CN217606785U - Panel etching device - Google Patents
Panel etching device Download PDFInfo
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- CN217606785U CN217606785U CN202221529070.2U CN202221529070U CN217606785U CN 217606785 U CN217606785 U CN 217606785U CN 202221529070 U CN202221529070 U CN 202221529070U CN 217606785 U CN217606785 U CN 217606785U
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Abstract
The utility model discloses a panel etching device, which comprises a reaction chamber, an insulating plate, an insulating piece and a plugging piece, wherein an insulating sleeve is arranged in an observation hole of the reaction chamber; the insulating plate covers the inner side wall of the reaction chamber, and a first through hole is formed in the position, corresponding to the observation hole, of the insulating plate; the insulating part comprises a cover plate and a first convex ring, the cover plate is attached to the insulating plate, the first convex ring is inserted into the first through hole, the peripheral part of the first convex ring covers the hole wall of the first through hole, and a second through hole penetrating through the insulating part is formed in the first convex ring; the plugging piece is used for plugging the observation hole, and a transparent area is arranged at the position of the plugging piece corresponding to the observation hole. Through setting up the insulating part, the insulating part can shelter from the pore wall position of the first through-hole of insulation board, avoids the metallic aluminum in the insulation board to expose, stops that insulation board and other parts produce electric arc and burn the insulation board during the reaction, has not only prolonged the life of insulation board, can also avoid the electric arc of production to influence the processing of panel, promotes the processingquality of panel.
Description
Technical Field
The utility model relates to a display panel processing equipment field especially relates to a panel etching device.
Background
The display device includes a display panel (hereinafter referred to as a panel), and during processing, a photoresist layer is coated on one side of the panel, and a panel etching device is used to etch the photoresist layer to form a groove, and then a conductive material is filled into the groove, so as to form a circuit structure on the panel.
The panel etching equipment is equipment for etching a photoresist layer based on chemical reaction, referring to fig. 1, the panel etching equipment comprises a reaction chamber 1 ', the side wall of the reaction chamber 1 ' is also provided with an observation hole, during operation, the operation process and the operation state in the reaction chamber 1 ' can be observed through the observation hole, the outer side wall of the reaction chamber 1 ' is provided with a pressing plate 4 ' and glass 3 ', the pressing plate 4 ' and the glass 3 ' are fixed on the outer side wall of the reaction chamber 1 ' through a first screw 5 ' to plug the observation hole, and the separation of the reaction chamber 1 ' and the external environment is realized. The material of reaction chamber 1 'lateral wall is the metal, the inside wall of reaction chamber 1' is fixed with insulation board 2 'through second screw 6', insulation board 2 'corresponds the position of observing the hole and is provided with through-hole 201', be provided with insulating cover 7 'in the observation hole of reaction chamber 1', insulating cover 7 'and observation hole interference fit, insulation board 2' and insulating cover 7 'all can hide the inside wall of reaction chamber 1', thereby avoid the inside wall of reaction chamber 1 'and other conducting structure to take place electric arc phenomenon, form the protection to the inside wall of reaction chamber 1'.
The prior art has the following problems: in order to ensure the strength of the insulating plate 2 ', an electrolytic process is usually used to form an insulating alumina layer on an aluminum plate to prepare the insulating plate 2', however, the alumina layer on the hole wall of the through hole 201 'of the insulating plate 2' prepared by the electrolytic process is thin, which causes the metal aluminum inside the insulating plate 2 'to be exposed, and is easy to generate an arc phenomenon with other metal parts (such as the second screw 6') in the reaction chamber 1 ', which not only causes the insulating plate 2' to be burnt and damaged, reduces the service life of the panel etching device, but also affects the processing quality of the panel.
SUMMERY OF THE UTILITY MODEL
The utility model aims to provide a: provided is a panel etching apparatus which has a long service life and can produce a panel having a high quality.
