CN217271663U

CN217271663U - Shock-absorbing structure of scanning electron microscope

Info

Publication number: CN217271663U
Application number: CN202220998369.6U
Authority: CN
Inventors: 梁建强; 杨思源; 杨润潇
Original assignee: Huiran Technology Co ltd
Current assignee: Huiran Technology Co ltd
Priority date: 2022-04-24
Filing date: 2022-04-24
Publication date: 2022-08-23
Anticipated expiration: 2032-04-24

Abstract

The utility model discloses a scanning electron microscope shock-absorbing structure, including a plurality of horizontal shock-absorbing units, horizontal shock-absorbing unit includes ball layer board, ball apron and ball, the ball layer board with it sets up a plurality of ball grooves correspondingly on the ball apron, and is a plurality of the ball centre gripping is in the ball layer board with it is corresponding respectively between the ball apron the ball inslot, the ball apron is fixed in the bottom of scanning electron microscope main part. The utility model provides a shock-absorbing structure utilizes globular connection to reduce the frictional force between electronic speculum main part and the support, weakens the component at the horizontal direction of the mechanical vibration of conduction such as from ground, support, improves electronic speculum image quality.

Description

Shock-absorbing structure of scanning electron microscope

Technical Field

The utility model relates to a scanning electron microscope technical field especially relates to a scanning electron microscope shock-absorbing structure.

Background

Scanning Electron Microscope (SEM), abbreviated Scanning Electron Microscope, is a common micro-analyzer for modulating and imaging various physical signals excited by a focused Electron beam when Scanning on a sample surface.

The mechanical vibration and impact problem has a large influence on the image quality and resolution after the scanning electron microscope is imaged, the scanning electron microscope at present mainly depends on an air floating device as a shock absorption measure, as shown in fig. 1, the measure is generally implemented by placing a scanning electron microscope body 1 on a support 2, and a plurality of air floating devices 3 (generally, four corners arranged at the bottom of the scanning electron microscope body) are arranged between the bottom of the scanning electron microscope body 1 and the top of the support 2.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a can weaken scanning electron microscope's horizontal direction vibration's shock-absorbing structure at least.

In order to achieve the above purpose, the utility model provides a following technical scheme:

the utility model provides a scanning electron microscope shock-absorbing structure, includes a plurality of horizontal shock-absorbing unit, horizontal shock-absorbing unit includes ball layer board, ball apron and ball, the ball layer board with the last corresponding a plurality of ball grooves that set up of ball apron, a plurality of the ball centre gripping is in between the ball layer board with the ball apron and spacing respectively corresponding in the ball inslot, the ball apron is fixed in the bottom of scanning electron microscope main part.

Optionally, the damping structure includes four horizontal damping units, and the ball covers are respectively fixed at four corners of the bottom of the scanning electron microscope body.

Optionally, the damping structure further includes a limiting member, and the limiting member extends upward from two adjacent side edges of the ball bearing plate, and is used for limiting the scanning electron microscope main body.

Optionally, a buffer is disposed on the limiting member.

Optionally, the buffer is a rubber pad or an air bag.

Optionally, the damping device further comprises a plurality of air floating devices, and the plurality of horizontal damping units are respectively fixed on the tops of the plurality of air floating devices.

The utility model provides a shock-absorbing structure utilizes globular connection to reduce the frictional force between electronic speculum main part and the support, weakens the component at the horizontal direction of the mechanical vibration of conduction such as from ground, support, improves electronic speculum image quality. The utility model provides a shock-absorbing structure can be applied to other high magnification microscopes equally, for example transmission electron microscope.

The above and other objects, advantages and features of the present invention will become more apparent to those skilled in the art from the following detailed description of specific embodiments thereof, taken in conjunction with the accompanying drawings.

Drawings

Some specific embodiments of the present invention will be described in detail hereinafter, by way of illustration and not by way of limitation, with reference to the accompanying drawings. The same reference numbers in the drawings identify the same or similar elements or components. Those skilled in the art will appreciate that the drawings are not necessarily drawn to scale. In the drawings:

FIG. 1 is a schematic illustration of a prior art scanning electron microscope shock absorber;

fig. 2 is a schematic diagram of the overall structure of a shock absorbing structure of a scanning electron microscope according to an embodiment of the present invention;

FIG. 3 is a schematic structural diagram of a horizontal damping unit (not including a ball cover plate) mounted on a support in a damping structure of a scanning electron microscope according to an embodiment of the present invention;

FIG. 4 is an enlarged view of the horizontal shock absorbing unit of FIG. 3;

fig. 5 is a schematic view illustrating an installation of the ball cover plate at the bottom of the main body of the scanning electron microscope in the embodiment of the present invention.

Reference numerals:

1-scanning electron microscope body, 2-support, 21-baffle, 3-air floating device, 4-horizontal damping unit, 41-ball supporting plate, 42-ball cover plate, 43-ball, 5-limiting piece and 51-buffer piece

Detailed Description

It should be noted that, in the present invention, the embodiments and features of the embodiments may be combined with each other without conflict. The present invention will be described in detail below with reference to the accompanying drawings in conjunction with embodiments.

The scanning electron microscope mainly comprises the following components:

an electron optical system comprising an electron gun and a lens system. The electron gun functions to produce an electron illumination source. The lens system is used for (1) reducing the size of virtual light source from tens of micrometers to 5nm (or less) and continuously changing from tens of micrometers to several nanometers, (2) controlling the opening angle of electron beam, which can be 10% ^-2 ～10 ^-3 rad, and (3) the formed focused electron beam can be scanned in a raster-like manner on the surface of the sample, and the scanning angle range is variable, in order to obtain the above scanning electron beam, the lens system usually includes an electromagnetic lens, a scanning coil and a diaphragm, the electromagnetic lens is used for focusing the electron beam, the scanning coil is used for deflecting the electron beam and making regular scanning on the surface of the sample, and the diaphragm is used for filtering the teleaxis electrons in the electron beam and adjusting the depth of field of the image.

