CN217517016U - Mask supporting structure and mask assembly - Google Patents

Mask supporting structure and mask assembly Download PDF

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Publication number
CN217517016U
CN217517016U CN202220767245.7U CN202220767245U CN217517016U CN 217517016 U CN217517016 U CN 217517016U CN 202220767245 U CN202220767245 U CN 202220767245U CN 217517016 U CN217517016 U CN 217517016U
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China
Prior art keywords
supporting
mask
support
supporting part
bar
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CN202220767245.7U
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Chinese (zh)
Inventor
刘佳宁
沈阔
刘华猛
关新兴
白珊珊
李彦松
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BOE Technology Group Co Ltd
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BOE Technology Group Co Ltd
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Priority to CN202220767245.7U priority Critical patent/CN217517016U/en
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Abstract

The embodiment of the application provides a mask supporting structure and a mask assembly. The mask supporting structure comprises a first supporting layer made of a first magnetic material and a second supporting layer made of a second magnetic material, and the magnetism of the second magnetic material is smaller than that of the first magnetic material, so that the complete mask supporting structure cannot generate overlarge magnetic field force, and the risk of crushing a substrate to be evaporated is reduced; high accuracy metal mask board includes a plurality of sub-mask boards, and sub-mask board width is less than the distance between the adjacent first supporting part, also is the storage gap between the edge of sub-mask board and the first supporting part, and this edge that more is favorable to high accuracy metal mask is unfolded to make the fold at high accuracy metal mask flange reason can the exhibition flat, can improve the too big bad problems such as colour mixture that arouse of display screen edge material coating by vaporization shadow, thereby be favorable to promoting the coating by vaporization quality.

Description

Mask supporting structure and mask assembly
Technical Field
The application relates to the technical field of OLED production, in particular to a mask supporting structure and a mask assembly.
Background
The OLED (Organic Light-Emitting Diode) display panel has the advantages of fast response time, large viewing angle, high contrast, Light weight, low power consumption and the like, is one of the popular research fields of display devices, and has an increasingly wide application range due to its unique flexibility.
The preparation of the OLED display panel comprises a plurality of processes, wherein evaporation is one important process, and the evaporation process involves the use of a permanent magnet magnetic plate member and a corresponding mask plate. Specifically, the used Mask plate is formed by welding a support plate F-Mask to a Frame (Frame), and then welding a Fine Metal Mask (FMM) to the Frame.
However, since the F-Mask has strong magnetism and is influenced by magnetic force greatly, the F-Mask is easy to bulge upwards and the FMM is easy to bulge upwards caused by the F-Mask in the evaporation process, so that the risk of crushing the display screen is increased.
SUMMERY OF THE UTILITY MODEL
The application provides a Mask supporting structure and a Mask assembly aiming at the defects of the existing mode and is used for solving the technical problem that the F-Mask protrudes upwards due to strong magnetism of the F-Mask in the prior art and the display screen is crushed.
In a first aspect, embodiments of the present application provide a mask support structure, comprising:
the first support layer is made of a plurality of first magnetic materials and comprises a plurality of first support strips extending along a first direction and second support strips extending along a second direction;
the second supporting layer is made of a second magnetic material, is positioned on the first supporting layer and comprises a third supporting strip extending along the first direction and a fourth supporting strip extending along the second direction, the orthographic projection of the third supporting strip on the first supporting layer is positioned in the first supporting strip, and the orthographic projection of the fourth supporting strip on the first supporting layer is positioned in the second supporting strip;
the second magnetic material has a magnetic property weaker than that of the first magnetic material.
Optionally, the third supporting bar includes a first supporting portion and second supporting portions located at two sides of the first supporting portion.
Optionally, the fourth supporting bar includes a first supporting portion and second supporting portions located on two sides of the first supporting portion, and the thickness of the first supporting portion is greater than that of the second supporting portion.
Optionally, an etching groove is formed in one side, close to the second support layer, of the first support bar and/or the second support bar; or the first supporting strip and/or the second supporting strip are/is provided with etching through holes, and the width of each etching through hole is smaller than that of the first supporting part.
