CN217628590U - Target sintering is with preventing evaporation sputtering device - Google Patents
Target sintering is with preventing evaporation sputtering device Download PDFInfo
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- CN217628590U CN217628590U CN202123074951.8U CN202123074951U CN217628590U CN 217628590 U CN217628590 U CN 217628590U CN 202123074951 U CN202123074951 U CN 202123074951U CN 217628590 U CN217628590 U CN 217628590U
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- lateral wall
- water tank
- mounting panel
- pipeline
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Abstract
The utility model discloses a target sintering is with preventing evaporation sputtering device, the pipeline comprises a pipeline, pipeline right-hand member fixedly connected with injection pipe, the pipeline lateral wall is equipped with cooling body, cooling body includes the mounting panel, the fixed frame of lateral wall fixedly connected with on the mounting panel, lateral wall fixedly connected with circulating pump on the mounting panel, the mounting panel lateral wall inlays and is equipped with the condenser pipe, the play water outlet end of circulating pump passes through outlet pipe and condenser pipe one end intercommunication, lateral wall fixedly connected with water tank on the mounting panel, lateral wall fixedly connected with motor on the fixed frame, the output shaft fixedly connected with bull stick of motor. The utility model discloses not only realize hydrologic cycle, can also guarantee that the temperature in the condenser pipe is lower always to accelerated the reducing speed of temperature in the water tank, further ensured the condenser pipe to the cooling of raw materials in the pipeline, prevent that the raw materials from guaranteeing the utilization ratio of material at the in-process of spraying because evaporation and loss.
Description
Technical Field
The utility model relates to a target production and processing technology field especially relates to a target sintering is with preventing evaporation sputtering device.
Background
The target material is a target material bombarded by high-speed charged particles, and is used in a high-energy laser weapon, and when lasers with different power densities, different output waveforms and different wavelengths interact with different target materials, different killing and destruction effects can be generated.
In the prior art, when sputtering is carried out on a target, the raw material is evaporated when the target is just injected into a pipeline due to high temperature, so that the consumption of the raw material is increased, the utilization rate of the raw material is reduced, and in order to solve the problems, an evaporation-preventing sputtering device for sintering the target needs to be designed.
SUMMERY OF THE UTILITY MODEL
The utility model aims at solving the defects existing in the prior art and providing an evaporation-proof sputtering device for sintering a target material.
In order to achieve the above purpose, the utility model adopts the following technical scheme:
the utility model provides a target sintering is with preventing evaporation sputtering device, includes the pipeline, pipeline right-hand member fixedly connected with injection pipe, the pipeline lateral wall is equipped with cooling body, cooling body includes the mounting panel, the fixed frame of lateral wall fixedly connected with on the mounting panel, lateral wall fixedly connected with circulating pump on the mounting panel, the mounting panel lateral wall inlays and is equipped with the condenser pipe, the play water outlet end of circulating pump passes through outlet pipe and condenser pipe one end intercommunication, lateral wall fixedly connected with water tank on the mounting panel, lateral wall fixedly connected with motor on the fixed frame, the output shaft fixedly connected with bull stick of motor, a plurality of stirring leaves of bull stick lateral wall fixedly connected with, the other end of condenser pipe passes through aqueduct and water tank lateral wall intercommunication, water tank lateral wall passes through the inlet tube and communicates with the end of intaking of circulating pump.
Preferably, the water guide pipe is positioned above the water tank, and the water inlet pipe is positioned below the water tank.
Preferably, the condensation pipe is spirally arranged, and the section of the injection pipe is funnel-shaped.
Preferably, the circulating pump and the water tank are both located in the fixing frame, and the water inlet pipe is made of rubber.
Preferably, the side wall intercommunication setting on the water tank, the bull stick runs through fixed frame upper side wall.
Preferably, the mounting plate is sleeved on the side wall of the pipeline, and the section of the mounting plate is rectangular.
The utility model discloses following beneficial effect has:
1. the utility model has the advantages that the water in the water tank is pumped into the condenser pipe through the circulating pump, and the water in the condenser pipe can enter the water tank, so that the water circulation is realized, the water temperature in the condenser pipe can be ensured to be always low, and the cooling effect of the condenser pipe is ensured;
2. the utility model discloses a motor drives the bull stick and rotates to drive a plurality of stirring leaves and rotate, can stir the water in the water tank, accelerate the reducing speed of temperature in the water tank, further ensure the cooling of condenser pipe to the interior raw materials of pipeline, prevent the raw materials because evaporation and loss, guarantee the utilization ratio of material at the in-process that sprays.
Drawings
Fig. 1 is a schematic structural view of an evaporation-preventing sputtering apparatus for sintering a target according to the present invention;
fig. 2 is a front view of an evaporation-preventing sputtering apparatus for sintering a target according to the present invention.
In the figure: 1 pipeline, 2 injection pipes, 3 mounting panels, 4 condenser pipes, 5 fixed frames, 6 circulating pumps, 7 water outlet pipes, 8 aqueducts, 9 water tanks, 10 water inlet pipes, 11 motors, 12 rotating rods and 13 stirring blades.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments.
Referring to fig. 1-2, an evaporation sputtering prevention device for target sintering comprises a pipeline 1, wherein the right end of the pipeline 1 is fixedly connected with an injection pipe 2, and the section of the injection pipe 2 is funnel-shaped, so that the injection range of materials is expanded.
