CN217233728U - Nitrogen flow direction device applied to semiconductor low-temperature pump - Google Patents
Nitrogen flow direction device applied to semiconductor low-temperature pump Download PDFInfo
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- CN217233728U CN217233728U CN202220908044.4U CN202220908044U CN217233728U CN 217233728 U CN217233728 U CN 217233728U CN 202220908044 U CN202220908044 U CN 202220908044U CN 217233728 U CN217233728 U CN 217233728U
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Abstract
The utility model discloses a be applied to semiconductor cryopump nitrogen gas flow direction device, including nitrogen gas guiding device, nitrogen gas guiding device from the bottom up has set gradually the air inlet dish, nitrogen gas draft tube and shower nozzle, the installing port has been seted up to the bottom of air inlet dish, be provided with flow control dish in the installing port, flow control dish sets up in the semicircular adjusting disk that shelters from the inboard with the activity including being fixed in intraoral semi-circle of installing, the adjusting disk all is fixed with the locating piece with semicircular sheltering from on the dish, the screw thread interlude has adjusting screw between two sets of locating pieces, adjusting screw's outer end symmetry is fixed with two sets of stoppers, two sets of stoppers set up respectively in the locating piece both sides that are located on the adjusting disk, be formed with the air inlet between adjusting disk and the installing port. The utility model discloses all be provided with adjustment mechanism at the both ends of guiding device and can carry out nimble regulation and control to the flow of nitrogen gas as required.
Description
Technical Field
The utility model relates to a cryopump technical field specifically is a be applied to semiconductor cryopump nitrogen gas flow direction device.
Background
Cryopumps are vacuum pumps that condense gases using cryogenic surfaces, also known as condensate pumps. The cryopump can obtain clean vacuum with the maximum pumping speed and the minimum limiting pressure, and is widely applied to the research and production of semiconductors and integrated circuits, the research and production of molecular beams, vacuum coating equipment, vacuum surface analysis instruments, ion implanters, space simulation devices and the like.
However, the conventional cryopump has the following problems in use: (1) in semiconductor cryopump equipment, nitrogen flows into a cryopump cavity at too large or too small flow rate, so that the temperature of the cryopump is unstable at low temperature, and the working effect of a pump body is influenced; (2) the nitrogen diversion mode of the existing cryopump is relatively fixed, and the nitrogen flow of the cryopump is inconvenient to adjust according to the requirement. For this reason, a corresponding technical scheme needs to be designed to solve the existing technical problems.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a be applied to semiconductor cryopump nitrogen gas flow direction device has solved in semiconductor cryopump equipment, and nitrogen gas appears the flow too big or undersize in flowing to the cryopump cavity, leads to the unstable temperature under the low temperature condition at the cryopump, influences the working effect of the pump body, this technical problem.
In order to achieve the above object, the utility model provides a following technical scheme: a nitrogen flow direction device applied to a semiconductor cryopump comprises a nitrogen flow guide device, wherein the nitrogen flow guide device is sequentially provided with an air inlet disc, a nitrogen flow guide cylinder and a spray head from bottom to top, the bottom of the air inlet disc is provided with an installation opening, a flow adjusting disc is arranged in the installation opening and comprises a semicircular shielding disc fixed in the installation opening and an adjusting disc movably arranged on the inner side of the semicircular shielding, positioning blocks are fixed on the adjusting disc and the semicircular shielding disc respectively, an adjusting screw rod is inserted between the two groups of positioning blocks in a threaded manner, the outer end of the adjusting screw rod is symmetrically fixed with two groups of limiting blocks, the two groups of limiting blocks are respectively arranged on two sides of the positioning blocks on the adjusting disc, an air inlet is formed between the adjusting disc and the installation opening, the bottom of the nitrogen flow guide cylinder is fixed on the air inlet disc, and the upper end of the nitrogen flow guide cylinder is provided with a notch, the improved sprayer is characterized in that two groups of adjusting blades are arranged in the nozzle in the notch, two sides of the notch are movably connected with two groups of adjusting blades through hinges, two groups of sliding grooves are symmetrically formed in two sides of the notch, sliding blocks are arranged in the sliding grooves, and positioning bolts and the inner ends of the positioning bolts are movably connected with the lower ends of the adjusting blades through threads on the sliding blocks.