Optionally, a gap is formed between the first supporting portion and the second supporting portion on the same third supporting bar or the same fourth supporting bar.
Optionally, the first supporting portion and the second supporting portion on the same third supporting bar or the same fourth supporting bar are connected.
Optionally, the third support bar includes a first support portion and a second support portion, the fourth support bar includes only the second support portion, and the second support portion included in the fourth support bar is connected to the second support portion included in the third support bar; or the fourth supporting bar comprises a first supporting part and a second supporting part, the third supporting bar only comprises a second supporting part, and the third supporting bar comprises a second supporting part connected with the second supporting part comprised by the fourth supporting bar.
In a second aspect, an embodiment of the present application provides a mask assembly, which includes:
a support frame;
the mask supporting structure is fixed on the supporting frame;
and the high-precision metal mask plate is positioned on one side of the second supporting layer, which is far away from the first supporting layer.
Optionally, a thickness difference between the first supporting portion and the second supporting portion is equal to a thickness of the high-precision metal mask plate.
Optionally, the third support bar includes a first support portion and a second support portion, the fourth support bar includes only the second support portion, and the second support portion included in the fourth support bar is connected to the second support portion included in the third support bar; or the fourth supporting bar comprises a first supporting part and a second supporting part, the third supporting bar only comprises a second supporting part, and the third supporting bar comprises a second supporting part connected with the second supporting part comprised by the fourth supporting bar.
Optionally, when the third supporting bar includes the first supporting portion and the second supporting portion, the high-precision metal mask plate includes a plurality of sub-mask plates extending along a first direction, and a distance between adjacent first supporting portions extending along the first direction is greater than a length of the sub-mask plates in a direction perpendicular to the first direction; or alternatively
When the fourth supporting bar includes first supporting portion with during the second supporting portion, high accuracy metal mask plate includes a plurality of sub-mask plates that extend along the second direction, then follows adjacent that the second direction extends distance between the first supporting portion is greater than sub-mask plate with the length in the second direction vertically direction.
The technical scheme provided by the embodiment of the application brings beneficial technical effects that:
(1) in the mask bearing structure and the mask subassembly that this application embodiment provided, the mask bearing structure includes the first supporting layer of making by first magnetic material and the second supporting layer of making by second magnetic material, and because the magnetism of second magnetic material is less than the magnetism of first magnetic material for complete mask bearing structure can not produce too big magnetic field force, also is that the mask bearing structure is difficult to upwards protruding, thereby reduces the risk of crushing wound treating the coating by vaporization base plate.
(2) At the in-process that uses mask bearing structure, need install high accuracy metal mask plate on the second supporting part, through the thickness design for being greater than the second supporting part with the thickness of first supporting part, can promote the mask subassembly including mask bearing structure and high accuracy metal mask plate and the flatness of treating the contact surface of coating by vaporization base plate to further prevent that high accuracy metal mask plate fish tail from treating the coating by vaporization base plate.
(3) High accuracy metal mask board includes a plurality of sub-mask boards, and sub-mask board width is less than the distance between the adjacent first supporting part, also is the storage gap between the edge of sub-mask board and the first supporting part, and this edge that more is favorable to high accuracy metal mask is unfolded to make the fold at high accuracy metal mask flange edge can the exhibition flat, can improve the too big bad problems such as colour mixture that arouses of display screen edge material coating by vaporization shadow. Thereby being beneficial to improving the evaporation quality.
Additional aspects and advantages of the present application will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the present application.
