CN217555939U

CN217555939U - Device for pretreatment of developing and etching wastewater

Info

Publication number: CN217555939U
Application number: CN202122137591.5U
Authority: CN
Inventors: 罗强
Original assignee: Guangzhou Nuanshu Environmental Protection Technology Co ltd
Current assignee: Guangzhou Nuanshu Environmental Protection Technology Co ltd
Priority date: 2021-09-06
Filing date: 2021-09-06
Publication date: 2022-10-11
Anticipated expiration: 2031-09-06

Abstract

The utility model provides a device of development etching waste water preliminary treatment relates to sewage treatment technical field, including development etching waste water preliminary treatment device, development etching waste water preliminary treatment device has set gradually pH regulatory region, coagulation area and flocculation area according to the flow direction of liquid, the pH regulatory region is connected with the sulfuric acid jar through sulphuric acid dosing pipe, the coagulation area is connected with the PAC jar through PAC dosing pipe, the flocculation area is connected with the PAM jar through PAM dosing pipe, be provided with sulphuric acid dosing pump on the sulphuric acid dosing pipe, be provided with PAC dosing pump on the PAC dosing pipe, be provided with PAM dosing pump on the PAM dosing pipe, flocculation area and acid precipitation district intercommunication, acid precipitation district and middle water passing district. The utility model discloses an useful part is, overcomes current monomer sediment to the limited defect of the total amount of getting rid of COD, provides a device of development etching waste water preliminary treatment, and it can the anti waste water impact load of at utmost, improves COD's load of getting rid of, improves COD's clearance rate.

Description

Device for pretreatment of developing and etching wastewater

Technical Field

The utility model relates to a device of development etching waste water preliminary treatment belongs to sewage treatment technical field.

Background

The developing etching is a core production link of products such as household industrial products (such as mobile phones, automobiles, televisions, chips and the like), in recent years, circuit board enterprises in China expand rapidly, and developing etching production processes are widely applied along with scale expansion.

With the wide application of the development etching, the amount of wastewater of the development etching is increased rapidly, the traditional acid-out technology is limited by the reason that the total COD removal amount is limited by one-time acid-out, and the load of the subsequent treatment process is increased; if a mode of several-stage acid precipitation is adopted, one-time investment cost is greatly increased, the operation difficulty of wastewater treatment is increased, and for enterprises involving pollution, developing and etching, a high-efficiency wastewater treatment technology is required to be provided.

Among various environmental protection technologies, the acid precipitation method is the most effective and rapid method for developing etching wastewater, and therefore, improving the COD removal efficiency of the acid precipitation technology is the next breakthrough of the environmental protection technology.

SUMMERY OF THE UTILITY MODEL

The utility model aims to solve the technical problem that overcome current monomer deposit to the limited defect of the total amount of getting rid of COD, provide a device of development etching waste water preliminary treatment, it can the anti waste water impact load of at utmost, improves COD's load of getting rid of, improves COD's clearance rate.

In order to solve the technical problem, the utility model discloses a realize through following technical scheme:

the utility model provides a device of development etching waste water preliminary treatment, includes development etching waste water preliminary treatment device, development etching waste water preliminary treatment device has set gradually pH regulating area, coagulation district and flocculation district according to the flow direction of liquid, the pH regulating area is connected with the sulfuric acid jar through sulphuric acid dosing pipe, the coagulation district is connected with the PAC jar through PAC dosing pipe, the flocculation district is connected with the PAM jar through PAM dosing pipe, be provided with sulphuric acid dosing pump on the sulphuric acid dosing pipe, be provided with PAC dosing pump on the PAC dosing pipe, be provided with PAM dosing pump on the PAM dosing pipe, flocculation district and acid precipitation district intercommunication, acid precipitation district and middle water passing district intercommunication, the pH regulating area is connected with the inlet tube, middle water passing district is connected with outlet pipe and backward flow subassembly.

Further, the backward flow subassembly includes backward flow inlet tube, backwash pump and back flow, the one end and the backwash pump of backward flow inlet tube are connected, the other end and the back flow of backwash pump are connected, the other end of back flow with the pH adjustment district is connected.

