CN217794593U - Polycrystalline silicon trade hydrochloric acid processing apparatus - Google Patents
Polycrystalline silicon trade hydrochloric acid processing apparatus Download PDFInfo
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- CN217794593U CN217794593U CN202222082209.XU CN202222082209U CN217794593U CN 217794593 U CN217794593 U CN 217794593U CN 202222082209 U CN202222082209 U CN 202222082209U CN 217794593 U CN217794593 U CN 217794593U
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Abstract
The utility model relates to the technical field of polycrystalline silicon hydrochloric acid treatment equipment, in particular to a hydrochloric acid treatment device in the polycrystalline silicon industry, which comprises a hydrochloric acid feeding system, a hydrochloric acid analysis system, a hydrogen chloride drying system and a tail gas washing system which are connected through pipelines; the hydrochloric acid feeding system comprises a discharging pump and a plurality of concentrated hydrochloric acid tanks which are connected through pipelines, and a discharge port of each concentrated hydrochloric acid tank is connected with the hydrochloric acid analysis system through a concentrated hydrochloric acid delivery pump; the hydrochloric acid analysis system comprises a jet mixer, an analysis tower, a calcium chloride circulating system, a hydrogen chloride condensing system and a demister, wherein a hydrogen chloride gas outlet of the demister is connected with a hydrogen chloride drying system; the tail gas washing system comprises a water washing tower and a water washing circulating cooler. The utility model discloses can realize the utilization to silicon tetrachloride in the accessory substance, obtain 99.9995% high-purity hydrogen chloride gas, reduce investment cost, provide the sound guarantee when back stage polycrystalline silicon production operation to whole device.
Description
Technical Field
The utility model relates to a polycrystalline silicon hydrochloric acid treatment facility technical field specifically is a polycrystalline silicon trade hydrochloric acid processing apparatus.
Background
With the rapid development of the polysilicon industry in China, the comprehensive utilization of byproducts becomes very important, and if the comprehensive utilization cannot be effectively solved, the comprehensive utilization of byproducts will certainly become a bottleneck limiting the development of the polysilicon industry in China.
The traditional method is to purify silicon tetrachloride in the by-product, then prepare ethyl silicate (or methyl silicate) at normal temperature and normal pressure by esterification reaction with absolute ethyl alcohol (or methanol), but the dosage is very limited, and some methods have separation difficulty and can not be completely utilized.
In addition, high-purity hydrogen chloride gas is needed in the production process of polycrystalline silicon and the polycrystalline silicon industry, for example, the synthesis process has high requirement on raw material gas and high investment cost, and how to obtain the high-purity hydrogen chloride gas while improving the utilization rate of the byproduct silicon tetrachloride in one set of equipment becomes a problem which needs to be solved urgently at present.
SUMMERY OF THE UTILITY MODEL
The utility model aims at providing a polycrystalline silicon trade hydrochloric acid processing apparatus, through the utility model discloses a hydrochloric acid charge-in system, the analytic system of hydrochloric acid, hydrogen chloride drying system and tail gas washing system can realize the utilization to silicon tetrachloride in the accessory substance, obtain 99.9995% high-purity hydrogen chloride gas, can also realize exhaust emission and handle, have solved the difficult problem that silicon tetrachloride handled in the above-mentioned and have reduced investment cost, provide powerful guarantee when back stage polycrystalline silicon production operation to whole device.
In order to solve the technical problem, the utility model provides a hydrochloric acid treatment device in the polysilicon industry, which comprises a hydrochloric acid feeding system, a hydrochloric acid analysis system, a hydrogen chloride drying system and a tail gas washing system which are connected through pipelines;
the hydrochloric acid feeding system comprises a discharging pump and a plurality of concentrated hydrochloric acid tanks which are connected through pipelines, and a discharge port of each concentrated hydrochloric acid tank is connected with the hydrochloric acid analysis system through a concentrated hydrochloric acid delivery pump;
the hydrochloric acid analysis system comprises an injection mixer, an analysis tower, a calcium chloride circulating system, a hydrogen chloride condensing system and a demister, wherein a liquid inlet end on one side of the injection mixer is connected with the concentrated hydrochloric acid delivery pump, a liquid inlet end on the bottom of the injection mixer is connected with the calcium chloride circulating system, a liquid outlet end on the other side of the injection mixer is connected with the analysis tower, a gas outlet on the top of the analysis tower is connected with the hydrogen chloride condensing system, the hydrogen chloride condensing system is connected with the demister, and a hydrogen chloride gas outlet of the demister is connected with the hydrogen chloride drying system;
the tail gas washing system comprises a washing tower and a washing circulation cooler, a tail gas inlet is arranged on one side of the upper end of the washing tower, the tail gas inlet is respectively connected with a tail gas outlet of a concentrated hydrochloric acid tank and a tail gas outlet of a demister, an inlet on one side of the lower end of the washing tower is connected with an absorption liquid tank, an outlet on the other side of the washing tower is connected with the washing circulation cooler through a washing circulating pump, and the washing circulation cooler is connected with an inlet on the upper end of the washing tower.
