhesive force between the PVD nano coating and the metal surface, avoid falling off of the PVD nano coating and further prolong the service life.

Description

Metal surface reinforcing structure with PVD nanometer cladding material

Technical Field

The utility model belongs to the technical field of metal structure, specifically be a metal surface reinforcing structure with PVD nanometer cladding material.

Background

The PVD nano-coating on the metal surface is widely applied to industry by using excellent service performances such as high hardness, high wear resistance, strong corrosion resistance, high temperature resistance, adhesion resistance and the like. However, when the existing PVD nano-plating is combined with a metal surface, the metal surface is smooth, and the contact area between the PVD nano-plating and the metal surface cannot be increased, so that the PVD nano-plating and the metal surface have poor adhesive force, and the plating is easy to fall off after long-time use.

SUMMERY OF THE UTILITY MODEL

To the above situation, for overcoming prior art's defect, the utility model provides a metal surface reinforcing structure with PVD nanometer cladding material, the effectual current PVD nanometer cladding material of having solved and the not strong problem of metal surface adhesive force.

In order to achieve the above object, the utility model provides a following technical scheme: the utility model provides a metal surface reinforcing structure with PVD nanometer cladding material, includes the metal body, the surface of metal body is provided with the physics and etches the layer, and the surface that the physics was etched the layer is provided with the chemical etching layer, and the surface that the chemical etching layer was provided with PVD nanometer cladding material, and the inside that the physics was etched the layer is provided with a plurality of physics etch holes, and the inside that the chemical etching layer was provided with a plurality of chemical etching lines, and chemical etching line and physics etch hole are the intercommunication formula structure.

Preferably, the thickness of the physical etching layer is 0.6-1.2mm.

Preferably, the thickness of the chemical etching layer is 0.2-0.6mm.

Preferably, the thickness of the PVD nano-coating is 1.4-1.8mm.

Preferably, the physical etching hole is composed of a plurality of inclined taper holes I, a plurality of inclined taper holes II, a plurality of inclined inverted taper holes I and a plurality of inclined inverted taper holes II, the inclined angles of the inclined taper holes I and the inclined inverted taper holes II are opposite, and the inclined taper holes I, the inclined taper holes II, the inclined inverted taper holes I and the inclined inverted taper holes II are in irregular arrangement structures.

Preferably, the chemical etching lines are composed of a plurality of metal surface etching lines and a plurality of physical etching hole lines, and the metal surface etching lines and the physical etching hole lines are both irregular structures.

Compared with the prior art, the beneficial effects of the utility model are that:

(1) In the work, the physical etching hole formed by the inclined taper holes I, the inclined taper holes II, the inclined reverse taper holes I and the inclined reverse taper holes II and the chemical etching line formed by the metal surface etching lines and the physical etching hole lines can improve the adhesive force between the PVD nanometer coating and the metal surface, the phenomenon that the PVD nanometer coating falls off is avoided, and the service life of metal is prolonged.

Drawings

The accompanying drawings are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention, and together with the description serve to explain the invention and not to limit the invention.

In the drawings:

FIG. 1 is a schematic structural view of the present invention;

FIG. 2 is a schematic diagram of the physical etching layer structure of the present invention;

FIG. 3 is a schematic view of a chemical etching layer structure according to the present invention;

in the figure: 1. a metal body; 2. physically etching the layer; 3. chemically etching the layer; 4. PVD nano-plating; 5. physically etching the hole; 6. chemically etching lines; 7. a first inclined taper hole; 8. a second inclined taper hole; 9. a first inclined inverted taper hole; 10. a second inclined inverted taper hole; 11. etching lines on the surface of the metal; 12. And (5) physically etching the hole lines.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments; based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