As an optimized mode of the utility model, six groups of screw holes have evenly been seted up to the periphery of the dish that admits air, six groups the screw is the annular and evenly sets up on the dish that admits air.
As an optimized mode of the utility model, four directional airflow guiding holes of group, four groups have evenly been seted up to the outer end of shower nozzle the inner and the nitrogen gas draft tube of location airflow guiding hole are linked together.
As an optimized mode of the utility model, the periphery of shower nozzle has still inlayed sealed the pad, the butt joint runner that the sealed pad of cooperation used is seted up to the periphery of notch.
As an optimized mode of the present invention, the adjusting blade is disposed in an inclined manner and made of an elastic metal material.
Compared with the prior art, the beneficial effects of the utility model are as follows:
1. this scheme has designed a device that is used for cryopump nitrogen gas specially to carry out the water conservancy diversion, and this nitrogen gas guiding device can carry out nimble regulation and control with the induction volume of nitrogen gas to the shower nozzle structure of cooperation tip carries out flow control, can carry out the control of certain degree to the flow direction of nitrogen gas water conservancy diversion as required in addition, improves the stability of the inside nitrogen gas of cryopump and temperature.
2. This scheme all is provided with adjustment mechanism at the both ends of guiding device and can carries out nimble regulation and control to the flow of nitrogen gas as required.
Drawings
FIG. 1 is an overall structure diagram of the present invention;
FIG. 2 is a bottom structure view of the present invention;
fig. 3 is a top view of the present invention;
fig. 4 is the notch structure diagram of the present invention.
In the figure, 1, an air inlet disc; 2. a nitrogen guide cylinder; 3. a spray head; 4. an installation port; 5. a flow regulating disk; 6. a semicircular shielding disc; 7. an adjusting disk; 8. positioning blocks; 9. adjusting the screw rod; 10. a limiting block; 11. an air inlet; 12. a notch; 13. adjusting the blades; 14. a chute; 15. a slider; 16. positioning bolts; 17. a screw hole; 18. a directional airflow guide hole; 19. a gasket; 20. and (6) butting the flow channel.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Referring to fig. 1-4, the present invention provides a technical solution: a nitrogen flow direction device applied to a semiconductor low-temperature pump comprises a nitrogen flow guiding device, wherein the nitrogen flow guiding device is sequentially provided with an air inlet disc 1, a nitrogen flow guiding cylinder 2 and a spray head 3 from bottom to top, the bottom of the air inlet disc 1 is provided with a mounting port 4, a flow adjusting disc 5 is arranged in the mounting port 4, the flow adjusting disc 5 comprises a semicircular shielding disc 6 fixed in the mounting port 4 and an adjusting disc 7 movably arranged on the inner side of the semicircular shielding, positioning blocks 8 are fixed on the adjusting disc 7 and the semicircular shielding disc 6 respectively, an adjusting screw 9 is inserted between the two groups of positioning blocks 8 in a threaded manner, two groups of limiting blocks 10 are symmetrically fixed at the outer end of the adjusting screw 9, the two groups of limiting blocks 10 are respectively arranged on two sides of the positioning blocks 8 on the adjusting disc, an air inlet 11 is formed between the adjusting disc 7 and the mounting port 4, the bottom of the nitrogen flow guiding cylinder 2 is fixed on the air inlet disc 1, and the upper end of the nitrogen flow guiding cylinder is provided with a notch 12, place in the notch 12 in the shower nozzle 3 and both sides have two sets of adjusting blade 13 through hinge swing joint, two sets of spouts 14 have still been seted up to the symmetry in the both sides of notch 12, are provided with slider 15 in the spout 14, and threaded fixation has locating pin 16 and the inner and adjusting blade 13's lower extreme swing joint on slider 15.
Further improved, as shown in fig. 2: six groups of screw holes 17 are uniformly formed in the periphery of the air inlet disc 1, and the six groups of screw holes 17 are uniformly formed in the annular shape on the air inlet disc 1, so that the nitrogen flow guide device is convenient to install.
In a further improvement, as shown in fig. 3: four groups of directional airflow guide holes 18 are uniformly formed in the outer end of the spray head 3, and the inner ends of the four groups of directional airflow guide holes 18 are communicated with the nitrogen guide cylinder 2 and can directionally flow to the spray head 3.
