CN217188702U - ALD tail gas treatment device - Google Patents
ALD tail gas treatment device Download PDFInfo
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- CN217188702U CN217188702U CN202220760982.4U CN202220760982U CN217188702U CN 217188702 U CN217188702 U CN 217188702U CN 202220760982 U CN202220760982 U CN 202220760982U CN 217188702 U CN217188702 U CN 217188702U
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Abstract
The utility model belongs to the technical field of atomic layer deposition, and provides an ALD tail gas treatment device, which comprises a first gas inlet, one end of the first air inlet is connected with the reaction cavity, the other end of the first air inlet is connected with a first-stage decomposition device, one end of the first-stage decomposition device far away from the first air inlet is provided with a first air outlet, the first air outlet is fixedly connected with one end of a connecting pipe, one end of the connecting pipe far away from the first air outlet is connected with a secondary decomposition device, a second air inlet is arranged on one side of the top of the secondary decomposition device, the connecting pipe is communicated with the secondary decomposition device through the second air inlet, the second air outlet is arranged at the lower side of one end of the second-stage decomposition device far away from the second air inlet, through the heating decomposition device of two-stage different density, control tail gas flow rate, improved tail gas decomposition efficiency, the life of extension pump has reduced the pollution of tail gas to the environment.
Description
Technical Field
The utility model belongs to the technical field of atomic layer deposition, concretely relates to ALD tail gas processing apparatus.
Background
Atomic Layer Deposition (ALD) is currently the most advanced coating and surface treatment technology. ALD plays a role as a medium flow column in the modern semiconductor industry. The existing ALD process is characterized in that sufficient precursors are introduced in a pulse mode, so that a plurality of precursors react and deposit in a reaction chamber, and sufficient precursors are required to be provided to adsorb the surface of a substrate in the using process, so that redundant precursors are inevitably pumped away and discharged by an air pump, the pump is exposed to the organic metal precursor pulse, the service life of the pump is shortened, the existing ALD process is mainly characterized in that the pump is heated at the front section of the air pump, however, a pure heat trap cannot fully react the excessive precursors, the service life of the pump cannot be normally prolonged, and the pollution of tail gas to the environment is increased.
SUMMERY OF THE UTILITY MODEL
In order to solve the problem, the utility model provides a ALD tail gas processing apparatus, through the thermal decomposition device of the different density of two-stage, control tail gas flow rate has improved tail gas decomposition efficiency, prolongs the life of pump, has reduced the pollution of tail gas to the environment.
The utility model provides a technical scheme as follows:
on one hand, the ALD tail gas treatment device comprises a first gas inlet, wherein one end of the first gas inlet is connected with a reaction cavity, the other end of the first gas inlet is connected with a primary decomposition device, one end, far away from the first gas inlet, of the primary decomposition device is provided with a first gas outlet, and the first gas outlet is fixedly connected with one end of a connecting pipe;
the one end that first gas outlet was kept away from to the connecting pipe is connected with second grade decomposition device, one side at second grade decomposition device top is equipped with the second air inlet, the connecting pipe communicates with each other with second grade decomposition device through the second air inlet, second grade decomposition device is equipped with the second gas outlet at the downside of the one end of keeping away from the second air inlet.
Furthermore, a plurality of first baffle plates which are connected with the inner wall in the vertical direction are arranged in the primary decomposition device, and the first baffle plates are alternately provided with ventilation openings at the upper part and the lower part.
Furthermore, a plurality of second baffles which are horizontally connected with the inner wall are arranged in the secondary decomposition device, and a plurality of air holes which are arranged in a staggered mode are formed in the second baffles.
Furthermore, a filter screen is arranged at the second air inlet of the secondary decomposition device.
Furthermore, the outer surfaces of the first-stage decomposition device and the second-stage decomposition device are both provided with heating devices.
Furthermore, the joints of the first-stage decomposition device, the second-stage decomposition device and the connecting pipe are respectively provided with a vacuum joint.
Further, the temperature of the heating device on the first-stage decomposition device is set to be 150-180 ℃, and the temperature of the heating device on the second-stage decomposition device is set to be 170-200 ℃.