A mechanical system comprising a support portion and a sample chamber. The sample chamber is provided with a sample platform, and the four walls are generally provided with a plurality of windows, so that the electronic detector can be installed, and other detectors and spectrometers can be installed at the same time.

Vacuum systems, which are important in electron-optical instruments, are because electron beams can only be generated and manipulated under vacuum. The commonly used high vacuum systems include three types, namely a dry pump system, a turbomolecular pump system and an ion pump system.

In the signal collecting, processing and displaying system, an electron beam emitted by an electron gun of a scanning electron microscope is focused and then converged into a point light source, the point light source forms a high-energy electron beam under an accelerating voltage, the high-energy electron beam is focused into a light spot with a small diameter through an electromagnetic lens, after passing through an electromagnetic lens with a scanning coil at the last stage, the electron beam bombards the surface of a sample point by point in a raster scanning mode, and physical signals with different depths are excited simultaneously. The physical signals can be received by different signal detectors and synchronously transmitted to a computer display screen through an amplifier to form real-time imaging record. Under the action of incident electron beams, the sample can generate various physical signals, namely auger electrons (Au E), Secondary Electrons (SE), backscattered electrons (BSE), X rays (characteristic X rays and continuous X rays), cathode fluorescence (CL), Absorbed Electrons (AE) and transmitted electrons, and different physical signals need different types of detection systems. There are roughly three main categories, namely electron detectors, cathodoluminescence detectors and X-ray detectors.

The electron optical system is generally located in a lens barrel above the sample chamber, the signal detector is generally located in the sample chamber or the lens barrel, the electron gun, the lens system, the signal detector and the like are connected with an external power supply, and the vacuum system provides a vacuum environment for the lens barrel and the sample chamber.

In order to strengthen the weakening of horizontal direction vibration (horizontal vibration component), the utility model provides a scanning electron microscope shock-absorbing structure, this shock-absorbing structure utilizes the roll of ball in the ball groove to weaken the vibration of horizontal direction to weaken the scanning electron microscope main part receives the influence of horizontal vibration.

As shown in fig. 1-5, the shock absorbing structure for a scanning electron microscope according to an embodiment of the present invention includes a plurality of horizontal shock absorbing units 4, each horizontal shock absorbing unit 4 includes a ball supporting plate 41 and a ball cover plate 42, a plurality of ball grooves are correspondingly disposed on the ball supporting plate 41 and the ball cover plate 42, and a plurality of balls 43 are clamped between the ball supporting plate 41 and the ball cover plate 42 and respectively limited in the corresponding ball grooves. The ball cover 42 is fixed to the bottom of the scanning electron microscope body 1 so that, when mechanical vibration is generated, a vibration component in the horizontal direction is attenuated by rolling of the balls 43 in the ball grooves.

In the present embodiment, the vibration attenuating structure includes four horizontal vibration attenuating units 4, and the ball covers 42 are fixed to four corners of the bottom of the scanning electron microscope body 1, respectively. The shock-absorbing structure further comprises a limiting part 5, wherein the limiting part 5 extends upwards from two adjacent side edges of the ball bearing plate 41 and is used for limiting the scanning electron microscope main body 1, correspondingly, the ball bearing cover plate 42 is limited, and the ball bearing cover plate 42 and the ball bearing plate 41 are prevented from being staggered mutually when vibration is large. In order to buffer the horizontal movement of the scanning electron microscope body 1, a buffer 51, such as a rubber pad or an air bag, may be further disposed on the limiting member 5 of the present embodiment.

In this embodiment, the damping structure further includes a plurality of air flotation devices 3, and the horizontal damping units 4 are respectively fixed on the tops of the air flotation devices 3. As shown in fig. 4, in the present embodiment, the upper panel of the air floating device 3 is directly used as the ball supporting plate 41, that is, the upper panel of the air floating device 3 is provided with a ball groove, thereby achieving the purpose of simplifying the structure.

The utility model discloses a shock-absorbing structure can directly lay subaerial, and for the purpose that facilitates the use, also can be like prior art, arrange support 2 in on, still can set up baffle 21 in its bight on support 2, make things convenient for shock-absorbing structure's location.

The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention should be covered by the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.

Claims

1. The utility model provides a scanning electron microscope shock-absorbing structure, its characterized in that includes a plurality of horizontal shock-absorbing units, horizontal shock-absorbing unit includes ball layer board, ball apron and ball, the ball layer board with the last corresponding a plurality of ball grooves that set up of ball apron, a plurality of the ball centre gripping is in the ball layer board with between the ball apron and spacing respectively corresponding in the ball groove, the ball apron is fixed in the bottom of scanning electron microscope main part.

2. The shock-absorbing structure for a scanning electron microscope according to claim 1, wherein the shock-absorbing structure comprises four horizontal shock-absorbing units, and the ball covers are respectively fixed to four corners of the bottom of the scanning electron microscope body.

3. The shock-absorbing structure for a scanning electron microscope according to claim 2, further comprising a limiting member extending upward from two adjacent sides of the ball bearing plate for limiting the scanning electron microscope main body.

4. The shock absorbing structure for a scanning electron microscope according to claim 3, wherein a buffer member is disposed on the position-limiting member.

5. The shock absorbing structure for a scanning electron microscope according to claim 4, wherein the buffer is a rubber pad or an air bag.

6. The shock absorbing structure for a scanning electron microscope according to any one of claims 1 to 5, further comprising a plurality of air floating devices, wherein the plurality of horizontal shock absorbing units are respectively fixed on top of the plurality of air floating devices.