CN217230935U - CVD deposition furnace device - Google Patents

CVD deposition furnace device Download PDF

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Publication number
CN217230935U
CN217230935U CN202221220897.5U CN202221220897U CN217230935U CN 217230935 U CN217230935 U CN 217230935U CN 202221220897 U CN202221220897 U CN 202221220897U CN 217230935 U CN217230935 U CN 217230935U
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China
Prior art keywords
shell
wall
baffle
dodge gate
deposition furnace
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CN202221220897.5U
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Chinese (zh)
Inventor
何少龙
周李伟
丁柳宁
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Zhejiang Liufang Semiconductor Technology Co.,Ltd.
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Zhejiang Liufang Carbon Technology Co ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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Abstract

The utility model discloses a CVD deposition furnace device belongs to CVD technical field. The utility model provides a CVD deposition furnace device, includes the shell, shell top surface middle part is connected with into the trachea, shell antetheca middle part is rotated and is connected with the dodge gate, dodge gate outer wall rear portion cover is equipped with sealing washer A, dodge gate antetheca middle part has set firmly the vacuum pump, the inside position for the dodge gate of shell is equipped with isolation assembly. The utility model discloses in operation process, only need manage to find time the region that the isolation component encloses, greatly reduced at every turn the area that needs manage to find time between the CVD deposit operation, and then just reduced the energy consumption when this device functions, reached the effect of saving the cost, the practicality is strong.

