CN217473133U - Absorption device for generating silicon dioxide through tail gas hydrolysis reaction - Google Patents
Absorption device for generating silicon dioxide through tail gas hydrolysis reaction Download PDFInfo
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- CN217473133U CN217473133U CN202221164187.5U CN202221164187U CN217473133U CN 217473133 U CN217473133 U CN 217473133U CN 202221164187 U CN202221164187 U CN 202221164187U CN 217473133 U CN217473133 U CN 217473133U
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Abstract
The utility model discloses an absorbing device that tail gas hydrolysis reaction produced silica, include: material dispersion mechanism includes: the tail gas treatment device comprises a first material dispersing mechanism and a second material dispersing mechanism, wherein the first material dispersing mechanism is arranged at the periphery of the second material dispersing mechanism, or the second material dispersing mechanism is arranged at the periphery of the first material dispersing mechanism, the first material dispersing mechanism is used for dispersing tail gas, and the second material dispersing mechanism is used for dispersing liquid water or water vapor; and the mixing reactor is connected with the material dispersing mechanism, and substances to be hydrolyzed contained in the tail gas in the mixing reactor and liquid water or water vapor are subjected to hydrolysis reaction to generate silicon dioxide. The utility model provides an absorbing device for the material that is hydrolyzed takes place hydrolysis reaction with water and generates silica, can not cause the jam, has avoided hydrolysis reaction to generate the clear stifled problem of jam pipeline, shut down production that orthosilicic acid leads to.
Description
Technical Field
The utility model belongs to the technical field of zircon sand chlorination production, concretely relates to tail gas hydrolysis generates absorbing device of silica.
Background
The zircon sand boiling chlorination method is the most advanced zirconium tetrachloride production process at present, and has the advantages of high product quality, low production cost, high raw material utilization rate and the like. The method comprises the steps of reacting a mixture of zircon sand and a reducing agent in a fluidized bed reactor to prepare zirconium tetrachloride and simultaneously obtain a byproduct of silicon tetrachloride, wherein the reducing agent comprises charcoal, petroleum coke, coal powder and the like. The zirconium tetrachloride synthetic gas produced by the chlorination method has the advantages of complex components, higher separation process difficulty, high separation energy consumption and low zirconium tetrachloride recovery rate, and after the zirconium tetrachloride is desublimated and condensed and absorbed, tail gas mainly contains silicon tetrachloride, carbon monoxide, carbon dioxide and chlorine.
The common treatment method of the silicon tetrachloride in the tail gas is that water is absorbed by an elution tower, but the reaction product of the silicon tetrachloride and the water is viscous orthosilicic acid, which is very easy to block pipelines and packing of the elution tower, and the production is stopped for cleaning.
SUMMERY OF THE UTILITY MODEL
The utility model aims to solve the technical problem that to the above-mentioned not enough that exists among the prior art, provide an absorbing device that tail gas hydrolysis reaction generated silica, solved the hydrolysis reaction and generated the jam pipeline that orthosilicic acid leads to, the clear stifled problem of stopping production.
Solve the utility model discloses technical scheme that technical problem adopted provides an absorbing device that tail gas hydrolysis reaction generated silica, include:
material dispersion mechanism includes: the tail gas treatment device comprises a first material dispersing mechanism and a second material dispersing mechanism, wherein the first material dispersing mechanism is arranged at the periphery of the second material dispersing mechanism, or the second material dispersing mechanism is arranged at the periphery of the first material dispersing mechanism, the first material dispersing mechanism is used for dispersing tail gas, and the second material dispersing mechanism is used for dispersing liquid water or water vapor;
and the mixed reactor is connected with the material dispersing mechanism, and substances to be hydrolyzed contained in tail gas in the mixed reactor and liquid water or water vapor are subjected to hydrolysis reaction to generate silicon dioxide.
Preferably, the first material dispersing mechanism is a first gas distributor, and the second material dispersing mechanism is a second gas distributor or an atomizer, wherein the second gas distributor is used for dispersing water vapor, and the atomizer is used for dispersing liquid water.