Further, hydrogen chloride drying system includes silicon tetrachloride drying tower and silicon tetrachloride circulative cooling ware, lower extreme one side of silicon tetrachloride drying tower is from last to having connected gradually hydrogen chloride admission line and silicon tetrachloride solution inlet channel down, the bottom liquid outlet of silicon tetrachloride drying tower pass through silicon tetrachloride circulating pump group with silicon tetrachloride circulative cooling ware is connected, silicon tetrachloride circulative cooling ware with the upper end inlet nozzle intercommunication of silicon tetrachloride drying tower, the top of silicon tetrachloride drying tower is connected with the hydrogen chloride pipeline of giving vent to anger, the hydrogen chloride is given vent to anger and is connected with the tail gas pipeline on the pipeline, the tail gas pipeline with the tail gas air inlet is connected.
Furthermore, the calcium chloride circulating system comprises a calcium chloride storage tank, a calcium chloride preparation tank and a concentration tower which are sequentially connected through pipelines, wherein a liquid outlet of the concentration tower is connected with the jet mixer through a calcium chloride circulating pump group, and a liquid inlet on one side of the concentration tower is connected with a liquid outlet on one side of the lower end of the analysis tower through a pipeline.
Further, the hydrogen chloride condensing system includes one-level condenser and second grade condenser, the air inlet of one-level condenser with the gas outlet of analytic tower is connected, the gas outlet of one-level condenser with the air inlet of second grade condenser is connected, the gas outlet of second grade condenser with the inlet end of defroster is connected, one-level condenser, second grade condenser and the bottom liquid outlet of defroster all passes through the pipeline intercommunication with the inlet of analytic tower.
Further, bottom one side of analytic tower is connected with analytic reboiler, analytic reboiler's water inlet is connected with first saturated steam conduit, analytic reboiler's delivery port is connected with analytic water jar of congealing, analytic water jar of congealing air inlet with analytic reboiler intercommunication.
Furthermore, one side of the concentration tower is connected with a concentration reboiler, and one side of the concentration reboiler is respectively connected with a second saturated steam pipeline and a flash condensation water tank.
Furthermore, an air outlet in the top of the concentrating tower is connected with an evaporative condenser, and a liquid outlet of the evaporative condenser is connected with a waste water tank.
Furthermore, the hydrogen chloride inlet pipeline and the silicon tetrachloride solution inlet pipeline are both connected with a nitrogen pipeline with a valve control.
The utility model has the advantages that:
1. through the utility model discloses a hydrochloric acid charge-in system, analytic system of hydrochloric acid, hydrogen chloride drying system and tail gas washing system can realize the utilization to accessory substance silicon tetrachloride, can also obtain 99.9995% high-purity hydrogen chloride gas, solve the difficult problem of silicon tetrachloride processing in the polycrystalline silicon production process effectively and reduced investment cost, provide the sound guarantee to whole device during later stage polycrystalline silicon production operation.
2. The hydrochloric acid is pressurized by a concentrated hydrochloric acid delivery pump and then is delivered into the jet mixer, and is uniformly mixed with the calcium chloride solution delivered by the calcium chloride circulating pump set in the jet mixer, and then is pumped into the analysis tower for analysis, so that the content of the analyzed hydrogen chloride can be greatly improved.
3. Introducing nitrogen through a nitrogen pipeline with valve control to dredge a hydrogen chloride inlet pipeline and a silicon tetrachloride solution inlet pipeline; in addition, nitrogen can be introduced to protect the hydrogen chloride gas, so that the hydrogen chloride gas is prevented from being oxidized, and the final content of the hydrogen chloride is ensured.
