CN217586147U - Vacuum degree detection structure of etching machine - Google Patents
Vacuum degree detection structure of etching machine Download PDFInfo
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- CN217586147U CN217586147U CN202221793961.9U CN202221793961U CN217586147U CN 217586147 U CN217586147 U CN 217586147U CN 202221793961 U CN202221793961 U CN 202221793961U CN 217586147 U CN217586147 U CN 217586147U
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- cooler
- etching
- vacuum degree
- cooling water
- air inlet
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Abstract
The utility model discloses a vacuum degree detection structure of an etching machine, which comprises an etching cavity, a vacuum gauge and a detection pipeline for connecting the etching cavity and the vacuum gauge; a cooler is arranged on the detection pipeline, an air inlet is formed in one end of the cooler, an air outlet is formed in the other end of the cooler, the air inlet and the air outlet are not on the same horizontal line, a cooling water jacket is arranged on the outer side of the cooler, and a cooling water inlet and a cooling water outlet are formed in the cooling water jacket; a set of partition plates is arranged in a flow path of gas in the cooler. The utility model discloses an increase the cooler before the vacuum gauge, make the sculpture gas in advance the condensation in the cooler to guarantee the sensitivity of vacuum gauge and improve life, but wide application in etching machine vacuum detection field.
Description
Technical Field
The utility model belongs to the technical field of the wafer processing technique and specifically relates to an etching machine vacuum detects structure is related to.
Background
The etching machine is an important processing device in chip processing, and in the processing process, a wafer is placed in the etching machine, and etching gas is continuously added into a cavity of the etching machine, so that the wafer is etched. One end of the etching cavity is connected with a vacuum pump for vacuumizing, and the other end of the etching cavity is connected with an etching gas source for etching the wafer through the etching gas. In the etching process, the flow rate of etching gas and the vacuum degree in the etching cavity need to be ensured, and in order to conveniently detect the vacuum degree in the etching cavity, a vacuum gauge is usually externally connected through a pipeline so as to conveniently monitor the vacuum degree in the etching cavity in real time. In the using process, the etching gas is accumulated in the vacuum gauge after the vacuum gauge is used for a period of time, and the accumulated substances can influence the sensitivity of the vacuum gauge and even cause the failure of the vacuum gauge. The main reason for this is found in that the vacuum gauge is disposed outside the etching chamber and is connected through a pipeline, the temperature at the position of the vacuum gauge is lower than that of the etching chamber, and a part of etching gas is condensed when being cooled, and the condensation in the vacuum gauge finally causes errors in the amount of the vacuum gauge.
SUMMERY OF THE UTILITY MODEL
The utility model aims at providing an etching machine vacuum detects structure solves the gaseous easy condensation of surveying the end at the vacuometer of current sculpture, causes the problem that the vacuum gauge detectivity descends.
The utility model provides a technical scheme that its technical problem adopted is: a vacuum degree detection structure of an etching machine comprises an etching cavity, a vacuum gauge and a detection pipeline, wherein the detection pipeline is used for connecting the etching cavity and the vacuum gauge; the detection device is characterized in that a cooler is arranged on the detection pipeline, an air inlet is formed in one end of the cooler, an air outlet is formed in the other end of the cooler, the air inlet and the air outlet are not on the same horizontal line, a cooling water jacket is arranged on the outer side of the cooler, and a cooling water inlet and a cooling water outlet are formed in the cooling water jacket.
To facilitate the cooling and condensation of the gas, a set of partition plates is provided in the cooler in the flow path of the gas.
In order to prolong the retention time of the gas in the cooler, the gas inlet is connected with a gas inlet pipe, one end of the gas inlet pipe extends into the cooler and has the length not less than half of the length of the cooler, and the other end of the gas inlet pipe is butted with a detection pipeline; the gas outlet is connected with a gas outlet pipe, one end of the gas outlet pipe extends into the cooler and is not less than half of the length of the cooler, and the other end of the gas outlet pipe is in butt joint with the detection pipeline.