Preferably, the second gas distributor is disposed at the periphery of the first gas distributor.
Preferably, the first gas distributor is arranged at the periphery of the atomizer.
Preferably, the material dispersing mechanism is arranged at the top of the mixing reactor, the top of the mixing reactor is provided with a mixing reactor inlet, and an outlet of the material dispersing mechanism is butted with the mixing reactor inlet.
Preferably, the absorption device for generating silica by reaction further includes:
and the heater is connected with the inlet of the first material dispersing mechanism and is used for heating tail gas.
Preferably, the absorption device for generating silica by reaction further includes:
and the gas-solid separator is connected with the mixing reactor and is used for carrying out gas-solid separation on the tail gas of the mixing reactor and separating solid silicon dioxide in the tail gas of the mixing reactor.
Preferably, the gas-solid separator includes:
the inlet of the cyclone separator is connected with the mixing reactor, and the cyclone separator is used for carrying out cyclone separation on the tail gas of the mixing reactor to separate the solid silicon dioxide;
and the bag-type dust collector is connected with the cyclone separator and is used for filtering and separating the tail gas of the cyclone separator to separate the solid silicon dioxide.
Preferably, the absorption device for generating silica by reaction further comprises:
and the heat exchanger is respectively connected with the mixing reactor and the gas-solid separator, and the tail gas to enter the mixing reactor and the tail gas discharged from the outlet of the gas-solid separator exchange heat through the heat exchanger.
Preferably, the absorption device for generating silica by reaction further comprises:
the first receiver is connected with the mixing reactor and is used for receiving the solid silicon dioxide discharged by the mixing reactor;
and the second receiver is connected with the gas-solid separator and is used for receiving the solid silicon dioxide discharged by the gas-solid separator.
The utility model provides a tail gas hydrolysis reaction generates silicon dioxide's absorbing device for the material by the hydrolysis and the hydrolysis reaction of water generation silicon dioxide can not cause the jam, has avoided the hydrolysis reaction to generate the clear stifled problem of jam pipeline, shut down of orthosilicic acid and lead to. The absorption device is suitable for treating a small amount of silicon tetrachloride in tail gas in the chlorination production of zircon sand, and is also suitable for treating silicon dioxide generated by the hydrolysis reaction of dichlorosilane and trichlorosilane.
Drawings
FIG. 1 is a schematic structural diagram of an absorption apparatus for producing silica by hydrolysis reaction of tail gas in embodiment 2 of the present invention;
FIG. 2 is a partial plan view of an absorption apparatus for producing silica by hydrolysis reaction of off-gas in embodiment 2 of the present invention;
FIG. 3 is a partial sectional view of an absorption apparatus for generating silica by hydrolysis reaction of tail gas in embodiment 2 of the present invention;
FIG. 4 is a schematic structural diagram of an absorption apparatus for generating silica by hydrolysis reaction of tail gas in embodiment 2 of the present invention;
FIG. 5 is a partial plan view of an absorption apparatus for generating silica by hydrolysis reaction of off-gas in embodiment 2 of the present invention;
fig. 6 is a partial sectional view of an absorption apparatus for generating silica by hydrolysis reaction of exhaust gas according to embodiment 2 of the present invention.
In the figure: 1-a heat exchanger; 2-a heater; 3-a second material dispersion mechanism; 4-a first material dispersing mechanism; 5-a mixing reactor; 6-a first receiver; 7-a cyclone separator; 8-bag dust collector; 9-a first sub-receiver; 10-a second sub-receiver; 11-exhaust hole.
Detailed Description
In order to make the technical solution of the present invention better understood by those skilled in the art, the present invention will be described in further detail with reference to the accompanying drawings and specific embodiments.
Reference will now be made in detail to embodiments of the present patent, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are exemplary only for the purpose of explaining the present patent and are not to be construed as limiting the present patent.
