CN217787481U - Clear large aperture monitoring camera of superelevation - Google Patents
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- CN217787481U CN217787481U CN202221354572.6U CN202221354572U CN217787481U CN 217787481 U CN217787481 U CN 217787481U CN 202221354572 U CN202221354572 U CN 202221354572U CN 217787481 U CN217787481 U CN 217787481U
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Abstract
The utility model relates to an ultra-high definition large-aperture monitoring lens, which comprises a first lens, a second lens, a diaphragm, a third lens, a fourth lens and a fifth lens which are arranged along a light incident light path from left to right in sequence; the first lens is a negative meniscus lens, the second lens is a positive meniscus lens, the third lens is a double convex positive lens, the fourth lens is a double concave negative lens, and the fifth lens is a double convex positive lens. The multi-chip aspheric surface design is adopted, the imaging quality is excellent, the imaging target surface is more than phi 6.6mm, and the high-definition camera can be used for high-definition camera shooting of pixels of 4K and above; the adopted F number is smaller, the peripheral illumination ratio is more than 65%, and the image surface illumination is sufficient and uniform; the material matching is reasonable, and the focus temperature drift is extremely low within the temperature range of-40 ℃ to 105 ℃.
Description
Technical Field
The utility model relates to a clear large aperture monitoring camera of superelevation.
Background
In order to ensure the imaging quality and the imaging stability, the security lens is usually designed by full glass, so that the system structure is complicated and the weight is high. The continuous push of new optical materials provides possibility for system architecture breakthrough of related lenses, and a hot tide of high-definition monitoring lenses which seek a simple structure emerges on the market.
SUMMERY OF THE UTILITY MODEL
In view of the deficiencies of the prior art, the utility model aims to solve the technical problem that a clear large aperture monitoring camera lens of superelevation is provided.
In order to solve the technical problem, the technical scheme of the utility model is that: an ultra-high definition large-aperture monitoring lens comprises a first lens, a second lens, a diaphragm, a third lens, a fourth lens and a fifth lens which are sequentially arranged along a light incident path from left to right; the first lens is a negative meniscus lens, the second lens is a positive meniscus lens, the third lens is a double convex positive lens, the fourth lens is a double concave negative lens, and the fifth lens is a double convex positive lens.
Preferably, the focal length of the optical system is set to f, and the focal lengths of the first lens, the second lens, the third lens, the fourth lens, and the fifth lens are set to f 1 、f 2 、f 3 、f 4 、f 5 Wherein the following ratio with f is satisfied: -2.5<f 1 /f<-1.5,4.0<f 2 /f<7.0,0.9<f 3 /f<2.1,-1.5<f 4 /f<-0.1,5.0<f 5 /f<6.5。
Preferably, the first lens satisfies the relation: n is a radical of d ≥1.5,V d Not less than 50.0; the second lens satisfies the relation: n is a radical of hydrogen d ≥1.5,V d Less than or equal to 50.0; the third lens satisfies the relation: n is a radical of hydrogen d ≥1.5,V d Not less than 50.0; the fourth lens satisfies the relation: n is a radical of d ≥1.5,V d Less than or equal to 50.0; the fifth lens satisfies the relation: n is a radical of hydrogen d ≥1.5,V d Not less than 50.0; wherein N is d Is refractive index, V d Abbe constant.
Preferably, the F-number of the optical system is less than or equal to 1.60.
Compared with the prior art, the utility model discloses following beneficial effect has: the design of multiple aspheric surfaces is adopted, the imaging quality is excellent, the imaging target surface is more than phi 6.6mm, and the imaging device can be used for high-definition camera shooting of pixels of 4K and above; the adopted F number is smaller, the peripheral illumination ratio is more than 65%, and the image surface illumination is sufficient and uniform; the material matching is reasonable, and the focus temperature drift is extremely low in a temperature range of-40 ℃ to 105 ℃.
The present invention will be described in further detail with reference to the accompanying drawings and specific embodiments.
Drawings
Fig. 1 is a schematic view of an optical structure according to a first embodiment of the present invention;
fig. 2 is an axial chromatic aberration diagram of an operating band according to a first embodiment of the present invention;
fig. 3 is a vertical axis chromatic aberration diagram of an operating waveband according to a first embodiment of the present invention;
fig. 4 is a field curvature distortion diagram of the working band according to the first embodiment of the present invention;
fig. 5 is a schematic view of an optical structure according to a second embodiment of the present invention;
fig. 6 is an axial chromatic aberration diagram of the operating band according to the second embodiment of the present invention;
fig. 7 is a vertical axis chromatic aberration diagram of the working wavelength band according to the second embodiment of the present invention;
fig. 8 is a field curvature distortion diagram of the working band of the second embodiment of the present invention;
in the figure: l1-a first lens; l2-a second lens; l3-a third lens; l4-fourth lens; l5-a fifth lens; an L6-glass plate; STO-stop; IMA-imaging plane.
Detailed Description
The present invention will be further explained with reference to the drawings and the embodiments.
It should be noted that the following detailed description is exemplary and is intended to provide further explanation of the disclosure. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs.
It is noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of example embodiments according to the present application. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, and it should be understood that when the terms "comprises" and/or "comprising" are used in this specification, they specify the presence of stated features, steps, operations, devices, components, and/or combinations thereof, unless the context clearly indicates otherwise.