4. A liquid inlet at one side of the concentrating tower is connected with a liquid outlet at one side of the lower end of the resolving tower through a pipeline; one side of the concentration tower is connected with a concentration reboiler, and one side of the concentration reboiler is respectively connected with a second saturated steam pipeline and a flash evaporation condensate tank; the gas outlet at the top of the concentration tower is connected with an evaporative condenser, the liquid outlet of the evaporative condenser is connected with the setting of a waste water tank', dilute calcium chloride solution containing trace hydrogen chloride is obtained at the bottom of the analytic tower, the dilute calcium chloride solution enters the middle part of the concentration tower from the liquid inlet at one side of the concentration tower, after temperature and pressure reduction, part of water vapor is evaporated, the liquid is heated by a thermosiphon reboiler, the generated acidic water vapor comes out from the gas outlet at the top of the concentration tower, the acidic water enters the waste water tank after cooling and condensation by the evaporative condenser, and finally the acidic water is pumped out of the factory by a waste water pump, the partially concentrated calcium chloride at the bottom of the concentration tower is sent into a jet mixer again by a calcium chloride circulating pump set for recycling, and the utilization rate of the calcium chloride is improved.
Drawings
In order to more clearly illustrate the technical solution of the present invention, the drawings required for the embodiment or the prior art description will be briefly introduced below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without inventive efforts.
FIG. 1 is a schematic structural diagram of a hydrochloric acid treatment device in the polysilicon industry according to the present invention;
FIG. 2 is a schematic diagram of the hydrochloric acid feed system of the present invention;
fig. 3 is a schematic structural diagram of the hydrochloric acid desorption system of the present invention;
FIG. 4 is a schematic diagram of the hydrogen chloride drying system of the present invention;
FIG. 5 is a schematic structural diagram of the tail gas scrubbing system of the present invention;
in the figure: 1-hydrochloric acid feeding system, 2-hydrochloric acid desorption system, 3-hydrogen chloride drying system, 4-tail gas washing system, 11-discharge pump, 12-concentrated hydrochloric acid tank, 13-concentrated hydrochloric acid delivery pump, 21-jet mixer, 22-desorption tower, 23-calcium chloride circulating system, 24-hydrogen chloride condensing system, 25-demister, 26-desorption reboiler, 27-first saturated steam pipeline, 28-desorption condensate tank, 31-silicon tetrachloride drying tower, 32-silicon tetrachloride circulating cooler, 33-hydrogen chloride inlet pipeline, 34-silicon tetrachloride solution inlet pipeline, 35-silicon tetrachloride circulating pump set, 36-liquid inlet nozzle, 37-hydrogen chloride outlet pipeline, 38-tail gas pipeline, 39-nitrogen pipeline, 41-water washing tower, 42-water washing circulating cooler, 43-absorption liquid tank, 44-water washing circulating pump, 411-tail gas inlet, 231-calcium chloride storage tank, 232-calcium chloride preparation tank, 233-concentration tower, 234-calcium chloride circulating pump set, 235-concentration extraction tank, 236-second saturated steam pipeline, 237-238-calcium chloride storage tank, 239-primary evaporator condenser and 242-secondary evaporator condenser.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by a person skilled in the art without creative efforts belong to the protection scope of the present invention.
In a specific embodiment of the present invention, as shown in fig. 1-5, a hydrochloric acid treatment apparatus for polysilicon industry includes a hydrochloric acid feeding system 1, a hydrochloric acid resolving system 2, a hydrogen chloride drying system 3 and a tail gas washing system 4 connected by a pipeline; the working process is as follows: outsourcing hydrochloric acid is sent into a plurality of concentrated hydrochloric acid tanks 12 from a tank car through a discharge pump 11, the hydrochloric acid is pressurized through a concentrated hydrochloric acid delivery pump 13 and then sent into a hydrochloric acid analysis system 2, analyzed hydrogen chloride gas is dehydrated through a hydrogen chloride drying system 3 and then sent to a downstream hydrogen chloride pressurization system, and tail gas is processed through a tail gas washing system 4. The utility model discloses can realize the utilization to silicon tetrachloride in the accessory substance, can also obtain 99.9995% high-purity hydrogen chloride gas, reduce investment cost, provide the sound guarantee when back stage polycrystalline silicon production operation to whole device. Wherein, the hydrochloric acid analysis adopts a calcium chloride deep analysis process, and the hydrogen chloride drying adopts a silicon tetrachloride drying process.
