CN217310125U - Surface cleaning apparatus and surface cleaning system - Google Patents

Abstract

The present disclosure provides a surface cleaning apparatus comprising: a base including at least a cleaning portion; a first liquid reservoir; a second liquid reservoir; a liquid dispenser; a vapor distributor; a first fluid pathway extending at least between the first liquid reservoir and the vapor distributor; the vacuumizing suction port is connected with the second liquid storage and is arranged on the base; a second fluid pathway extending at least between the second fluid reservoir and the vacuum extraction port; a vacuum source in fluid communication with the second fluid reservoir and the vacuum extraction inlet, the vacuum source being adapted to generate a working air flow to recycle liquid from the surface to be cleaned to the second fluid reservoir; a thick film heater located in the first fluid path, the arrangement of the thick film heater on the surface cleaning apparatus being such that the level at which the first end of the thick film heater is located is always equal to or lower than the level at which the second end is located when the surface cleaning apparatus is in operation. The present disclosure also provides a surface cleaning system.

Description

Surface cleaning apparatus and surface cleaning system

Technical Field

The present disclosure relates to the field of cleaning device/cleaning system technology, and more particularly to a surface cleaning device and a surface cleaning system.

Background

One development route in the surface cleaning equipment industry, such as floor washers, is the use of steam as a cleaning agent.

Steam washers typically require a boiler as the steam generator. After the cleaning liquid is heated by the boiler, the vapor is pumped to a flat plate applicator where it contacts the surface being cleaned.

An advantage of the steam system is that the temperature generated can be effective in killing various microorganisms, bacteria, microorganisms and mites. However, boiler systems suffer from high power and inefficient heating, and the high power requirements for steam generation do not allow sufficient surplus power to run the vacuum motor to recover the contaminated water from the cleaned surface, so cleaning performance is further hampered.

SUMMERY OF THE UTILITY MODEL

To address at least one of the above technical problems, the present disclosure provides a surface cleaning apparatus and a surface cleaning system.

According to an aspect of the present disclosure, there is provided a surface cleaning apparatus comprising:

a base including at least a cleaning portion;

a first liquid reservoir for storing a cleaning liquid to be dispensed;

a second liquid reservoir for holding a recovery liquid;

a liquid distributor connected to the first liquid reservoir for distributing a cleaning liquid at least to a surface to be cleaned and/or to the cleaning section;

a vapor distributor connected to the first liquid reservoir;

a first fluid pathway extending at least between the first liquid reservoir and the vapor distributor;

the vacuumizing suction port is connected with the second liquid storage and is arranged on the base;

a second fluid pathway extending at least between the second fluid reservoir and the evacuation suction port;

a vacuum source in fluid communication with the second fluid reservoir and the vacuum extraction inlet, the vacuum source configured to generate a working air flow that passes through the vacuum extraction inlet, the second fluid passageway, and the second fluid reservoir to at least recycle liquid from the surface to be cleaned to the second fluid reservoir;

a thick film heater located in the first fluid path, a first end of the thick film heater being associated with the first liquid reservoir and a second end of the thick film heater being associated with the vapour distributor, the thick film heater being adapted to heat at least a portion of the cleaning liquid to above the boiling point of the cleaning liquid in a heating cavity of the thick film heater to form a heated vapour, the vapour distributor distributing the heated vapour to a surface to be cleaned in front of the vacuum extraction suction opening and/or to the cleaning portion;

wherein the arrangement of the thick film heater on the surface cleaning apparatus is such that the level at which the first end of the thick film heater is located is always equal to or lower than the level at which the second end of the thick film heater is located when the surface cleaning apparatus is in operation.

A surface cleaning apparatus according to at least one embodiment of the present disclosure further includes a body portion coupled to a base, the thick film heater being disposed on at least one of the base and the body portion.

According to the surface cleaning device of at least one embodiment of the present disclosure, the thick film heater is provided on the base, the thick film heater is arranged laterally on the base, and a first end of the thick film heater is located at a level lower than or equal to a level at which a second end is located.

According to the surface cleaning device of at least one embodiment of the present disclosure, the thick film heater is arranged on the main body part, the thick film heater is vertically arranged on the main body part, and the position of the first end part of the thick film heater is lower than or equal to the position of the second end part.

According to the surface cleaning apparatus of at least one embodiment of the present disclosure, the thick film heater further includes a thick film heating body, and the heating cavity of the thick film heater is formed within the thick film heating body.

According to the surface cleaning device of at least one embodiment of the present disclosure, a fluid guide is arranged in the thick film heating body, and a heating cavity of the thick film heater is formed between the inner wall of the thick film heating body and the fluid guide.

According to the surface cleaning apparatus of at least one embodiment of the present disclosure, the fluid guide is a spiral guide such that a spiral heating cavity is formed between an inner wall of the thick film heating body and the fluid guide.

According to the surface cleaning apparatus of at least one embodiment of the present disclosure, the thick film heater includes a thick film heater housing, the thick film heater being disposed within the thick film heater housing, the heating cavity of the thick film heater being formed between the thick film heater and the thick film heater housing.

According to at least one embodiment of the present disclosure, the thick film heater is an elongated thick film heater having a cross-sectional shape that is circular, oval or rectangular.

According to the surface cleaning apparatus of at least one embodiment of the present disclosure, the thick film heating body includes at least a first portion and a second portion, the first portion being located above the second portion in the vertical direction, the first portion having a larger electrical resistance than the second portion.

According to the surface cleaning apparatus of at least one embodiment of the present disclosure, the thick film heating body includes at least a first portion and a second portion, the first portion being located above the second portion in the vertical direction, the first portion not being provided with the thick film heating layer.

A surface cleaning apparatus according to at least one embodiment of the present disclosure further comprises a steam duct connected between the thick film heater and the steam distributor, and a cleaning liquid duct connected between the first liquid reservoir and the liquid distributor, the steam duct and the cleaning liquid duct being arranged spaced apart from each other.

According to a surface cleaning apparatus of at least one embodiment of the present disclosure, a flow detector is provided on the first fluid path, the flow detector being provided between the first liquid reservoir and the thick film heater to detect a flow rate of cleaning liquid provided to the thick film heater.

