CN217632953U

CN217632953U - Chemical process pump capable of preventing inner wall deposition

Info

Publication number: CN217632953U
Application number: CN202220368400.8U
Authority: CN
Inventors: 李国�; 周乃明; 蔡银桂; 沙达顺
Original assignee: Jiangsu Deerjia Machinery Manufacture Co ltd
Current assignee: Jiangsu Deerjia Machinery Manufacture Co ltd
Priority date: 2022-02-23
Filing date: 2022-02-23
Publication date: 2022-10-21
Anticipated expiration: 2032-02-23

Abstract

The utility model relates to a process pump technical field specifically is a prevent inner wall deposit chemical industry process pump, including the bottom plate, the last surface mounting of bottom plate has pump machine casing, and pump machine casing's right-hand member opening part is connected with the coupling mechanism who prevents blockking up, and pump machine casing's inside is provided with the impeller master, and the center department of impeller master is connected with the center pin, and the impeller master is provided with the blade on the surface, and the surface of impeller master is provided with the wiper mechanism that can get rid of the inner wall deposit. The utility model provides a prevent inner wall deposit chemical industry process pump, at equipment during operation, because of being provided with the coupling mechanism who prevents blockking up, the material gets into from the right-hand member of connecting pipe, and the material is filtered by the filter plate, and bulky solid impurity is blockked off, avoids impurity entering equipment inside, gathers up a certain amount of back when solid impurity on the filter plate, and the flexible post of control is flexible for the cleaning plate reciprocates the surface of cleaning the filter plate, avoids the filter plate to be blockked up.

Description

Chemical process pump capable of preventing inner wall deposition

Technical Field

The utility model relates to a process pump technical field specifically is a prevent inner wall deposit chemical industry process pump.

Background

The chemical process pump is a general name of various pumps in the chemical production process, is suitable for conveying neutral or corrosive, clean or low-temperature or high-temperature liquid media containing solid particles, is a liquid conveying device commonly used in the chemical industry, can convey inorganic acid and organic acid solutions such as sulfuric acid, nitric acid, hydrochloric acid, phosphoric acid and the like at various temperatures and concentrations, and can also be used for conveying slurry, waste liquid and the like with high concentration.

However, the existing chemical process pump still has certain problems in the using process; for example in transportation process, probably contain bulky solid impurity etc. in the material of carrying, these solid impurity get into inside the damage impeller of equipment or cause the jam, and when carrying comparatively viscous material, the material can remain on pump body casing's inner wall, after work, the inside difficult washing of equipment, long-time deposit and accumulation after these residual material are dry can make the inner wall thickening, influence equipment and use.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a prevent inner wall deposit chemical industry process pump to solve the problem that proposes in the above-mentioned background art.

In order to achieve the above purpose, the utility model provides a following technical scheme: the utility model provides a prevent inner wall deposit chemical industry process pump, including the bottom plate, the last surface mounting of bottom plate has pump machine casing, the right-hand member opening part of pump machine casing is connected with the coupling mechanism who prevents blockking up, the inside of pump machine casing is provided with the impeller owner dish, the center department of impeller owner dish is connected with the center pin, the impeller owner dish be provided with the blade on the surface, the surface of impeller owner dish is provided with can get rid of the sedimentary wiper mechanism of inner wall.

Preferably, the connecting mechanism comprises a connecting pipe, a filter cavity is arranged in the connecting pipe, and an opening and closing sealing cover is arranged below the filter cavity.

Preferably, the filter chamber internally mounted has the filter plate, install flexible post on the connecting pipe, the bottom of flexible post runs through the inside of pegging graft at the filter chamber, and the end connection of flexible post has the cleaning board, is provided with the brush on the cleaning board, and the brush laminating is on the surface of filter plate.

Preferably, the impeller main disc and the central shaft are of a hollow structure, and the impeller main disc is communicated with the inside of the central shaft.

Preferably, the cleaning mechanism comprises a stand column, the stand column is of a hollow tubular structure, the stand column is rotatably installed on the side wall of the impeller main disc, first spray heads are installed on the side wall and the end portion of the stand column, and the first spray heads on the side wall of the stand column are installed in an inclined mode.

