CN217733295U - Copper washing cylinder and polar plate washing assembly for electrolytic treatment of acidic etching solution - Google Patents
Copper washing cylinder and polar plate washing assembly for electrolytic treatment of acidic etching solution Download PDFInfo
- Publication number
- CN217733295U CN217733295U CN202220747575.XU CN202220747575U CN217733295U CN 217733295 U CN217733295 U CN 217733295U CN 202220747575 U CN202220747575 U CN 202220747575U CN 217733295 U CN217733295 U CN 217733295U
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- CN
- China
- Prior art keywords
- etching solution
- electrolytic treatment
- polar plate
- copper
- cylinder body
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- 238000005530 etching Methods 0.000 title claims abstract description 44
- 238000005406 washing Methods 0.000 title claims abstract description 44
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 43
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 43
- 239000010949 copper Substances 0.000 title claims abstract description 43
- 230000002378 acidificating effect Effects 0.000 title claims description 18
- 239000002253 acid Substances 0.000 claims abstract description 20
- 238000004140 cleaning Methods 0.000 claims abstract description 16
- 230000003014 reinforcing effect Effects 0.000 claims description 13
- 238000005868 electrolysis reaction Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 abstract description 6
- 239000000243 solution Substances 0.000 description 28
- 238000010586 diagram Methods 0.000 description 7
- 239000002699 waste material Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000011550 stock solution Substances 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- Electrolytic Production Of Metals (AREA)
Abstract
The utility model discloses an acid etching solution electrolytic treatment is with washing copper jar, cylinder body open-top, bearing structure are located the cylinder body bottom and are used for supporting the polar plate, and location structure is located the opening edge is equipped with two sets of constant head tanks on the location structure, two sets of constant head tanks that go up are located bearing structure both ends and mutual disposition respectively. Through the acid etching solution electrolytic treatment of above-mentioned optimal design with washing copper jar, through cylinder body opening edge constant head tank, and the design of the inside bearing structure of cylinder body for the polar plate is evenly spaced in washing the copper jar and is arranged, is convenient for unify the washing to it, and can not cause secondary damage to the polar plate in the cleaning process. The utility model discloses still provide an acid etching solution is polar plate cleaning assembly for electrolytic treatment.
Description
Technical Field
The utility model relates to an acid etching solution electrolysis technical field especially relates to an acid etching solution electrolysis is handled with washing copper jar and polar plate and washs subassembly.
Background
In the production process of Printed Circuit Boards (PCB), an etching process is required, a large amount of etching solution stock solution is required in the etching process, and a large amount of etching solution waste liquid is generated at the same time. The main components of the common acidic etching solution stock solution are copper chloride, concentrated hydrochloric acid, hydrogen peroxide, water and other components. In the waste etching solution generated after PCB etching, CU + H can be known according to the chemical formula 2 0 2 +2HCL＝CUCl 2 +2H 2 O, which contains a large amount of copper with higher economic value. In the process of recovering copper, other impurities can be introduced, and the waste liquid after copper separation needs to be subjected to subsequent treatment so as to avoid environmental pollution. After the electrolysis, the plate to which copper is attached needs to be treated. In order to ensure the recovery rate of copper, the polar plate needs to be cleaned in advance, the manual cleaning is time-consuming and labor-consuming, and the polar plate is easily subjected to secondary damage to influence the subsequent electrolytic use.
SUMMERY OF THE UTILITY MODEL
In order to solve the technical problem existing in the background technology, the utility model provides a copper washing cylinder and polar plate washing assembly for the electrolytic treatment of acidic etching solution.
The utility model provides a pair of acid etching solution electrolysis is handled with washing copper jar, include: the device comprises a cylinder body, a positioning structure and a supporting structure;
the cylinder body open-top, bearing structure are located the cylinder body bottom and are used for supporting the polar plate, and location structure is located the opening edge is equipped with two sets of constant head tanks of going up on, two sets of constant head tanks of going up are located bearing structure both ends and mutual disposition respectively.
Preferably, the outer wall of the cylinder body is provided with an upper reinforcing structure extending around the periphery of the opening, and the top of the upper reinforcing structure is provided with a supporting part.
Preferably, the cylinder outer wall is provided with a middle reinforcing structure, and the middle reinforcing structure extends around the middle of the cylinder to form an annular structure.
Preferably, the width of the upper positioning groove is gradually reduced from top to bottom.
Preferably, the top of the supporting structure is provided with a lower positioning groove for positioning the lower end of the polar plate, and the width of the lower positioning groove is gradually reduced from top to bottom.
The utility model discloses in, acid etching solution electrolytic treatment who provides is with washing copper jar, cylinder body open-top, bearing structure are located the cylinder body bottom and are used for supporting the polar plate, and location structure is located the opening edge is equipped with two sets of constant head tanks on the location structure, two sets of constant head tanks that go up are located bearing structure both ends and mutual disposition respectively. Through the acid etching solution electrolytic treatment of above-mentioned optimal design with washing copper jar, through cylinder body opening edge constant head tank, and the design of the inside bearing structure of cylinder body for the polar plate is evenly spaced in washing the copper jar and is arranged, is convenient for unify the washing to it, and can not cause secondary damage to the polar plate in the cleaning process.
