CN217797654U - Quartz wafer decontamination plant - Google Patents
Quartz wafer decontamination plant Download PDFInfo
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- CN217797654U CN217797654U CN202221741074.7U CN202221741074U CN217797654U CN 217797654 U CN217797654 U CN 217797654U CN 202221741074 U CN202221741074 U CN 202221741074U CN 217797654 U CN217797654 U CN 217797654U
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- quartz wafer
- sewage
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Abstract
The utility model relates to the technical field of quartz wafer decontamination, and discloses a quartz wafer decontamination device, which comprises a main mechanism and a decontamination mechanism, wherein the main mechanism comprises a frame, a sewage tank, a water gun and a sewage cover; decontamination mechanism includes the motor, and motor below swing joint has the pivot, and pivot both sides fixedly connected with backup pad, backup pad left and right sides swing joint have the locating plate, and the pivot both sides are provided with anchor clamps. This quartz wafer decontamination plant, through placing quartz wafer in the inside draw-in groove of anchor clamps, then with the anchor clamps block at locating plate and backup pad inner wall, then through the fix with screw locating plate, then open motor and squirt, the motor is rotatory to drive the pivot rotatory, then it is rotatory to drive the anchor clamps of backup pad and backup pad inner wall, the anchor clamps of squirt pairing rotation are washed, then the sewage that washes falls into the sewage case, then open the sewage lid, collect the processing to sewage, the arrival carries out abluent effect to quartz wafer through the mode of washing.
Description
Technical Field
The utility model relates to a quartz chip decontamination technology field specifically is a quartz chip decontamination plant.
Background
The quartz wafer is the most important element in electronic components, the quartz wafer needs to be subjected to a plurality of treatment processes in the production flow, and the prepared quartz wafer pollutes the surface of the quartz wafer in the processing process and needs to be cleaned;
according to the cleaning device for quartz wafer production disclosed in the Chinese patent publication No. CN214022286U, by arranging a wafer cleaning tank and a hydraulic lifting rotary joint cleaning mechanism, the hydraulic lifting rotary joint cleaning mechanism is arranged in the inner cavity and the top of the wafer cleaning tank, the bottom of a hydraulic pump is fixedly connected with a speed reducing motor, and an output rotating shaft is movably connected at a central through hole at the bottom of the speed reducing motor, so that dust and impurities on the outer surface of the quartz wafer can be prevented from colliding and damaging the quartz wafer;
however, the above-mentioned device has a problem that the quartz crystal wafer is not cleaned cleanly due to soaking and cleaning, and therefore, we propose a quartz crystal wafer decontamination device to solve the problem that the existing decontamination device can not clean the surface of the quartz crystal wafer by soaking.
SUMMERY OF THE UTILITY MODEL
Technical problem to be solved
The utility model provides a quartz wafer decontamination plant, possess can wash advantages such as quartz wafer through the mode that washes, solved and mentioned among the above-mentioned background art and present soak the washing to quartz wafer and can lead to wasing unclean problem.
(II) technical scheme
In order to achieve the above purpose, the utility model provides a following technical scheme: a quartz wafer decontamination device comprises a main body mechanism, wherein a decontamination mechanism is arranged inside the main body mechanism;
the main body mechanism comprises a frame, a sewage tank is fixedly connected below the frame, water tanks are arranged on the front side and the rear side above the frame, a water gun is movably connected below the water tanks, and a sewage cover is movably connected behind the frame;
decontamination mechanism includes the motor, motor below swing joint has the pivot, pivot both sides fixedly connected with backup pad, backup pad left and right sides swing joint has the locating plate, the pivot both sides are provided with anchor clamps.
Through placing quartz wafer in the inside draw-in groove of anchor clamps, then with the anchor clamps block at locating plate and backup pad inner wall, then through the fix with screw locating plate, then open motor and squirt, the motor is rotatory to drive the pivot rotatory, then it is rotatory to drive the anchor clamps of backup pad and backup pad inner wall, the anchor clamps of squirt pairing rotation are washed, then the sewage that washes falls into the sewage case, then open the sewage lid, collect sewage and handle, the arrival carries out abluent effect through the mode of washing to quartz wafer.