In order to achieve the purpose, the utility model adopts the following technical proposal:
provided is a panel etching apparatus including:
the device comprises a reaction chamber, a plurality of observation holes and an insulation sleeve, wherein the side wall of the reaction chamber is provided with the observation holes, the insulation sleeve is arranged in the observation holes, and the insulation sleeve covers the hole walls of the observation holes;
the insulating plate is arranged on the inner side wall of the reaction chamber and covers the inner side wall of the reaction chamber, and a first through hole is formed in the insulating plate at a position corresponding to the observation hole;
the insulating piece comprises a cover plate and a first convex ring arranged on the cover plate, the cover plate is attached to the insulating plate, the first convex ring is inserted into the first through hole, the outer side wall of the first convex ring covers the hole wall of the first through hole, and a second through hole in the first convex ring penetrates through the cover plate;
the plugging piece is fixed outside the reaction chamber and used for plugging the observation hole, and a transparent area is arranged at the position, corresponding to the observation hole, of the plugging piece.
The preferred scheme of the panel etching device comprises a plurality of fixing pieces, each fixing piece comprises a stud and a ceramic cap, a first threaded hole is formed in the end face of the ceramic cap, the first threaded hole is a blind hole, one end of the stud is screwed into the first threaded hole, a plurality of first mounting holes are formed in the cover plate at intervals, a plurality of second mounting holes are formed in the insulating plate at intervals, a plurality of second threaded holes are formed in the side wall of the reaction chamber at intervals, the number of the first mounting holes, the number of the second mounting holes and the number of the second threaded holes correspond to the number of the fixing pieces, one end, far away from the ceramic cap, of the stud penetrates through the first mounting holes and the second mounting holes and is screwed into the second threaded holes, and the end face, provided with the first threaded holes, of the ceramic cap abuts against the side face of the insulating piece.
As a preferable mode of the panel etching apparatus, the hole wall of the first through hole is provided with an internal thread, the outer periphery of the first convex ring is provided with an external thread, and the insulating member is in threaded connection with the insulating plate.
As a preferable mode of the panel etching apparatus, the insulating member and the insulating sleeve are integrally formed.
As a preferable scheme of the panel etching device, the hole wall of the observation hole is provided with an internal thread, the periphery of the insulating sleeve is provided with an external thread, and the insulating sleeve is in threaded connection with the reaction chamber; or the like, or, alternatively,
the insulating sleeve is in interference fit with the observation hole.
As a preferred scheme of panel etching device, the insulating part still includes the mounting panel, the mounting panel is fixed first bulge loop is kept away from one side of apron, the second through-hole runs through the mounting panel, the shutoff piece includes transparent plate and clamp plate, be provided with the third mounting hole on the clamp plate, be provided with the fourth mounting hole on the transparent plate, be provided with the third screw hole on the mounting panel, the screw passes the third mounting hole with the fourth mounting hole is twisted soon and is gone into in the third screw hole, just the tip of screw with the lateral wall of reacting chamber supports tightly, the nut of screw with the clamp plate supports tightly.
As a preferable scheme of the panel etching device, a first sealing ring is clamped between the cover plate and the insulating plate;
a second sealing ring is clamped between the mounting plate and the transparent plate;
and a third sealing ring is clamped between the transparent plate and the pressing plate.
As a preferable scheme of the panel etching device, two second seal rings are provided, the two second seal rings are concentrically arranged, and the screw is located between the two second seal rings; and/or the presence of a gas in the gas,
the number of the third sealing rings is two, the two third sealing rings are arranged concentrically, and the screw is located between the two third sealing rings.
As a preferable scheme of the panel etching apparatus, a second convex ring is disposed on one side surface of the cover plate close to the insulating plate, and the second through hole is located in the second convex ring.
As a preferable scheme of the panel etching device, one side surface of the second convex ring close to the insulating plate is an arc surface.