As shown in fig. 1 to 8, the present embodiment provides an ultra-high definition large-aperture monitoring lens, which includes a first lens, a second lens, a diaphragm, a third lens, a fourth lens, and a fifth lens, which are sequentially disposed along a light incident path from left to right; the first lens is a negative meniscus lens, the second lens is a positive meniscus lens, the third lens is a double convex positive lens, the fourth lens is a double concave negative lens, and the fifth lens is a double convex positive lens.
In an embodiment of the present invention, the focal length of the optical system is set to be f, and the focal lengths of the first lens, the second lens, the third lens, the fourth lens and the fifth lens are respectively f 1 、f 2 、f 3 、f 4 、f 5 Wherein the following ratio with f is satisfied: -2.5<f 1 /f<-1.5,4.0<f 2 /f<7.0,0.9<f 3 /f<2.1,-1.5<f 4 /f<-0.1,5.0<f 5 /f<6.5。
In an embodiment of the present invention, the first lens satisfies the following relation: n is a radical of d ≥1.5,V d Not less than 50.0; the second lens satisfies the relation: n is a radical of d ≥1.5,V d Less than or equal to 50.0; the third lens satisfies the relation: n is a radical of d ≥1.5,V d Not less than 50.0; the fourth lens satisfies the relation: n is a radical of d ≥1.5,V d Less than or equal to 50.0; the fifth lens satisfies the relation: n is a radical of hydrogen d ≥1.5,V d Not less than 50.0; wherein N is d Is refractive index, V d Abbe constant.
The embodiment of the present invention provides an aspheric lens, which comprises a first lens, a second lens, a third lens and a fourth lens, wherein the aspheric curve equation expression is:
wherein Z is the distance from the vertex of the aspheric surface to the aspheric surface when the aspheric surface is at the position with the height of h along the optical axis direction; c is the paraxial curvature of the aspheric surface; k is a conic constant; alpha (alpha) ("alpha") 1 、α 2 、α 3 、α 4 、α 5 、α 6 、α 7 、α 8 Are all high-order term coefficients.
In the embodiment of the present invention, the total optical length TTL of the optical system and the focal length f of the optical system satisfy: TTL/f is less than or equal to 5.62.
In the embodiment of the present invention, the F number of the optical system is less than or equal to 1.60.
In the embodiment of the present invention, the half-image height ImaH of the optical system and the focal length f of the optical system satisfy: imaH/f is more than or equal to 0.82.
An imaging method of an ultra-high-definition large-aperture monitoring lens is carried out according to the following steps: the light rays sequentially pass through the first lens, the second lens, the diaphragm, the third lens, the fourth lens and the fifth lens from left to right to form an image.
The specific implementation process comprises the following steps:
the first embodiment is as follows: the technical indexes of the optical system of the embodiment are as follows:
(1) Focal length: EFFL is more than or equal to 3.7mm and less than or equal to 4.5mm; (2) the aperture F is less than or equal to 1.60; (3) working wave band: visible light.
In order to realize the above design parameters, the specific design adopted by the optical system of this embodiment is as follows:
the aspherical surface coefficients of the aspherical lenses of the optical system of the present embodiment are as follows:
the second embodiment: the technical indexes of the optical system of the embodiment are as follows:
(1) Focal length: EFFL is more than or equal to 3.7mm and less than or equal to 4.5mm; (2) the aperture F is less than or equal to 1.60; (3) working wave band: visible light.
To realize the above design parameters, the specific design adopted by the optical system of this embodiment is as follows:
the aspherical coefficients of the aspherical lenses of the optical system of the present embodiment are as follows:
while the invention has been described with reference to a preferred embodiment, it will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention. However, any simple modification, equivalent change and modification made to the above embodiments according to the technical substance of the present invention still belong to the protection scope of the technical solution of the present invention.
Claims (4)
1. The utility model provides a clear large aperture monitoring lens of superelevation which characterized in that: the device comprises a first lens, a second lens, a diaphragm, a third lens, a fourth lens and a fifth lens which are sequentially arranged from left to right along a light incident path; the first lens is a negative meniscus lens, the second lens is a positive meniscus lens, the third lens is a double convex positive lens, the fourth lens is a double concave negative lens, and the fifth lens is a double convex positive lens.
2. The ultra-high definition large-aperture monitoring lens according to claim 1, characterized in that: setting the focal length of the optical system as f, and the focal lengths of the first lens, the second lens, the third lens, the fourth lens and the fifth lens as f 1 、f 2 、f 3 、f 4 、f 5 Wherein the following ratio with f is satisfied: -2.5<f 1 /f<-1.5,4.0<f 2 /f<7.0,0.9<f 3 /f<2.1,-1.5<f 4 /f<-0.1,5.0<f 5 /f<6.5。
3. The ultra-high definition large-aperture monitoring lens according to claim 1, characterized in that: the first lens satisfies the relation: n is a radical of d ≥1.5,V d Not less than 50.0; the second lens satisfies the relation: n is a radical of d ≥1.5,V d Less than or equal to 50.0; the third lens satisfies the relation: n is a radical of d ≥1.5,V d Not less than 50.0; the fourth lens satisfies the relation: n is a radical of d ≥1.5,V d Less than or equal to 50.0; the fifth lens satisfies the relation: n is a radical of d ≥1.5,V d Not less than 50.0; wherein N is d Is refractive index, V d Abbe constant.
4. The ultra-high definition large-aperture monitoring lens according to claim 1, characterized in that: the F number of the optical system is less than or equal to 1.60.
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CN115268015A (en) * | 2022-06-01 | 2022-11-01 | 福建福光天瞳光学有限公司 | Ultrahigh-definition large-aperture monitoring lens and imaging method thereof |
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