Example 1
This embodiment provides an absorbing device for tail gas hydrolysis reaction generates silica, includes:
material dispersion mechanism includes: the tail gas treatment device comprises a first material dispersing mechanism and a second material dispersing mechanism, wherein the first material dispersing mechanism is arranged at the periphery of the second material dispersing mechanism, or the second material dispersing mechanism is arranged at the periphery of the first material dispersing mechanism, the first material dispersing mechanism is used for dispersing tail gas, and the second material dispersing mechanism is used for dispersing liquid water or water vapor;
and the mixing reactor is connected with the material dispersing mechanism, and substances to be hydrolyzed contained in the tail gas in the mixing reactor and liquid water or water vapor are subjected to hydrolysis reaction to generate silicon dioxide.
The absorption device for generating silicon dioxide through tail gas hydrolysis reaction in the embodiment enables hydrolyzed substances and water to generate silicon dioxide through hydrolysis reaction, cannot cause blockage, and avoids the problems of pipeline blockage and production stoppage and blockage removal caused by the fact that orthosilicic acid is generated through hydrolysis reaction. The absorption device is suitable for treating a small amount of silicon tetrachloride in tail gas in the chlorination production of zircon sand, and is also suitable for treating silicon dioxide generated by the hydrolysis reaction of dichlorosilane and trichlorosilane.
Example 2
As shown in fig. 1 to 6, the present embodiment provides an absorption apparatus for generating silica through a tail gas hydrolysis reaction, including:
material dispersion mechanism includes: the tail gas treatment device comprises a first material dispersing mechanism 4 and a second material dispersing mechanism 3, wherein the first material dispersing mechanism 4 is arranged at the periphery of the second material dispersing mechanism 3, or the second material dispersing mechanism 3 is arranged at the periphery of the first material dispersing mechanism 4, the first material dispersing mechanism 4 is used for dispersing tail gas, and the second material dispersing mechanism 3 is used for dispersing liquid water or water vapor;
and the mixing reactor 5 is connected with the material dispersing mechanism, and substances to be hydrolyzed contained in the tail gas in the mixing reactor 5 and liquid water or water vapor are subjected to hydrolysis reaction to generate silicon dioxide.
Preferably, the first material dispersing mechanism 4 is a first gas distributor, and the second material dispersing mechanism 3 is a second gas distributor or an atomizer, wherein the second gas distributor is used for dispersing water vapor, and the atomizer is used for dispersing liquid water.
Preferably, as shown in fig. 1 to 3, the second gas distributor is disposed at the periphery of the first gas distributor. The second gas distributor is used for distributing water vapor, and the second gas distributor is arranged at the periphery, so that the contact of tail gas with the wall of the mixing reactor 5 is reduced, and the corrosion of the tail gas to the wall of the mixing reactor 5 is reduced.
After passing through the second gas distributor, the water vapor is sprayed out from a gas nozzle of the second gas distributor, which is inserted into the mixing reactor 5, wherein the spraying area is conical and is towards the middle part of the mixing reactor 5 along the wall direction of the mixing reactor 5; after passing through the first gas distributor, the tail gas is sprayed out from a gas nozzle of the first gas distributor, which is inserted into the mixing reactor 5, wherein the spraying area is conical and is towards the wall part of the mixing reactor 5 along the vertical direction; the gases from the nozzles of the two gas distributors meet, mix and react in the inner region of the mixing reactor 5.
Preferably, as shown in fig. 4 to 6, the first gas distributor is disposed at the periphery of the atomizer. The atomizer disperses liquid water, which is a large quantity compared to gas, so it is sufficient to place the atomizer in the middle, and the water entering the atomizer is water with a preset temperature.
After passing through the first gas distributor, the tail gas is sprayed out from a gas nozzle of the first gas distributor, which is inserted into the mixing reactor 5, wherein the spraying area is conical and is towards the middle part of the mixing reactor 5 along the wall direction of the mixing reactor 5; after water at a certain temperature passes through the atomizer, the water is sprayed into fog drops in a conical shape by taking a vertical line as a center; the fog drops and the tail gas meet, mix and react in the inner area of the mixing reactor 5; atomizers include, but are not limited to, rotary atomizers, pressure atomizers, two-fluid atomizers.
