CN217604861U - Silicon rod measuring tool - Google Patents
Silicon rod measuring tool Download PDFInfo
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- CN217604861U CN217604861U CN202221293378.1U CN202221293378U CN217604861U CN 217604861 U CN217604861 U CN 217604861U CN 202221293378 U CN202221293378 U CN 202221293378U CN 217604861 U CN217604861 U CN 217604861U
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- silicon rod
- chamfer
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- guide surface
- tool
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Abstract
A silicon rod measuring tool comprising: the silicon rod positioning device comprises a reference part, a positioning part and a positioning part, wherein at least two reference tables capable of being used for placing two adjacent side surfaces of a silicon rod are constructed, and the reference tables are arranged in a crossed manner and enclose a space so as to position a position to be positioned of any chamfer of the silicon rod; the measuring piece is provided with an inclined surface and a guide surface, and the included angle between the inclined surface and the guide surface is consistent with the angle of the chamfer; the guide surface can slide along the inner side wall surface of one of the reference tables to drive the inclined surface to be in contact with the chamfer slope surface, and when the inclined surface completely covers the chamfer slope surface and the vertex of the inclined surface completely overlaps with the vertex of the chamfer close to the guide surface, the length of the intersection position of the guide surface and the other reference table is the size of an included angle edge parallel to the guide surface of the chamfer. The utility model discloses simple structure and easily control, can place on the both sides edge of silicon rod crest line chamfer fast and can place the location steadily to whether the contained angle limit size that obtains chamfer angle both sides accurately accords with the standard requirement.
Description
Technical Field
The utility model belongs to the technical field of the silicon rod is measured, especially, relate to a measuring tool of silicon square bar chamfer.
Background
With the improvement of the photovoltaic market on the demand of the solar cell power generation efficiency, the size requirement of the cell end on the silicon wafer is gradually strict, and the conversion efficiency of the cell is directly influenced. In the processing process of a single crystal square rod, in order to improve the strength of a silicon wafer, chamfering is carried out on four vertical edges of a silicon rod, the difficulty in measuring the chamfering of the edges is high, and the straight edge size of the silicon wafer is directly influenced by the chamfering angle; once any chamfer of silicon square bar is unqualified, directly can lead to the width between two adjacent crest lines to be different with other three width size, can the condition that differs in size, produce badly if the difference is great can lead to in the battery piece processing. The current measuring tool can not be stably placed, needs to be long time consuming and needs a plurality of people to cooperate to enable the tool to be placed in a fit manner with the silicon rod plane, and therefore the measuring size accuracy is poor and the working efficiency is low.
SUMMERY OF THE UTILITY MODEL
The utility model provides a silicon rod measuring tool especially is applicable to the measurement of its chamfer size of monocrystalline silicon square bar, has solved current unstable, the unsafe technical problem of measurement size of measurement location.
For solving at least one above-mentioned technical problem, the utility model discloses a technical scheme be:
a silicon rod measuring tool for measuring the size of a silicon rod edge chamfer department included angle edge, comprising:
the silicon rod positioning device comprises a reference part, a positioning part and a positioning part, wherein at least two reference tables capable of being used for placing two adjacent side surfaces of a silicon rod are constructed, and the reference tables are arranged in a crossed manner and enclose a space so as to position a position to be positioned of any chamfer of the silicon rod;
the measuring piece is provided with an inclined plane and a guide plane, and the included angle between the inclined plane and the guide plane is consistent with the angle of the chamfer;
the guide surface can slide along the inner side wall surface of one of the reference tables to drive the inclined surface to be in contact with the chamfer slope surface, and when the inclined surface completely covers the chamfer slope surface and the vertex of the inclined surface completely overlaps with the vertex of the chamfer close to the guide surface, the length of the intersection position of the guide surface and the other reference table is the size of an included angle edge parallel to the guide surface of the chamfer.
The utility model discloses a one of them embodiment, two one side of benchmark platform and silicon rod side contact is the planishing face, and its crisscross contained angle is 360/N, and wherein, N is the ridge number.
In one embodiment of the present invention, the angle of the chamfer is 45 °.
The utility model discloses a one of them embodiment, when with survey on the silicon rod side at another contained angle limit place on a measured chamfer contained angle limit the width of benchmark platform and silicon rod face contact is not more than when 5mm, benchmark portion still includes the perpendicular to survey the auxiliary table of piece, just the auxiliary table is constructed and is put the edge survey this side setting of silicon rod side on another contained angle limit place on a measured chamfer contained angle limit and hug closely the silicon rod.
