CN217468367U - Silicon wafer storage device - Google Patents

Abstract

The utility model discloses a silicon wafer storage device, which comprises a plurality of supports and storage rods, wherein the storage rods surround a storage space for storing silicon wafers, two ends of each storage rod are respectively connected with the supports, each storage rod is provided with a plurality of storage teeth along the height direction thereof at intervals, and a silicon wafer is stored between two adjacent storage teeth; wherein: deposit the tooth and be the toper tooth, and the tooth width along keeping away from the direction of depositing the pole and reduce gradually, and adjacent two are deposited interval between the tooth and are increased gradually along keeping away from the direction of depositing the pole. The silicon wafer storage device can play a role in guiding the silicon wafer in the process of placing the silicon wafer, better avoids the phenomenon of damage of the silicon wafer when the silicon wafer is placed and taken out, and reduces the waste wafer rate.

Description

Silicon wafer storage device

Technical Field

The utility model relates to the field of photovoltaic technology, especially, relate to a silicon chip strorage device.

Background

With the rapid development of the photovoltaic industry, competition in the industry is increasingly strong, and photovoltaic enterprises have higher and higher requirements for improving the production and storage yield of silicon wafers. Current strorage device is the basket of flowers structure, appears the damaged phenomenon of silicon chip easily when putting into the basket of flowers with the silicon chip, has promoted the scrap rate.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a silicon chip strorage device, this silicon chip strorage device can play the guide effect to the silicon chip at the in-process of putting into the silicon chip, avoids the silicon chip to appear damaged phenomenon when laying and taking out betterly, has reduced the sweeps rate.

For realizing the above technical effect, the technical scheme of the utility model as follows:

the utility model discloses a silicon chip strorage device, include: a support; the silicon wafer storage device comprises a plurality of storage rods, a bracket and a plurality of storage teeth, wherein the storage rods surround a storage space for storing silicon wafers, two ends of each storage rod are connected to the bracket respectively, a plurality of storage teeth are arranged on each storage rod at intervals along the height direction of the storage rod, and one silicon wafer is stored between every two adjacent storage teeth; wherein: deposit the tooth and be the toper tooth, the tooth width along keeping away from deposit the pole in the direction reduce gradually, adjacent two deposit the interval between the tooth along keeping away from deposit the pole in the direction increase gradually.

In some embodiments, the storage teeth are of a quadrangular frustum pyramid structure, and an included angle a between an edge of each storage tooth and the horizontal direction is a, and a satisfies the relation: a is more than or equal to 3 degrees and less than or equal to 15 degrees.

In some embodiments, the plurality of storage rods are divided into a plurality of groups, and each group of storage rods is used for storing a plurality of silicon wafers which are arranged at intervals along the vertical direction.

In some specific embodiments, the plurality of storage rods are divided into at least four groups.

In some specific embodiments, the silicon wafer is a half silicon wafer, and each group of the storage rods comprises first stand columns matched with two long sides of the silicon wafer and second stand columns matched with one short side of the silicon wafer.

In some more specific embodiments, the first column located at the outermost side of the plurality of first columns is provided with one row of the storage teeth, the rest of the first columns are provided with two rows of the storage teeth, and the two rows of the storage teeth are symmetrically arranged around the axis of the first column, and/or: and a row of storage teeth are arranged on the second upright post.

In some more specific embodiments, each set of the holding rods further comprises a stopper pillar fitted into the other short side of the silicon wafer, the stopper pillar being detachably attached to the holder in the direction of the long side of the silicon wafer.

In some optional embodiments, the bracket is provided with a clamping groove with an open end, and two ends of the limiting upright post are respectively provided with a clamping joint matched with the clamping groove.

In some optional embodiments, the side of the limiting upright column close to the silicon wafer is provided with the storage teeth.

In some embodiments, the support comprises two support plates arranged at intervals, the support plates are provided with matching holes, two ends of the storage rod are respectively matched with the matching holes, the matching holes are threaded holes, and two ends of the storage rod are respectively provided with matching threads.

