CN217922300U

CN217922300U - Supporting structure for chemical vapor deposition furnace for producing silicon carbide coating

Info

Publication number: CN217922300U
Application number: CN202221630168.7U
Authority: CN
Inventors: 贺鹏博; 舒学福
Original assignee: Hunan Kaixin New Material Technology Co ltd
Current assignee: Hunan Kaixin New Material Technology Co ltd
Priority date: 2022-06-28
Filing date: 2022-06-28
Publication date: 2022-11-29
Anticipated expiration: 2032-06-28

Abstract

The utility model provides a silicon carbide coating production is with bearing structure for chemical vapor deposition furnace. The support structure for the chemical vapor deposition furnace for producing the silicon carbide coating comprises: a base and a rotating plate; and the fixing assemblies are arranged on two sides of the rotating plate respectively and comprise electric telescopic rods and positioning plates. The utility model provides a silicon carbide coating production is with bearing structure for chemical vapor deposition furnace, through setting up this fixed establishment, can realize automatic fixed and unblock operation to the chemical vapor deposition furnace, when installation or dismantlement, the staff only need press the switch, make electric telescopic handle can drive the locating plate and remove, finally make the outside separation of joint piece and chemical vapor deposition furnace or joint, a plurality of fixed establishment forms of tradition have been changed, when installation or dismantlement, need not too much manually operation, make whole process very simple, it is very convenient to operate when installation and dismantlement, it is very convenient.

Description

Supporting structure for chemical vapor deposition furnace for producing silicon carbide coating

Technical Field

The utility model relates to a carborundum coating production and processing field especially relates to a carborundum coating production is with bearing structure for chemical vapor deposition furnace.

Background

The silicon carbide is an inorganic substance, has a chemical formula of SiC, is formed by smelting quartz sand, petroleum coke, wood chips and other raw materials in a resistance furnace at high temperature, has rare minerals such as Mosang stone in nature, is one of the most widely and economically applicable non-oxide high-technology refractory raw materials such as C, N, B and the like, and can be called as corundum or refractory sand.

The silicon carbide coating is a SIC coating prepared by physical or chemical vapor deposition, spraying and other methods, a chemical vapor deposition furnace is needed to finish production in the production and processing process of the silicon carbide coating, and a supporting structure is arranged outside the chemical vapor deposition furnace and can drive the chemical vapor deposition furnace to rotate so as to produce a uniform silicon carbide coating.

Among the correlation technique, bearing structure generally is assembled with the furnace body, can freely with furnace body installation and dismantlement, and bearing structure and furnace body generally can use a plurality of fixed establishment to fix for when installation or dismantlement, need people respectively to a plurality of fixed establishment manually operation, whole process is loaded down with trivial details relatively, operates more troublesome.

Therefore, there is a need to provide a supporting structure for a chemical vapor deposition furnace for producing silicon carbide coatings, which solves the above technical problems.

SUMMERY OF THE UTILITY MODEL

The utility model provides a silicon carbide coating production is with bearing structure for chemical vapor deposition furnace has solved bearing structure fixed with the more loaded down with trivial details problem of unblock operation.

In order to solve the technical problem, the utility model provides a silicon carbide coating production is with bearing structure for chemical vapor deposition furnace, include:

a base and a rotating plate;

the two fixing assemblies are respectively arranged on two sides of the rotating plate and comprise an electric telescopic rod, a positioning plate and a clamping block, the electric telescopic rod is horizontally arranged at the bottom of the rotating plate, the telescopic end of the electric telescopic rod is fixedly arranged with one side of the positioning plate, the clamping block is fixedly arranged on one side of the positioning plate, and the clamping block is clamped in a clamping groove outside the chemical vapor deposition furnace;

the bottom of the positioning plate is connected with the inner part of the sliding groove in a sliding manner.

Preferably, the two electric telescopic rods are respectively positioned on the left side and the right side of the bottom of the rotating plate, and the two positioning plates are respectively positioned on the left side and the right side of the top of the rotating plate.

Preferably, the positioning plate is an arc-shaped plate, and the positioning plate and the rotating plate are vertically arranged.

Preferably, the top of the rotating plate is attached to the bottom of the chemical vapor deposition furnace, and a plurality of mounting holes are formed in the top of the rotating plate.

Preferably, the inside of base is provided with drive structure, drive structure includes driving motor, two rotating gear and axis of rotation, driving motor install in the base, two rotating gear respectively fixed mounting in driving motor's output and the outside of axis of rotation.

Preferably, the two rotating gears are meshed with each other, and the bottom end of the rotating shaft is fixedly mounted on the bottom of the rotating plate.

Preferably, a plurality of cushion blocks are fixedly mounted at the top of the rotating plate, and a plurality of grooves are formed in the top of the rotating plate.