Referring to fig. 2, the hydrochloric acid feeding system 1 includes a discharge pump 11 and a plurality of concentrated hydrochloric acid tanks 12 connected by pipes, and a discharge port of each concentrated hydrochloric acid tank 12 is connected to the hydrochloric acid resolving system 2 by a concentrated hydrochloric acid delivery pump 13.
As shown in fig. 3, the hydrochloric acid desorption system 2 comprises a jet mixer 21, a desorption tower 22, a calcium chloride circulation system 23, a hydrogen chloride condensation system 24 and a demister 25, wherein a liquid inlet end on one side of the jet mixer 21 is connected with the concentrated hydrochloric acid delivery pump 13, a liquid inlet end on the bottom of the jet mixer 21 is connected with the calcium chloride circulation system 23, a liquid outlet end on the other side of the jet mixer 21 is connected with the desorption tower 22, a gas outlet on the top of the desorption tower 22 is connected with the hydrogen chloride condensation system 24, the hydrogen chloride condensation system 24 is connected with the demister 25, and a hydrogen chloride gas outlet of the demister 25 is connected with the hydrogen chloride drying system 3; one side of the bottom of the desorption tower 22 is connected with a desorption reboiler 26, a water inlet of the desorption reboiler 26 is connected with a first saturated steam pipeline 27, a water outlet of the desorption reboiler 26 is connected with a desorption condensate tank 28, and a gas inlet of the desorption condensate tank 28 is communicated with the desorption reboiler 26;
the calcium chloride circulating system 23 comprises a calcium chloride storage tank 231, a calcium chloride preparation tank 232 and a concentration tower 233 which are sequentially connected through pipelines, a calcium chloride conveying pump unit 2310 is arranged between the calcium chloride preparation tank 232 and the concentration tower 233, a liquid outlet of the concentration tower 233 is connected with the jet mixer 21 through the calcium chloride circulating pump unit 234, and a liquid inlet on one side of the concentration tower 233 is connected with a liquid outlet on one side of the lower end of the resolution tower 22 through a pipeline; one side of the concentration tower 233 is connected with a concentration reboiler 235, and one side of the concentration reboiler 235 is respectively connected with a second saturated steam pipeline 236 and a flash condensation water tank 237; an air outlet at the top of the concentrating tower 233 is connected with an evaporative condenser 238, and a liquid outlet of the evaporative condenser 238 is connected with a waste water tank 239;
the hydrogen chloride condensing system 24 comprises a first-stage condenser 241 and a second-stage condenser 242, wherein an air inlet of the first-stage condenser 241 is connected with an air outlet of the desorption tower 22, an air outlet of the first-stage condenser 241 is connected with an air inlet of the second-stage condenser 242, an air outlet of the second-stage condenser 242 is connected with an air inlet end of the demister 25, and liquid outlets at the bottoms of the first-stage condenser 241, the second-stage condenser 242 and the demister 25 are communicated with a liquid inlet of the desorption tower 22 through a pipeline.