Preferably, the area of the isolation plate is smaller than the sectional area of the inner cavity of the cooler, and the isolation plate is arranged in the cooler in a staggered mode.
Preferably, the cooler is a round tubular structure.
For the convenience with the cooler pull down the washing, intake pipe and outlet duct detachable install on the cooler.
Preferably, a control valve for controlling the on-off of the air flow is arranged on a pipeline of the detection pipeline between the etching cavity and the cooler.
The utility model has the advantages that: the utility model discloses an increase a cooler on the test tube way, make the sculpture gaseous cooling and congeal the long-pending in the cooler before reacing the vacuometer to guarantee that the vacuometer detection end can not congeal long-pending sculpture gaseous, in order to guarantee the sensitivity and the life of vacuometer. The cooler adopts the cooling water jacket, conveniently adjusts the temperature of cooler. The partition plate can prolong the retention time of etching gas in the cooler, so that the etching gas is convenient to be condensed on the partition plate. The gas inlet pipe and the gas outlet pipe are arranged in position, so that the flowing time of gas in the cooler is prolonged, and etching gas condensation is facilitated. The air inlet pipe and the air outlet pipe are connected with the cooler through a detachable structure, and the cooler is conveniently detached to be cleaned at regular intervals.
The present invention will be described in more detail with reference to the accompanying drawings and examples.
Drawings
Fig. 1 is a schematic view of the three-dimensional structure of the present invention.
Fig. 2 is a perspective view of the internal structure of the cooler of the present invention.
Detailed Description
In the embodiment, as shown in fig. 1 and fig. 2, a vacuum degree detection structure of an etching machine comprises an etching cavity 1, the etching cavity 1 is connected with a detection pipeline 3, the tail end of the detection pipeline 3 is provided with a vacuum gauge 2 for detecting the vacuum degree in the etching cavity 1, and the detection end of the vacuum gauge 2 is installed on the detection pipeline 3. For the detection end condensation etching gas who avoids vacuometer 2, be provided with on the detection pipeline 3 and be used for cooling off etching gas cooler 4, make the etching gas at cooler 4 internal condensation before getting into vacuometer 2 to guarantee the sensitivity and the increase of service life of vacuometer 2. Meanwhile, a control valve 7 for controlling the on-off of air flow is arranged on a pipeline of the detection pipeline 3 between the etching cavity 1 and the cooler 4, so that the detection pipeline 3 is convenient to close when the cooler 4 is detached, replaced and cleaned.
As shown in fig. 2, the specific structure of the cooler 4 is as follows:
the cooler 4 is a circular tubular structure, one end of the cooler 4 is provided with an air inlet 41, the other end of the cooler 4 is provided with an air outlet 42, and the air inlet 41 and the air outlet 42 are not on the same horizontal line. The air inlet 41 is connected with an air inlet pipe 43, one end of the air inlet pipe 43 extends into the cooler 4 and has a length not less than half of the length of the cooler 4, and the other end is in butt joint with the detection pipeline 3; an air outlet pipe 44 is connected to the air outlet 42, one end of the air outlet pipe 44 extends into the cooler 4 and has a length not less than half of the length of the cooler 4, and the other end of the air outlet pipe 44 is in butt joint with the detection pipeline 3. The air inlet pipe 43 and the air outlet pipe 44 are detachably mounted on the cooler 4, and can be mounted on the cooler 4 in a threaded fit manner or in a fit manner through a sealing ring, and the air inlet pipe 43 and the air outlet pipe 44 can be connected with the detection pipeline 3 through a pipe joint or other common pipeline connection manners.
A cooling water jacket 5 is arranged outside the cooler 4, a cooling water inlet 51 and a cooling water outlet 52 are arranged on the cooling water jacket 5, and the gas in the cooler 4 is cooled through the cooling water jacket 5.