A surface cleaning apparatus according to at least one embodiment of the present disclosure further includes a controller that provides a control signal to the thick film heater to turn off the thick film heater or reduce heating power of the thick film heater based at least on the detection signal generated by the flow detector.

A surface cleaning apparatus according to at least one embodiment of the present disclosure further includes a flow diversion assembly having a first outlet portion coupled to a first end of the thick film heater and a second outlet portion coupled to the liquid distributor, the first and second outlet portions of the flow diversion assembly adapted to be selectively controlled such that cleaning liquid is distributed from the first liquid reservoir to at least one of the thick film heater and the liquid distributor.

According to another aspect of the present disclosure, there is provided a surface cleaning system comprising: the surface cleaning apparatus of any one of the above; and a base station device; wherein the base station apparatus comprises a third liquid reservoir holding cleaning liquid to be dispensed to the first liquid reservoir of the surface cleaning apparatus.

Drawings

The accompanying drawings, which are included to provide a further understanding of the disclosure and are incorporated in and constitute a part of this specification, illustrate exemplary embodiments of the disclosure and together with the description serve to explain the principles of the disclosure.

Fig. 1 and 2 are schematic overall structural views from different perspectives of a surface cleaning apparatus according to an embodiment of the present disclosure. Fig. 3 is a partial structural schematic view from one perspective of a surface cleaning apparatus of an embodiment of the present disclosure, and fig. 4 is a partial structural schematic view from yet another perspective of a surface cleaning apparatus of an embodiment of the present disclosure. The structure of the first liquid reservoir is shown in fig. 5 and 6. FIG. 7 is a schematic partial structural view of a main body portion of a surface cleaning apparatus according to one embodiment of the present disclosure. FIG. 8 is a schematic diagram of a second liquid reservoir of a surface cleaning apparatus according to one embodiment of the present disclosure. FIG. 9 is a schematic view of a partial internal configuration of a main body portion of a surface cleaning apparatus according to one embodiment of the present disclosure. FIG. 10 is a schematic view of a partial structure of a surface cleaning apparatus according to one embodiment of the present disclosure. FIG. 11 is a schematic view of a partial structure of a surface cleaning apparatus according to one embodiment of the present disclosure. Fig. 12 to 14 are schematic structural views of a thick film heater according to a preferred embodiment of the present disclosure. Fig. 15 to 17 are schematic structural views of a thick film heater according to another preferred embodiment of the present disclosure. FIG. 18 is a schematic view of a partial structure of a surface cleaning apparatus according to one embodiment of the present disclosure. Fig. 19-22 illustrate the internal structure and bottom structure of the base of the surface cleaning apparatus of one embodiment of the present disclosure. Fig. 23 to 25 are schematic structural views of a thick film heater provided on a base. Fig. 26 to 27 show the structure of a dry-burning preventing thick film heating body of one embodiment of the present disclosure. Fig. 28 shows a structure of a liquid dispenser of an embodiment of the present disclosure.

Detailed Description

The present disclosure will be described in further detail with reference to the drawings and embodiments. It is to be understood that the specific embodiments described herein are for purposes of illustration only and are not to be construed as limitations of the present disclosure. It should be further noted that, for the convenience of description, only the portions relevant to the present disclosure are shown in the drawings.

It should be noted that the embodiments and features of the embodiments in the present disclosure may be combined with each other without conflict. Technical solutions of the present disclosure will be described in detail below with reference to the accompanying drawings in conjunction with embodiments.

Unless otherwise indicated, the illustrated exemplary embodiments/examples are to be understood as providing exemplary features of various details of some ways in which the technical concepts of the present disclosure may be practiced. Accordingly, unless otherwise indicated, features of the various embodiments may be additionally combined, separated, interchanged, and/or rearranged without departing from the technical concept of the present disclosure.

The use of cross-hatching and/or shading in the drawings is generally used to clarify the boundaries between adjacent components. As such, unless otherwise noted, the presence or absence of cross-hatching or shading does not convey or indicate any preference or requirement for a particular material, material property, size, proportion, commonality between the illustrated components and/or any other characteristic, attribute, property, etc., of a component. Further, in the drawings, the size and relative sizes of components may be exaggerated for clarity and/or descriptive purposes. While example embodiments may be practiced differently, the specific process sequence may be performed in a different order than that described. For example, two processes described consecutively may be performed substantially simultaneously or in reverse order to that described. In addition, like reference numerals denote like parts.

When an element is referred to as being "on" or "on," "connected to" or "coupled to" another element, it can be directly on, connected or coupled to the other element or intervening elements may be present. However, when an element is referred to as being "directly on," "directly connected to" or "directly coupled to" another element, there are no intervening elements present. For purposes of this disclosure, the term "connected" may refer to physically, electrically, etc., and may or may not have intermediate components.

For descriptive purposes, the present disclosure may use spatially relative terms such as "below … …," below … …, "" below … …, "" below, "" above … …, "" above, "" … …, "" higher, "and" side (e.g., "in the sidewall") to describe one component's relationship to another (other) component as illustrated in the figures. Spatially relative terms are intended to encompass different orientations of the device in use, operation, and/or manufacture in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, elements described as "below" or "beneath" other elements or features would then be oriented "above" the other elements or features. Thus, the exemplary term "below … …" can encompass both an orientation of "above" and "below". Further, the devices may be otherwise positioned (e.g., rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.

The terminology used herein is for the purpose of describing particular embodiments and is not intended to be limiting. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. Furthermore, when the terms "comprises" and/or "comprising" and variations thereof are used in this specification, the stated features, integers, steps, operations, elements, components and/or groups thereof are stated to be present but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components and/or groups thereof. It is also noted that, as used herein, the terms "substantially," "about," and other similar terms are used as approximate terms and not as degree terms, and as such, are used to interpret inherent deviations in measured values, calculated values, and/or provided values that would be recognized by one of ordinary skill in the art.

The surface cleaning apparatus and surface cleaning system of the present disclosure are described in detail below with reference to fig. 1-28.