The working process of the hydrochloric acid analysis system 2 comprises the following steps: the hydrochloric acid is pressurized by a concentrated hydrochloric acid delivery pump 13 and then is delivered into a jet mixer 21 of a hydrochloric acid analysis system 2, is mixed with a calcium chloride solution delivered by a calcium chloride circulating pump group 234 in the jet mixer 21, is pumped into an analysis tower 22 for analysis, is analyzed from the top hydrogen chloride in the analysis tower, moves upwards along the tower, and part of liquid flowing to the tower kettle continuously enters an analysis reboiler 26 for reheating through thermosiphon natural circulation; the hydrogen chloride/water mixed gas obtained by analysis of the analysis tower 22 is evaporated and separated through an analysis reboiler 26 at the bottom of the analysis tower 22, the hydrogen chloride gas is condensed through an analysis condensate tank 28, the condensed hydrogen chloride gas is introduced into the analysis tower 22 again for repeated cycle analysis, the generated acid steam flows upwards along the tower, in the operation process, the hydrogen chloride gas is analyzed from the mixed solution of hydrochloric acid and calcium chloride and is discharged from a gas outlet at the top of the analysis tower 22, the analyzed hydrogen chloride gas contains saturated acid steam, the hydrogen chloride gas is cooled through a primary condenser 241 (refrigerant: circulating cooling water) and a secondary condenser 242 (refrigerant: low-temperature silicon tetrachloride solution), acid mist is separated through a demister 25, the hydrogen chloride gas is sent into a hydrogen chloride drying system 3 after pressure stabilization regulation, wherein liquid outlets at the bottoms of the primary condenser 241, the secondary condenser 242 and the demister 25 are all communicated with a liquid inlet of the analysis tower 22, and the condensed liquid is returned into the analysis tower 22 for analysis treatment;
the diluted calcium chloride solution containing trace hydrogen chloride is obtained at the bottom of the desorption tower 22, enters the middle part of the concentration tower 233 from a liquid inlet at one side of the concentration tower 233, is subjected to temperature reduction and pressure reduction, part of water vapor is evaporated, the liquid is heated by a thermosiphon reboiler, the generated acidic water vapor comes out from a gas outlet at the top of the concentration tower 233, is cooled and condensed by an evaporative condenser 238, the condensed acidic water enters a waste water tank 239 and is finally pumped out of the world by a waste water pump, and the concentrated calcium chloride at the bottom part of the concentration tower 233 is re-fed into the jet mixer 21 by a calcium chloride circulating pump 234 for recycling, so that the utilization rate of the calcium chloride is improved.
As shown in fig. 4, the hydrogen chloride drying system 3 includes a silicon tetrachloride drying tower 31 and a silicon tetrachloride circulation cooler 32, a hydrogen chloride inlet pipe 33 and a silicon tetrachloride solution inlet pipe 34 are sequentially connected to one side of the lower end of the silicon tetrachloride drying tower 31 from top to bottom, a bottom liquid outlet of the silicon tetrachloride drying tower 31 is connected to the silicon tetrachloride circulation cooler 32 through a silicon tetrachloride circulation pump unit 35, the silicon tetrachloride circulation cooler 32 is communicated with an upper liquid inlet nozzle 36 of the silicon tetrachloride drying tower 31, a hydrogen chloride outlet pipe 37 is connected to the top of the silicon tetrachloride drying tower 31, a tail gas pipe 38 is connected to the hydrogen chloride outlet pipe 37, the tail gas pipe 38 is connected to the tail gas inlet pipe 411, and nitrogen pipes 39 with valve controls are connected to the hydrogen chloride inlet pipe 33 and the silicon tetrachloride solution inlet pipe 34.
The working flow of the hydrogen chloride drying system 3 is as follows: the hydrogen chloride gas entering from the hydrogen chloride gas inlet pipeline 33 is in countercurrent contact with the silicon tetrachloride, a small amount of water contained in the hydrogen chloride gas is subjected to chemical reaction with the silicon tetrachloride which flows down in a countercurrent manner to generate hydrogen chloride and silicon dioxide, the hydrogen chloride gas is dried, and the content of the hydrogen chloride gas is increased. The silicon tetrachloride solution cools the hydrogen chloride drying system 3 through the action of the silicon tetrachloride circulating pump unit 35 and the silicon tetrachloride circulating cooler 32, the temperature of the system can be kept to be less than 0 ℃, and the influence of high content of chlorosilane in the product hydrogen chloride on a subsequent compression unit is avoided.
Wherein, nitrogen can be introduced through a nitrogen pipeline 39 with valve control to dredge the hydrogen chloride inlet pipeline 33 and the silicon tetrachloride solution inlet pipeline 34; in addition, nitrogen can be introduced to protect the hydrogen chloride gas, so that the hydrogen chloride gas is prevented from being oxidized, and the final content of the hydrogen chloride is ensured.
As shown in fig. 5, the tail gas washing system 4 includes a washing tower 41 and a washing circulative cooler 42, one side of the upper end of the washing tower 41 is connected with a tail gas inlet duct 411, the tail gas inlet duct 411 is respectively connected with the tail gas outlet of the concentrated hydrochloric acid tank 12 and the tail gas outlet of the demister 25, a liquid inlet on one side of the lower end of the washing tower 41 is connected with an absorption liquid tank 43, a liquid outlet on the other side is connected with the washing circulative cooler 42 through a washing circulating pump 44, and the washing circulative cooler 42 is connected with a liquid inlet on the upper end of the washing tower 41.