The beneficial effects of the utility model are that: through setting up the insulating part, the insulating part can shelter from the pore wall position of the first through-hole of insulation board, avoids the metallic aluminum in the insulation board to expose, stops that insulation board and other parts produce electric arc and burn the insulation board during the reaction, has not only prolonged the life of insulation board, can also avoid the electric arc of production to influence the processing of panel, promotes the processingquality of panel.
Drawings
The present invention will be described in further detail with reference to the accompanying drawings and examples.
Fig. 1 is a schematic view of a panel etching apparatus according to the prior art.
Fig. 2 is a schematic view of a panel etching apparatus according to an embodiment of the present invention.
Fig. 3 is a schematic view of a panel etching apparatus according to the second embodiment of the present invention.
Fig. 4 is a schematic view of a panel etching apparatus according to a third embodiment of the present invention.
Fig. 5 is a schematic view of a panel etching apparatus according to the fourth embodiment of the present invention.
Fig. 6 is a schematic view of an insulating member according to an embodiment of the present invention.
In FIG. 1:
1', a reaction chamber; 2', an insulating plate; 201', a through hole; 3', glass; 4', a pressing plate; 5', a first screw; 6', a second screw; 7', an insulating sleeve;
in fig. 2 to 6:
1. a reaction chamber; 2. an insulating plate; 3. an insulating member; 301. a cover plate; 302. a first convex ring; 303. a second through hole; 304. a second convex ring; 305. mounting a plate; 3051. a third threaded hole; 4. an insulating sleeve; 5. a blocking piece; 501. a transparent plate; 502. pressing a plate; 6. a fixing member; 601. a stud; 602. a ceramic cap; 7. a screw; 8. a first seal ring; 9. a second seal ring; 10. and a third sealing ring.
Detailed Description
The advantages and features of the present invention and the methods of accomplishing the same will become apparent with reference to the following detailed description of the embodiments taken in conjunction with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but may be implemented in various different forms, and the embodiments are provided only to accomplish the disclosure of the present invention and to enable those skilled in the art to fully understand the scope of the present invention, and the present invention is limited only by the scope of the claims. Like reference numerals denote like constituent elements throughout the specification.
Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.
As shown in fig. 2 to 4, the utility model provides a pair of panel etching device, including reaction chamber 1, insulation board 2, insulating part 3, shutoff piece 5, the lateral wall of reaction chamber 1 is provided with the observation hole, be provided with insulating cover 4 in the observation hole, insulating cover 4 covers the pore wall of observation hole, insulation board 2 sets up on reaction chamber 1's the inside wall and covers reaction chamber 1's inside wall, the position that corresponds the observation hole on insulation board 2 is provided with first through-hole, insulating part 3 includes apron 301 and the first bulge loop 302 of setting on apron 301, apron 301 and the laminating of insulation board 2, first bulge loop 302 inserts in the first through-hole, and the pore wall of first bulge loop 302 covers the pore wall of first through-hole, second through-hole 303 in the first bulge loop 302 runs through the apron 301 of insulating part 3, shutoff piece 5 is fixed outside reaction chamber 1, shutoff piece 5 is used for the shutoff observation hole, the position that shutoff piece 5 corresponds the observation hole is provided with the transparent area. Through setting up insulating part 3, insulating part 3 can shelter from the pore wall position of 2 first through-holes of insulation board, avoids the metallic aluminum in insulation board 2 to expose, stops that insulation board 2 produces electric arc and burns insulation board 2 with other parts during the reaction, has not only prolonged the life of insulation board 2, can also avoid the electric arc that produces to influence the processing of panel, promotes the processingquality of panel.
In this example, a spray coating process was used to form an insulative yttria coating (Y) on an aluminum workpiece 2 O 3 ) The layer is used to make the insulator 3, the yttria has good insulation, and the spraying process can make the insulatorThe outer surface of the insulating part 3 is covered by the yttrium oxide coating, so that the insulating property of the insulating part 3 is ensured.
