CN217941074U

CN217941074U - PSG water film spraying mechanism

Info

Publication number: CN217941074U
Application number: CN202221333891.9U
Authority: CN
Inventors: 钱诚; 李刚; 王长江
Original assignee: Jiangsu Asia Electronics Technology Co Ltd
Current assignee: Jiangsu Asia Electronics Technology Co Ltd
Priority date: 2022-05-30
Filing date: 2022-05-30
Publication date: 2022-12-02
Anticipated expiration: 2032-05-30

Abstract

The utility model discloses a PSG water film spraying mechanism, which comprises a frame, the inside upper end of frame is provided with the shower that is used for forming the in bank setting of water film, the shower becomes two rows of settings, the shower below is provided with the transfer roller that is used for transmitting photovoltaic silicon chip, the transfer roller below is provided with the blowing pipe, the blowing pipe sets up in adjacent two clearance department between the transfer roller. Has the advantages that: the utility model discloses be provided with a plurality of lugs on the transfer roller that sets up, be provided with a plurality of air nozzles on the blowing pipe, the air nozzle evenly sets up between per two lugs, guarantees to blow evenly, prevents the water film and sprays equipment spun water and get into the lower surface of photovoltaic silicon chip, improves the cleaning performance.

Description

PSG water film spraying mechanism

Technical Field

The utility model relates to a spray equipment technical field especially relates to PSG water film sprays mechanism.

Background

Along with the development of science and technology, especially the development of crystal silicon technique, PERC solar wafer outward appearance requirement is more strict, in the battery piece back etching process, when PSG was got rid of to the back, the battery piece passes through the water film and sprays the mechanism, make the battery piece openly form the water film protection, the PSG who forms after adopting the water film protection under the battery piece openly adopted the condition of water film protection gets rid of, present water film sprays the mechanism, its transmission roller below is provided with the pipeline of blowing, the pipeline of blowing only has a great ascending spout, it is not even enough to blow, probably lead to spun water to get into the lower surface of photovoltaic silicon chip, the cleaning performance is general.

SUMMERY OF THE UTILITY MODEL

The utility model aims at providing a PSG water film sprays mechanism in order to solve above-mentioned problem.

The utility model discloses a following technical scheme realizes above-mentioned purpose:

PSG water film sprays mechanism, including the frame, the inside upper end of frame is provided with the shower that the water film spraying equipment is used for forming the in bank setting of water film, the shower becomes two rows of settings, the shower below is provided with the transfer roller that is used for transmitting photovoltaic silicon chip, the transfer roller below is provided with the blowing pipe, the blowing pipe sets up in adjacent two clearance department between the transfer roller.

Preferably, a plurality of bumps are connected to the conveying roller, and the bumps are cylindrical.

Preferably, a plurality of air nozzles are arranged at the top of each blowpipe, the air nozzles on each blowpipe are arranged in front and back two rows, the openings of the air nozzles are upward, and the air nozzles are positioned between every two lugs.

Preferably, the bottom of the blowpipe is connected with a vent pipe, the vent pipe communicates the blowpipes with each other, the vent pipe is connected with an air supply pipe, and the air supply pipe is located on one side of the conveying roller.

Preferably, a plurality of air nozzles are arranged at the top of each blowpipe, the air nozzles on each blowpipe are arranged into a front row and a rear row, the openings of the air nozzles are upward, and the air nozzles are positioned between every two lugs.

Preferably, the air nozzles are divided into a left group and a right group, and are used for respectively ejecting air to the two parallel photovoltaic silicon wafers.

Preferably, the edge of the wide edge of the photovoltaic silicon wafer is provided with an air nozzle correspondingly.

Preferably, each row of air nozzles can be controlled to be opened and closed independently.

Has the advantages that: the utility model discloses be provided with a plurality of lugs on the transfer roller that sets up, be provided with a plurality of air nozzles on the blowing pipe, the air nozzle evenly sets up between per two lugs, guarantees to blow evenly, prevents the water film to spray equipment spun water and gets into the lower surface of photovoltaic silicon chip, improves the cleaning performance.

Additional features and advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention.

Drawings

The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the principles of the invention and not to limit the invention. In the drawings:

fig. 1 is a perspective view of the PSG water film spraying mechanism of the present invention;

fig. 2 is a front view of the PSG water film spraying mechanism of the present invention;

FIG. 3 is a perspective view of the structure of a conveying roller and a blowing pipe of the PSG water film spraying mechanism of the utility model;

fig. 4 is a top view of the relationship between the projection and the air nozzle of the PSG water film spraying mechanism of the present invention;

the reference numerals are explained below: 1. a frame; 2. a shower pipe; 3. a conveying roller; 31. a bump; 4. a blowpipe; 41. an air nozzle; 42. a ventilation pipe; 43. a gas supply pipe; 9. a photovoltaic silicon wafer.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments.

In the description of the present invention, it should be understood that the terms "upper", "lower", "front", "rear", "left", "right", "top", "bottom", "inner", "outer", and the like indicate orientations or positional relationships based on orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention.

The present invention will be further explained with reference to the accompanying drawings:

example 1

As shown in fig. 1-4, the PSG water film spraying mechanism comprises a frame 1, spraying pipes 2 arranged in a row and used for forming water films are arranged at the upper end inside the frame 1, the spraying pipes 2 are arranged in two rows, conveying rollers 3 used for conveying photovoltaic silicon wafers are arranged below the spraying pipes 2, blowing pipes 4 are arranged below the conveying rollers 3, and the blowing pipes 4 are arranged in the gaps between the two adjacent conveying rollers 3.