According to one embodiment of the present disclosure, a surface cleaning apparatus 1000 of the present disclosure includes:

a base 100, the base 100 including at least a cleaning portion 104;

a main body portion 200 coupled with the base 100;

a first liquid reservoir 201 for storing a cleaning liquid to be dispensed;

a liquid distributor 114 connected to the first liquid reservoir 201, the liquid distributor 114 being adapted to distribute at least cleaning liquid to the surface to be cleaned and/or to the cleaning portion 104; a vapor distributor 103 connected to the first liquid reservoir 201;

a first fluid pathway extending at least between the first liquid reservoir 201 and the vapor distributor 103;

a second liquid storage 202, wherein the second liquid storage 202 is used for storing the recovered liquid;

a vacuum suction port 110 connected to the second liquid reservoir 202 and provided in the base 100;

a second fluid pathway extending at least between second fluid reservoir 202 and vacuum suction port 110;

a vacuum source 203 in fluid communication with the second fluid reservoir 202 and the vacuum extraction nozzle 110, the vacuum source 203 being adapted to generate a working air flow from the vacuum extraction nozzle 110, the working air flow passing through the second fluid path and the second fluid reservoir 202 to return fluid to the second fluid reservoir 202 after cleaning of the surface to be cleaned;

a thick film heater 113, 213 located in the first fluid path, a first end portion 1131, 2131 of the thick film heater 113, 213 being associated with the first liquid reservoir 201, a second end portion 1132, 2132 of the thick film heater 113, 213 being associated with the steam distributor 103, the thick film heater 113, 213 being adapted to heat at least a portion of the cleaning liquid to above the boiling point of the cleaning liquid in the heating cavity of the thick film heater 113, 213 to form heated steam, the steam distributor 103 distributing the heated steam to the surface to be cleaned and/or to the cleaning portion 104 in front of the vacuum extraction suction 110; wherein the arrangement of the thick film heaters 113, 213 on the surface cleaning apparatus 1000 is such that the level at which the positions of the first ends 1131, 2131 of the thick film heaters 113, 213 are always at or below the level at which the positions of the second ends of the thick film heaters are at when the surface cleaning apparatus 1000 is in operation.

Thick film heater 113, 213 comprises a heating cavity and a thick film heating body 1134, 2134 at least partially disposed within or surrounding the heating cavity, a first end of the heating cavity being associated with first liquid reservoir 201 and a second end of the heating cavity being associated with vapor distributor 103; the thick film heater 113, 213 is adapted to heat at least a portion of the cleaning liquid in the heating cavity above the boiling point of the cleaning liquid to form a heated cleaning liquid vapour, the vapour distributor 103 being at least capable of distributing the heated cleaning liquid vapour to a surface to be cleaned located in front of the cleaning portion 104 and/or to the cleaning portion 104.

Referring to fig. 1 to 3, the surface cleaning apparatus 1000 is preferably constituted by a base 100, a main body portion 200, and an operating portion 300, the base 100 being used to perform a cleaning/rinsing work of a surface to be cleaned. The operation unit 300 is operated by a user. The operating portion 300 may be a rod-shaped handle portion.

Fig. 1 and 2 are schematic diagrams of the overall structure of a surface cleaning apparatus 1000 of one embodiment of the present disclosure from different perspectives.

Fig. 3 is a partial structural view from one perspective of a surface cleaning apparatus 1000 according to an embodiment of the present disclosure, and fig. 4 is a partial structural view from another perspective of a surface cleaning apparatus 1000 according to an embodiment of the present disclosure.

Fig. 12 to 14 are schematic structural views of a thick film heater 213 according to a preferred embodiment of the present disclosure. Referring to fig. 12-14, thick film heater 213 includes a first end portion 2131, a second end portion 2132 and a thick film heater 2134, wherein a heating cavity is formed in thick film heater 2134, cleaning liquid enters the heating cavity through first end portion 2131, and cleaning liquid is heated in the heating cavity to a temperature higher than the boiling point of the cleaning liquid to form cleaning liquid vapor, which is output through second end portion 2132. Heater retaining portions 2133 may also be included, among other things, to retain the thick film heater on the body portion 200 or the base 100.

Fig. 15 to 17 are schematic structural views of a thick film heater 213 according to still another preferred embodiment of the present disclosure. Referring to fig. 15-17, thick film heater 213 includes a first end portion 2131, a second end portion 2132, a thick film heater housing 2136, and a thick film heater 2134, where thick film heater 2134 is partially or completely disposed within thick film heater housing 2136, a heating cavity 2138 as described above is formed between thick film heater 2134 and thick film heater housing 2136, cleaning liquid enters heating cavity 2138 through first end portion 2131, cleaning liquid is heated in heating cavity 2138 to a temperature above the boiling point of the cleaning liquid to form cleaning liquid vapor, and the cleaning liquid vapor is output through second end portion 2132.

According to a preferred embodiment of the present disclosure, forming the heating cavity 2138 described above in a manner to increase the contact area with the thick film heater 2134 improves the efficiency of heating the cleaning liquid to form cleaning liquid vapor by increasing the contact area with the thick film heater 2134.

Preferably, the heating cavity may be provided as a labyrinth or a tube cavity (especially in the form of a curved tube).

The cleaning liquid described in the present disclosure may be clear water, a washing liquid, or a mixture thereof, etc., and the present disclosure is not particularly limited to the components of the cleaning liquid.

As can be seen from the above description, the surface cleaning apparatus 1000 of the present disclosure can offset the factor of the excessive water flow rate due to gravity by keeping the first ends 1131, 2131 of the thick film heaters 113, 213 at the same level or lower than the second end of the thick film heaters, so that the water entering the thick film heaters is more sufficiently evaporated to ensure that the steam distributor 103 does not spray the heated cleaning liquid.

With the surface cleaning apparatus 1000 of each of the above embodiments, the thick film heaters 113, 213 of the present disclosure are provided on at least one of the base 100 and the main body portion 200.

The surface cleaning apparatus 1000 of the present disclosure may be provided with one thick film heater provided on the base or the main body portion, or may be provided with two thick film heaters provided on the base and the main body portion, respectively.

According to one embodiment of the present disclosure, referring to fig. 4, 11 to 14, the thick film heater 213 is provided on the main body portion 200, and the thick film heater 213 is vertically arranged on the main body portion 200 (i.e., arranged along the axial direction of the main body portion 200), and the first end portion 2131 of the thick film heater 213 is located on a plane lower than the second end portion 2132.