Referring to fig. 2, in an embodiment, the panel etching apparatus includes a plurality of fixing members 6, each fixing member 6 includes a stud 601 and a ceramic cap 602, a first threaded hole is formed in an end surface of the ceramic cap 602, the first threaded hole is a blind hole, one end of the stud 601 is screwed into the first threaded hole, a plurality of first mounting holes are formed in the cover plate 301 at intervals, a plurality of second mounting holes are formed in the insulating plate 2 at intervals, a plurality of second threaded holes are formed in a sidewall of the reaction chamber 1 at intervals, the number of the first mounting holes, the number of the second mounting holes and the number of the second threaded holes correspond to that of the fixing members, one end of the stud 601, which is far away from the ceramic cap 602, penetrates through the first mounting holes and the second mounting holes and is screwed into the second threaded holes, and the end surface of the ceramic cap 602, which is provided with the first threaded hole, abuts against a side surface of the insulating member 3. In this embodiment, the insulating member 3 is fixed in the reaction chamber 1 by the fixing member 6, and at this time, the insulating member 3 and the insulating plate 2 can be fixed by using one fixing member 6, so that the number of the fixing members 6 can be reduced; through setting up ceramic nut, can shelter from the double-screw bolt 601 of metal material, can reduce exposing of metal parts in the reacting chamber 1 like this, reduce insulating board 2 and insulating part 3 by the electric arc burn's that the electricity leads to the production probability.
Referring to fig. 3, in another embodiment, the wall of the first through hole is provided with an internal thread, the outer circumference of the first male ring 302 is provided with an external thread, and the insulating member 3 and the insulating plate 2 are screwed. By directly arranging the internal thread on the hole wall of the first through hole and arranging the external thread on the first convex ring 302, the use of connecting pieces can be reduced, and the number of metal components in the reaction chamber 1 can be reduced; in this embodiment, the probability of electrical conduction occurring in the reaction chamber 1 can be reduced by reducing the use of metal parts, and the generation of electric arcs can be reduced;
referring to fig. 4, in one embodiment, the insulating member 3 and the insulating sleeve 4 are integrally formed. Through setting up integrated into one piece's insulating part 3 and insulating cover 4, after insulating cover 4 is fixed to be accomplished, can fix insulating part 3 in step, saved the step of equipment.
The insulating sleeve 4 and the reaction chamber 1 can be mechanically fixed in various ways, for example, an internal thread may be provided on the hole wall of the observation hole, an external thread may be provided on the outer periphery of the insulating sleeve 4, and the insulating sleeve 4 and the reaction chamber 1 are connected by a thread, at this time, the hole wall of the first through hole of the insulating plate 2 is smooth, and the circumference of the first convex ring 302 is also smooth; for another example, the insulating sleeve 4 and the observation hole can be in interference fit, and the observation hole is directly formed in the side wall of the reaction chamber 1, so that the insulating sleeve 4 and the observation hole are in interference fit, the connection strength between the insulating member 3 and the reaction chamber 1 can be ensured, and the insulating member 3 is prevented from falling off.
Referring to fig. 5 and 6, in an embodiment, the insulating member 3 further includes a mounting plate 305, the mounting plate 305 is fixed on a side of the first convex ring 302 away from the cover plate 301, the second through hole 303 penetrates through the mounting plate 305, the blocking member 5 includes a transparent plate 501 and a pressing plate 502, in this embodiment, the transparent plate 501 is a glass plate, a third mounting hole is formed in the pressing plate 502, a fourth mounting hole is formed in the transparent plate 501, a third threaded hole 3051 is formed in the mounting plate 305, a screw 7 passes through the third mounting hole and the fourth mounting hole and is screwed into the third threaded hole 3051 of the mounting plate 305, an end surface of a column of the screw 7 abuts against an outer sidewall of the reaction chamber 1, and a nut of the screw 7 abuts against the pressing plate 502. It can be understood that the observation hole has a large size, the difficulty of the internal thread on the hole wall of the observation hole or on the hole wall of the first through hole is high, the processing is not facilitated, the installation space can be provided for the insulating part 3 on the outer side of the side wall of the reaction chamber 1 by arranging the installation plate 305, the number of the metal connecting parts in the reaction chamber 1 can be reduced, and the processing and assembling difficulty of the panel etching device can be reduced. In this embodiment, the insulating sleeve 4 and the first protruding ring 302 may be integrally formed, that is, the insulating sleeve 4 is a part of the insulating member 3, and the first protruding ring 302 and the mounting plate 305 are connected by the insulating sleeve 4.