In the present embodiment, a plurality of bumps 31 are attached to the conveying roller 3, and the bumps 31 have a cylindrical shape. The bumps 31 of two adjacent conveying rollers 3 are arranged in a staggered manner.

In this embodiment, the top of the blowpipe 4 is provided with a plurality of air nozzles 41, the air nozzles 41 on each blowpipe 4 are arranged in two rows, the air nozzles 41 are opened upwards, the air nozzles 41 are located between every two bumps 31, and the air nozzles 41 are ensured to be distributed uniformly, so that the air blowing is uniform.

In this embodiment, the bumps 31 have two functions, one of which is to reduce the contact area of the photovoltaic silicon wafer, and the other of which is to provide an installation space for the air nozzles 41, and especially, after the bumps 31 are arranged in a staggered manner, the air nozzles can be placed in the gaps between the bumps 31 and the bumps 31, and can be arranged on the whole surface matched with the silicon wafer as much as possible, so that the air is blown more uniformly.

In this embodiment, a ventilation pipe 42 is connected to the bottom of the blowpipe 4, the blowpipe 4 is communicated with the ventilation pipe 42, an air supply pipe 43 is connected to the ventilation pipe 42, and the air supply pipe 43 is located on the conveying roller 3 side.

The air nozzles 41 are divided into a left group and a right group, and are used for spraying air to two parallel photovoltaic silicon wafers respectively.

The working principle is as follows: when the transmission photovoltaic silicon wafer 9 of transfer roller 3 transmission is transmitted forward, the water film sprays the equipment and starts, sprays to the upper surface of transmission photovoltaic silicon wafer and forms the water film, and the composition of water film is configured by the user by oneself, is not restricted to the water film of pure water, and air nozzle 41 upwards jets air, prevents that water film spraying equipment spun water from getting into the lower surface of photovoltaic silicon wafer, improves the cleaning performance.

Example 2

A method for attaching a water film to a photovoltaic silicon wafer comprises the steps that the PSG water film spraying mechanism in embodiment 1 is used, the photovoltaic silicon wafer 9 is carried by a conveying roller 3 and moves towards the conveying direction, air nozzles 41 are correspondingly arranged on the edges of the photovoltaic silicon wafer 9 in the width direction, as shown in fig. 4, at least 5 air nozzles 41 can be covered on the photovoltaic silicon wafer 9 in the length direction, and at least 3 air nozzles 41 can be covered in the width direction.

In addition, every row of air nozzle 41 homoenergetic individual control switching, set up sensor or video monitoring, control the switching of the air nozzle 41 in photovoltaic silicon chip transmission direction the place ahead, when sensor or video monitoring monitor certain row of air nozzle 41 apart from photovoltaic silicon chip less than or equal to 1 centimetre, open air nozzle 41, in order to prevent that air nozzle 41 from influencing the water smoke that shower 2 sprays, prevent that water smoke from being blown to photovoltaic silicon chip below (too near jet-propelled can lead to the flight of water smoke uncontrollable).

The foregoing illustrates and describes the general principles, features and advantages of the present invention. It will be understood by those skilled in the art that the present invention is not limited to the above embodiments, and that the foregoing embodiments and descriptions are provided only to illustrate the principles of the present invention without departing from the spirit and scope of the present invention. The scope of the invention is defined by the appended claims and equivalents thereof.

Claims

PSG water film sprays mechanism, including frame (1), its characterized in that: the solar photovoltaic silicon wafer conveying device is characterized in that spray pipes (2) arranged in rows and used for forming water films are arranged at the upper end inside the frame (1), the spray pipes (2) are arranged in two rows, conveying rollers (3) used for conveying photovoltaic silicon wafers are arranged below the spray pipes (2), blowing pipes (4) are arranged below the conveying rollers (3), and the blowing pipes (4) are arranged in the adjacent two gaps between the conveying rollers (3).
2. The PSG water film spraying mechanism of claim 1, wherein: the conveying roller (3) is connected with a plurality of bumps (31), and the bumps (31) are cylindrical.
3. The PSG water film spraying mechanism of claim 2, wherein: the convex blocks (31) of the two adjacent conveying rollers (3) are arranged in a staggered mode.
4. The PSG water film spraying mechanism of claim 3, wherein: the top of the blowpipe (4) is provided with a plurality of air nozzles (41), each air nozzle (41) on the blowpipe (4) is arranged into a front row and a rear row, the opening of the air nozzle (41) is upward, and the air nozzle (41) is positioned between every two lugs (31).
5. The PSG water film spraying mechanism of claim 4, wherein: the blow pipe (4) bottom is connected with breather pipe (42), breather pipe (42) will blow pipe (4) intercommunication each other, breather pipe (42) are connected with air supply pipe (43), air supply pipe (43) are located transfer roller (3) one side.
6. The PSG water film spraying mechanism of claim 4, wherein: the air nozzles (41) are divided into a left group and a right group, and are used for spraying air to the two parallel photovoltaic silicon wafers respectively.
7. The PSG water film spraying mechanism of claim 1, wherein: and the edge of the wide edge of the photovoltaic silicon wafer corresponds to an air nozzle.
8. The PSG water film spraying mechanism of claim 1, wherein: each row of air nozzles (41) can be independently controlled to be opened and closed.