The working process of the tail gas washing system 4 is as follows: the tail gas entering the water scrubber 41 is in countercurrent contact with the absorption liquid cooled by the water scrubbing circulation cooler 42, so that the tail gas treatment is realized, and a trace amount of wastewater is sent to the outer pipe network of acidic water.
The utility model discloses an overall work flow specifically does:
outsourcing hydrochloric acid (the concentration is 31%) is conveyed into a plurality of concentrated hydrochloric acid tanks 12 through a discharge pump 11 by a tank car through a hydrochloric acid feeding system 1, the hydrochloric acid is pressurized by a concentrated hydrochloric acid conveying pump 13 and then conveyed into an injection mixer 21 of a hydrochloric acid analysis system 2, the hydrochloric acid and a calcium chloride solution conveyed by a calcium chloride circulating pump group 234 are mixed in the injection mixer 21, then the hydrochloric acid is pumped into an analysis tower 22 for analysis, the analyzed hydrogen chloride containing saturated acid steam sequentially enters a first-stage condenser 241 and a second-stage condenser 242 from an air outlet of the analysis tower 22 for condensation, then the hydrogen chloride gas is demisted by a demister 25 to be conveyed into a hydrogen chloride drying system 3 after pressure stabilization regulation, the hydrogen chloride gas enters the silicon tetrachloride drying tower 31 from a hydrogen chloride inlet pipeline 33 and flows towards the upper end of the tower body and is in countercurrent contact with silicon tetrachloride from a liquid inlet nozzle 36 at the upper end of the silicon tetrachloride drying tower 31, a trace amount of water in the hydrogen chloride gas and the silicon tetrachloride undergo a chemical reaction to generate hydrogen chloride and silicon dioxide, wherein the circulating silicon chloride gas is cooled by a circulating silicon tetrachloride cooler to maintain the temperature of the hydrogen chloride drying system 3 to be less than 0 ℃, the influence of a follow-up compression unit caused by high content in the product hydrogen chloride in the product, and the silicon tetrachloride drying unit is avoided, and the hydrogen chloride drying system, and the hydrogen chloride is conveyed out from the pressurized hydrogen chloride drying tower from a demister 37 after the pressurized hydrogen chloride drying system.
The tail gas pipeline 38 on the hydrogen chloride outlet pipeline 37, the tail gas outlet of the concentrated hydrochloric acid tank 12 and the tail gas outlet of the demister 25 enter the tail gas inlet pipeline 411 of the tail gas washing system 4 to be in countercurrent contact with the absorption liquid, so that the tail gas treatment is realized.
The above disclosure is only a preferred embodiment of the present invention, and certainly should not be taken as limiting the scope of the invention, which is defined by the claims and their equivalents.
Claims (9)
1. The hydrochloric acid treatment device in the polycrystalline silicon industry is characterized by comprising a hydrochloric acid feeding system (1), a hydrochloric acid analysis system (2), a hydrogen chloride drying system (3) and a tail gas washing system (4) which are connected through pipelines;
the hydrochloric acid feeding system (1) comprises a discharging pump (11) and a plurality of concentrated hydrochloric acid tanks (12) which are connected through pipelines, and a discharge port of each concentrated hydrochloric acid tank (12) is connected with the hydrochloric acid resolving system (2) through a concentrated hydrochloric acid conveying pump (13);
the hydrochloric acid analysis system (2) comprises a jet mixer (21), an analysis tower (22), a calcium chloride circulating system (23), a hydrogen chloride condensing system (24) and a demister (25), wherein a liquid inlet end on one side of the jet mixer (21) is connected with the concentrated hydrochloric acid conveying pump (13), a liquid inlet end on the bottom of the jet mixer (21) is connected with the calcium chloride circulating system (23), a liquid outlet end on the other side of the jet mixer is connected with the analysis tower (22), a gas outlet on the top of the analysis tower (22) is connected with the hydrogen chloride condensing system (24), the hydrogen chloride condensing system (24) is connected with the demister (25), and a hydrogen chloride gas outlet of the demister (25) is connected with the hydrogen chloride drying system (3);
tail gas washing system (4) are including washing tower (41) and washing circulative cooler (42), washing tower (41) upper end one side is connected with tail gas inlet line (411), tail gas inlet line (411) respectively with the tail gas export of concentrated hydrochloric acid jar (12) with the tail gas exit linkage of defroster (25), washing tower (41) lower extreme one side inlet is connected with absorption liquid jar (43), the opposite side liquid outlet through washing circulating pump (44) with washing circulative cooler (42) are connected, washing circulative cooler (42) with washing tower (41) upper end inlet is connected.