Wherein the first liquid reservoir 201 provides cleaning liquid to the thick film heater 213 through the first end 2131 of the thick film heater 213, the cleaning liquid is heated by the thick film heater 213 to generate steam, and the steam is output to the steam distributor 103 through the second end 2132 of the thick film heater 213 via the steam pipe.

Referring to fig. 4, the main body part 200 has a cavity structure, and the thick film heater 213 is disposed within the cavity structure of the main body part 200.

According to another embodiment of the present disclosure, referring to fig. 18, 19 and 22 to 24, the thick film heater 113 is provided on the base 100, the thick film heater 113 is arranged laterally on the base 100 (i.e., arranged along the lateral direction of the base 100), and the first end portion 1131 of the thick film heater 113 is located at a level lower than or equal to the level of the location of the second end portion 1132.

Preferably, the first end portion 1131 of the thick film heater 113 is located at a lower level than the second end portion 1132.

Wherein the base 100 has a cavity structure, and the thick film heater 113 is disposed within the cavity structure of the base 100.

Referring to fig. 18 and 19, steam generated by thick film heater 113 is delivered to steam distributor 103 via steam line 101.

With the surface cleaning apparatus 1000 of each of the above embodiments, the heating cavity of the thick film heaters 113, 213 is formed within the thick film heaters 1134, 2134.

The heating cavities of thick film heaters 113 and 213 shown in fig. 12 to 14 and 23 to 25 are formed within thick film heating bodies 1134 and 2134.

Preferably, referring to fig. 12-14 and 23-25, fluid guides 1135, 2135 are provided within thick film heaters 1134, 2134, with the heating cavities of thick film heaters 113, 213 being formed between the inner walls of thick film heaters 1134, 2134 and fluid guides 1135, 2135.

More preferably, fluid guides 1135, 2135 described above are spiral guides such that a spiral heating cavity is formed between the inner walls of thick film heaters 1134, 2134 and fluid guides 1135, 2135 to increase heating efficiency.

According to a thick film heater of yet another embodiment of the present disclosure, referring to fig. 15-17, thick film heater 213 includes a thick film heater housing 2136, a thick film heater 2134 disposed within thick film heater housing 2136, and a heating cavity 2138 of thick film heater 213 formed between thick film heater 2134 and thick film heater housing 2136.

With the surface cleaning apparatus 1000 of the present disclosure, the thick film heaters 113, 213 are preferably elongated thick film heaters, and with reference to fig. 4, 11, 19, 20, the cross-sectional shape of the thick film heaters 113, 213 may be circular, elliptical, rectangular, or the like.

However, those skilled in the art can also adjust the thick film heater in fig. 15 to 17 to be a strip shape, all falling within the scope of the present disclosure.

Fig. 19-22 show an internal and bottom schematic view, respectively, of the base 100 of the surface cleaning apparatus 1000 of one embodiment of the present disclosure.

Referring to fig. 19 to 22, the steam distributor 103 includes steam distribution ports 1031, and the steam distributor 103 is connected to the thick film heater 113. The heating chamber of the thick film heater 113 communicates with the steam distribution port 1031 so that the heated steam distributed from the steam distribution port 1031 can be applied to the surface to be cleaned or the cleaning portion 104.

In accordance with a preferred embodiment of the present disclosure, and with reference to fig. 19 and 20, a thick film heater 113 is disposed within the base 100 and a cleaning portion 104, such as a rotating brush, is provided at the rear end of the steam distributor 103 to facilitate loosening of immobilized debris, stains, from the surface being cleaned (e.g., floor, tile, etc.). Wherein the liquid distributor 114 is arranged within the base 100 and is adapted to communicate with the first liquid reservoir 201 bypassing the thick film heater 113, such that the first liquid reservoir 201 distributes the cleaning liquid evenly over the cleaning portion 104, e.g. a flocked rotating brush surface. The first liquid reservoir 201 supplying fluid to the thick film heater 113 and liquid distributor 114 may contain heated cleaning liquid if desired.

According to one embodiment of the present disclosure, the thick film heating body 1134 receives power through the power cord, heating the liquid of the heating chamber to steam.

According to a preferred embodiment of the present disclosure, referring to fig. 22, the liquid distributor 114 of the present disclosure uses the liquid distributor structure of the roll brush assembly described in chinese patent CN 202110688477.3.

According to another preferred embodiment of the present disclosure, referring to fig. 28, the liquid distributor 114 of the present disclosure is disposed at the rear of the cleaning portion 104, the liquid distributor 114 has a liquid outlet surface, a plurality of liquid outlet holes are formed on the liquid outlet surface, the liquid outlet holes may be in a transverse single-row structure or in a transverse multi-row structure, and the cleaning liquid output through the liquid outlet holes is provided to the surface of the cleaning portion 104 (see the direction of the arrow in fig. 28).

Referring to fig. 28, the liquid outlet surface is an inclined liquid outlet surface to facilitate the delivery of the cleaning liquid to the surface of the cleaning portion 104.

With the surface cleaning apparatus 1000 of each of the embodiments described above, it is preferable that it further comprises a first control element for controlling at least the thick film heater 213 so that the thick film heater 213 can selectively deliver the heated cleaning liquid vapor.

Preferably, the first control element comprises a first trigger (one of a plurality of control keys 301) provided on the operating portion 300 or the main body portion 200 of the surface cleaning apparatus 1000 for selective operation to control activation and deactivation of the thick film heaters 113, 213.

Preferably, the first control element comprises a second trigger (one of the plurality of control keys 301) provided on the operating portion 300 or the main body portion 200 of the surface cleaning apparatus 1000 for selectively adjusting operation to control the flow rate of the vapor output by the thick film heaters 113, 213 to achieve output flow rate control of the thick film heaters 113, 213.

Preferably, the first control element includes a first trigger such as a steam function control key (which may be one of the control keys 301) provided on the operation part 300.

By operating the steam function control key, the cleaning liquid can be guided from the first liquid reservoir 201 to the heating steam position in the thick film heater 113, 213, i.e. in the tubular enclosure (heating cavity) formed surrounded by the thick film heating body 1134, 2134, where the cleaning liquid is heated to above the boiling point of the cleaning liquid, e.g. 100 degrees celsius, to generate steam.

In fig. 4, a first circuit board 205 is further disposed in the cavity of the main body 200, and a steam function control circuit may be formed on the first circuit board 205, and the steam function control circuit generates a steam function control signal based on the operation of the steam function control key to start or stop the heating function of the thick film heater 213.