The utility model discloses an one of them embodiment, the auxiliary table with survey the piece divide locate with survey on the silicon rod side at another contained angle limit place on the measured chamfer contained angle limit of piece the both sides of benchmark platform.
The utility model discloses an one of them embodiment, when with survey on the silicon rod side at another contained angle limit place on a measured chamfer contained angle limit the reference bench is greater than when 5mm with the width of silicon rod face contact, with survey on the silicon rod side at another contained angle limit place on a measured chamfer contained angle limit the width of reference bench is not less than survey on the silicon rod side at the measured chamfer contained angle limit place of piece the width of reference bench.
In one embodiment of the present invention, the width of the reference platform is the same.
In one embodiment of the present invention, the reference portion further includes an extension table perpendicular to the thickness of the reference table on the side of the silicon rod where the other bevel edge of the bevel edge measured by the measuring member is located, and the height of the extension table is parallel to the height of the measuring member;
the cross section of the extension table is of a U-shaped structure, and the measuring piece is clamped on the inner side wall surface of the extension table.
The utility model discloses a one of them embodiment, with survey the spigot surface contact of piece the cross section of benchmark platform is L type structure, and is another the benchmark platform with survey in the piece with the position department of the relative side contact of spigot surface still is equipped with the stopper.
In one embodiment of the present invention, the guide surface is further configured with scales.
Adopt the utility model discloses a silicon rod measuring tool, simple structure and easily control, can place on the both sides edge of silicon rod crest line chamfer fast and can place the location steadily, and the inclined plane of piece is surveyed in the control again and silicon rod chamfer is domatic aligns the measurement, can obtain the contained angle limit size of chamfer angle both sides accurately to judge fast whether chamfer both sides contained angle limit size accords with standard size requirement.
Drawings
Fig. 1 is a perspective view of a measuring tool according to an embodiment of the present invention;
fig. 2 is a schematic view of a structure in a measuring tool according to an embodiment of the present invention;
FIG. 3 is an enlarged view of the portion X in FIG. 1;
fig. 4 is a top view of a measuring tool in an embodiment of the invention;
fig. 5 is a schematic view of a structure in a measuring tool according to another embodiment of the present invention;
fig. 6 is a schematic view of a structure in a measuring tool according to another embodiment of the present invention;
fig. 7 is a schematic structural diagram of a measuring tool according to another embodiment of the present invention.
In the figure:
100. measuring tool 200, silicon rod 10, and reference part
11. First reference table 12, second reference table 13 and auxiliary table
14. Extension table 15, stopper 20, survey piece
21. Inclined surface 22, guide surface
Detailed Description
The present invention will be described in detail with reference to the accompanying drawings and specific embodiments.
The present embodiment provides a silicon rod measuring tool 100, as shown in fig. 1, for measuring the dimensions of an included angle side a and an included angle side B at an edge chamfer of a silicon rod 200, including a reference portion 10 and a measuring part 20, wherein the reference portion 10 is at least configured with a first reference table 11 and a second reference table 12 which can be used for placing two adjacent side surfaces of any edge of the silicon rod 200, the first reference table 11 and the second reference table 12 are arranged in a crossing manner and enclose a space to locate the dimensions of the included angle side a and the included angle side B at a measured position of the chamfer at the edge of the silicon rod 200; the measuring part 20 is provided with a slope 21 and a guide surface 22, the included angle theta between the slope 21 and the guide surface 22 is consistent with the angle of the chamfer, and the guide surface 22 is provided with a scale. In the work, the guide surface 22 in the measuring part 20 can slide along the inner side wall surface of the first reference table 11 to drive the inclined surface 21 to contact with the chamfered slope surface, and when the inclined surface 21 completely covers the chamfered slope surface and the vertex of the inclined surface 21 completely overlaps with the vertex of the chamfer close to the guide surface 22, the length of the intersection position of the guide surface 22 and the second reference table 12 is the size of an included angle edge A parallel to the chamfer and the guide surface 22; the measuring tool is exchanged for 180 degrees, and the measuring piece 20 is controlled in the same way to obtain the size of the other chamfered edge B; and determining whether the sizes of the included angle edge A and the included angle edge B meet the standard size requirement.