Drawings
The above and/or additional aspects and advantages of the present application will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
FIG. 1 is a schematic structural diagram of a support frame and a support plate in the prior art;
FIG. 2 is a schematic structural diagram of a mask in the prior art;
FIG. 3 is a schematic diagram of an upward protrusion of a mask plate due to magnetic effect in the prior art;
FIG. 4 is a schematic view of a mask support structure according to an embodiment of the present disclosure;
FIG. 5 is a schematic cross-sectional view of the mask support structure of FIG. 4 taken along line A-A;
FIG. 6 is a schematic cross-sectional view of the mask support structure of FIG. 4 taken along line A-A;
FIG. 7 is a schematic cross-sectional view of the mask support structure of FIG. 4 taken along line A-A;
FIG. 8 is a schematic cross-sectional view of the mask support structure of FIG. 4 taken along line A-A;
FIG. 9 is a schematic view of another cross-sectional view of the mask support structure of FIG. 4 taken along line A-A;
FIG. 10 is a schematic view of another cross-sectional view of the mask support structure of FIG. 4 taken along line A-A;
FIG. 11 is a schematic partial top view of the first support layer in the mask support structure shown in FIG. 7 or FIG. 8;
FIG. 12 is a schematic partial top view of the first support layer in the mask support structure shown in FIG. 9 or FIG. 10;
FIG. 13 is a schematic view of a support frame coupled to a mask support structure in an embodiment of the present application;
fig. 14 is a schematic connection diagram of a mask supporting structure and a high-precision metal mask plate in an embodiment of the present application;
fig. 15 is a schematic connection diagram of a mask assembly and a substrate to be vapor-deposited in an embodiment of the present application.
Reference numerals:
1-a mask support structure; 11-a first support layer; 111-a first support bar; 1110 a-etching a groove; 1110 b-etching a through hole; 112-second support bar; 12-a second support layer; 121-third support bars; 1211 — a first support part; 1212-a second support; 122-a fourth support bar;
2-a support frame;
3-high precision metal mask plate;
4-the substrate to be evaporated.
Detailed Description
Embodiments of the present application are described below in conjunction with the drawings in the present application. It should be understood that the embodiments set forth below in connection with the drawings are exemplary descriptions for explaining technical solutions of the embodiments of the present application, and do not limit the technical solutions of the embodiments of the present application.
As used herein, the singular forms "a", "an", "the" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise.
As shown in fig. 1 and 2, a mask plate for OLED evaporation in the prior art includes a support plate 1', a high-precision metal mask plate 3, and a support frame 2. In general, the support plate 1 'is made of a material with good magnetism, so that the support plate 1' is attached to a substrate to be evaporated through magnetism in the evaporation process.
As shown in fig. 3, since the support plate 1' has strong magnetism, is greatly influenced by magnetic force, and is greatly influenced by magnetic force, the F-Mask is easily protruded upwards and the FMM is easily protruded upwards due to the F-Mask in the evaporation process, which increases the risk of damaging the substrate to be evaporated. And the strong flattening of the fold that is unfavorable for high accuracy metal mask plate 3 edge that receives of magnetic field force of backup pad 1' moreover, this causes display screen edge material coating by vaporization shadow too big easily, causes harmfully such as colour mixture.
To make the objects, technical solutions and advantages of the present application more clear, the following detailed description of the embodiments of the present application will be made with reference to the accompanying drawings.
The application provides a mask bearing structure and mask subassembly aims at solving prior art technical problem as above.
The present embodiment provides a mask support structure, and as shown in fig. 4, the mask support structure 1 includes a first support layer 11 and a second support layer 12.
The first support layer 11 is made of a first magnetic material, and includes a plurality of first support bars 111 extending along the first direction Y and second support bars 112 extending along the second direction X; the second support layer 12 is made of a second magnetic material and is located on the first support layer 11, and includes a third support bar 121 extending along the first direction Y and a fourth support bar 122 extending along the second direction X, an orthographic projection of the third support bar 121 on the first support layer 11 is located in the first support bar 111, and an orthographic projection of the fourth support bar 122 on the first support layer 11 is located in the second support bar 112; the second magnetic material has a magnetic property weaker than that of the first magnetic material.
In the present application, the phrase "the second magnetic material has a magnetic property weaker than that of the first magnetic material" means that: the magnetic field force generated by the second magnetic material of the same size is smaller than the magnetic field force generated by the first magnetic material with respect to the same magnet.