Preferably, the water tanks and the water guns are two groups, wherein the upper parts of the water guns are movably connected with the lower parts of the water pipes, and the lower parts of the water tanks are movably connected with the upper parts of the water pipes.
The water tank and the water gun are two groups, the two groups of water gun are movably connected with the water pipe below and the two groups of water tank are movably connected with the water pipe above, the water gun is internally provided with the prior art, the water pipe is connected with the water gun through the water tank, and the decontamination mechanism is flushed through the water gun.
Preferably, a circular mounting hole is formed in the upper portion of the frame, and the lower portion of the motor is fixedly connected with the circular mounting hole formed in the upper portion of the frame.
Circular mounting hole has been seted up to the frame top, and in the circular mounting hole that motor below swing joint frame top was seted up, the motor is inside to be prior art, increases the stability of structure.
Preferably, two circular holes are respectively formed in the upper portion and the side face of the rotating shaft, a threaded hole is formed in the lower portion of the side face of the motor, the lower portion of the motor penetrates through the circular hole in the upper portion of the rotating shaft and extends to the inner bottom wall of the rotating shaft, and a circular hole screw formed in the side face of the rotating shaft penetrates through the threaded hole formed in the lower portion of the side face of the motor.
Two circular ports have been seted up respectively to pivot top and side, and motor side below sets up threaded hole, and the motor below runs through the circular port of pivot top and extends to diapire in the pivot, and the circular port screw that the pivot side was seted up alternates in the threaded hole that motor side below was seted up, and fixed pivot and motor can drive the pivot rotation when making the motor rotatory.
Preferably, there are two groups of support plates, there are four groups of positioning plates, and the four groups of positioning plate screws are movably connected to the left and right sides of the two groups of support plates.
The backup pad has two sets ofly, and the locating plate has four groups, and four group's locating plate screw swing joint are in two sets of backup pads left and right sides, through the fixed of locating plate and backup pad, make the rotation that anchor clamps can stabilize can not drop, reach fixed effect.
Preferably, the anchor clamps have two sets ofly, two sets of anchor clamps block is connected at locating plate and backup pad inner wall, two sets of anchor clamps are inside to be provided with the draw-in groove.
The anchor clamps have two sets ofly, and two sets of anchor clamps blocks are connected at locating plate and backup pad inner wall, and two sets of inside draw-in grooves that are provided with of anchor clamps make things convenient for place quartz wafer in the draw-in groove, and the block is then fixed through the locating plate, conveniently takes.
Preferably, a water outlet threaded hole is formed in the lower portion of the rear end of the sewage tank, and the sewage cover penetrates through the water outlet threaded hole formed in the lower portion of the rear end of the sewage tank and extends to the inner wall of the sewage tank.
A water outlet threaded hole is formed in the lower portion of the rear end of the sewage tank, and the sewage cover penetrates through the water outlet threaded hole formed in the lower portion of the rear end of the sewage tank and extends to the inner wall of the sewage tank, so that subsequent sewage discharge is facilitated, and the effect of conveniently recycling sewage is achieved.
Compared with the prior art, the utility model provides a quartz wafer decontamination plant possesses following beneficial effect:
1. this quartz wafer decontamination plant, through placing quartz wafer in the inside draw-in groove of anchor clamps, then with the anchor clamps block at locating plate and backup pad inner wall, then through the fix with screw locating plate, then open motor and squirt, the motor is rotatory to drive the pivot rotatory, then it is rotatory to drive the anchor clamps of backup pad and backup pad inner wall, the anchor clamps of squirt pairing rotation are washed, then the sewage that washes falls into the sewage case, then open the sewage lid, collect the processing to sewage, the arrival carries out abluent effect to quartz wafer through the mode of washing.
2. This quartz wafer decontamination plant sets up out the water screw hole through sewage case rear end below, and the sewage lid runs through the water screw hole of seting up below the sewage case rear end and extends to sewage incasement wall, makes things convenient for follow-up emission to sewage, reaches the effect of conveniently retrieving sewage.
Drawings
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a bottom view of the structure of the present invention;
FIG. 3 is a schematic view of the planing surface of the present invention;
fig. 4 is a schematic view of the structure clamp of the present invention.