The utility model discloses a silicon chip strorage device's beneficial effect: because the width of the storage teeth for storing the silicon wafers is gradually reduced along the direction far away from the storage rod, the distance between every two adjacent storage teeth is gradually increased along the direction far away from the storage rod, when the silicon wafers are supported by the storage teeth, the silicon wafers are in point contact with the storage teeth, the stable support of the storage teeth on the silicon wafers can be ensured, the contact area of the silicon wafers and the storage teeth can be reduced, and the possibility that the silicon wafers are damaged by the storage teeth is reduced. And the inclined storage teeth can also play a role in guiding when the silicon wafer enters the inner space surrounded by the plurality of storage rods, so that the silicon wafer can be smoothly placed in the inner space surrounded by the plurality of storage rods.

Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.

Drawings

Fig. 1 is a schematic structural diagram of a silicon wafer storage device according to an embodiment of the present invention;

FIG. 2 is an enlarged schematic view of FIG. 1 at circle A;

fig. 3 is a schematic partial structure diagram of a storage column according to an embodiment of the present invention.

Reference numerals:

1. a support plate; 11. a mating hole; 12. a clamping groove;

2. a storage rod; 201. storing the teeth; 21. a first upright post; 22. a second upright post; 23. a limiting upright post; 231. and (4) clamping a connector.

Detailed Description

In order to make the technical problem solved by the present invention, the technical solution adopted by the present invention and the technical effect achieved by the present invention clearer, the technical solution of the present invention will be further explained by combining the drawings and by means of the specific implementation manner.

In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", and the like, indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention.

Furthermore, features defined as "first" and "second" may explicitly or implicitly include one or more of the features for distinguishing between descriptive features, non-sequential, non-trivial and non-trivial. In the description of the present invention, "a plurality" means two or more unless otherwise specified.

In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.

The specific structure of the silicon wafer storage device according to the embodiment of the present invention will be described with reference to fig. 1 to 3.

The utility model discloses a silicon chip strorage device, as shown in fig. 1, the silicon chip strorage device of this embodiment includes the support and deposits pole 2, and it is a plurality of to deposit pole 2, and a plurality of pole 2 that deposit surround into the parking space that is used for depositing the silicon chip, and every both ends of depositing pole 2 are connected respectively on the support, and every deposits and is provided with a plurality of teeth 201 of depositing along its direction of height interval on the pole 2, and adjacent two deposit and have deposited a silicon chip between the tooth 201. Deposit tooth 201 and eat for the toper, and the tooth width along keeping away from depositing pole 2 in the direction taper, the interval between two adjacent deposit teeth 201 along keeping away from depositing pole 2 in the direction taper increase.

It can be understood that, since the storage teeth 201 for storing silicon wafers in the present embodiment are tapered teeth, and the tooth width gradually decreases in a direction away from the storage rod 2, the distance between two adjacent storage teeth 201 gradually increases in a direction away from the storage rod 2. That is to say, in this embodiment, the contact position between the storage teeth 201 and the silicon wafer is an inclined plane, so that when the storage teeth 201 support the silicon wafer, the silicon wafer and the storage teeth 201 are in point contact, which not only ensures the stable support of the storage teeth 201 to the silicon wafer, but also reduces the contact area between the silicon wafer and the storage teeth 201, thereby reducing the possibility of damage to the silicon wafer by the storage teeth 201. Meanwhile, when the silicon wafer is placed in the silicon wafer storage device in the embodiment, the distance between the silicon wafer and the storage teeth 201 in the vertical direction is gradually reduced and finally becomes zero, and compared with a straight tooth structure in the prior art, before the distance between the silicon wafer and the storage teeth 201 in the vertical direction becomes zero, the silicon wafer and the storage teeth 201 cannot contact at all, so that friction possibly generated between the silicon wafer and the storage teeth 201 is avoided, and the possibility that the silicon wafer is damaged by the storage teeth 201 is further reduced. In addition, the inclined storage teeth 201 can also play a role in guiding silicon wafers when the silicon wafers enter the inner space surrounded by the plurality of storage rods 2, so that the silicon wafers can be smoothly placed in the inner space surrounded by the plurality of storage rods 2.