Compared with the prior art, the utility model provides a silicon carbide coating production is with supporting structure for chemical vapor deposition furnace has following beneficial effect:

the utility model provides a silicon carbide coating production is with bearing structure for chemical vapor deposition furnace, through setting up this fixed establishment, can realize automatic fixed and unblock operation to the chemical vapor deposition furnace, when installation or dismantlement, the staff only need press the switch, make electric telescopic handle can drive the locating plate and remove, finally make joint piece and the outside separation of chemical vapor deposition furnace or joint, a plurality of fixed establishment forms of tradition have been changed, when installation or dismantlement, need not too much manual operation, make whole process very simple, it is very convenient to operate when installation and dismantlement, it is very convenient.

Drawings

FIG. 1 is a schematic structural view of a first embodiment of a supporting structure for a CVD furnace for producing SiC coatings according to the present invention;

FIG. 2 isbase:Sub>A cross-sectional view taken along plane A-A of FIG. 1;

FIG. 3 is a schematic view of the exterior of the base support structure shown in FIG. 1;

FIG. 4 is a schematic structural view of a second embodiment of the supporting structure for a CVD furnace for producing SiC coatings according to the present invention.

Reference numbers in the figures:

1. a base;

2. a rotating plate;

3. a fixing assembly;

31. the electric telescopic rod 32, the positioning plate 33 and the clamping block;

4. a chute 5 and a mounting hole;

6. a drive structure;

61. the driving motor 62, the rotating gear 63 and the rotating shaft;

7. cushion block, 8, groove.

Detailed Description

The present invention will be further described with reference to the accompanying drawings and embodiments.

First embodiment

Referring to fig. 1, fig. 2 and fig. 3, wherein fig. 1 is a schematic structural diagram of a first embodiment of a supporting structure for a chemical vapor deposition furnace for producing a silicon carbide coating according to the present invention; FIG. 2 isbase:Sub>A cross-sectional view taken along plane A-A of FIG. 1; fig. 3 is a schematic structural view of the exterior of the base support structure shown in fig. 1. Support structure for chemical vapor deposition furnace for producing silicon carbide coating comprises:

a base 1 and a rotating plate 2;

the two fixing assemblies 3 are respectively arranged on two sides of the rotating plate 2, each fixing assembly 3 comprises an electric telescopic rod 31, a positioning plate 32 and a clamping block 33, the electric telescopic rods 31 are horizontally arranged at the bottom of the rotating plate 2, the telescopic ends of the electric telescopic rods 31 are fixedly arranged with one side of the positioning plate 32, the clamping blocks 33 are fixedly arranged on one side of the positioning plate 32, and the clamping blocks 33 are clamped in clamping grooves outside the chemical vapor deposition furnace;

and the two sliding grooves 4 are respectively arranged at two sides of the top of the rotating plate 2, and the bottom of the positioning plate 32 is in sliding connection with the insides of the sliding grooves 4.

Electric telescopic handle 31 is external to have the power, it is flexible through external switch control, through being connected with locating plate 32, can drive locating plate 32 and remove at the horizontal direction, realize expansion and the shrink to locating plate 32, locating plate 32 keeps setting up perpendicularly with rotor plate 2, mainly used plays the fixed action to the outside of chemical vapor deposition stove, the joint piece 33 of its inboard sets up with the outside draw-in groove adaptation that sets up of chemical vapor deposition stove, through joint piece 33 and draw-in groove joint, and then play effectual fixed action to the chemical vapor deposition stove outside, make the chemical vapor deposition stove can stably install the top at rotor plate 2, spout 4 then sets up with locating plate 32 adaptation, mainly play limiting displacement to the bottom of locating plate 32, make locating plate 32 can be in the stable slip of horizontal direction.

Two electric telescopic handle 31 is located respectively the left side and the right side of rotor plate 2 bottom, two locating plate 32 is located respectively the left side and the right side at rotor plate 2 top.

The positioning plate 32 is an arc-shaped plate, and the positioning plate 32 and the rotating plate 2 are vertically arranged.

And a certain gap is formed between the positioning plate 32 and the chemical vapor deposition, so that the heat outside the chemical vapor deposition furnace can be rapidly dissipated.

The top of the rotating plate 2 is attached to the bottom of the chemical vapor deposition furnace, and a plurality of mounting holes 5 are formed in the top of the rotating plate 2.

The mounting hole 5 is matched with the supporting leg at the bottom of the chemical vapor deposition furnace, and the bottom of the chemical vapor deposition furnace is further positioned through matching and clamping of the mounting hole and the supporting leg.

The inside of base 1 is provided with drive structure 6, drive structure 6 includes driving motor 61, two rotating gear 62 and axis of rotation 63, driving motor 61 install in the base 1, two rotating gear 62 respectively fixed mounting in driving motor 61's output and the outside of axis of rotation 63.

The two rotating gears 62 are engaged with each other, and the bottom end of the rotating shaft 63 is fixedly mounted on the bottom of the rotating plate 2.

The driving motor 61 is externally connected with a power supply, and the rotation of the driving motor is controlled by an external switch, so that the driving motor is mainly used for driving the two rotating gears 62 to rotate, and further the rotating shaft 63 can drive the rotating plate 2 to synchronously rotate, and the chemical vapor deposition furnace can rotate.