Wherein: 1. a main body mechanism; 101. a frame; 102. a sewage tank; 103. a water tank; 104. a water gun; 105. a sewage cover; 2. a decontamination mechanism; 201. a motor; 202. a rotating shaft; 203. a support plate; 204. positioning a plate; 205. and (4) clamping.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Referring to fig. 1-4, a quartz wafer decontamination apparatus includes a main body mechanism 1, a decontamination mechanism 2 disposed inside the main body mechanism 1;
the main body mechanism 1 comprises a frame 101, a sewage tank 102 is fixedly connected below the frame 101, water tanks 103 are arranged on the front side and the rear side above the frame 101, a water gun 104 is movably connected below the water tanks 103, and a sewage cover 105 is movably connected behind the frame 101;
Through above-mentioned technical scheme, through placing quartz wafer in the inside draw-in groove of anchor clamps 205, then with anchor clamps 205 block at locating plate 204 and backup pad 203 inner wall, then through fix with screw locating plate 204, then open motor 201 and squirt 104, motor 201 is rotatory to be driven pivot 202 rotatory, then it is rotatory to drive backup pad 203 and backup pad 203 inner wall's anchor clamps 205, squirt 104 washes the anchor clamps 205 of rotation, then the sewage that washes falls into sewage case 102, then open sewage lid 105, collect sewage and handle, reach and carry out abluent effect to quartz wafer through the mode of washing.
There are two sets of water tanks 103 and water guns 104, and the upper parts of the two sets of water guns 104 are movably connected with the lower parts of the water pipes, and the lower parts of the two sets of water tanks 103 are movably connected with the upper parts of the water pipes. Water tank 103 and squirt 104 have two sets ofly, two sets of squirt 104 top swing joint water pipe below, two sets of water tank 103 below swing joint water pipe top, and squirt 104 is inside to be prior art, connects the water pipe through water tank 103 and is connecting squirt 104, advances to wash decontamination mechanism 2 through squirt 104.
A circular mounting hole is formed above the frame 101, and the lower part of the motor 201 is fixedly connected with the circular mounting hole formed above the frame 101. Circular mounting hole has been seted up to frame 101 top, and in the circular mounting hole that motor 201 below swing joint frame 101 top was seted up, motor 201 is inside to be prior art, increases the stability of structure.
Two circular holes are respectively formed in the upper side and the side surface of the rotating shaft 202, a threaded hole is formed in the lower side of the side surface of the motor 201, the lower side of the motor 201 penetrates through the circular hole in the upper side of the rotating shaft 202 and extends to the inner bottom wall of the rotating shaft 202, and a circular hole screw formed in the side surface of the rotating shaft 202 is inserted into the threaded hole formed in the lower side of the side surface of the motor 201. Two circular holes have been seted up respectively to pivot 202 top and side, and threaded hole has been seted up to motor 201 side below, and motor 201 below runs through the circular hole of pivot 202 top and extends to pivot 202 inner bottom wall, and the circular hole screw that the pivot 202 side was seted up alternates in the threaded hole that motor 201 side below was seted up, and fixed pivot 202 and motor 201 can drive pivot 202 when making motor 201 rotatory.
There are two sets of support plates 203, there are four sets of positioning plates 204, and the four sets of positioning plates 204 are movably connected to the left and right sides of the two sets of support plates 203 by screws. The backup pad 203 has two sets ofly, and the locating plate 204 has four groups, and four group's locating plate 204 screw swing joint is in two sets of backup pads 203 left and right sides, through the fixed of locating plate 204 and backup pad 203, makes the rotation that anchor clamps 205 can stabilize can not drop, reaches fixed effect.
The two sets of clamps 205 are provided, the two sets of clamps 205 are clamped and connected with the positioning plate 204 and the inner wall of the supporting plate 203, and clamping grooves are formed in the two sets of clamps 205. The two sets of clamps 205 are arranged, the two sets of clamps 205 are clamped and connected to the inner walls of the positioning plate 204 and the supporting plate 203, clamping grooves are formed in the two sets of clamps 205, quartz wafers can be conveniently placed in the clamping grooves, and the clamping is fixed through the positioning plate 204 and is convenient to take.