In some embodiments, as shown in fig. 3, the storage tooth 201 has a quadrangular frustum pyramid structure, and an angle a between an edge of the storage tooth 201 and the horizontal direction is a, where a satisfies the following relation: a is more than or equal to 3 degrees and less than or equal to 15 degrees. It can be appreciated that the quadrangular frustum pyramid structure is well machined, and the machining process of the storage teeth 201 can be simplified, so that the machining cost of the storage teeth 201 is reduced. It should be noted that the smaller the included angle between the edge of the storage tooth 201 and the horizontal direction is, the easier the silicon wafer rubs against the storage tooth 201 when the silicon wafer is placed, and the larger the included angle between the edge of the storage tooth 201 and the horizontal direction is, the larger the inclination generated after the silicon wafer is placed may be, thereby being not beneficial to subsequent correction, in this embodiment, the included angle between the edge of the storage tooth 201 and the horizontal direction is 3 ° to 15 °, which can not only avoid the silicon wafer from rubbing against the storage tooth 201, but also avoid the silicon wafer from inclining, and is convenient to correct. Preferably, a is more than or equal to 7 degrees and less than or equal to 12 degrees, and of course, in other embodiments of the present invention, the included angle between the edge of the storage tooth 201 and the horizontal direction can also be selected according to actual needs, and is not limited to 3 degrees to 15 degrees in this embodiment.

In some embodiments, the plurality of storage rods 2 are divided into a plurality of groups, and each group of storage rods 2 is used for storing a plurality of silicon wafers arranged at intervals in the vertical direction. It can be understood that the plurality of storage rods 2 are divided into a plurality of groups of silicon wafers which can be lifted to be placed, so that the production requirement of the battery piece is met.

In some specific embodiments, the plurality of storage rods 2 are divided into at least four groups. It should be noted here that the number of sets of the storage rods 2 can be selected according to actual needs, and is not limited to at least four sets of the present embodiment, and may be any number of two sets, three sets, or more than four sets.

In some specific embodiments, as shown in fig. 1, the silicon wafer is a half silicon wafer, and each set of the holding rods 2 includes a first upright post 21 engaged on two long sides of the silicon wafer and a second upright post 22 engaged on one short side of the silicon wafer. It can be understood that, since the silicon wafers are rectangular, each group of the storage rods 2 includes the first upright post 21 and the second upright post 22, which can support three sides of the silicon wafers, and ensure that each group of the storage rods 2 can stably support the silicon wafers, thereby ensuring the reliability of the silicon wafer storage device of the embodiment. In addition, what the silicon chip strorage device of this embodiment deposited is that half silicon chip can promote the holding capacity of strorage device.

In some more specific embodiments, as shown in fig. 1, the first upright 21 located at the outermost side among the plurality of first uprights 21 is provided with one row of storage teeth 201, the remaining first uprights 21 are provided with two rows of storage teeth 201, and the two rows of storage teeth 201 are symmetrically arranged about the axis of the first upright 21. From this, the first stand 21 in the adjacent two sets of depositing pole 2 can share, particularly, when needs place two rows of silicon chips, only need set up three rows of first stand 21 can, wherein have on the first stand 21 of both sides and deposit tooth 201, be equipped with on the first stand 21 in the middle of two rows and deposit tooth 201, can simplify whole silicon chip strorage device's concrete structure like this, reduce silicon chip strorage device's manufacturing cost.

In some embodiments, the second column 22 is provided with an array of storage teeth 201, so as to ensure the stability of the silicon wafer in the silicon wafer storage device.