Further improved, as shown in fig. 3 and 4: the periphery of the spray head 3 is further sleeved with a sealing gasket 19, the periphery of the notch 12 is provided with a butt joint flow channel 20 used by matching with the sealing gasket 19, and the design mode is convenient for the spray head 3 to carry out sealed butt joint on the butt joint flow channel 20.
Specifically, the adjusting blade 13 is disposed in an inclined manner and made of an elastic metal material, and such a design facilitates the adjustment of the height of the nozzle 3 by the adjusting blade 13 during the movement of the slider 15.
When in use: the nitrogen gas guiding device that this scheme designed installs in the air inlet department of cryopump, air inlet 11 through 1 department of the dish that admits air introduces nitrogen gas and guides nitrogen gas to shower nozzle 3 in through nitrogen gas draft tube 2, in the cavity of the leading-in cryopump of shower nozzle 3 at last, when needs are controlled the flow of cryopump, can move about adjusting disk 7 through twisting adjusting screw 9, thereby make the open-ended specification change of air inlet 11, can control and realize the design or directly derive through notch 12 through slider 15 to exhaust nitrogen gas volume in addition, improve the flexibility of device.
Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications may be made to the embodiments described in the foregoing embodiments, or equivalents may be substituted for elements thereof. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (5)
1. The utility model provides a be applied to semiconductor cryopump nitrogen gas flow direction device, includes nitrogen gas guiding device, its characterized in that: the nitrogen guiding device is sequentially provided with an air inlet disc (1), a nitrogen guiding cylinder (2) and a spray head (3) from bottom to top, the bottom of the air inlet disc (1) is provided with an installation opening (4), a flow adjusting disc (5) is arranged in the installation opening (4), the flow adjusting disc (5) comprises a semicircular shielding disc (6) fixed in the installation opening (4) and an adjusting disc (7) movably arranged on the semicircular shielding inner side, positioning blocks (8) are fixed on the adjusting disc (7) and the semicircular shielding disc (6), an adjusting screw (9) is inserted between the two groups of positioning blocks (8) in a threaded manner, two groups of limiting blocks (10) are symmetrically fixed at the outer end of the adjusting screw (9), the two groups of limiting blocks (10) are respectively arranged on two sides of the positioning blocks (8) positioned on the adjusting disc, an air inlet (11) is formed between the adjusting disc (7) and the installation opening (4), the bottom of nitrogen gas draft tube (2) is fixed in on air inlet plate (1) and notch (12) have been seted up to the upper end, place in notch (12) in shower nozzle (3) and both sides have two sets of adjusting vane (13) through hinge swing joint, two sets of spout (14) have still been seted up to the symmetry in the both sides of notch (12), be provided with slider (15) in spout (14), threaded fixation has the lower extreme swing joint of pilot pin (16) and inner and adjusting vane (13) on slider (15).
2. The nitrogen flow direction device applied to the semiconductor cryopump of claim 1, wherein: six groups of screw holes (17) are uniformly formed in the periphery of the air inlet disc (1), and the six groups of screw holes (17) are uniformly formed in the air inlet disc (1) in an annular shape.
3. The nitrogen flow direction device applied to the semiconductor cryopump of claim 1, wherein: four groups of directional airflow guide holes (18) are uniformly formed in the outer end of the spray head (3), and the inner ends of the four groups of directional airflow guide holes (18) are communicated with the nitrogen guide cylinder (2).
4. The nitrogen flow direction device applied to the semiconductor cryopump of claim 3, wherein: the periphery of the spray head (3) is further sleeved with a sealing gasket (19), and a butt joint flow channel (20) matched with the sealing gasket (19) for use is formed in the periphery of the notch (12).
5. The nitrogen flow direction device applied to the semiconductor cryopump of claim 1, wherein: the adjusting blades (13) are arranged in an inclined shape and made of elastic metal materials.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220908044.4U CN217233728U (en) | 2022-04-19 | 2022-04-19 | Nitrogen flow direction device applied to semiconductor low-temperature pump |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220908044.4U CN217233728U (en) | 2022-04-19 | 2022-04-19 | Nitrogen flow direction device applied to semiconductor low-temperature pump |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217233728U true CN217233728U (en) | 2022-08-19 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202220908044.4U Active CN217233728U (en) | 2022-04-19 | 2022-04-19 | Nitrogen flow direction device applied to semiconductor low-temperature pump |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN217233728U (en) |
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- 2022-04-19 CN CN202220908044.4U patent/CN217233728U/en active Active
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