The utility model provides a silicon carbide coating production is with chemical vapor deposition supporting structure for stove's theory of operation as follows:

when the chemical vapor deposition furnace is arranged on the supporting structure, the chemical vapor deposition furnace is hoisted on the top of the rotating plate 2 through hoisting equipment, and after the supporting legs at the bottom of the chemical vapor deposition furnace are aligned with the positions of the mounting holes 5 up and down, the chemical vapor deposition furnace is placed on the top of the rotating plate 2;

then, the fixing component 3 is controlled to further fix the chemical vapor deposition furnace, the two positioning plates 32 are moved in the horizontal direction at the same time by controlling the two electric telescopic rods 31 to be shortened, and finally the clamping blocks 33 on one sides of the positioning plates 32 are clamped with clamping grooves outside the chemical vapor deposition furnace, so that the chemical vapor deposition furnace and the rotating plate 2 are kept fixed;

and when dismantling, only need control two electric telescopic handle 31 extensions for two locating plates 32 outwards remove, and then make joint piece 33 and the outside draw-in groove separation of chemical vapor deposition stove, then use lifting device to hoist chemical vapor deposition stove and bearing structure separation can.

Compared with the prior art, the utility model provides a silicon carbide coating production is with bearing structure for chemical vapor deposition furnace has following beneficial effect:

through setting up this fixed establishment 3, can realize automatic fixed and unblock operation to chemical vapor deposition stove, in the installation or when dismantling, the staff only need press the switch, make electric telescopic handle 31 can drive locating plate 32 and remove, finally make joint piece 33 and the outside separation of chemical vapor deposition stove or joint, a plurality of fixed establishment forms of tradition have been changed, when installation or dismantlement, need not too much manual operation, make whole process very simple, it is very convenient to operate when installation and dismantlement, it is very convenient.

Second embodiment

Referring to fig. 4, based on the first embodiment of the present invention, a supporting structure for a cvd furnace for producing silicon carbide coating is provided, and the second embodiment of the present invention provides another supporting structure for a cvd furnace for producing silicon carbide coating, wherein the second embodiment does not hinder the independent implementation of the technical solution of the first embodiment.

Specifically, the utility model provides a bearing structure difference lies in for another kind of carborundum coating production chemical vapor deposition furnace:

the top of the rotating plate 2 is fixedly provided with a plurality of cushion blocks 7, and the top of the rotating plate 2 is provided with a plurality of grooves 8.

Cushion 7 is provided with four altogether, evenly distributed is at the top of rotor plate 2, mainly for chemical vapor deposition stove bottom provides the support, it has certain clearance to make its bottom and rotor plate 2, avoid both direct contact, and recess 8 also is provided with four, it distributes at rotor plate 2 top to be the circumference form, a gas permeability for increasing rotor plate 2 top, and through setting up cushion 7 and recess 8, gas permeability between multiplicable rotor plate 2 and the chemical vapor deposition stove bottom, be convenient for the chemical vapor deposition stove dispels the heat to outside fast, avoid its outside high temperature, play the guard action to the chemical vapor deposition stove.

The above only is the embodiment of the present invention, not limiting the scope of the present invention, all the equivalent structures or equivalent processes of the present invention are used in the specification and the attached drawings, or directly or indirectly applied to other related technical fields, and the same principle is included in the protection scope of the present invention.

Claims

1. A supporting structure for a chemical vapor deposition furnace for producing a silicon carbide coating is characterized by comprising:

a base and a rotating plate;

2. The supporting structure for a chemical vapor deposition furnace for producing a silicon carbide coating according to claim 1, wherein the two electric telescopic rods are respectively located at left and right sides of the bottom of the rotating plate, and the two positioning plates are respectively located at left and right sides of the top of the rotating plate.

3. The supporting structure for a chemical vapor deposition furnace for producing a silicon carbide coating according to claim 1, wherein the positioning plate is provided as an arc-shaped plate, and the positioning plate is vertically provided with the rotating plate.

4. The support structure for the chemical vapor deposition furnace for producing the silicon carbide coating as recited in claim 1, wherein the top of the rotating plate is attached to the bottom of the chemical vapor deposition furnace, and a plurality of mounting holes are formed in the top of the rotating plate.

5. The supporting structure for a chemical vapor deposition furnace for producing a silicon carbide coating according to claim 1, wherein a driving structure is provided inside the base, the driving structure comprises a driving motor, two rotating gears and a rotating shaft, the driving motor is installed inside the base, and the two rotating gears are fixedly installed at an output end of the driving motor and outside the rotating shaft, respectively.

6. The support structure for a chemical vapor deposition furnace for producing a silicon carbide coating according to claim 5, wherein two of the rotating gears are externally engaged, and a bottom end of the rotating shaft is fixedly installed to a bottom of the rotating plate.

7. The supporting structure for the chemical vapor deposition furnace for producing the silicon carbide coating as claimed in claim 1, wherein a plurality of spacers are fixedly mounted on the top of the rotating plate, and a plurality of grooves are formed on the top of the rotating plate.