In one embodiment of the present invention, as shown in fig. 2, two reference tables, i.e. the first 11 and the second 12 reference tables, are flat surfaces on the side contacting the silicon rod 200 to ensure the stability of placement, and the crossed included angle θ between the first 11 and the second 12 reference tables is 360 °/N, where N is the number of ridges. In the embodiment, N is 4, correspondingly, the included angle theta between the first reference table 11 and the second reference table 12 is 90 degrees, and the included angle side A and the included angle side B are right-angle sides of the chamfer; certainly, N may also be 6 or 8, accordingly, the included angle θ between the first reference table 11 and the second reference table 12 is 60 ° or 45 °, and the included angle side a and the included angle side B are included angle sides of the acute angle chamfer, which may be measured based on the technical solution in this embodiment to obtain the dimensions of the included angle side a and the included angle side B on both sides of the included angle θ, and these are within the protection scope of this application.
The utility model discloses a one of them embodiment, as shown in fig. 3, to silicon rod 200, no matter how many its crest lines have, the angle of grinding the chamfer after the evolution all is 45, makes the side of crest line chamfer both sides keep unanimous to the length of side that makes the silicon chip after the processing all is the same.
In the embodiment, the measuring part 20 and the reference part 10 are arranged adjustably and also comprise a detachable connection arrangement; wherein, the measuring piece 20 is an inclined plane 21 with one side being a bevel edge and a guide plane 22 with one side being a straight edge, and the other side surface connected with the inclined plane 21 is a straight wall surface; the guide surface 22 is directly in surface contact with the inner side wall of the first reference table 11 and moves downward along the inner side wall of the first reference table 11. That is, the width of the first reference table 11 is protruded than the width of the second reference table 12, so that the guide surface 22 of the measuring piece 20 can slide along the inner wall surface of the first reference table 11. The measuring part 20 is arranged perpendicular to the side surface of the silicon rod 200 corresponding to the second reference table 12, that is, vertically arranged on the top surface of the silicon rod 200 and vertically pushed downwards by the inclined surface 21, so that the inclined surface 21 contacts with the chamfered surface and moves downwards.
The utility model discloses a one of them embodiment, as shown in fig. 4, when being not more than 5mm with survey two 12 reference platforms and silicon rod 200's the width W1 of the face contact on the silicon rod 200 side at another contained angle limit B of 20 measured chamfer contained angle limit A, then, reference portion 100 can not place on silicon rod 200's side steadily, correspondingly, survey 20 also can't move down along the internal face of reference platform 11 steadily, need personnel manual supplementary reference portion 10, can lead to measuring inaccurate like this. In order to solve this problem, the reference part 10 further includes an auxiliary table 13 perpendicular to the measuring part 20, and the auxiliary table 13 is disposed in a longitudinal direction of a side surface of the silicon rod 200 where the other included angle side B of the included angle side a of the chamfer measured along the measuring part 20 is located and is disposed closely to the side surface of the silicon rod 200, that is, the auxiliary table 13 is disposed perpendicular to the second reference table 12 and is integrally connected to the second reference table 12.
The utility model discloses a two 12's of benchmark platform on one of them embodiment, the silicon rod 200 side on that supplementary platform 13 and survey 20 branch locate and survey 20 measuring chamfer contained angle limit A another contained angle limit B place is located. Preferably, the width W2 of the auxiliary table 13 along the length direction of the side surface of the silicon rod 20 closely attached thereto is not less than 5mm and not more than 20mm, because it is too small to play a supporting role; if the size of the container is too large, the container is too heavy and cannot be quickly stored.
The utility model discloses a one of them embodiment, as shown in fig. 5, when with survey the width W1 that the face contact of two reference platforms 12 on the side of silicon rod 200 at another contained angle limit B place of 20 measuring chamfer contained angle limit A and silicon rod 200 is greater than 5mm, with survey two reference platforms 12 on the side of silicon rod 200 at another contained angle limit B place of 20 measuring chamfer contained angle limit A width W1 not less than survey the width W3 of a reference platform 11 on the side of silicon rod 200 at 20 measuring chamfer contained angle limit A place.