Specifically, as shown in fig. 4, the first supporting layer 11 and the second supporting layer 12 are both of a grid structure, and a plurality of hollow areas are respectively defined, and the overlapping area of the hollow areas of the first supporting layer 11 and the hollow areas of the second supporting layer 12 enables the organic light-emitting material to be deposited on the substrate to be evaporated. That is, by designing the patterns of the first supporting layer 11 and the second supporting layer 12, different hollow areas can be designed, that is, the mask supporting structure 1 has a certain function of a mask plate.
Specifically, the thickness of the first support layer 11 is 30 to 60 micrometers, which is lower than that of the prior art support plate with a thickness of about 100 micrometers, so that the magnetic field force of the mask support structure 1 is reduced.
The mask supporting structure 1 provided by the present embodiment includes the first supporting layer 11 made of the first magnetic material and the second supporting layer 12 made of the second magnetic material, and because the magnetism of the second magnetic material is smaller than that of the first magnetic material, the complete mask supporting structure 1 does not generate an excessive magnetic force, that is, the mask supporting structure 1 is not easy to protrude upwards, thereby reducing the risk of crushing the substrate to be evaporated.
It should be noted that, for convenience of description, in the following embodiments, all the sectional views along the line a-a in fig. 4 are given in the following drawings, that is, the sectional views of the first supporting bar 111 and the third supporting bar 121.
Optionally, as shown in fig. 4 and fig. 5, in the mask supporting structure 1 provided in this embodiment, the third supporting strip 121 includes a first supporting portion 1211 and second supporting portions 1212 located at two sides of the first supporting portion 1211, or the fourth supporting strip 122 includes the first supporting portion 1211 and the second supporting portions 1212 located at two sides of the first supporting portion 1211, and a thickness of the first supporting portion 1211 is greater than a thickness of the second supporting portions 1212.
Specifically, in the process of using the mask support structure 1, the high-precision metal mask plate 3 needs to be installed on the second support portion 1212, and the flatness of the contact surface between the mask assembly including the mask support structure 1 and the high-precision metal mask plate 3 and the substrate to be evaporated can be improved by designing the thickness of the first support portion 1211 to be greater than that of the second support portion 1212, so that the high-precision metal mask plate 33 is further prevented from scratching the substrate to be evaporated.
Further, as shown in fig. 4 and 5, in the mask supporting structure 1 provided in the present embodiment, the thickness difference between the first supporting portion 1211 and the second supporting portion 1212 is equal to the thickness of the high-precision metal mask plate 33. At this moment, the contact surface of the mask assembly comprising the mask supporting structure 1 and the high-precision metal mask plate 3 and the substrate to be evaporated is the most flat.
Alternatively, as shown in fig. 4 and 5, in the mask supporting structure 1 provided in the present embodiment, both the first magnetic material and the second magnetic material are iron alloys including nickel. Specifically, by adjusting the ratio of iron to nickel, iron alloys having different magnetic properties, i.e., a first magnetic material and a second magnetic material having different magnetic properties, can be obtained.
For example, the first magnetic material may be Invar, which is an iron alloy containing 35.4% Ni and has a low coefficient of thermal expansion at room temperature (-20 deg.C, with an average of about 1.6 × 10) -6 /° c), which makes the deformation amount of the first supporting layer 11 in the vapor deposition layer small, and is beneficial to improving the accuracy of vapor deposition; and the magnetism of Invar material is good, can guarantee that the mask subassembly including mask bearing structure 1 and the magnetic member in the coating by vaporization equipment have sufficient magnetic field force to guarantee that the mask subassembly closely laminates with treating coating by vaporization base plate 4.
For example, the second magnetic material is 304 stainless steel, which is weaker than the Invar material, so that the magnetic force of the mask supporting structure 1 is moderate to prevent the mask supporting structure 1 from bulging upwards to damage the substrate to be evaporated.
Specifically, during the manufacturing process, the first support layer 11 needs to be formed first, and the second support layer 12 needs to be formed by using the electroforming technique. The electroforming method can ensure high patterning accuracy of the second support layer 12.