In some more specific embodiments, as shown in fig. 1, each set of storage rods 2 further comprises a restraining post 23 that fits within the other short side of the silicon wafer, the restraining post 23 being removably attached to the support in the direction of the long side of the silicon wafer. It can be understood that after the silicon wafers are stored in the silicon wafer storage device of this embodiment, the silicon wafers may not be used immediately and need to be temporarily stored for a period of time, in this embodiment, a limit upright column 23 is additionally provided, the limit upright column 23 has a limit state and a release state, in the limit state, the limit upright column 23 is matched on the bracket, and the silicon wafers in each group of storage rods 2 cannot leave the silicon wafer storage device; in a release state, the limiting upright posts 23 are detached from the support along the direction of the long side of the silicon wafer, and the silicon wafers in each group of the storage rods 2 can leave the silicon wafer storage device. That is to say, after the silicon wafers are completely stored, the limiting upright posts 23 are installed into the support along the direction of the long side of the silicon wafers, so that the silicon wafers can be prevented from falling off from the silicon wafer storage device of the embodiment, the waste wafer rate is reduced well, and when the silicon wafers are required to be taken out from the silicon wafer storage device, the limiting upright posts 23 can be detached from the support.

In some alternative embodiments, the side of the restraining post 23 adjacent to the silicon wafer is provided with a storage tooth 201. It can be understood that, in the process of using the silicon wafer storage device, due to the improvement of the capacity and the efficiency, the number of the whole silicon wafers or the half silicon wafers stored in the silicon wafer storage device is continuously increased, the distance between the silicon wafers is smaller and smaller, and the thinner silicon wafers are easy to deform. On the basis, if the storage teeth 201 are not arranged on one side of the limiting upright column 23 close to the silicon wafer, in the cleaning and texturing processes, the flowing cleaning solution or etching solution in the cleaning tank and the etching tank deforms the silicon wafer so that one side of the silicon wafer close to the limiting upright column 23 is deformed, adjacent silicon wafers are adsorbed together, and finally the cleaning or etching effect cannot reach the expected effect. Therefore, in order to fully clean and etch the silicon wafer, in this embodiment, the storage teeth 201 are arranged on one side of the limiting upright column 23 close to the silicon wafer, so that the four sides of the silicon wafer are limited from being deformed, and the problem of adsorption of adjacent silicon wafers does not exist, so that the cleaning and etching effects are better.

In some alternative embodiments, as shown in fig. 2, the bracket is provided with a clamping groove 12 with an open end, and two ends of the position-limiting upright 23 are respectively provided with a clamping head 231 matched with the clamping groove 12. Therefore, the limiting upright column 23 can be conveniently clamped into the clamping groove 12 from the open end of the clamping groove 12 or pulled out from the clamping groove 12, and the operation of a user is facilitated.

In some embodiments, as shown in fig. 1, the rack includes two support plates 1 spaced apart from each other, the support plates 1 are provided with fitting holes 11, and both ends of the storage rod 2 are respectively fitted into the fitting holes 11. It can be understood that the support frame includes only two support plates 1 to simplify the structure of the support frame and ensure the stability of the connection with the storage rods 2, thereby simplifying the structure of the silicon wafer storage device and reducing the manufacturing cost of the silicon wafer storage device.

In some embodiments, the mating holes 11 are threaded holes, and the two ends of the storage rod 2 are respectively provided with mating threads. Therefore, the storage rod 2 and the bracket can be conveniently mounted and dismounted.

Example (b):

the specific structure of the silicon wafer storage device according to an embodiment of the present invention will be described with reference to fig. 1 to 3.