Description

CVD deposition furnace device
Technical Field
The utility model relates to a CVD technical field, more specifically says, relates to a CVD deposition furnace device.
Background
CVD generally refers to chemical vapor deposition, which is a chemical technology that mainly utilizes one or more gaseous compounds or simple substances containing film elements to carry out chemical reaction on the surface of a substrate to generate a film, the most important element of a chemical vapor deposition device is a reactor, according to the difference of the reactor structure, the chemical vapor deposition technology can be divided into two types of open tube/closed tube airflow methods, which are also divided into normal pressure or vacuum conditions, generally, the quality of a vacuum deposition film layer is good, when the vacuum deposition method is adopted, a worker needs to pump the interior of the deposition furnace to be in a vacuum state, but most of the existing devices can lead external air to be filled into the furnace when the deposition furnace is opened, so that the interior of the deposition furnace needs to be fully pumped out when the deposition furnace is continuously used, time and labor are wasted, and power resources are consumed, while reducing the efficiency of the CVD deposition operation, a CVD deposition furnace apparatus is proposed.
SUMMERY OF THE UTILITY MODEL
1. Technical problem to be solved
An object of the utility model is to provide a CVD deposition furnace device to solve the problem that proposes among the above-mentioned background art.
2. Technical scheme
The utility model provides a CVD deposition furnace device, includes the shell, shell top surface middle part is connected with into the trachea, shell antetheca middle part is rotated and is connected with the dodge gate, dodge gate outer wall rear portion cover is equipped with sealing washer A, dodge gate antetheca middle part has set firmly the vacuum pump, the inside position for the dodge gate of shell is equipped with isolation assembly.
Preferably, the upper portion of the shell is of a step structure, the interior of the air inlet pipe is communicated with the interior of the shell, and the rear end of the vacuum pump penetrates through the front wall of the movable door and extends into the shell.
Preferably, keep apart the subassembly including being two baffles that the symmetrical structure set up, the baffle is L type structure, baffle outer wall outside end cover is equipped with sealing washer B, sealing washer B outer wall and shell inner wall friction contact are located left baffle medial extremity rear portion has set firmly the picture peg, is located the right side the board groove has been seted up for the position of picture peg to the baffle medial extremity, the cooperation is pegged graft with the board groove to the picture peg.
Preferably, the limit groove has been seted up to baffle lateral wall top surface medial extremity, limit groove medial extremity articulates there is the rotor plate, the rotor plate is the setting of the slope structure of interior low outer height, is located the left rotor plate medial extremity is linear equidistant structure and has set firmly a plurality of three hornblocks, is located the right side the rotor plate medial extremity has seted up three horn grooves for three horn blocks's position, three horn blocks and three horn groove cooperation of pegging graft.
Preferably, the turn trough has been seted up for the position of turn plate rear end to baffle rear side inner wall, the turn trough is fan-shaped structure, turn plate rear end and turn trough sliding fit, the position of shell front side inner wall for the dodge gate top has set firmly the baffle, the baffle is the decurrent U type structure of concave surface, baffle top surface both ends respectively with two change board bottom surface medial extremity extrusion fit, the shell bottom surface is for two position between the baffle has set firmly the base, baffle lateral wall four corners department all is equipped with electric putter, the electric putter both ends all articulate there are the connecting rod, two the connecting rod is articulated each other, is located inboard side connecting rod medial extremity is articulated with the baffle outer wall, is located outboard side connecting rod outside end is articulated with the shell inner wall.
3. Advantageous effects
Compared with the prior art, the utility model has the advantages of:
1. the utility model discloses be equipped with isolation assembly, the staff only need manage to find time the region that isolation assembly encloses when using this device, greatly reduced at every turn the area that needs manage to find time between the CVD deposit operation, and then just reduced the energy consumption when this device functions, reached the effect of saving the cost, the practicality is strong.
Drawings
Fig. 1 is a schematic view of the overall structure of the present invention;
FIG. 2 is a schematic sectional view of the present invention;
FIG. 3 is an exploded view of the isolation assembly of the present invention;
fig. 4 is an enlarged schematic view of the structure at a of the present invention;
fig. 5 is an enlarged schematic structural diagram of the position B of the present invention.
The numbering in the figures illustrates: 1. a housing; 2. entering an air pipe; 3. a movable door; 4. a sealing ring A; 5. a vacuum pump; 6. an isolation component; 7. a baffle plate; 8. a seal ring B; 9. inserting plates; 10. a plate groove; 11. a side groove; 12. rotating the plate; 13. a triangular block; 14. a triangular groove; 15. rotating the groove; 16. a guide plate; 17. a base; 18. an electric push rod; 19. a connecting rod.
Detailed Description
Referring to fig. 1-5, the present invention provides a technical solution:
a CVD deposition furnace device comprises a shell 1, the upper part of the shell 1 is of a step structure, the middle part of the top surface of the shell 1 is connected with an air inlet pipe 2, the inside of the air inlet pipe 2 is communicated with the inside of the shell 1, the middle part of the front wall of the shell 1 is rotatably connected with a movable door 3, the rear part of the outer wall of the movable door 3 is sleeved with a sealing ring A4, the middle part of the front wall of the movable door 3 is fixedly provided with a vacuum pump 5, the rear end of the vacuum pump 5 penetrates through the front wall of the movable door 3 and extends into the shell 1, an isolation assembly 6 is arranged in the shell 1 relative to the position of the movable door 3, the isolation assembly 6 comprises two baffle plates 7 which are arranged in a symmetrical structure, each baffle plate 7 is of an L-shaped structure, the outer side end of the outer wall of each baffle plate 7 is sleeved with a sealing ring B8, the outer wall of each sealing ring B8 is in frictional contact with the inner wall of the shell 1, the rear part of the inner side end of the baffle plate 7 on the left side is fixedly provided with an insertion plate 9, the plate groove 10 is arranged on the inner side of the baffle plate 7 on the right side relative to the insertion plate 9, the inserting plate 9 is matched with the plate groove 10 in an inserting manner, the inner side end of the top surface of the side wall of the baffle plate 7 is provided with an edge groove 11, the inner side end of the edge groove 11 is hinged with a rotating plate 12, the rotating plate 12 is arranged in an inclined structure with a low inner part and a high outer part, the inner side end of the rotating plate 12 on the left side is fixedly provided with a plurality of triangular blocks 13 in a linear equal interval structure, the inner side end of the rotating plate 12 on the right side is provided with a triangular groove 14 relative to the position of the triangular blocks 13, the triangular blocks 13 are matched with the triangular grooves 14 in an inserting manner, the inner wall on the rear side of the baffle plate 7 is provided with a rotating groove 15 relative to the position of the rear end of the rotating plate 12, the rotating groove 15 is in a fan-shaped structure, the rear end of the rotating plate 12 is in a sliding fit with the rotating groove 15, the guide plate 16 is fixedly arranged on the inner wall on the front side of the shell 1 relative to the upper part of the movable door 3, the guide plate 16 is in a U-shaped structure with a downward concave surface, the two ends of the guide plate 16 are respectively in an extrusion fit with the inner side of the bottom surfaces of the two rotating plate 12, the bottom surfaces, the bottom surface of the shell 1 is fixedly provided with a base 17 relative to the position between the two baffle plates 7, the four corners of the outer side wall of the baffle 7 are respectively provided with an electric push rod 18, two ends of each electric push rod 18 are respectively hinged with a connecting rod 19, the two connecting rods 19 are hinged with each other, the inner side end of the connecting rod 19 positioned on the inner side is hinged with the outer wall of the baffle 7, and the outer side end of the connecting rod 19 positioned on the outer side is hinged with the inner wall of the shell 1.
The working principle is as follows: when a worker uses the device to carry out CVD deposition operation, the electric push rod 18 can be operated to extend, then under the pushing of the electric push rod 18, the included angle of the two connecting rods 19 is expanded and pushes the baffle 7 to move inwards, at the moment, the inner side ends of the rotating plates 12 hinged in the edge grooves 11 of the inner walls of the baffle 7 deflect upwards under the extrusion of the guide plates 16, the triangular blocks 13 and the triangular grooves 14 of the inner walls of the two rotating plates 7 are in mutual insertion fit, meanwhile, the rear parts of the top surfaces of the rotating plates 12 are tightly attached to the top surfaces of the rotating grooves 15, on the other hand, the inserting plates 9 and the inserting grooves at the rear parts of the two baffle plates 7 are also in mutual insertion, so that the mutually connected positions of the two baffle plates 7 and the two rotating plates 12 at the two sides generate a labyrinth type sealing effect, the sealing effect of the sealing ring B8 on the joint of the baffle 7 and the inner walls of the shell 1 is matched, the four enclosed areas can be independent, and at the moment, the area isolated by the isolating assembly 6 can be filled up by opening the external air of the movable door 3, and other areas still keep original vacuum state, take the staff to put into the article that needs processing after, only need close the dodge gate 3 again and utilize vacuum pump 5 to evacuate to the isolation component 6 internal region can, can effectual reduction evacuation's scope, reduce the energy consumption, the staff just can pour into the used gas of CVD deposit into inside shell 1 with only connecting the income trachea 2 of this device with outside air feeder at last.