Preferably, the second material distribution mechanism 3 is concentrically arranged with the first material distribution mechanism 4.
Preferably, the material dispersing means is arranged concentrically with the mixing reactor 5.
Preferably, the material dispersing mechanism is arranged at the top of the mixing reactor 5, the top of the mixing reactor 5 is provided with a mixing reactor inlet, and an outlet of the material dispersing mechanism is butted with the mixing reactor inlet.
The first material dispersing mechanism 4 makes the tail gas uniformly distributed in the mixing reactor 5 and fully mixed with the steam or atomized water from the second material dispersing mechanism 3. Compared with the steam ejector scheme in the prior art, the technical scheme in the embodiment adopts steam or atomized water to replace steam, and greatly reduces energy consumption. The atomizer adopts a rotary atomizing disk or a pressure atomizer to atomize water.
By adopting the technical scheme, the second gas distributor is a steam distributor, the atomizer is a water atomizer, and the steam distributor or the water atomizer enables steam or atomized water to be uniformly distributed in the mixing reactor 5 and uniformly mixed with tail gas; compared with the scheme of the steam ejector, the steam ejector can form negative pressure only by ejecting a large amount of steam and is uniformly mixed with tail gas; in the scheme, the tail gas is uniformly mixed with water or water vapor through the first gas distributor and the steam distributor or the atomizer, so that the steam consumption can be greatly reduced compared with the scheme of a steam ejector; the first gas distributor is used for uniformly distributing the tail gas and the water vapor or the atomized water in the mixing reaction vessel or distributing the tail gas and the water vapor or the atomized water to a specific point, such as the simplest flower disc, and the gas is uniformly added into the mixing reactor 5 through a plurality of uniform gas outlets. The atomizer is used for changing liquid into water mist or liquid mist, for example, a common spray head for spraying pesticides is one type of atomizer, a household watering sprinkling can is also one type of atomizer, and a household humidifier is also one type of atomizer.
By adopting the technical scheme, the tail gas in the mixing reactor 5 is uniformly mixed with the water vapor or atomized water and reacts to form hydrogen chloride and silicon dioxide; compared with the steam ejector scheme, the mixing reactor 5 is provided with a larger space, the silicon dioxide generated by the reaction can directly fall on the bottom of the mixing reactor 5, and the bottom of the mixing reactor 5 is connected with the first receiver 6, so that slag can be discharged conveniently.
Preferably, the absorption device for generating silica by reaction further includes:
and the heater 2 is connected with an inlet of the first material dispersing mechanism 4, and the heater 2 is used for heating tail gas.
Preferably, the absorption device for generating silica by reaction further includes:
and the gas-solid separator is connected with the mixing reactor 5 and is used for carrying out gas-solid separation on the tail gas of the mixing reactor 5 and separating solid silicon dioxide in the tail gas of the mixing reactor 5.
The exhaust hole 11 of the mixing reactor 5 is arranged on the side surface below the mixing reactor 5, the exhaust hole 11 of the mixing reactor 5 is higher than the stacking height of the solid materials stacked in the mixing reactor 5, and meanwhile, the exhaust hole 11 of the mixing reactor 5 is arranged on the side surface below the mixing reactor 5 so that the materials in the mixing reactor 5 are fully mixed and reacted, the reaction materials enter from the upper part and are discharged from the lower part, and the longest reaction contact time is obtained.
Preferably, the gas-solid separator includes:
an inlet of the cyclone separator 7 is connected with the mixing reactor 5, and the cyclone separator 7 is used for performing cyclone separation on the tail gas of the mixing reactor 5 to separate solid silicon dioxide;
and the bag-type dust collector 8 is connected with the cyclone separator 7, and the bag-type dust collector 8 is used for filtering and separating the tail gas of the cyclone separator 7 to separate the lower solid silicon dioxide.
Preferably, the absorption device for generating silica by reaction further comprises:
and the heat exchanger 1 is respectively connected with the mixing reactor 5 and the gas-solid separator, and the tail gas to enter the mixing reactor 5 and the tail gas discharged from the outlet of the gas-solid separator exchange heat through the heat exchanger 1.