In the mask support structure 1 provided in the present application, the first support layer 11 and the second support layer 12 may be designed differently, which will be described in detail below.
For the first support layer 11, the specific design is as follows:
in some alternative embodiments, as shown in fig. 5 and 6, the first support bar 111 may be of conventional design, i.e. the thickness of the first support bar 111 is equal throughout. The conventional design of the first support bar 111 is beneficial to simplifying the manufacturing process of the first support bar 111, thereby reducing the production cost.
In other alternative embodiments, as shown in fig. 7, 8 and 11, the first support bar 111 and/or the second support bar 112 are provided with an etching groove 1110a (i.e. a half-etching design) on a side close to the second support layer 12.
In still other alternative embodiments, as shown in fig. 9, 10 and 12, the first and/or second support bars 111 and 112 are provided with etching through holes 1110b, and the width of the etching through holes 1110b is smaller than that of the first support portion 1211 (i.e., a full etching design). It should be noted that the width of the etching through hole 1110b refers to the length of the etching through hole in the direction perpendicular to the extending direction of the supporting strip, for example, if the first supporting strip 111 is provided with an etching through hole, the width of the etching through hole refers to the length of the etching through hole in the direction perpendicular to the first direction Y.
The first support strip 111 and/or the second support strip 112 are/is half-etched or fully-etched, that is, the first support strip 111 and/or the second support strip 112 are/is subjected to material reduction design, so that the magnetic effect of the first support layer 11 can be further reduced, and the risk of crushing the substrate to be evaporated is further reduced.
For the second support layer 12, the specific design is as follows:
in some alternative embodiments, as shown in fig. 5, 7 and 9, a gap is formed between the first support portion 1211 and the second support portion 1212 on the same third support strip 121 or the same fourth support strip 122. That is, the first support 1211 and the second support 1212 are designed to be separated from each other.
Because high accuracy metal mask plate 3 is overlap joint on second supporting portion 1212, consequently have the gap between first supporting portion 1211 and the second supporting portion 1212, more be favorable to the edge of high accuracy metal mask to stretch out to make the fold at high accuracy metal mask plate 3 edge can flatten, can improve the too big bad problems such as colour mixture that arouses of display screen edge material coating by vaporization shadow.
In other alternative embodiments, as shown in fig. 6, 10 and 12, the first support 1211 on the same third support strip 121 or fourth support strip 122 is connected to the second support 1212. That is, the first support 1211 and the second support 1212 are designed as a single body, which is more favorable for reducing the difficulty of the process of the second support layer 12.
As shown in fig. 5 to 10, various mask supporting structures 1 are provided, and in a specific application, an appropriate mask supporting structure 1 can be selected according to specific requirements such as the area, shape, precision and the like of a sub-pixel to be evaporated.
Based on the same inventive concept, the present application provides a mask assembly, as shown in fig. 13 and 14, the mask assembly provided in this embodiment includes the mask supporting structure 1 in the above embodiment, has the beneficial effects of the mask supporting structure 1 in the above embodiment, and is not described herein again.
Specifically, as shown in fig. 13 and 14, the mask assembly provided by the present embodiment further includes a support frame 2 and a high-precision metal mask plate 3, wherein the mask support structure 1 is fixed on the support frame 2, and the high-precision metal mask plate 3 is located on a side of the second support layer 12 away from the first support layer 11.
Specifically, as shown in fig. 13 and 14, in the mask assembly provided in this embodiment, the third supporting strip 121 includes a first supporting portion 1211 and a second supporting portion 1212, the fourth supporting strip 122 includes only the second supporting portion 1212, and the fourth supporting strip 122 includes the second supporting portion 1212 connected to the second supporting portion 1212 included in the third supporting strip 121. Or the fourth support bar 122 includes a first support portion 1211 and a second support portion 1212, the third support bar 121 includes only the second support portion 1212, and the third support bar 121 includes the second support portion 1212 connected to the second support portion 1212 included in the fourth support bar 122.