Preferably, the widths of the two reference tables are the same, that is, the width W3 of the first reference table 11 is the same as the width W1 of the second reference table 12. This structure not only facilitates processing, but also facilitates the fitting of the balance reference part 10 with the silicon rod 200, and is easier to handle; furthermore, the width W3 of the first reference table 11 and the width W1 of the second reference table 12 are not smaller than 20mm and not larger than 50mm, and the size is more exquisite and easy to machine on the basis of ensuring the overall stable matching of the measuring tool 100.
In the two embodiments, the guide surface 22 of the measuring part 20 slides along the inner wall surface of the first reference table 11, that is, regardless of whether the widths of the first reference table 11 and the second reference table 12 are the same, at the position where the measuring part 20 is placed, the width of the first reference table 11 is offset with respect to the width of the second reference table 12, that is, the width of the first reference table 11 is protruded than the width of the second reference table 12, so that the position surface where the guide surface 22 of the measuring part 20 is protruded along the first reference table 11 during measurement is used as a reference to slide, so as to control accurate alignment of the measuring part 20 with respect to the chamfer slope surface, and ensure the accuracy and stability of measurement.
In the measuring process, the guide surface 22 is a straight line segment, a plurality of scales are engraved on the straight line segment, of course, a digital display structure can be adopted for reading, and when the inclined surface 21 of the measuring piece 20 is completely aligned with the inclined surface of the chamfer, the scale of the intersection of the second reference table 12 and the guide surface 22 is the length a corresponding to the included angle edge a. When the included angle side B is tested, the reference part 10 is replaced to rotate 180 degrees, the first reference table 11 is aligned with the included angle side B, the second reference table 12 is aligned with the included angle side A, the measuring piece 20 is controlled to slide along the inner wall surface of the first reference table 11, the inclined surface 21 completely covers the inclined surface of the chamfer, and the crossed scale of the second reference table 12 and the guide surface 22 is the length B corresponding to the included angle side B. After the result to be tested is finished, whether the size of the length a of the included angle edge A and the size of the length B of the included angle edge B at the chamfer are within the range of the standard difference value or not is compared, and whether the size of the side width of the silicon rod 200 where the included angle edge A is located and the size of the side width of the silicon rod 200 where the included angle edge B is located meet the requirements or not can be further judged.
In one embodiment of the present invention, as shown in fig. 6, the reference portion 10 further includes an extension stage 14 having a thickness of two reference stages 12 perpendicular to the silicon rod 200 on the side where another included angle side B of the chamfer included angle side a measured by the measurement piece 20 is located, and the height of the extension stage 14 is parallel to the height of the measurement piece 20.
In one embodiment of the present invention, the cross section of the extension stage 14 is configured as a U-shaped structure, and the measuring member 20 is clamped on the inner side wall surface of the extension stage 14; at this time, one sides of the first reference table 11 and the second reference table 12 close to the measuring part 20 are flush planes, the widths of the first reference table 11 and the second reference table 12 are the same, and at this time, the width W3 of the first reference table 11 and the width W1 of the second reference table 12 are not less than 20mm and not more than 50mm.
Of course, the most difference from fig. 6 is that the width W1 of the second reference table 12 in surface contact with the silicon rod 200 is greater than 5mm, and an auxiliary table 13 is provided on the side of the second reference table 12 away from the measuring part 20, wherein the structures of the first reference table 11, the second reference table 12 and the auxiliary table 13 are the same as those in fig. 1, and the drawings are omitted.
The utility model discloses an one of them embodiment, as shown in fig. 7, the cross section of the reference station 11 with survey the contact of the guiding surface 22 of piece 20 is L type structure, and in another reference station two 12 with survey the position department of the straight wall face contact of one side relative with guiding surface 22 in 20 still be equipped with stopper 15, namely, stopper 15 sets up and is close to the one side of surveying piece 20 at reference station two 12, thereby it can supply to survey the gliding interval from top to bottom of the width of piece 20 to make to form one between stopper 15 and the reference station 11, and then can guarantee to survey piece 20 and can follow this spacing interval and reciprocate steadily and safely, thereby can guarantee to survey 20 measuring precision.
Adopt the utility model discloses a silicon rod measuring tool, simple structure just easily controls, can place the location on the both sides edge of silicon rod crest line chamfer fast and can steadily, and the inclined plane of piece is surveyed in the control again and silicon rod chamfer domatic alignment measurement, can obtain the contained angle limit size of chamfer angle both sides accurately to whether the snap judgments chamfer both sides contained angle limit size meets the standard requirement.