Claims (5)

1. A CVD deposition furnace arrangement comprising a housing (1), characterized in that: shell (1) top surface middle part is connected with into trachea (2), shell (1) antetheca middle part is rotated and is connected with dodge gate (3), dodge gate (3) outer wall rear portion cover is equipped with sealing washer A (4), dodge gate (3) antetheca middle part has set firmly vacuum pump (5), shell (1) inside is equipped with isolation components (6) for the position of dodge gate (3).
2. The CVD deposition furnace apparatus of claim 1, wherein: the upper portion of the shell (1) is of a step structure, the interior of the air inlet pipe (2) is communicated with the interior of the shell (1), and the rear end of the vacuum pump (5) penetrates through the front wall of the movable door (3) and extends into the shell (1).
3. The CVD deposition furnace apparatus of claim 1, wherein: keep apart subassembly (6) including two baffle (7) that are the symmetrical structure and set up, baffle (7) are L type structure, baffle (7) outer wall outside end cover is equipped with sealing washer B (8), sealing washer B (8) outer wall and shell (1) inner wall friction contact are located left baffle (7) medial extremity rear portion has set firmly picture peg (9), is located the right side board groove (10) have been seted up for the position of picture peg (9) to baffle (7) medial extremity, picture peg (9) are pegged graft with board groove (10) and are cooperated.
4. The CVD deposition furnace apparatus according to claim 3, wherein: baffle (7) lateral wall top surface medial extremity has seted up limit groove (11), limit groove (11) medial extremity articulates there is commentaries on classics board (12), commentaries on classics board (12) are the slope structure setting of interior low outer height, are located the left commentaries on classics board (12) medial extremity is linear equidistant structure and has set firmly a plurality of three hornblocks (13), is located the right side change board (12) medial extremity has seted up three horn grooves (14) for the position of three horn blocks (13), three horn blocks (13) and three horn grooves (14) cooperation of pegging graft.
5. The CVD deposition furnace apparatus according to claim 4, wherein: the inner wall of the rear side of the baffle (7) is provided with a rotating groove (15) relative to the position of the rear end of the rotating plate (12), the rotating groove (15) is of a fan-shaped structure, the rear end of the rotating plate (12) is in sliding fit with the rotating groove (15), a guide plate (16) is fixedly arranged on the inner wall of the front side of the shell (1) relative to the position above the movable door (3), the guide plate (16) is of a U-shaped structure with a downward concave surface, two ends of the top surface of the guide plate (16) are respectively in extrusion fit with the inner side ends of the bottom surfaces of the two rotating plates (12), a base (17) is fixedly arranged on the bottom surface of the shell (1) relative to the position between the two baffles (7), electric push rods (18) are arranged at four corners of the outer side wall of the baffle (7), two connecting rods (19) are hinged with each other, the inner side ends of the connecting rods (19) are hinged with the outer wall of the baffle (7), the outer side end of the connecting rod (19) positioned at the outer side is hinged with the inner wall of the shell (1).
CN202221220897.5U 2022-05-19 2022-05-19 CVD deposition furnace device Active CN217230935U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202221220897.5U CN217230935U (en) 2022-05-19 2022-05-19 CVD deposition furnace device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202221220897.5U CN217230935U (en) 2022-05-19 2022-05-19 CVD deposition furnace device

Publications (1)

Publication Number Publication Date
CN217230935U true CN217230935U (en) 2022-08-19

Family

ID=82823442

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202221220897.5U Active CN217230935U (en) 2022-05-19 2022-05-19 CVD deposition furnace device

Country Status (1)

Country Link
CN (1) CN217230935U (en)

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CP01 Change in the name or title of a patent holder

Address after: 311800 78 Zhancheng Avenue, Taozhu street, Zhuji City, Shaoxing City, Zhejiang Province

Patentee after: Zhejiang Liufang Semiconductor Technology Co.,Ltd.

Address before: 311800 78 Zhancheng Avenue, Taozhu street, Zhuji City, Shaoxing City, Zhejiang Province

Patentee before: Zhejiang Liufang Carbon Technology Co.,Ltd.

CP01 Change in the name or title of a patent holder