As shown in fig. 1, the silicon wafer storage device of this embodiment includes a support and a storage rod 2, the silicon wafer storage device of this embodiment is used for bearing a rectangular half silicon wafer, the support includes two support plates 1 that the interval set up, the support plate 1 is equipped with mating holes 11 (this embodiment is threaded holes) and a clamping groove 12, the clamping groove 12 is established at the front side edge of the support plate 1 and has an open end. Deposit pole 2 and be sixteen, eighteen are deposited including ten first stands 21 in the pole 2, four second stands 22 and four spacing stands 23, ten first stands 21 fall into five groups, the first stand 21 of five groups sets up along 1 left and right sides direction interval of backup pad, and be located and be equipped with one on four first stands 21 of both sides and deposit tooth 201, six first stands 21 that are located the middle part are equipped with two and deposit tooth 201, four second stands 22 set up along the left and right sides direction interval of backup pad 1, and be located the rear end of backup pad 1, every second stand 22 all is located between two sets of adjacent first stands 21, the front side of every second stand 22 all is equipped with one and deposits tooth 201, the both ends of first stand 21 and second stand 22 all are equipped with the cooperation screw thread, and the cooperation is in mating holes 11. Every spacing stand 23 all is located between two sets of adjacent first stands 21, and corresponds the setting with second stand 22, and the both ends of every spacing stand 23 all are equipped with joint groove 12 of joint in joint 231.

In the description herein, references to the description of "some embodiments," "other embodiments," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

The above description is only for the preferred embodiment of the present invention, and for those skilled in the art, there are variations on the detailed description and the application scope according to the idea of the present invention, and the content of the description should not be construed as a limitation to the present invention.

Claims (10)

1. A silicon wafer storage apparatus, comprising:

a support;

the silicon wafer storage rack comprises a plurality of storage rods (2), wherein the plurality of storage rods (2) surround to form a storage space for storing silicon wafers, two ends of each storage rod (2) are connected to a support respectively, a plurality of storage teeth (201) are arranged on each storage rod (2) at intervals along the height direction of the storage rod, and one silicon wafer is stored between every two adjacent storage teeth (201); wherein:

deposit tooth (201) and be the toper tooth, the tooth width is along keeping away from deposit pole (2) direction taper and decrease, and adjacent two deposit the interval between tooth (201) along keeping away from deposit pole (2) on the direction increase gradually.

2. The silicon wafer storage device as claimed in claim 1, wherein the storage teeth (201) are of a quadrangular frustum pyramid structure, an included angle a between the edge of the storage teeth (201) and the horizontal direction is, and a satisfies the relation: a is more than or equal to 3 degrees and less than or equal to 15 degrees.

3. The silicon wafer storage device according to claim 1, wherein the plurality of storage rods (2) are divided into a plurality of groups, and each group of storage rods (2) is used for storing a plurality of silicon wafers which are arranged at intervals in the vertical direction.

4. The silicon wafer storage device according to claim 3, wherein the plurality of storage rods (2) are divided into at least four groups.

5. The silicon wafer storage device according to claim 3, wherein the silicon wafers are half silicon wafers, and each group of the storage rods (2) comprises a first upright post (21) matched with two long sides of the silicon wafer and a second upright post (22) matched with one short side of the silicon wafer.

6. The silicon wafer storage device according to claim 5, wherein the first column (21) located at the outermost side of the plurality of first columns (21) is provided with one row of the storage teeth (201), the remaining first columns (21) are provided with two rows of the storage teeth (201), and the two rows of the storage teeth (201) are symmetrically arranged about the axis of the first column (21), and/or:

a row of the storage teeth (201) is arranged on the second upright post (22).

7. The silicon wafer storage device as claimed in claim 5, wherein each set of the storage rods (2) further comprises a stopper post (23) fitted into the other short side of the silicon wafer, the stopper post (23) being detachably attached to the holder in the direction of the long side of the silicon wafer.

8. The silicon wafer storage device as claimed in claim 7, wherein the bracket is provided with a clamping groove (12) with one open end, and the two ends of the limiting upright column (23) are respectively provided with a clamping joint (231) matched with the clamping groove (12).

9. The silicon wafer storage device as claimed in claim 7, wherein the side of the limiting column (23) close to the silicon wafer is provided with the storage teeth (201).

10. The silicon wafer storage device according to any one of claims 1 to 9, wherein the support comprises two support plates (1) arranged at intervals, mating holes (11) are formed in the support plates (1), two ends of the storage rod (2) are respectively matched with the mating holes (11), the mating holes (11) are threaded holes, and two ends of the storage rod (2) are respectively provided with matching threads.

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