Specifically, the heat exchanger 1 in the embodiment is respectively connected with the heater 2 and the bag-type dust collector 8, and the heat exchanger 1 exchanges heat between the tail gas entering the heat exchanger 1 and the gas filtered by the bag-type dust collector 8 after entering the mixing reactor 5; the temperature of the tail gas passing through the bag-type dust collector 8 is 100-200 ℃, and the temperature of the tail gas introduced into the heat exchanger 1 is-30-10 ℃.
By adopting the technical scheme, the heater 2 heats the tail gas according to the reaction condition in the mixing reactor 5 to the process temperature of 100-300 ℃.
Preferably, the absorption device for generating silica by reaction further includes:
a first receiver 6 connected to the mixing reactor 5, the first receiver 6 being adapted to receive the solid silica discharged from the mixing reactor 5;
and the second receiver is connected with the gas-solid separator and is used for receiving the solid silicon dioxide discharged by the gas-solid separator.
By adopting the technical scheme, the first receiver 6 separates silica generated by reaction in the mixing reactor 5 from other substances and discharges the silica out of the mixing reactor 5.
The second receiver comprises a first sub-receiver 9 and a second sub-receiver 10, the first sub-receiver 9 is connected with the cyclone separator 7, the first sub-receiver 9 is used for receiving the solid silica separated by the cyclone separator 7, separating the solid silica from other substances and discharging the solid silica out of the cyclone separator 7; the second sub-receiver 10 is connected with the bag-type dust collector 8, and the second sub-receiver 10 is used for receiving solid silicon dioxide filtered by the bag-type dust collector 8, separating the solid silicon dioxide from other substances and discharging the solid silicon dioxide outside the bag-type dust collector 8.
The absorption device in this embodiment further comprises a control cabinet connected with the components of the absorption device and corresponding connecting pipelines.
By adopting the technical scheme, the tail gas enters and is discharged from the absorption device, and power control is provided outside the absorption device. By adopting the technical scheme, the control cabinet controls the process parameters and realizes automatic production.
Adopt above-mentioned each technical scheme, provide an absorbing device that tail gas hydrolysis reaction generates silica, the tail gas heats before entering mixing reactor 5, heats to the uniform temperature, the atomizing water or the steam that obtain through first material dispersion mechanism 4 and second material dispersion mechanism 3 is even mixed and reacts, generate dry silica, through first receiver 6, first sub-receiver 9, second sub-receiver 10, cyclone 7, sack cleaner 8 discharge silica, the tail gas that has handled through this device continues to get into former tail gas system and handles.
The absorption device in the embodiment is suitable for treating a small amount of silicon tetrachloride in tail gas generated in the chlorination production of zircon sand, and is also suitable for treating silicon dioxide generated by the hydrolysis reaction of the tail gas containing dichlorosilane and trichlorosilane.
The method comprises the steps of introducing chlorine into a mixture of zircon sand and a reducing agent in a fluidized bed reactor to react to prepare zirconium tetrachloride and simultaneously produce silicon tetrachloride as a byproduct, wherein the reducing agent comprises charcoal, petroleum coke, coal powder and the like. The zirconium tetrachloride synthetic gas produced by the chlorination method has complex components, higher separation process difficulty, large separation energy consumption and low zirconium tetrachloride recovery rate, and after the zirconium tetrachloride is desublimated and condensed and absorbed, tail gas produced by chlorination of zircon sand mainly contains silicon tetrachloride, carbon monoxide, carbon dioxide and chlorine. Specifically, in the embodiment, the content of silicon tetrachloride in the tail gas generated in the chlorination production of zircon sand is 1-15 vol%.
The absorption device for generating silicon dioxide through tail gas hydrolysis reaction in the embodiment enables hydrolyzed substances and water to generate silicon dioxide through hydrolysis reaction, cannot cause blockage, and avoids the problems of pipeline blockage and production stoppage and blockage removal caused by the fact that orthosilicic acid is generated through hydrolysis reaction.