A water outlet threaded hole is formed in the lower portion of the rear end of the sewage tank 102, and the sewage cover 105 penetrates through the water outlet threaded hole formed in the lower portion of the rear end of the sewage tank 102 and extends to the inner wall of the sewage tank 102. A water outlet threaded hole is formed in the lower portion of the rear end of the sewage tank 102, and the sewage cover 105 penetrates through the water outlet threaded hole formed in the lower portion of the rear end of the sewage tank 102 and extends to the inner wall of the sewage tank 102, so that subsequent sewage discharge is facilitated, and the effect of facilitating sewage recovery is achieved.
When using, through placing quartz wafer in the inside draw-in groove of anchor clamps 205, then with anchor clamps 205 block at locating plate 204 and backup pad 203 inner wall, then through fix with screw locating plate 204, then open motor 201 and squirt 104, motor 201 is rotatory to be driven pivot 202 rotatory, then it is rotatory to drive the anchor clamps 205 of backup pad 203 and backup pad 203 inner wall, squirt 104 washes the anchor clamps 205 of rotation, then the sewage that washes falls into sewage case 102, then open sewage lid 105, collect sewage and handle, the arrival carries out abluent effect to quartz wafer through the mode of washing.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (7)
1. A quartz wafer decontamination device comprises a main body mechanism, and is characterized in that: a decontamination mechanism is arranged inside the main body mechanism;
the main body mechanism comprises a frame, a sewage tank is fixedly connected below the frame, water tanks are arranged on the front side and the rear side above the frame, a water gun is movably connected below the water tanks, and a sewage cover is movably connected behind the frame;
decontamination mechanism includes the motor, motor below swing joint has the pivot, pivot both sides fixedly connected with backup pad, backup pad left and right sides swing joint has the locating plate, the pivot both sides are provided with anchor clamps.
2. The quartz wafer desmear device of claim 1, wherein: the water tanks and the water guns are two groups, wherein the upper parts of the water guns are movably connected with the lower parts of the water pipes, and the lower parts of the water tanks are movably connected with the upper parts of the water pipes.
3. The quartz wafer desmear device of claim 1, wherein: a circular mounting hole is formed in the upper portion of the frame, and the lower portion of the motor is movably connected with the inside of the circular mounting hole formed in the upper portion of the frame.
4. The quartz wafer desmear device of claim 1, wherein: two circular holes are respectively formed in the upper portion and the side face of the rotating shaft, a threaded hole is formed in the lower portion of the side face of the motor, the lower portion of the motor penetrates through the circular hole in the upper portion of the rotating shaft and extends to the inner bottom wall of the rotating shaft, and a circular hole screw formed in the side face of the rotating shaft penetrates through the threaded hole formed in the lower portion of the side face of the motor.
5. The quartz wafer desmear device of claim 1, wherein: the supporting plates are provided with two groups, the positioning plates are provided with four groups, and the four groups of positioning plate screws are movably connected to the left side and the right side of the two groups of supporting plates.
6. The quartz wafer desmear device of claim 1, wherein: the fixture is provided with two groups, wherein the two groups of fixtures are clamped and connected to the positioning plate and the inner wall of the supporting plate, and clamping grooves are formed in the two groups of fixtures.
7. The quartz wafer desmear device of claim 1, wherein: and a water outlet threaded hole is formed in the lower portion of the rear end of the sewage tank, and the sewage cover penetrates through the water outlet threaded hole formed in the lower portion of the rear end of the sewage tank and extends to the inner wall of the sewage tank.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202221741074.7U CN217797654U (en) | 2022-07-08 | 2022-07-08 | Quartz wafer decontamination plant |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN202221741074.7U CN217797654U (en) | 2022-07-08 | 2022-07-08 | Quartz wafer decontamination plant |
Publications (1)
Publication Number | Publication Date |
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CN217797654U true CN217797654U (en) | 2022-11-15 |
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CN202221741074.7U Active CN217797654U (en) | 2022-07-08 | 2022-07-08 | Quartz wafer decontamination plant |
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CN (1) | CN217797654U (en) |
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2022
- 2022-07-08 CN CN202221741074.7U patent/CN217797654U/en active Active
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