Referring to fig. 3, in accordance with a preferred embodiment of the present disclosure, the surface cleaning apparatus 1000 further includes a touch panel or touch screen 209, the first control element may include a control key displayed on the touch panel or touch screen 209, and a steam function control key, a steam temperature control key, etc., may be displayed on the touch panel or touch screen 209.

FIG. 10 is a schematic partial configuration of a surface cleaning apparatus 1000 according to one embodiment of the present disclosure, and referring to FIG. 10, the first control element includes a flow diversion assembly 215 connected to at least the first liquid reservoir 201, a first outlet 2112 of the flow diversion assembly 215 is connected to the thick film heaters 113, 213, a second outlet 2122 of the flow diversion assembly 215 is connected to a liquid distributor 114 disposed on the base 100, the first outlet 2112 and the second outlet 2122 of the flow diversion assembly 215 are adapted to be selectively controlled such that cleaning liquid flows from the first liquid reservoir 201 to at least one of the thick film heaters 113, 213 and the liquid distributor 114.

By means of the second trigger described above, the flow rate of the liquid delivered by the shunt assembly 215 to the thick film heater 113, 213 can be controlled to control the vapor output flow rate of the thick film heater 113, 213, for example, by operating the second trigger to operate the degree of opening and closing of a flow control element (valve, etc.) between the shunt assembly 215 and the thick film heater 113, 213.

Two flow control elements may be provided in the flow divider assembly 215, one for controlling the flow of liquid delivered by the flow divider assembly 215 to the thick film heaters 113, 213 and the other for controlling the flow of liquid delivered by the flow divider assembly 215 to the liquid distributor 114, and the flow divider assembly 215 may include a three-way structure adapted to accommodate the arrangement of the two flow control elements.

Based on the flow dividing assembly 215, the cleaning liquid in the first liquid storage 201 of the present disclosure may be selectively sent to the thick film heaters 113, 213 and/or the liquid distributor 114 depending on whether the floor washing function control key and/or the steam function control key on the operating part 300 is activated.

The floor-washing function control key may be one of the control keys 301 on the operation portion 300, or may be a floor-washing function control key displayed on the touch panel or the touch screen 209 described above.

With the surface cleaning apparatus 1000 of each of the embodiments described above, in any event, vacuuming can be performed by turning on the vacuum source 203 to create suction at the vacuuming suction opening 110, thereby removing dry or wet debris from the surface being cleaned without the application of steam or cleaning liquid.

When the cleaning liquid is required to be used for surface cleaning, the floor-washing function control key is operated, the cleaning liquid in the first liquid storage 201 enters the liquid supply pipeline 210 and flows out to the surface of the cleaning part 104 such as a rotary brush through the outlet of the liquid distributor 114, and the rolling rotary brush dissolves and removes the debris/dirt and the like on the floor along with the cleaning liquid.

When it is required to apply heated steam onto a surface to be cleaned, the steam function control key is operated. Thus, heated steam may be selectively applied to the surface to be cleaned to heat the surface to be cleaned. This function provides the user with the option of alternating between heated vapor and liquid. When the steam function control key is operated, e.g., pressed, the cleaning liquid flows through the liquid supply line 210 and into the thick film heaters 113, 213, and the cleaning liquid is rapidly heated to heated steam, dispensed from the steam dispensing ports 1031 (referring to fig. 21, 6 steam dispensing ports 1031 are exemplarily shown), and released onto the surface being cleaned. After the surface being cleaned is steamed, the tough surface adhering debris is softened and removed, thereby being drawn into the vacuum suction opening 110 by the action of the rolling rotating brush (see FIG. 22), and any liquid generated on the surface by the heated steam or cleaning liquid is collected into the vacuum suction opening 110 and eventually into the second liquid reservoir 202. Preferably, a first wiper strip (upper wiper strip) and a second wiper strip (lower wiper strip) may be disposed on both sides of the vacuum suction port 110.

According to a preferred embodiment of the present disclosure, the heating steam may be continuously delivered to apply to the surface to preheat the surface, which in turn heats any cleaning liquid that may be subsequently applied to the surface to bring the temperature of the cleaning liquid above that of the surface to be treated or other surface to be cleaned, and further, the heated surface to be treated will reduce any heat loss from the heated cleaning liquid applied to the surface to be treated due to the elevated temperature of the cleaning liquid applied to the surface to be treated.

According to a preferred embodiment of the present disclosure, the cleaning part 104, e.g., the rotary brush, may be driven by a drive motor separate from the vacuum source 203, and may be individually controlled so that the cleaning part 104, the vacuum source 203, may be operated independently of the thick film heater 113, 213. In addition, the vacuum motor of the vacuum source 203 and the drive motor of the rotating brush may be turned off, enabling the surface cleaning apparatus 1000 of the present disclosure to apply only heated steam, removing the working air flow generated by the vacuum motor and the additional air circulation generated by the rotating brush resulting in higher surface temperatures, thereby enhancing the cleaning effect.

Fig. 7 is a partial structural schematic view of a main body portion 200 of a surface cleaning apparatus of one embodiment of the present disclosure. The first liquid tank 201 includes a first operation portion 2014, and the first liquid tank 201 can be detached from the main body portion 200 or the first liquid tank 201 can be attached to the main body portion 200 by operating the first operation portion 2014. A vacuum source 203 is provided below the first liquid tank 201, and a second liquid tank 202 is provided below the vacuum source 203, wherein the second liquid tank 202 includes a second operation portion 2021, and the second liquid tank 202 can be detached from the main body portion 200 or the second liquid tank 202 can be attached to the main body portion 200 by operating the second operation portion 2021.

Fig. 8 is a schematic structural diagram of the second liquid storage 202 of the surface cleaning apparatus 1000 according to an embodiment of the disclosure, an air inlet 2022 is disposed at the bottom of the second liquid storage 202, the working air flow generated by the vacuum source 203 enters the second liquid storage 202 through the air inlet 2022, the working air flow enters a solid dirt recovery portion 2041 disposed in the second liquid storage 202, the solid dirt is stored in the solid dirt recovery portion 2041, and the recovered liquid carried by the working air flow is blocked by a filter assembly 2042 (e.g., a hepa assembly), falls back, and is stored in the second liquid storage 202.