It is to be understood that the above embodiments are merely exemplary embodiments that have been employed to illustrate the principles of the present invention, and that the present invention is not limited thereto. It will be apparent to those skilled in the art that various modifications and improvements can be made without departing from the spirit and substance of the invention, and these modifications and improvements are also considered to be within the scope of the invention.
Claims (10)
1. An absorption device for generating silicon dioxide by tail gas hydrolysis reaction is characterized by comprising:
material dispersion mechanism includes: the tail gas treatment device comprises a first material dispersing mechanism and a second material dispersing mechanism, wherein the first material dispersing mechanism is arranged at the periphery of the second material dispersing mechanism, or the second material dispersing mechanism is arranged at the periphery of the first material dispersing mechanism, the first material dispersing mechanism is used for dispersing tail gas, and the second material dispersing mechanism is used for dispersing liquid water or water vapor;
and the mixed reactor is connected with the material dispersing mechanism, and substances to be hydrolyzed contained in tail gas in the mixed reactor and liquid water or water vapor are subjected to hydrolysis reaction to generate silicon dioxide.
2. The absorption apparatus for generating silica by reaction of claim 1 wherein the first material dispersing mechanism is a first gas distributor and the second material dispersing mechanism is a second gas distributor or an atomizer, wherein the second gas distributor is used for dispersing water vapor and the atomizer is used for dispersing liquid water.
3. The apparatus of claim 2, wherein the second gas distributor is disposed about the first gas distributor.
4. The apparatus of claim 2, wherein the first gas distributor is disposed about the periphery of the atomizer.
5. The absorption device for generating silica by reaction according to claim 1, wherein the material dispersing mechanism is disposed at the top of the mixing reactor, the top of the mixing reactor is provided with an inlet of the mixing reactor, and an outlet of the material dispersing mechanism is butted with the inlet of the mixing reactor.
6. The absorption apparatus for generating silica by reaction according to any one of claims 1 to 5, further comprising:
and the heater is connected with the inlet of the first material dispersing mechanism and is used for heating tail gas.
7. The absorption apparatus for generating silica by reaction according to any one of claims 1 to 5, further comprising:
and the gas-solid separator is connected with the mixing reactor and is used for carrying out gas-solid separation on the tail gas of the mixing reactor and separating solid silicon dioxide in the tail gas of the mixing reactor.
8. The absorption apparatus for silica formed by reaction of claim 7 wherein the gas-solid separator comprises:
the inlet of the cyclone separator is connected with the mixing reactor, and the cyclone separator is used for carrying out cyclone separation on the tail gas of the mixing reactor to separate the solid silicon dioxide;
and the bag-type dust collector is connected with the cyclone separator and is used for filtering and separating the tail gas of the cyclone separator to separate the lower solid silicon dioxide.
9. The absorption apparatus for silica formed by reaction of claim 7 further comprising:
and the heat exchanger is respectively connected with the mixing reactor and the gas-solid separator, and exchanges heat between the tail gas to enter the mixing reactor and the tail gas discharged from the outlet of the gas-solid separator through the heat exchanger.
10. The absorption apparatus for silica formed by reaction of claim 7 further comprising:
the first receiver is connected with the mixing reactor and is used for receiving the solid silicon dioxide discharged by the mixing reactor;
and the second receiver is connected with the gas-solid separator and is used for receiving the solid silicon dioxide discharged by the gas-solid separator.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221164187.5U CN217473133U (en) | 2022-05-13 | 2022-05-13 | Absorption device for generating silicon dioxide through tail gas hydrolysis reaction |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202221164187.5U CN217473133U (en) | 2022-05-13 | 2022-05-13 | Absorption device for generating silicon dioxide through tail gas hydrolysis reaction |
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| CN217473133U true CN217473133U (en) | 2022-09-23 |
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| CN202221164187.5U Active CN217473133U (en) | 2022-05-13 | 2022-05-13 | Absorption device for generating silicon dioxide through tail gas hydrolysis reaction |
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