Specifically, a first sealing ring 8 is clamped between the cover plate 301 and the insulating plate 2, a second sealing ring 9 is clamped between the mounting plate 305 and the transparent plate 501, and a third sealing ring 10 is clamped between the transparent plate 501 and the pressing plate 502. Through setting up first sealing washer 8, second sealing washer 9 and third sealing washer 10, can shutoff apron 301 and insulation board 2, mounting panel 305 and transparent plate 501 and the clearance between transparent plate 501 and the clamp plate 502 to realize the isolation of the interior outer environment of reacting chamber 1, avoid outside air to get into the processing operation that influences the panel in reacting chamber 1.
Specifically, two second sealing rings 9 are arranged, the two second sealing rings 9 are concentrically arranged, the diameters of the two second sealing rings 9 are different, the screw 7 is located between the two second sealing rings 9, it can be understood that the pressure exerted by the screw 7 on the peripheral plate material is the largest, and by arranging the two second sealing rings 9 concentrically, the two second sealing rings 9 can both be close to the screw 7 as much as possible, so that the second sealing rings 9 can be compressed, and the gap can be sealed. Correspondingly, the number of the third seal rings 10 can also be two, the two third seal rings 10 are concentrically arranged, the diameters of the two third seal rings 10 are different, and the screw 7 is located between the two third seal rings 10, so that the two third seal rings 10 can be both close to the screw 7 as much as possible, and the third seal rings 10 can be compressed.
Referring to fig. 6, in particular, a side surface of the cap plate 301 adjacent to the insulating plate 2 is provided with a second convex ring 304, and the second through hole 303 is located in the second convex ring 304. By providing the second convex ring 304, when the screw 7 is tightened for fixing, the cover plate 301 and the insulating plate 2 may press the second convex ring 304 together, and the second convex ring 304 may be deformed to some extent, thereby further sealing the gap between the cover plate 301 and the insulating plate 2.
In this embodiment, a side surface of the second convex ring 304 close to the insulating plate 2 is a cambered surface. Through setting up a side that second bulge loop 304 is close to insulation board 2 and be the cambered surface, if apron 301 produces bending deformation because of the atress when, still can guarantee that second bulge loop 304 can laminate with insulation board 2's side to realize the sealed in clearance.
Although the embodiments of the present invention have been described above with reference to the accompanying drawings, the present invention is not limited to the above embodiments, but may be manufactured in various forms, and those skilled in the art will understand that the present invention may be embodied in other specific forms without changing the technical spirit or essential features of the invention. It is therefore to be understood that the above described embodiments are illustrative and not restrictive in all respects.
Claims (10)
1. A panel etching apparatus, comprising:
the device comprises a reaction chamber, a plurality of observation holes and an insulation sleeve, wherein the side wall of the reaction chamber is provided with the observation holes, the insulation sleeve is arranged in the observation holes, and the insulation sleeve covers the hole walls of the observation holes;
the insulating plate is arranged on the inner side wall of the reaction chamber and covers the inner side wall of the reaction chamber, and a first through hole is formed in the insulating plate corresponding to the observation hole;
the insulating piece comprises a cover plate and a first convex ring arranged on the cover plate, the cover plate is attached to the insulating plate, the first convex ring is inserted into the first through hole, the outer side wall of the first convex ring covers the hole wall of the first through hole, and a second through hole in the first convex ring penetrates through the cover plate;
the plugging piece is fixed outside the reaction chamber and used for plugging the observation hole, and a transparent area is arranged at the position, corresponding to the observation hole, of the plugging piece.