Given by fig. 1 to 3, the utility model discloses a metal body 1, the surface of metal body 1 is provided with physical etching layer 2, and the surface of physical etching layer 2 is provided with chemical etching layer 3, and the surface of chemical etching layer 3 is provided with PVD nanometer cladding material 4, and the inside of physical etching layer 2 is provided with a plurality of physical etching holes 5, and the inside of chemical etching layer 3 is provided with a plurality of chemical etching lines 6, and chemical etching lines 6 and physical etching holes 5 are the connected structure;

as shown in fig. 1 to 3, the thickness of the physical etching layer 2 is 0.6-1.2mm, the thickness of the chemical etching layer 3 is 0.2-0.6mm, the thickness of the PVD nano-coating 4 is 1.4-1.8mm, the physical etching hole 5 is composed of a plurality of inclined cone holes i 7, a plurality of inclined cone holes i 8, a plurality of inclined inverted cone holes i 9 and a plurality of inclined inverted cone holes i 10, the inclined cone holes i 7 are opposite to the inclined angle of the inclined cone holes i 8, the inclined angles of the inclined inverted cone holes i 9 and the inclined inverted cone holes i 10 are opposite, the inclined cone holes i 7, the inclined cone holes i 8, the inclined inverted cone holes i 9 and the inclined inverted cone holes i 10 are in irregular arrangement structure, so that the PVD nano-coating 4 can penetrate into the inclined cone holes i 7, the inclined cone holes i 8, the inclined inverted cone holes i 9 and the inclined inverted cone holes i 10, the adhesion of the PVD nano-coating 4 is improved, the PVD nano-texture is formed by further etching the physical etching of the plurality of the PVD nano-coating 6 and the PVD nano-coating 11, and the physical etching hole 11 and the PVD nano-etching can be further formed by the physical etching of the inclined cone hole 11 and the physical etching nano-coating 4 and the nano-12 nano-etching metal coating 4 and the physical etching hole 12;

during the coating film, PVD nanometer cladding material 4 at first infiltrates into the inside of oblique taper hole 7, oblique taper hole two 8, oblique back taper hole 9 and oblique back taper hole two 10, then infiltrates into the inside of metal surface etching line 11 and physics etching hole line 12, improves PVD nanometer cladding material 4 and metal surface's attached area, and then can avoid causing droing of PVD nanometer cladding material 4, improves life.

In the work, the physical etching hole formed by the inclined taper holes I, the inclined taper holes II, the inclined inverted taper holes I and the inclined inverted taper holes II and the chemical etching line formed by the metal surface etching lines and the physical etching hole lines can improve the adhesive force between the PVD nano coating and the metal surface, avoid falling off of the PVD nano coating and prolong the service life of the metal.

Claims

1. A metal surface enhancement structure with PVD nano-coating, comprising a metal body (1), characterized in that: the surface of the metal body (1) is provided with a physical etching layer (2), the surface of the physical etching layer (2) is provided with a chemical etching layer (3), the surface of the chemical etching layer (3) is provided with a PVD nano-coating (4), the inside of the physical etching layer (2) is provided with a plurality of physical etching holes (5), the inside of the chemical etching layer (3) is provided with a plurality of chemical etching grains (6), and the chemical etching grains (6) and the physical etching holes (5) are of communicated structures.

2. The metallic surface enhancement structure with PVD nanocoating of claim 1, wherein: the thickness of the physical etching layer (2) is 0.6-1.2mm.

3. The metallic surface enhancement structure with PVD nanocoating of claim 1, further comprising: the thickness of the chemical etching layer (3) is 0.2-0.6mm.

4. The metallic surface enhancement structure with PVD nanocoating of claim 1, wherein: the thickness of the PVD nano-coating (4) is 1.4-1.8mm.

5. The metallic surface enhancement structure with PVD nanocoating of claim 1, further comprising: the physical etching hole (5) is composed of a plurality of inclined taper holes I (7), a plurality of inclined taper holes II (8), a plurality of inclined inverted taper holes I (9) and a plurality of inclined inverted taper holes II (10), the inclination angles of the inclined taper holes I (7) and the inclined taper holes II (8) are opposite, the inclination angles of the inclined inverted taper holes I (9) and the inclined inverted taper holes II (10) are opposite, and the inclined taper holes I (7), the inclined taper holes II (8), the inclined inverted taper holes I (9) and the inclined inverted taper holes II (10) are of irregular arrangement structures.

6. The metallic surface enhancement structure with PVD nanocoating of claim 1, further comprising: the chemical etching lines (6) are composed of a plurality of metal surface etching lines (11) and a plurality of physical etching hole lines (12), and the metal surface etching lines (11) and the physical etching hole lines (12) are both irregular structures.