Furthermore, a first partition plate is arranged between the pH adjusting area and the coagulation area, a second partition plate is arranged between the coagulation area and the flocculation area, and the height of the first partition plate is higher than that of the second partition plate.

Furthermore, the flocculation area is provided with a communication port communicated with the acidification settling area, and the height of the communication port is lower than that of the second partition plate.

Compared with the prior art, the beneficial effects of the utility model are that:

the utility model discloses the impact load of anti development etching waste water improves COD's removal load, improves COD's clearance to simple structure, area economizes.

Drawings

Fig. 1 is a plan view of an apparatus for pretreating a developing etching waste water according to the present invention;

fig. 2 is a side view of fig. 1.

In the figure: the device comprises a 0-developing etching wastewater pretreatment device, a 1-water inlet pipe, a 2-pH adjusting area, a 3-coagulation area, a 4-flocculation area, a 5-sulfuric acid tank, a 6-PAC tank, a 7-PAM tank, an 8-sulfuric acid dosing pump, a 9-PAC dosing pump, a 10-PAM dosing pump, an 11-acidification precipitation area, a 12-middle water passing area, a 13-water outlet pipe, a 14-backflow water inlet pipe, a 15-backflow pump, a 16-backflow pipe, a 17-sulfuric acid dosing pipe, an 18-PAC dosing pipe, a 19-PAM dosing pipe, a 20-first partition plate, a 21-second partition plate and a 22-communication port.

Detailed Description

The preferred embodiments of the present invention will be described hereinafter with reference to the accompanying drawings, and it should be understood that the preferred embodiments described herein are merely for purposes of illustration and explanation, and are not intended to limit the present invention.

As shown in fig. 1 and 2, a device for pretreating development etching wastewater comprises a device 0 for pretreating development etching wastewater, the device 0 for pretreating development etching wastewater is sequentially provided with a pH adjusting region 2, a coagulating region 3 and a flocculating region 4 according to the flowing direction of liquid, the pH adjusting region 2 is connected with a water inlet pipe 1, external wastewater is conveyed from the water inlet pipe 1 to the pH adjusting region 2, a first partition plate 20 is arranged between the pH adjusting region 2 and the coagulating region 3, a second partition plate 21 is arranged between the coagulating region 3 and the flocculating region 4, the first partition plate 20 and the second partition plate 21 both achieve the separation effect, in addition, the height of the first partition plate 20 is higher than that of the second partition plate 21, so that the wastewater sequentially flows through the first partition plate 20 and the second partition plate 21 to achieve the graded flow according to the sequence of the pH adjusting region 2, the coagulating region 3 and the flocculating region 4.

The pH adjusting area 2 is connected with a sulfuric acid tank 5 through a sulfuric acid dosing pipe 17, the coagulating area 3 is connected with a PAC tank 6 through a PAC dosing pipe 18, the flocculating area 4 is connected with the PAM tank 7 through a PAM dosing pipe 19, a sulfuric acid dosing pump 8 is arranged on the sulfuric acid dosing pipe 17, a PAC dosing pump 9 is arranged on the PAC dosing pipe 18, a PAM dosing pump 10 is arranged on the PAM dosing pipe 19, the sulfuric acid dosing pump 8 starts to control the drugs in the sulfuric acid tank 5 to be put into the pH adjusting area 2, the PAC dosing pump 9 starts to control the drugs in the PAC tank 6 to be put into the coagulating area 3, the PAM dosing pump 10 starts to control the drugs in the PAM tank 7 to be put into the flocculating area 4, the flocculating area 4 is communicated with an acid precipitation zone 11, the acid precipitation zone 11 is communicated with a middle water passing zone 12, the middle water passing zone 12 is arranged to ensure that a back-flow pump 15 runs stably, the middle water passing zone 12 is connected with a water outlet pipe 13 and a backflow assembly, the backflow assembly comprises a backflow inlet pipe 14, an effluent pipe 15 and the other end 16, one end of the backflow pump 14 is connected with the backflow assembly 15, and the backflow assembly is connected with the backflow assembly 15, and the other end of the backflow assembly 15, and the backflow assembly 15 is connected with the backflow assembly 15, and the backflow assembly 15;

the flocculation area 4 is provided with a communication port 22 communicated with the acidification settling area 11, water in the flocculation area 4 flows into the acidification settling area 11 through the communication port 22, and the height of the communication port 22 is lower than that of the second partition plate 21, so that the effect of preventing counter flow is achieved.