Fig. 9 is a partial structural diagram of the interior of the main body 200 of the surface cleaning apparatus 1000 according to an embodiment of the disclosure, and referring to fig. 9, a solid dirt recovery portion 2041 is disposed below the vacuum source 203, and the solid dirt recovery portion 2041 is disposed in the second liquid storage 202.

Also shown in fig. 9 is sound element 206, by which sound element 206 a warning signal generated by surface cleaning apparatus 1000 can be audibly output.

With respect to the surface cleaning apparatus 1000 of each of the above embodiments, it is preferable that it further comprises a second control element, which may comprise a steam temperature control circuit on the first circuit board 205, the second control element being associated with the thick film heaters 1134, 2134 of the thick film heaters 113, 213, the second control element being at least for controlling the supply of power to the thick film heaters 1134, 2134 according to a set temperature or temperature range. The second control element preferably further comprises a steam temperature control key (which may be one of the control keys 301), and the steam temperature control circuit generates a steam temperature control signal based on the operation of the steam temperature control key to control parameters such as heating power of the thick film heating body.

Preferably, the second control element is connected to the thick film heaters 1134 and 2134, and generates a control signal to stop the operation of the thick film heaters 1134 and 2134 when the temperatures of the thick film heaters 1134 and 2134 are greater than or equal to a set temperature, and the steam temperature control circuit of the second control element of the present embodiment can generate a corresponding control signal based on the temperatures of the thick film heaters 1134 and 2134.

Fig. 11 is a partial schematic view of a surface cleaning apparatus 1000 according to an embodiment of the present disclosure. Referring to fig. 11, in accordance with a preferred embodiment of the present disclosure, the surface cleaning apparatus 1000 of the present disclosure further includes a third control element associated with the flow splitting assembly 215, which may include control buttons provided on the operating portion 300 and control circuitry provided on the first circuit board 205, for selectively controlling the flow of cleaning liquid to the inlet portion 2101 of the flow splitting assembly 215, e.g., to adjust between zero flow (inclusive) and maximum flow (inclusive).

Preferably, the thick film heaters 113, 213 are connected to a common electrical input with the vacuum source 203 and are adapted to be powered by a common power source. The power source for powering the thick film heaters 113 and 213 and the vacuum source 203 is a rechargeable battery of the surface cleaning apparatus 1000, and may be an electrical line of 220V to 240V or 100V to 130V.

Wherein the cleaning liquid applied to the surface to be cleaned by the cleaning portion 104, such as a rotating brush, may be heated. In the off-line mode, the heater for heating the cleaning liquid may be provided separately in the first liquid reservoir 201 or upstream of the liquid distributor 114, and the heated cleaning liquid is applied to the rotating brush and carried by the rotating brush to the cleaning surface. In the off-line mode, the heater may also be a thick film heater, heating at least a portion of the tubing immediately upstream of the fluid distributor 114 in the vicinity of the thick film heater, heating the fluid flowing through the portion of the tubing using the principles of heat exchange, applying the heated cleaning fluid to the rotating brush, and carrying it by the rotating brush to the cleaning surface.

Referring again to fig. 1-2, the base 100 of the surface cleaning apparatus 1000 of the present disclosure is adapted to move over a surface to be cleaned; the main body 200 is pivotally mounted on the base 100; the surface cleaning apparatus 1000 further comprises a telescopic operating part 300 mounted on the main body part 200, the operating part 300 being at least used for manipulating the base 100 on the surface to be cleaned.

According to one embodiment of the present disclosure, the thick film heater 113 may be disposed on the base 100 at a position close to the vapor distributor 103. The hose extends from upstream of the thick film heater 113 to the first liquid reservoir 201 and the vapour line extends downstream of the thick film heater 113 to the vapour distributor 103.

Preferably, a steam valve is provided at the outlet of the heating chamber downstream of the thick film heater 113, 213, and when the steam valve is closed, the heated steam is under pressure to produce a superheated state. The generated heating steam exerts pressure on the hot solution and forces cleaning of the surface to be cleaned when the steam valve is opened. Once equilibrium is reached, the hot solution fluid is replaced by the same volume of heated steam under increased pressure, which is supplied under pressure to the surface to be cleaned when the steam valve is opened. During cleaning of the surface with heated steam, the dispensing of liquid to the cleaning portion 104, e.g., a rotating brush, may be turned off or on. When the brush is closed, the rotating brush is in a liquid-free state, and when the brush is opened, the rotating brush is in a liquid-applying state.

According to a preferred embodiment of the present disclosure, referring to fig. 19 to 22, the vapor distributor 103 and the liquid distributor 114 are both provided on the base 100, and the vapor distributor 103 is located in front of the liquid distributor 114.

Preferably, with reference to fig. 4, the surface cleaning apparatus 1000 further comprises a pump arrangement disposed downstream of the first liquid reservoir 201 and upstream of the flow diversion assembly 215, the pump arrangement being at least for pumping cleaning liquid in the first liquid reservoir 201 to the flow diversion assembly 215.

Referring to fig. 19, a pump device may also be provided within the base 100, a first pump 111 and a second pump 112 for pumping cleaning liquid to a liquid distributor 114 and a thick film heater 113, respectively.

Referring to fig. 10, according to still another preferred embodiment of the present disclosure, a first pump 211 and a second pump 212 are disposed below the flow dividing assembly 215, the flow dividing assembly 215 has a liquid outlet port communicating with both the first pump 211 and the second pump 212 in addition to the liquid inlet port, and the flow dividing of the cleaning liquid from the flow dividing assembly 215 to the first pump 211 and/or the second pump 212 is achieved by turning on/off the first pump 211 and/or the second pump 212. In this embodiment, the flow divider 215 is a three-way structure.

In accordance with a preferred embodiment of the present disclosure, the surface cleaning apparatus 1000 further comprises a first heating device (not shown) associated with the liquid dispensing for heating the cleaning liquid prior to dispensing the cleaning liquid to the surface to be cleaned.

The present disclosure also shows, in fig. 5 and 6, the structure of the first liquid tank 201, the first liquid tank 201 including an inlet 2011 and an outlet 2012, the first liquid tank 201 having a cavity containing cleaning liquid.