Preferably, the cleaning mechanism further comprises second spray heads, and the second spray heads are uniformly distributed on the other side wall of the impeller main disc.

Preferably, a group of sealing bearings are installed on the side wall of the left end of the central shaft, sealing enclosing plates are installed on the sealing bearings, a high-pressure water pump is installed on the upper surface of the bottom plate, and a water delivery pipe is connected between the high-pressure water pump and the sealing enclosing plates.

Compared with the prior art, the beneficial effects of the utility model are that:

1. the utility model provides a prevent inner wall deposit chemical industry process pump, when equipment work, because of being provided with the coupling mechanism who prevents blockking up, the material gets into from the right-hand member of connecting pipe, and the material is filtered by the filter plate, and bulky solid impurity is stopped off, avoids impurity to get into inside the equipment, after solid impurity accumulates a certain amount on the filter plate, controls flexible post and stretches out and draws back, makes the cleaning plate reciprocate and cleans the surface of filter plate, avoids the filter plate to be blockked up;

2. after equipment transported substance material ends, need wash the equipment inside, can get rid of the sedimentary wiper mechanism of inner wall because of being provided with, high pressure water pump passes through the inside of water delivery pipe conveying feed center pin with the washing liquid, then the washing liquid enters into the inside of impeller owner dish, the washing liquid is washd the equipment inside from first shower nozzle and second shower nozzle blowout, the first shower nozzle slope installation on the stand lateral wall, the stand takes place to rotate under the recoil effect, the washing liquid evenly spouts on to the inner wall of pump machine casing and the blade, improve the cleaning performance, prevent a large amount of material deposits.

Drawings

FIG. 1 is a schematic view of the structure of the device of the present invention;

FIG. 2 is a structural diagram of the main impeller disc of the present invention;

FIG. 3 is a connection diagram of the column of the present invention;

fig. 4 is an enlarged view of a portion a in fig. 1.

In the figure: the device comprises a bottom plate 1, a pump shell 2, a connecting pipe 3, a filter cavity 4, a filter plate 5, a telescopic column 6, a cleaning plate 601, an impeller main disc 7, a central shaft 8, blades 9, a vertical column 10, a first spray head 11, a second spray head 12, a sealing bearing 13, a sealing coaming plate 14, a high-pressure water pump 15 and a water delivery pipe 16.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts all belong to the protection scope of the present invention.

Referring to fig. 1 to 4, the present invention provides a technical solution: the utility model provides a prevent inner wall deposit chemical industry process pump, including bottom plate 1, the last surface mounting of bottom plate 1 has pump machine casing 2, and the right-hand member opening part of pump machine casing 2 is connected with prevents the coupling mechanism of jam, and coupling mechanism is including connecting pipe 3, and the inside of connecting pipe 3 is provided with filter chamber 4, and the internally mounted of filter chamber 4 has filter plate 5, install flexible post 6 on the connecting pipe 3, the bottom of flexible post 6 runs through the inside of pegging graft at filter chamber 4, and the end connection of flexible post 6 has cleaning board 601, is provided with the brush on the cleaning board 601, and the brush laminating is on the surface of filter plate 5, and the material is filtered by filter plate 5, and bulky solid impurity is blockked off, avoids inside the impurity entering equipment, after solid impurity accumulates a certain amount on filter plate 5, controls flexible post 6 and stretches out and draws back for cleaning board 601 reciprocates and cleans the surface of filter plate 5, avoids filter plate 5 to be blockked up. An opening and closing cover is arranged below the filter cavity 4 and is opened, so that impurities accumulated in the filter cavity 4 can be taken out conveniently.