1 lateral wall of pipeline is equipped with cooling body, cooling body includes mounting panel 3, 3 covers of mounting panel are established at 1 lateral wall of pipeline, the cross-section of mounting panel 3 is the rectangle, the fixed frame 5 of lateral wall fixedly connected with on mounting panel 3, lateral wall fixedly connected with circulating pump 6 on mounting panel 3, 3 lateral walls of mounting panel inlay and are equipped with condenser pipe 4, condenser pipe 4 is the spiral setting, the cooling zone has been enlarged, the play water end of circulating pump 6 passes through outlet pipe 7 and condenser pipe 4 one end intercommunication, lateral wall fixedly connected with water tank 9 on mounting panel 3, lateral wall intercommunication sets up on water tank 9, the temperature reducing rate in the water tank 9 has been accelerated, under the initial condition, water is equipped with in the water tank 9, circulating pump 6 all is located fixed frame 5 with water tank 9, lateral wall fixedly connected with motor 11 on fixed frame 5, motor 11's output shaft fixedly connected with bull stick 12, bull stick 12 runs through the lateral wall on fixed frame 5, bull stick 12 lateral wall fixedly connected with a plurality of stirring leaf 13, the other end of condenser pipe 4 passes through aqueduct 8 and 9 lateral wall intercommunication of aqueduct, aqueduct 8 is located the top of water tank 9, prevent that the water in the water tank 9 from flowing backwards in the water inlet pipe from getting into 4, the inlet pipe 10 below the circulation pump 10 is made by the rubber.
The utility model discloses its functional principle is explained to following mode of operation of accessible: during the use, start circulating pump 6, in circulating pump 6 gone into condenser pipe 4 with the water pump of water tank 9, water in the condenser pipe 4 gets into water tank 9 along with aqueduct 8 in, from this circulation, can constantly change the water in the condenser pipe 4, guaranteed the cooling effect of condenser pipe 4.
Can also start motor 11, motor 11 drives bull stick 12 and rotates to drive a plurality of stirring leaves 13 and rotate, can stir the water in the water tank 9, accelerate the reduction of temperature in the water tank 9, further guaranteed the condensation effect of condenser pipe 4, thereby cool off the raw materials through pipeline 1, prevent that the raw materials from because the evaporation and the loss, guarantee the utilization ratio of material at the in-process that sprays.
The above, only be the embodiment of the preferred of the present invention, but the protection scope of the present invention is not limited thereto, and any technical solution and the utility model thereof should be covered by the present invention in addition to equivalent replacement or change.
Claims (6)
1. The utility model provides a target sintering is with preventing evaporation sputtering device, includes pipeline (1), its characterized in that: pipeline (1) right-hand member fixedly connected with injection pipe (2), pipeline (1) lateral wall is equipped with cooling body, cooling body includes mounting panel (3), the fixed frame (5) of side wall fixedly connected with on mounting panel (3), side wall fixedly connected with circulating pump (6) on mounting panel (3), mounting panel (3) lateral wall inlays and is equipped with condenser pipe (4), the outlet end of circulating pump (6) passes through outlet pipe (7) and condenser pipe (4) one end intercommunication, side wall fixedly connected with water tank (9) on mounting panel (3), side wall fixedly connected with motor (11) on fixed frame (5), output shaft fixedly connected with bull stick (12) of motor (11), a plurality of stirring leaf of bull stick (12) lateral wall fixedly connected with (13), the other end of condenser pipe (4) passes through aqueduct (8) and water tank (9) lateral wall intercommunication, water tank (9) lateral wall passes through inlet tube (10) and the end intercommunication of intaking of circulating pump (6).
2. The evaporation-preventing sputtering apparatus for sintering a target according to claim 1, wherein: the water guide pipe (8) is positioned above the water tank (9), and the water inlet pipe (10) is positioned below the water tank (9).
3. The evaporation prevention sputtering apparatus for sintering a target according to claim 1, wherein: the condensation pipe (4) is spirally arranged, and the section of the injection pipe (2) is funnel-shaped.
4. The evaporation prevention sputtering apparatus for sintering a target according to claim 2, wherein: circulating pump (6) and water tank (9) all are located fixed frame (5), inlet tube (10) are made by rubber.
5. The evaporation prevention sputtering apparatus for sintering a target according to claim 4, wherein: the side wall intercommunication sets up on water tank (9), lateral wall on fixed frame (5) is run through in bull stick (12).
6. The evaporation prevention sputtering apparatus for sintering a target according to claim 1, wherein: the mounting plate (3) is sleeved on the side wall of the pipeline (1), and the cross section of the mounting plate (3) is rectangular.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202123074951.8U CN217628590U (en) | 2021-12-09 | 2021-12-09 | Target sintering is with preventing evaporation sputtering device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202123074951.8U CN217628590U (en) | 2021-12-09 | 2021-12-09 | Target sintering is with preventing evaporation sputtering device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217628590U true CN217628590U (en) | 2022-10-21 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202123074951.8U Active CN217628590U (en) | 2021-12-09 | 2021-12-09 | Target sintering is with preventing evaporation sputtering device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN217628590U (en) |
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2021
- 2021-12-09 CN CN202123074951.8U patent/CN217628590U/en active Active
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