A set of partition plates 6 is provided in the cooler 4 on the flow path of the gas. The area of the isolation plate 6 is smaller than the sectional area of the inner cavity of the cooler 4, and the isolation plate 6 is arranged in the cooler 4 in a staggered manner, in this embodiment, the two isolation plates 6 are arranged in a staggered manner. Through the design of air inlet 41 and gas outlet 42 position, the design of intake pipe 43 and outlet duct 44 and division board 6, can prolong the gaseous time of etching in cooler 4, guarantee that the gaseous cooling coagulation deposit of accomplishing in advance in cooler 4 of etching makes vacuometer 2 can not have the coagulation deposit, guarantees the sensitivity of vacuometer and improves life. When the cooler 4 needs to be cleaned, the air inlet pipe 43 and the air outlet pipe 44 are detached, the cooler is placed in the water tank, and the cleaning is completed by using ultrasonic oscillation.
The invention has been described above by way of example with reference to the accompanying drawings. Obviously, the specific implementation of the present invention is not limited by the above-described manner. As long as the method conception and the technical scheme of the utility model are adopted for various insubstantial improvements; or without improvement, the above conception and technical solution of the present invention can be directly applied to other occasions, all within the protection scope of the present invention.
Claims (7)
1. A vacuum degree detection structure of an etching machine comprises an etching cavity (1), a vacuum gauge (2) and a detection pipeline (3) which is connected with the etching cavity (1) and the vacuum gauge (2); the method is characterized in that: the detection device is characterized in that a cooler (4) is arranged on the detection pipeline (3), one end of the cooler (4) is provided with an air inlet (41), the other end of the cooler is provided with an air outlet (42), the air inlet (41) and the air outlet (42) are not on the same horizontal line, a cooling water jacket (5) is arranged on the outer side of the cooler (4), and a cooling water inlet (51) and a cooling water outlet (52) are arranged on the cooling water jacket (5).
2. The vacuum degree detection structure of the etching machine according to claim 1, characterized in that: a set of partition plates (6) is arranged in the cooler (4) on the flow path of the gas.
3. The vacuum degree detection structure of the etching machine according to claim 2, characterized in that: the air inlet (41) is connected with an air inlet pipe (43), one end of the air inlet pipe (43) extends into the cooler (4) and has a length not less than half of the length of the cooler (4), and the other end of the air inlet pipe (43) is butted with the detection pipeline (3); an air outlet pipe (44) is connected to the air outlet (42), one end of the air outlet pipe (44) extends into the cooler (4) and is not less than half of the length of the cooler (4), and the other end of the air outlet pipe is in butt joint with the detection pipeline (3).
4. The vacuum degree detection structure of the etching machine according to claim 3, characterized in that: the area of the isolation plate (6) is smaller than the sectional area of the inner cavity of the cooler (4), and the isolation plate (6) is arranged in the cooler (4) in a staggered mode.
5. The vacuum degree detection structure of the etching machine according to claim 1, characterized in that: the cooler (4) is of a circular tubular structure.
6. The vacuum degree detection structure of the etching machine according to claim 3, characterized in that: the air inlet pipe (43) and the air outlet pipe (44) are detachably arranged on the cooler (4).
7. The vacuum degree detection structure of the etching machine according to claim 1, characterized in that: and a control valve (7) for controlling the on-off of air flow is arranged on the pipeline of the detection pipeline (3) between the etching cavity (1) and the cooler (4).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221793961.9U CN217586147U (en) | 2022-07-11 | 2022-07-11 | Vacuum degree detection structure of etching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221793961.9U CN217586147U (en) | 2022-07-11 | 2022-07-11 | Vacuum degree detection structure of etching machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217586147U true CN217586147U (en) | 2022-10-14 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202221793961.9U Active CN217586147U (en) | 2022-07-11 | 2022-07-11 | Vacuum degree detection structure of etching machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN217586147U (en) |
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2022
- 2022-07-11 CN CN202221793961.9U patent/CN217586147U/en active Active
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