The working steps of the utility model are as follows:

1. development etching waste water passes through inlet tube 1 and gets into pH regulation district 2 that development etching waste water pretreatment of water device 0, sulphuric acid adds the medicine pump 8, PAC adds the medicine pump 9, PAM adds the medicine pump 10 and opens, respectively with sulphuric acid jar 5, PAC jar 6, PAM jar 7 passes through sulphuric acid and adds the medicine pipe 17, PAC adds the medicine pipe 18, PAM adds 19 pump income pH regulation district 2 of medicine pipe, it distinguishes 3 to coagulate, flocculation district 4, after adding the medicine, waste water deposits in acid-out settling zone 11, realize COD and waste water separation, glue type COD and deposit with the form of precipitation, go out water entering middle water passing zone 12.

2. Part of water in the intermediate water passing area 12 flows into a return pipe 16 from a return pump 15 through a return water inlet pipe 14 and returns to the pH adjusting area 2.

3. Part of water is discharged outside through the water outlet pipe 13 or enters the next process for treatment.

4. The above three steps are continuously circulated.

Through effluent backflow, backflow and raw water mixing and mixed water secondary dosing, the COD concentration in the mixed water is reduced, so that the COD concentration before acidification precipitation is greatly reduced, the COD concentration of the effluent is reduced to the maximum extent, and the total removal rate of COD is improved. Greatly improving the efficiency of removing COD and simultaneously improving the impact load capacity of the wastewater for resisting the COD. Finally, the effluent is superior to a common device, the COD concentration of the effluent is guaranteed, the operation cost is saved, the one-time investment cost is saved, the occupied area is small, the operation is simple and convenient, and the labor intensity is low.

Finally, it should be noted that: although the present invention has been described in detail with reference to the preferred embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or replace part of the technical features of the embodiments with equivalent alternatives, modifications, and improvements made within the spirit and principles of the present invention.

Claims

1. The utility model provides a device that development etching waste water was pretreated which characterized in that: including development etching wastewater pretreatment of water device (0), development etching wastewater pretreatment of water device (0) has set gradually pH adjusting zone (2), coagulation zone (3) and flocculation zone (4) according to the flow direction of liquid, pH adjusting zone (2) are connected with sulfuric acid tank (5) through sulphuric acid dosing pipe (17), coagulation zone (3) are connected with PAC jar (6) through PAC dosing pipe (18), flocculation zone (4) are connected with PAM jar (7) through PAM dosing pipe (19), be provided with sulphuric acid dosing pump (8) on sulphuric acid dosing pipe (17), be provided with PAC dosing pump (9) on PAC dosing pipe (18), be provided with PAM dosing pump (10) on PAM dosing pipe (19), flocculation zone (4) and acid-out precipitation zone (11) intercommunication, acid-out precipitation zone (11) and middle water passing zone (12) intercommunication, pH adjusting zone (2) are connected with inlet tube (1), water passing zone (12) and backflow subassembly (13) and outlet pipe are crossed to the centre;

a first clapboard (20) is arranged between the pH adjusting area (2) and the coagulating area (3), a second clapboard (21) is arranged between the coagulating area (3) and the flocculating area (4), and the height of the first clapboard (20) is higher than that of the second clapboard (21);

the flocculation zone (4) is provided with a communicating opening (22) communicated with the acidification settling zone (11), and the height of the communicating opening (22) is lower than that of the second partition plate (21).

2. The apparatus for pretreating development etching waste water according to claim 1, wherein: the backward flow subassembly includes backward flow inlet tube (14), backwash pump (15) and back flow (16), the one end and the backwash pump (15) of backward flow inlet tube (14) are connected, the other end and the back flow (16) of backwash pump (15) are connected, the other end of back flow (16) with pH adjustment area (2) are connected.