Specifically, as shown in fig. 5 to 10 and fig. 13 and 14, when the third supporting bars 121 include the first supporting portions 1211 and the second supporting portions 1212, the high-precision metal mask 3 includes a plurality of sub-masks extending in the first direction Y, and a distance between adjacent first supporting portions 1211 extending in the first direction Y is greater than a length of the sub-masks in a direction perpendicular to the first direction Y.
Specifically, as shown in fig. 5 to 10 and fig. 13 and 14, when the fourth supporting bars 122 include the first supporting portions 1211 and the second supporting portions 1212, the high-precision metal mask 3 includes a plurality of sub-masks extending along the second direction X, and a distance between adjacent first supporting portions 1211 extending along the second direction X is greater than a length of the sub-masks in a direction perpendicular to the second direction X.
Specifically, in the mask assembly provided by this embodiment, the high-precision metal mask plate 3 includes a plurality of sub-mask plates, the width of each sub-mask plate is smaller than the distance between adjacent first supporting portions 1211, that is, a gap is stored between the edge of each sub-mask plate and the first supporting portion 1211, in a general case, the width of the gap is in the range of 0.5mm to 1.5mm, the existence of the gap is more favorable for the edge of the high-precision metal mask to stretch, so that the folds at the edge of the high-precision metal mask plate 3 can be flattened, and the problem of poor color mixing and the like caused by the overlarge evaporation shadow of the material at the edge of the display screen can be improved. Thereby being beneficial to improving the evaporation quality.
The mask assembly provided by this embodiment is applied to an evaporation process of an organic light emitting material of an OLED display panel, and a using method of the mask assembly provided by this embodiment is described below with reference to fig. 15, and specifically is used according to the following steps:
1) assembling a support frame, a mask support structure 1 and a high-precision metal mask in the mask assembly;
2) placing the assembled mask assembly into an evaporation chamber, and moving the substrate 4 to be evaporated and the magnetic component downwards, wherein the high-precision metal mask plate 3 is attached to the substrate 4 to be evaporated due to the magnetism of the magnetic plate and the mask assembly;
3) and evaporating each layer of organic material, wherein each layer of organic material generally comprises an organic light-emitting layer material and at least one functional layer material, and the functional layer material comprises an electron injection layer material, an electron transport layer material, a hole injection layer material and a hole transport layer material.
By applying the embodiment of the application, at least the following beneficial effects can be realized:
(1) in the mask bearing structure and the mask subassembly that this application embodiment provided, the mask bearing structure includes the first supporting layer of making by first magnetic material and the second supporting layer of making by second magnetic material, and because the magnetism of second magnetic material is less than the magnetism of first magnetic material for complete mask bearing structure can not produce too big magnetic field force, also is that the mask bearing structure is difficult to upwards protruding, thereby reduces the risk of crushing wound treating the coating by vaporization base plate.
(2) In the process of using the mask supporting structure, the high-precision metal mask plate needs to be installed on the second supporting portion, the thickness of the first supporting portion is designed to be larger than that of the second supporting portion, the flatness of the contact surface between the mask assembly comprising the mask supporting structure and the high-precision metal mask plate and the evaporation substrate to be treated can be improved, and therefore the evaporation substrate is further prevented from being scratched by the high-precision metal mask plate.
(3) High accuracy metal mask board includes a plurality of sub-mask boards, and sub-mask board width is less than the distance between the adjacent first supporting part, also is the storage gap between the edge of sub-mask board and the first supporting part, and this edge that more is favorable to high accuracy metal mask is unfolded to make the fold at high accuracy metal mask flange edge can the exhibition flat, can improve the too big bad problems such as colour mixture that arouses of display screen edge material coating by vaporization shadow. Thereby being beneficial to improving the evaporation quality.
In the description of the present application, the directions or positional relationships indicated by the words "center", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like are for convenience of description or simplicity of describing the embodiments of the present application based on the exemplary directions or positional relationships shown in the drawings, and do not indicate or imply that the devices or components referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, are not to be construed as limiting the present application.
The terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present application, "a plurality" means two or more unless otherwise specified.
In the description herein, particular features, structures, materials, or characteristics may be combined in any suitable manner in any one or more embodiments or examples.
The foregoing is only a part of the embodiments of the present application, and it should be noted that, for those skilled in the art, other similar implementation means based on the technical idea of the present application may be adopted without departing from the technical idea of the present application, and the scope of protection of the embodiments of the present application also belongs to the embodiments of the present application.

Claims (10)

1. A mask support structure, comprising:
the first supporting layer is made of a first magnetic material and comprises a plurality of first supporting strips extending along a first direction and second supporting strips extending along a second direction;
the second supporting layer is made of a second magnetic material, is positioned on the first supporting layer and comprises a third supporting strip extending along the first direction and a fourth supporting strip extending along the second direction, the orthographic projection of the third supporting strip on the first supporting layer is positioned in the first supporting strip, and the orthographic projection of the fourth supporting strip on the first supporting layer is positioned in the second supporting strip;
the second magnetic material has a magnetic property weaker than that of the first magnetic material.
2. Mask support structure according to claim 1,
the third support bar includes first supporting part and is located the second supporting part of first supporting part both sides, perhaps the fourth support bar includes first supporting part and is located the second supporting part of first supporting part both sides, the thickness of first supporting part is greater than the thickness of second supporting part.
3. Mask support structure according to claim 2,
and etching grooves are formed in one side, close to the second supporting layer, of the first supporting strip and/or the second supporting strip.
4. Mask support structure according to claim 2,
the first supporting strip and/or the second supporting strip are/is provided with etching through holes, and the width of each etching through hole is smaller than that of the corresponding first supporting part.
5. The mask support structure of claim 2, wherein a gap is formed between the first support portion and the second support portion on the same third support bar or the same fourth support bar.
6. The mask support structure of claim 2, wherein the first support portion and the second support portion are connected to the same third support bar or the same fourth support bar.
7. Mask support structure according to claim 5 or 6,
the third supporting bar comprises a first supporting part and a second supporting part, the fourth supporting bar only comprises the second supporting part, and the second supporting part of the fourth supporting bar is connected with the second supporting part of the third supporting bar; or
The fourth support bar includes first supporting part and second supporting part, the third support bar only includes the second supporting part, just the third support bar including the second supporting part with the second supporting part that the fourth support bar includes is connected.
8. A mask assembly, comprising:
a support frame;
the mask support structure of any one of claims 1-7, secured to the support frame;
and the high-precision metal mask plate is positioned on one side of the second supporting layer, which is far away from the first supporting layer.
9. A mask assembly according to claim 8, wherein the difference in thickness between the first support portion and the second support portion is equal to the thickness of the high-precision metal mask plate.
10. A mask assembly according to claim 9,
when the third supporting bars comprise the first supporting parts and the second supporting parts, the high-precision metal mask plate comprises a plurality of sub-mask plates extending along a first direction, and the distance between every two adjacent first supporting parts extending along the first direction is larger than the length of the sub-mask plates in the direction perpendicular to the first direction;
when the fourth supporting bar includes first supporting portion with during the second supporting portion, high accuracy metal mask plate includes a plurality of sub-mask plates that extend along the second direction, then follows adjacent that the second direction extends distance between the first supporting portion is greater than sub-mask plate with the length in the second direction vertically direction.
CN202220767245.7U 2022-03-31 2022-03-31 Mask supporting structure and mask assembly Active CN217517016U (en)

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Application Number Priority Date Filing Date Title
CN202220767245.7U CN217517016U (en) 2022-03-31 2022-03-31 Mask supporting structure and mask assembly

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Application Number Priority Date Filing Date Title
CN202220767245.7U CN217517016U (en) 2022-03-31 2022-03-31 Mask supporting structure and mask assembly

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CN217517016U true CN217517016U (en) 2022-09-30

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