The above detailed description of the embodiments of the present invention is only for the purpose of illustrating the preferred embodiments of the present invention, and should not be taken as limiting the scope of the present invention. The equivalent changes and improvements made according to the application scope of the present invention should be still included in the patent coverage of the present invention.
Claims (10)
1. A silicon rod measuring tool for measuring the size of a bevel edge at a chamfer of an edge of a silicon rod, comprising:
the silicon rod positioning device comprises a reference part, a positioning part and a positioning part, wherein at least two reference tables capable of being used for placing two adjacent side surfaces of a silicon rod are constructed, and the reference tables are arranged in a crossed manner and enclose a space so as to position a position to be positioned of any chamfer of the silicon rod;
the measuring piece is provided with an inclined plane and a guide plane, and the included angle between the inclined plane and the guide plane is consistent with the angle of the chamfer;
the guide surface can slide along the inner side wall surface of one of the reference tables to drive the inclined surface to be in contact with the chamfer slope surface, and when the inclined surface completely covers the chamfer slope surface and the vertex of the inclined surface completely overlaps with the vertex of the chamfer close to the guide surface, the length of the intersection position of the guide surface and the other reference table is the size of an included angle edge parallel to the guide surface of the chamfer.
2. The tool as set forth in claim 1, wherein the two reference platforms are flat and intersect at an angle of 360 °/N, where N is the number of ridges.
3. The silicon rod measuring tool as set forth in claim 1 or 2, wherein the angle of the chamfer is 45 °.
4. The silicon rod measuring tool as set forth in claim 3, wherein the reference portion further comprises an auxiliary table perpendicular to the measuring member when the width of the contact of the reference table with the silicon rod surface on the silicon rod side surface on which the other of the chamfered sides measured by the measuring member is located is not more than 5mm, and the auxiliary table is disposed in a length direction of the silicon rod side surface on which the other of the chamfered sides measured by the measuring member is located and closely attached to the silicon rod side surface.
5. The tool as set forth in claim 4, wherein the auxiliary table and the measuring member are respectively disposed on both sides of the reference table on a side surface of the silicon rod on which the other of the chamfered edges measured by the measuring member is located.
6. The silicon rod measuring tool as set forth in claim 3, wherein when the width of the reference table on the silicon rod side surface on which the other of the chamfered edges measured by the measuring member is located is greater than 5mm, the width of the reference table on the silicon rod side surface on which the other of the chamfered edges measured by the measuring member is located is not less than the width of the reference table on the silicon rod side surface on which the chamfered edge measured by the measuring member is located.
7. The tool of claim 6, wherein the two reference tables have the same width.
8. The silicon rod measuring tool as set forth in any one of claims 4 to 7, wherein the reference portion further comprises an extension stage perpendicular to a thickness of the reference stage on a side surface of the silicon rod on which the other of the chamfered sides measured from the measuring member is located, the height of the extension stage being arranged in parallel with the height of the measuring member;
the cross section of the extension table is of a U-shaped structure, and the measuring piece is clamped on the inner side wall surface of the extension table.
9. The tool as set forth in any one of claims 4 to 7, wherein the reference table contacting the guide surface of the measuring member has an L-shaped cross section, and a stopper is further provided at a position where the other reference table contacts the side surface of the measuring member opposite to the guide surface.
10. The tool as set forth in claim 1, wherein a scale is further formed on the guide surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221293378.1U CN217604861U (en) | 2022-05-27 | 2022-05-27 | Silicon rod measuring tool |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221293378.1U CN217604861U (en) | 2022-05-27 | 2022-05-27 | Silicon rod measuring tool |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217604861U true CN217604861U (en) | 2022-10-18 |
Family
ID=83587240
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202221293378.1U Active CN217604861U (en) | 2022-05-27 | 2022-05-27 | Silicon rod measuring tool |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN217604861U (en) |
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2022
- 2022-05-27 CN CN202221293378.1U patent/CN217604861U/en active Active
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Address after: No.19, Amur South Street, Saihan District, Hohhot, Inner Mongolia Autonomous Region Patentee after: Inner Mongolia Zhonghuan Crystal Materials Co.,Ltd. Address before: No.19, Amur South Street, Saihan District, Hohhot, Inner Mongolia Autonomous Region Patentee before: INNER MONGOLIA ZHONGHUAN XIEXIN PHOTOVOLTAIC MATERIAL Co.,Ltd. |