According to a preferred embodiment of the present disclosure, one end portion of the first liquid tank 201 is formed with a slope portion 2013, so that the first liquid tank 201 can be more easily detached from the main body portion 200 or the first liquid tank 201 can be attached to the main body portion 200 by providing the slope portion 2013.

A second circuit board may also be provided within the base 100 of the surface cleaning apparatus of the present disclosure, at least for controlling the drive means 109 or a heater or the like that may be provided within the base 100, the drive means 109 being for outputting a driving action to drive the cleaning portion 104, e.g., a rotating brush, into operation.

Referring to fig. 21 and 22, the cleaning portion 104 includes a flexible portion 1040 (e.g., sponge, fluff, etc.), and the flexible portion 1040 wraps the liquid distributor 114 such that the cleaning liquid output via the liquid distributor 114 permeates to an outer surface of the liquid distributor 114 in a non-spraying manner. In fig. 18, four liquid output apertures 1141 of the liquid distributor 114 are exemplarily shown.

In disposing the thick film heater 113 on the base 100, referring to fig. 23 to 25, the thick film heater 113 may employ a thick film heater of the same or similar structure as that shown in fig. 12 to 14.

For the thick film heater described in the present disclosure, the thick film heater may be a thick film heater with a stainless steel material as a substrate, or a thick film heater with a metal material as a substrate, the thick film heating layer (e.g. a resistance layer) is disposed on the outer surface of the substrate through an inner insulating medium layer, and an outer insulating medium layer is disposed on the outer surface of the thick film heating layer.

In light of the teachings of the present disclosure, those skilled in the art can modify the configuration of the thick film heater, all falling within the scope of the present disclosure.

The thick film heater is provided with electrical energy to generate heat to heat the cleaning liquid to form a cleaning liquid vapor.

With the surface cleaning apparatus 1000 of each of the embodiments described above, it is preferable that the thick-film heating body includes at least a first portion (portion above the broken line in fig. 26) and a second portion (portion below the broken line in fig. 26), the first portion being located above the second portion in the vertical direction, the first portion having a larger electrical resistance than the second portion.

In the disclosure, referring to fig. 26, for the thick film heating body horizontally disposed in the base, the resistance value of the first portion (the upper half is taken as an example) of the thick film heating body is set to be greater than the resistance value of the second portion (the lower half is taken as an example), so that the heating power of the upper half is less than that of the lower half, the temperature of the upper half rises slowly, the temperature is relatively low, and the generated heat and the consumed heat are balanced to achieve the effect of preventing dry burning.

The dimensions of the first portion and the second portion may be adjusted by one skilled in the art and are within the scope of the present disclosure.

Referring to fig. 27 (fig. 26 is a sectional view in the a-a direction in fig. 27), a surface cleaning apparatus 1000 according to still another preferred embodiment of the present disclosure, a thick film heating body thereof includes a first portion (a portion above a broken line in fig. 26, 27) located above the second portion in the vertical direction, and a second portion (a portion below the broken line in fig. 26, 27) where the thick film heating layer is not provided (the thick film heating layer is indicated by a black thick line in fig. 26).

The thick film heater of this embodiment does not set up the thick film zone of heating through the first part with the thick film heating body (above half is the example), because the thick film heater transversely sets up, when the less unable cavity of filling the thick film heater of clean liquid flow (clean liquid can be clear water, the mixed liquid of scrubber and clear water etc.), the upper portion region of thick film heating body can not produce the heat owing to not set up the thick film zone of heating to do not take place to burn futilely.

Also, when the thick film heating body is vertically disposed in the main body portion 200, a first portion (upper portion) and a second portion (lower portion) of the thick film heating body in the vertical direction may also be set such that the resistance value of the first portion is smaller than that of the second portion, or the first portion is not provided with the thick film heating layer, to achieve the purpose of preventing dry burning.

With the surface cleaning apparatus 1000 of each of the embodiments described above, it is preferable that a flow rate detector is provided on the first fluid passage, the flow rate detector being provided between the first liquid reservoir and the thick film heater to detect the flow rate of the cleaning liquid supplied to the thick film heater.

In this embodiment, the flow detector is arranged to monitor the flow rate of the cleaning liquid supplied to the thick film heater, and the flow detector may be any type of flow meter in the prior art, which falls within the protection scope of the present disclosure.

For the surface cleaning apparatus 1000 of each of the above embodiments, it is preferable that a controller (not shown) is further included, the controller providing a control signal to the thick film heater to turn off the thick film heater or to reduce the heating power of the thick film heater based on at least the detection signal generated by the flow detector.

The controller may be disposed on or part of the first circuit board 205, or may be disposed on or part of a second circuit board on the base.

The controller provides a control signal to the thick film heater when the flow signal detected by the flow detector is equal to or less than a preset threshold, and a plurality of preset thresholds can be set, for example, when the flow signal is equal to or less than a first preset threshold, the controller provides a first control signal to reduce the heating power of the thick film heater, and when the flow signal is equal to or less than a second preset threshold, the controller provides a second control signal to turn off the thick film heater.

In light of the technical solutions of the present embodiment, those skilled in the art can adjust the threshold size, the threshold number, and the like of the flow rate signal of the flow rate detector, and all of them fall within the scope of the present disclosure.

The controller of the present disclosure may be a control chip or a part of a control chip, and the present disclosure does not particularly limit a specific control circuit thereof.

In general, external power cords are inconvenient to use for larger rooms, and therefore, it is desirable to employ rechargeable power sources. However, the capacity of rechargeable power sources is limited and the time of use of the surface cleaning apparatus is greatly reduced when the heated cleaning liquid and steam are simultaneously operated. Thus, in some further embodiments of the present disclosure, the heated liquid is provided by a base station apparatus associated with the surface cleaning apparatus 1000.

A surface cleaning system according to one embodiment of the present disclosure includes: the surface cleaning apparatus 1000 of any of the embodiments described above; and a base station apparatus.

Wherein, the base station equipment includes:

a third liquid reservoir that stores cleaning liquid to be dispensed to the first liquid reservoir 201 of the surface cleaning apparatus 1000.

The base station device of the present disclosure may adopt the structure of the base station device in chinese patent 202110776224.1.