The utility model discloses still provide an acid etching solution is polar plate cleaning assembly for electrolytic treatment, including foretell acid etching solution electrolytic treatment with washing the copper jar.
Preferably, the pole plate unit further comprises a plurality of pole plates which are sequentially arranged at ordinary times, the upper end of each pole plate is connected with a current conducting plate, two supporting arms extending out of the end part of each pole plate are arranged at two ends of each current conducting plate, and the two supporting arms are respectively matched with the two opposite upper positioning grooves.
Preferably, the pole plate unit further comprises a conductive bar, and one end of the pole plate, which is close to the conductive bar, is provided with a tab and is electrically connected with the conductive bar through the tab.
Preferably, one end of the conductive plate is provided with a supporting arm extending from the end of the pole plate, and the conductive bar is positioned below the supporting arm.
The utility model discloses in, the acid etching solution is polar plate for electrolytic treatment washs the subassembly, washes copper tank complex polar plate through design and the aforesaid, makes it place fast fixedly in washing the copper tank, the quick washing of electrolyte on the polar plate of being convenient for.
Drawings
FIG. 1 is a schematic structural diagram of an embodiment of a copper washing tank for the electrolytic treatment of acidic etching solution according to the present invention.
FIG. 2 is a schematic view of a partial structure of an embodiment of a copper washing tank for electrolytic treatment of acidic etching solution according to the present invention.
Fig. 3 is a schematic structural diagram of a plate unit in an embodiment of the plate cleaning assembly for the electrolytic treatment of acidic etching solution according to the present invention.
Fig. 4 is a schematic diagram of a structure of a pole plate unit and a copper washing cylinder in an embodiment of the pole plate cleaning assembly for the electrolytic treatment of the acidic etching solution of the present invention.
Detailed Description
As shown in fig. 1 to 4, fig. 1 is the utility model provides an acid etching solution electrolytic treatment is with washing the structural schematic diagram of an embodiment of copper jar, fig. 2 is the utility model provides an acid etching solution electrolytic treatment is with washing the local structural schematic diagram of an embodiment of copper jar, fig. 3 is the utility model provides an acid etching solution electrolytic treatment is with the structural schematic diagram of the polar plate unit in an embodiment of polar plate cleaning assembly, fig. 4 is the utility model provides an acid etching solution electrolytic treatment is with polar plate cleaning assembly's an embodiment with polar plate unit and washing copper jar cooperation structural schematic diagram.
Referring to fig. 1 and 2, the utility model provides an acid etching solution electrolysis is handled with washing copper jar, includes: cylinder 200, positioning structure 220 and support structure 210;
In order to describe the specific use mode of the copper washing cylinder in the embodiment in detail, referring to fig. 3 and 4, the embodiment also provides an electrode plate cleaning assembly for the electrolytic treatment of the acidic etching solution, which comprises the copper washing cylinder for the electrolytic treatment of the acidic etching solution. Specifically, still include 8 units of polar plate, 8 units of polar plate are including a plurality of polar plates 8 that arrange at ordinary times in proper order, and every 8 upper ends of polar plate are connected with current conducting plate 9, and current conducting plate 9 both ends are equipped with two support arms that stretch out from 8 tip of polar plate, and two support arms cooperate with relative two last constant head tank respectively.
During the washing, place the polar plate after the electrolysis in proper order in washing the copper tank for the support arm at polar plate both ends respectively with relative a set of constant head tank correspondence arrange, the polar plate lower extreme supports on bearing structure, makes the polar plate interval one by one set up in washing the copper jar, then washs the polar plate in washing the copper jar. By the group design of the polar plates, a plurality of polar plates can be taken out of the electrolytic bath and arranged in the copper washing cylinder conveniently.
In this embodiment, the acid etching solution electrolytic treatment who provides is with washing copper jar, cylinder body open-top, and bearing structure is located the cylinder body bottom and is used for supporting the polar plate, and location structure is located the opening edge is equipped with two sets of constant head tanks on the location structure, two sets of constant head tanks are located bearing structure both ends and relative arrangement respectively on. Through the acid etching solution electrolytic treatment of above-mentioned optimal design with washing copper jar, through cylinder body opening edge constant head tank, and the design of the inside bearing structure of cylinder body for the polar plate is evenly spaced in washing the copper jar and is arranged, is convenient for unify the washing to it, and can not cause secondary damage to the polar plate in the cleaning process.
In order to facilitate the electrical connection of the plate unit formed by a plurality of plates, in a specific embodiment, the plate unit further includes a conductive bar 110, and one end of the plate 8 close to the conductive bar 110 is provided with a tab 91 and is electrically connected to the conductive bar 110 through the tab 91.
Further, one end of the conductive plate 9 is provided with a support arm extending from the end of the pole plate 8, and the conductive bar 110 is positioned below the support arm.