An impeller main disc 7 is arranged in the pump shell 2, a central shaft 8 is connected to the center of the impeller main disc 7, the impeller main disc 7 and the central shaft 8 are of a hollow structure, the impeller main disc 7 is communicated with the inside of the central shaft 8, blades 9 are arranged on the surface of the impeller main disc 7, and a cleaning mechanism capable of removing inner wall deposition is arranged on the surface of the impeller main disc 7. The cleaning mechanism comprises a stand column 10, the stand column 10 is of a hollow tubular structure, the stand column 10 is rotatably installed on the side wall of the impeller main disc 7, first spray nozzles 11 are installed on the side wall and the end portion of the stand column 10, and the first spray nozzles 11 on the side wall of the stand column 10 are installed in an inclined mode. The cleaning mechanism further comprises a second spray head 12, the second spray heads 12 are evenly distributed on the other side wall of the impeller main disc 7, one-way valves are arranged inside the first spray head 11 and the second spray head 12, materials can be prevented from entering the inside during material conveying, the left end of the central shaft 8 is connected with an output shaft, a group of sealing bearings 13 are arranged on the side wall of the left end of the central shaft 8, sealing enclosing plates 14 are arranged on the sealing bearings 13, a high-pressure water pump 15 is arranged on the upper surface of the bottom plate 1, the high-pressure water pump 15 is connected with a water source, and a water conveying pipe 16 is connected between the high-pressure water pump 15 and the sealing enclosing plates 14.

The utility model provides a prevent inner wall deposit chemical industry process pump, when equipment work, because of being provided with the coupling mechanism who prevents blockking up, the material gets into from the right-hand member of connecting pipe 3, and the material is filtered by filter plate 5, and bulky solid impurity is stopped off, avoids impurity to get into the equipment inside, after solid impurity accumulates a certain amount on filter plate 5, controls flexible post 6 and stretches out and draws back, makes sweeping plate 601 reciprocate to clean the surface of filter plate 5, avoids filter plate 5 to be blockked up; after equipment transported material, need wash the inside of equipment, because of being provided with the wiper mechanism who can get rid of inner wall deposit, high pressure water pump 15 carries the inside of center pin 8 with the washing liquid through raceway 16, then the washing liquid enters into the inside of impeller owner dish 7, the washing liquid is washed the inside of equipment from first shower nozzle 11 and the blowout of second shower nozzle 12, first shower nozzle 11 slope installation on the stand 10 lateral wall, stand 10 takes place to rotate under the recoil force effect, the washing liquid evenly spouts on to the inner wall of pump machine casing 2 and blade 9, the cleaning performance is improved, prevent a large amount of material deposits.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims

1. The utility model provides a prevent inner wall deposit chemical industry process pump, including bottom plate (1), its characterized in that: the upper surface of the bottom plate (1) is provided with a pump shell (2), the right end opening of the pump shell (2) is connected with a connection mechanism for preventing blockage, an impeller main disc (7) is arranged in the pump shell (2), a central shaft (8) is connected to the center of the impeller main disc (7), the impeller main disc (7) and the central shaft (8) are of a hollow structure, the impeller main disc (7) is communicated with the inside of the central shaft (8), blades (9) are arranged on the surface of the impeller main disc (7), a cleaning mechanism capable of removing inner wall deposition is arranged on the surface of the impeller main disc (7), the cleaning mechanism comprises a stand column (10), the stand column (10) is of a hollow tubular structure, the stand column (10) is rotatably arranged on the side wall of the impeller main disc (7), a first spray nozzle (11) is arranged on the side wall and at the end part of the stand column (10), the first spray nozzle (11) on the side wall of the stand column (10) is obliquely arranged, the cleaning mechanism further comprises a second spray nozzle (12), the second spray nozzle (12) is uniformly distributed on the side wall of the main disc (7), a left side wall of the other side wall of the impeller main disc (8), a high-sealing surface bearing (13) is arranged on the bottom plate (1), and a group of a sealing bearing (13) is arranged on the upper surface of a high-sealing cover plate (13), a water delivery pipe (16) is connected between the high-pressure water pump (15) and the sealing coaming (14).

2. The chemical process pump for preventing the inner wall from depositing of claim 1, wherein: the connecting mechanism comprises a connecting pipe (3), a filter cavity (4) is arranged inside the connecting pipe (3), and an opening and closing sealing cover is arranged below the filter cavity (4).

3. The chemical process pump for preventing the inner wall deposition as claimed in claim 2, wherein: the filter plate cleaning device is characterized in that a filter plate (5) is arranged inside the filter cavity (4), a telescopic column (6) is arranged on the connecting pipe (3), the bottom end of the telescopic column (6) penetrates through the filter cavity (4) and is inserted into the filter cavity, the end portion of the telescopic column (6) is connected with a cleaning plate (601), a brush is arranged on the cleaning plate (601), and the brush is attached to the surface of the filter plate (5).