Wherein the base station apparatus is capable of dispensing heated cleaning liquid to the surface cleaning apparatus 1000.

Preferably, the base station apparatus comprises a second heating device associated with the third liquid reservoir for heating the cleaning liquid in the third liquid reservoir or the cleaning liquid output by the third liquid reservoir, such that the base station apparatus dispenses the heated cleaning liquid to the first liquid reservoir 201 of the surface cleaning apparatus 1000.

Preferably, in one embodiment, to increase the heating efficiency, a heater is located downstream of the first liquid reservoir. When the user places the main unit in the base station, the base station can replenish the supply tank of the main unit with a large amount of hot cleaning liquid.

In the description herein, reference to the description of the terms "one embodiment/mode," "some embodiments/modes," "example," "specific example" or "some examples" or the like means that a particular feature, structure, material, or characteristic described in connection with the embodiment/mode or example is included in at least one embodiment/mode or example of the present disclosure. In this specification, the schematic representations of the terms used above are not necessarily intended to be the same embodiment/mode or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments/modes or examples. Furthermore, the various embodiments/aspects or examples and features of the various embodiments/aspects or examples described in this specification can be combined and combined by one skilled in the art without conflicting therewith.

Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present disclosure, "a plurality" means at least two, e.g., two, three, etc., unless explicitly specifically limited otherwise.

It will be understood by those skilled in the art that the foregoing embodiments are merely for clarity of illustration of the disclosure and are not intended to limit the scope of the disclosure. Other variations or modifications may occur to those skilled in the art, based on the foregoing disclosure, and are still within the scope of the present disclosure.

Claims (16)

1. A surface cleaning apparatus, comprising:

a base including at least a cleaning portion;

a first liquid reservoir for storing a cleaning liquid to be dispensed;

a second liquid reservoir;

a vapor distributor connected to the first liquid reservoir;

a first fluid pathway extending at least between the first liquid reservoir and the vapor distributor;

the vacuumizing suction port is connected with the second liquid storage and is arranged on the base;

a second fluid pathway extending at least between the second fluid reservoir and the evacuation suction port;

a vacuum source in fluid communication with the second fluid reservoir and the vacuum extraction inlet, the vacuum source configured to generate a working air flow that passes through the vacuum extraction inlet, the second fluid passageway, and the second fluid reservoir to at least recycle liquid from the surface to be cleaned to the second fluid reservoir; and

a thick film heater located in the first fluid pathway, a first end of the thick film heater being associated with the first liquid reservoir and a second end of the thick film heater being associated with the steam distributor, the thick film heater being adapted to heat at least a portion of the cleaning liquid above the boiling point of the cleaning liquid to form a heated steam, the steam distributor distributing the heated steam to a surface to be cleaned in front of the vacuum extraction suction opening and/or to the cleaning portion;

wherein the arrangement of the thick film heater on the surface cleaning apparatus is such that the level at which the position of the first end of the thick film heater is always equal to or lower than the level at which the position of the second end of the thick film heater is.

2. A surface cleaning apparatus as claimed in claim 1, further comprising a body portion coupled to the base, the thick film heater being provided on at least one of the base and the body portion.

3. A surface cleaning apparatus as claimed in claim 2, characterised in that the thick film heater is provided on the base, the thick film heater is arranged laterally on the base, and the first end of the thick film heater is located at a level lower than or equal to the level of the second end.

4. A surface cleaning apparatus as claimed in claim 2, characterised in that the thick film heater is provided on the main body portion and is arranged vertically on the main body portion with the first end of the thick film heater being located at a level lower than or equal to the level at which the second end is located.

5. A surface cleaning apparatus as claimed in claim 3 or 4, characterised in that the thick film heater further comprises a thick film heating body within which the heating cavity of the thick film heater is formed.

6. Surface cleaning apparatus according to claim 5 in which a fluid guide is provided within the thick film heating body, a heating cavity of the thick film heater being formed between an inner wall of the thick film heating body and the fluid guide.

7. Surface cleaning apparatus according to claim 6 in which the fluid guide is a helical guide such that a helical heating cavity is formed between the inner wall of the thick film heating body and the fluid guide.

8. The surface cleaning apparatus of claim 5 wherein the thick film heater comprises a thick film heater housing, the thick film heater being disposed within the thick film heater housing, the heating cavity of the thick film heater being formed between the thick film heater and the thick film heater housing.

9. Surface cleaning apparatus according to claim 3 or 4 characterised in that the thick film heater is an elongate thick film heater which is circular, elliptical or rectangular in cross-section.

10. Surface cleaning apparatus according to claim 5, characterised in that the thick film heating body comprises at least a first section and a second section, the first section being located above the second section in the vertical direction, the electrical resistance of the first section being greater than the electrical resistance of the second section.

11. Surface cleaning apparatus according to claim 5 in which the thick film heating body comprises at least a first portion and a second portion, the first portion being located above the second portion in the vertical direction, the first portion being provided without a thick film heating layer.

12. A surface cleaning apparatus as claimed in claim 1, further comprising a liquid distributor connected to the first liquid reservoir for distributing cleaning liquid at least to a surface to be cleaned and/or to the cleaning section.

13. A surface cleaning apparatus as claimed in any one of claims 1 to 4, characterised in that a flow detector is provided in the first fluid path, the flow detector being provided between the first liquid reservoir and the thick film heater to detect the flow of cleaning liquid provided to the thick film heater.

14. The surface cleaning apparatus of claim 13, further comprising a controller that provides a control signal to the thick film heater to turn off the thick film heater or reduce heating power of the thick film heater based at least on the detection signal generated by the flow detector.

15. A surface cleaning apparatus as claimed in claim 12 further comprising a flow diversion assembly, a first outlet portion of the flow diversion assembly being connected to a first end of the thick film heater and a second outlet portion of the flow diversion assembly being connected to the liquid distributor, the first and second outlet portions of the flow diversion assembly being adapted to be selectively controlled such that cleaning liquid is distributed from the first liquid reservoir to at least one of the thick film heater and the liquid distributor.

16. A surface cleaning system, comprising:

the surface cleaning apparatus of any one of claims 1 to 15; and

a base station device;

wherein the base station apparatus comprises a third liquid reservoir holding cleaning liquid to be dispensed to the first liquid reservoir of the surface cleaning apparatus.

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