Correspondingly, the outer wall of the cylinder body 200 is provided with an upper reinforcing structure 240 extending around the periphery of the opening, the top of the upper reinforcing structure 240 is provided with a supporting part, the polar plates are placed in the copper washing cylinder, and the conductive bars are positioned outside the cylinder body and supported on the supporting part of the upper reinforcing structure.
In other embodiments of the copper washing cylinder, the outer wall of the cylinder body 200 is provided with a middle reinforcing structure 230, and the middle reinforcing structure 230 extends around the middle of the cylinder body 200 to form an annular structure, so as to enhance the load-bearing strength of the side wall of the cylinder body.
In order to facilitate the placement of the polar plate, the width of the upper positioning groove is gradually reduced from top to bottom. Similarly, the top of the supporting structure 210 is provided with a lower positioning groove for positioning the lower end of the pole plate 8, and the width of the lower positioning groove is gradually reduced from top to bottom.
The above, only be the embodiment of the preferred of the present invention, but the protection scope of the present invention is not limited thereto, and any person skilled in the art is in the technical scope of the present invention, according to the technical solution of the present invention and the utility model, which are designed to be replaced or changed equally, all should be covered within the protection scope of the present invention.
Claims (9)
1. A copper washing cylinder for electrolytic treatment of acidic etching solution is characterized by comprising: a cylinder (200), a positioning structure (220) and a support structure (210);
cylinder body (200) open-top, bearing structure (210) are located cylinder body (200) bottom and are used for supporting polar plate (8), and location structure (220) are located the opening edge is equipped with two sets of constant head tanks on location structure (220), the constant head tank is located bearing structure (210) both ends and relative arrangement respectively on two sets of.
2. The copper washing cylinder for the electrolytic treatment of acidic etching solution according to claim 1, characterized in that the outer wall of the cylinder body (200) is provided with an upper reinforcing structure (240) extending around the periphery of the opening, and the top of the upper reinforcing structure (240) is provided with a support.
3. The copper washing cylinder for the electrolytic treatment of acidic etching solution according to claim 1, characterized in that the outer wall of the cylinder body (200) is provided with a middle reinforcing structure (230), and the middle reinforcing structure (230) extends around the middle part of the cylinder body (200) to form an annular structure.
4. The copper washing cylinder for electrolytic treatment of acidic etching solution according to claim 1, wherein the width of the upper positioning groove is gradually reduced from top to bottom.
5. The copper washing tank for the electrolytic treatment of acidic etching solution according to claim 1, wherein the top of the supporting structure (210) is provided with a lower positioning groove for positioning the lower end of the polar plate (8), and the width of the lower positioning groove is gradually reduced from top to bottom.
6. An acid etching solution electrolysis treatment electrode plate cleaning assembly, which is characterized by comprising the acid etching solution electrolysis treatment copper cleaning cylinder according to any one of claims 1 to 5.
7. The cleaning assembly for the polar plate (8) for the electrolytic treatment of the acidic etching solution according to claim 6, further comprising a polar plate unit, wherein the polar plate unit comprises a plurality of polar plates (8) which are sequentially arranged at ordinary times, a conductive plate (9) is connected to the upper end of each polar plate (8), two supporting arms extending from the end part of each polar plate (8) are arranged at two ends of each conductive plate (9), and the two supporting arms are respectively matched with the two opposite upper positioning grooves.
8. The electrode plate cleaning assembly for the electrolytic treatment of acidic etching solution according to claim 6, wherein the electrode plate unit further comprises a conductive bar (110), and one end of the electrode plate (8) close to the conductive bar (110) is provided with a tab (91) and electrically connected with the conductive bar (110) through the tab (91).
9. The cleaning assembly for electrode plates for the electrolytic treatment of acidic etching solutions according to claim 8, wherein the conductive plate (9) is provided at one end with a support arm extending from the end of the electrode plate (8), and the conductive bar (110) is located below the support arm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220747575.XU CN217733295U (en) | 2022-04-01 | 2022-04-01 | Copper washing cylinder and polar plate washing assembly for electrolytic treatment of acidic etching solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220747575.XU CN217733295U (en) | 2022-04-01 | 2022-04-01 | Copper washing cylinder and polar plate washing assembly for electrolytic treatment of acidic etching solution |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217733295U true CN217733295U (en) | 2022-11-04 |
Family
ID=83815075
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202220747575.XU Active CN217733295U (en) | 2022-04-01 | 2022-04-01 | Copper washing cylinder and polar plate washing assembly for electrolytic treatment of acidic etching solution |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN217733295U (en) |
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2022
- 2022-04-01 CN CN202220747575.XU patent/CN217733295U/en active Active
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| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of utility model: A copper washing cylinder and electrode cleaning component for acidic etching solution electrolytic treatment Granted publication date: 20221104 Pledgee: Lu'an yuan financing Company limited by guarantee Pledgor: Anhui Zhongke rantu Environmental Protection Technology Co.,Ltd. Registration number: Y2024980018596 |