2. The panel etching device according to claim 1, comprising a plurality of fixing members, wherein the fixing members include a stud and a ceramic cap, a first threaded hole is formed in an end surface of the ceramic cap, the first threaded hole is a blind hole, one end of the stud is screwed into the first threaded hole, a plurality of first mounting holes are formed in the cover plate at intervals, a plurality of second mounting holes are formed in the insulating plate at intervals, a plurality of second threaded holes are formed in a side wall of the reaction chamber at intervals, the number of the first mounting holes, the number of the second mounting holes and the number of the second threaded holes correspond to the number of the fixing members, one end of the stud, which is far away from the ceramic cap, penetrates through the first mounting holes and the second mounting holes and is screwed into the second threaded holes, and the end surface of the ceramic cap, on which the first threaded hole is formed, abuts against the side surface of the insulating member.
3. The apparatus according to claim 1, wherein the wall of the first through hole is provided with an internal thread, the outer circumference of the first male ring is provided with an external thread, and the insulating member is screwed with the insulating plate.
4. The panel etching apparatus according to claim 1, wherein the insulating member and the insulating sheath are integrally formed.
5. The panel etching apparatus according to claim 4, wherein the wall of the observation hole is provided with an internal thread, the outer periphery of the insulating sleeve is provided with an external thread, and the insulating sleeve is in threaded connection with the reaction chamber; or the like, or, alternatively,
the insulating sleeve is in interference fit with the observation hole.
6. The panel etching apparatus according to claim 1, wherein the insulating member further includes a mounting plate, the mounting plate is fixed to a side of the first collar away from the cover plate, the second through hole penetrates through the mounting plate, the blocking member includes a transparent plate and a pressing plate, a third mounting hole is formed in the pressing plate, a fourth mounting hole is formed in the transparent plate, a third threaded hole is formed in the mounting plate, a screw passes through the third mounting hole and the fourth mounting hole and is screwed into the third threaded hole, an end of the screw abuts against an outer sidewall of the reaction chamber, and a nut of the screw abuts against the pressing plate.
7. The panel etching apparatus according to claim 6, wherein a first seal ring is clamped between the cap plate and the insulating plate;
a second sealing ring is clamped between the mounting plate and the transparent plate;
and a third sealing ring is clamped between the transparent plate and the pressing plate.
8. The panel etching apparatus according to claim 7, wherein the second sealing rings are provided in two numbers, the two second sealing rings are concentrically provided, and the screw is located between the two second sealing rings; and/or the presence of a gas in the atmosphere,
the number of the third sealing rings is two, the two third sealing rings are arranged concentrically, and the screw is located between the two third sealing rings.
9. The apparatus according to claim 6, wherein a second collar is disposed on a side of the cover plate adjacent to the insulating plate, and the second through hole is disposed in the second collar.
10. The panel etching apparatus according to claim 9, wherein a side of the second collar adjacent to the insulating plate is a curved surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221529070.2U CN217606785U (en) | 2022-06-16 | 2022-06-16 | Panel etching device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221529070.2U CN217606785U (en) | 2022-06-16 | 2022-06-16 | Panel etching device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217606785U true CN217606785U (en) | 2022-10-18 |
Family
ID=83589177
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202221529070.2U Active CN217606785U (en) | 2022-06-16 | 2022-06-16 | Panel etching device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN217606785U (en) |
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2022
- 2022-06-16 CN CN202221529070.2U patent/CN217606785U/en active Active
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