2. The hydrochloric acid treatment device in the polysilicon industry as claimed in claim 1, wherein the hydrogen chloride drying system (3) comprises a silicon tetrachloride drying tower (31) and a silicon tetrachloride circulation cooler (32), one side of the lower end of the silicon tetrachloride drying tower (31) is sequentially connected with a hydrogen chloride inlet pipe (33) and a silicon tetrachloride solution inlet pipe (34) from top to bottom, a liquid outlet at the bottom of the silicon tetrachloride drying tower (31) is connected with the silicon tetrachloride circulation cooler (32) through a silicon tetrachloride circulation pump set (35), the silicon tetrachloride circulation cooler (32) is communicated with an upper end inlet nozzle (36) of the silicon tetrachloride drying tower (31), the top of the silicon tetrachloride drying tower (31) is connected with a hydrogen chloride outlet pipe (37), the hydrogen chloride outlet pipe (37) is connected with a tail gas pipe (38), and the tail gas pipe (38) is connected with the tail gas inlet pipe (411).
3. The polycrystalline silicon industry hydrochloric acid treatment device as claimed in claim 1, wherein the calcium chloride circulation system (23) comprises a calcium chloride storage tank (231), a calcium chloride preparation tank (232) and a concentration tower (233) which are connected in sequence through pipelines, the liquid outlet of the concentration tower (233) is connected with the jet mixer (21) through a calcium chloride circulation pump group (234), and a liquid inlet on one side of the concentration tower (233) is connected with a liquid outlet on one side of the lower end of the desorption tower (22) through a pipeline.
4. The polycrystalline silicon industry hydrochloric acid treatment device according to claim 1, wherein the hydrogen chloride condensation system (24) comprises a first-stage condenser (241) and a second-stage condenser (242), the air inlet of the first-stage condenser (241) is connected with the air outlet of the desorption tower (22), the air outlet of the first-stage condenser (241) is connected with the air inlet of the second-stage condenser (242), the air outlet of the second-stage condenser (242) is connected with the air inlet end of the demister (25), and the bottom liquid outlets of the first-stage condenser (241), the second-stage condenser (242) and the demister (25) are all communicated with the liquid inlet of the desorption tower (22) through pipelines.
5. The polycrystalline silicon industry hydrochloric acid treatment device according to claim 1, characterized in that one side of the bottom of the desorption tower (22) is connected with a desorption reboiler (26), a first saturated steam pipeline (27) is connected with a water inlet of the desorption reboiler (26), a desorption condensed water tank (28) is connected with a water outlet of the desorption reboiler (26), and a gas inlet of the desorption condensed water tank (28) is communicated with the desorption reboiler (26).
6. The polycrystalline silicon industry hydrochloric acid treatment device according to claim 3, characterized in that one side of the concentration tower (233) is connected with a concentration reboiler (235), and one side of the concentration reboiler (235) is connected with a second saturated steam pipeline (236) and a flash condensate tank (237), respectively.
7. The polycrystalline silicon industry hydrochloric acid treatment device as claimed in claim 3, characterized in that an evaporation condenser (238) is connected to the top gas outlet of the concentration tower (233), and a waste water tank (239) is connected to the liquid outlet of the evaporation condenser (238).
8. The hydrochloric acid treatment device in the polysilicon industry as claimed in claim 2, wherein the hydrogen chloride inlet pipe (33) and the silicon tetrachloride solution inlet pipe (34) are both connected with a nitrogen pipe (39) with a valve control.
9. The polycrystalline silicon industry hydrochloric acid treatment device as claimed in claim 2, characterized in that a calcium chloride delivery pump group (2310) is arranged between the calcium chloride preparation tank (232) and the concentration tower (233).
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| CN202222082209.XU CN217794593U (en) | 2022-08-09 | 2022-08-09 | Polycrystalline silicon trade hydrochloric acid processing apparatus |
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