To sum up, the beneficial effects of the utility model are that:
(1) the utility model discloses a thermal decomposition work is carried out to tail gas in grades to the heating decomposition device of the different density of two-stage, has improved the tail gas decomposition rate, has reduced the pollution of tail gas to the environment.
(2) The utility model discloses set up the baffle of different density in the heating decomposition device, the velocity of flow of control tail gas has further improved tail gas decomposition efficiency, prolongs the life of vacuum pump.
Drawings
FIG. 1 is a schematic sectional view of the present invention;
FIG. 2 is a schematic view of the overall structure of the present invention;
FIG. 3 is a schematic top view of the present invention;
fig. 4 is a schematic top view of the second decomposition device of the present invention;
FIG. 5 is a schematic side sectional view of the second decomposition device of the present invention;
fig. 6 is a schematic side sectional structural view of the first decomposition device of the present invention.
The reference numbers are as follows:
1. a first air inlet; 2. a first-stage decomposition device; 3. a secondary decomposition device; 4. a first air outlet; 5. a second air inlet; 6. a second air outlet; 7. a connecting pipe; 8. a heating device; 9. a vacuum joint; 21. a first baffle plate; 31. a second baffle; 32. air holes; 33. and (4) a filter screen.
Detailed Description
In order to deepen the understanding of the present invention, the present invention will be described in detail with reference to the following embodiments, which are only used to explain the present invention and do not limit the scope of the present invention.
As shown in fig. 1-6, an ALD tail gas treatment device comprises a first gas inlet 1, one end of the first gas inlet 1 is connected to a reaction chamber, the other end of the first gas inlet 1 is connected to a first-stage decomposition device 2, one end of the first-stage decomposition device 2, which is far away from the first gas inlet 1, is provided with a first gas outlet 4, the first gas outlet 4 is fixedly connected to one end of a connecting pipe 7, and the connecting pipe 7 may be U-shaped, right-angled, or the like;
one end of connecting pipe 7, which is far away from first gas outlet 4, is connected with second grade decomposition device 3, one side at the top of second grade decomposition device 3 is equipped with second gas inlet 5, connecting pipe 7 communicates with each other through second gas inlet 5 and second grade decomposition device 3, and second grade decomposition device 3 is equipped with second gas outlet 6 at the downside of the one end of keeping away from second gas inlet 5.
In this embodiment, a plurality of first baffles 21 connected with the inner wall in the vertical direction are arranged in the primary decomposition device 2, the first baffles 21 are alternately provided with ventilation openings from top to bottom, and the ventilation openings are arranged in a staggered manner, so that the flowing distance of the tail gas is increased, the retention time of the tail gas in the primary decomposition device 2 is prolonged, and the reaction efficiency is improved.
In this embodiment, the second baffle 31 connected to the inner wall is arranged in the second-stage decomposition device 3 in a plurality of horizontal directions, the second baffle 31 is provided with a plurality of air holes 32 arranged in a staggered manner, the tail gas enters from the top of the second-stage decomposition device 3 and flows downwards through the air holes 32 under the action of the vacuum device and gravity, and the structural density inside the second-stage decomposition device 3 is greater than the internal structural density of the first-stage decomposition device 2, so that the reaction process is further strengthened.
In this embodiment, the second-stage decomposition device 3 is provided with a filter screen 33 at the second air inlet 5, and the filter screen 33 can rapidly absorb impurities after the first-stage reaction of the tail gas.
In this embodiment, the outer surfaces of the primary decomposing device 2 and the secondary decomposing device 3 are both provided with heating devices 8, and the heating devices 8 can be set to different temperatures as required to heat the decomposing devices.
In this embodiment, the joints of the first-stage decomposition device 2, the second-stage decomposition device 3 and the connecting pipe 7 are provided with vacuum joints 9, and the vacuum joints 9 can adopt the joints such as KF40 or KF50, which can effectively prevent the exhaust gas from leaking.
The temperature of the heating device 8 on the first-stage decomposition device 2 is set to be 150-180 ℃, and the temperature of the heating device 8 on the second-stage decomposition device 3 is set to be 170-200 ℃.
The decomposition effect of the tail gas treatment device is tested by different flow rates and temperatures as follows:
test 1:
the flow rate of the tail gas in the first-stage heating decomposition device 2 is 1000ml/min;
the tail gas flows into the first-stage heating decomposition device 2, and the temperature of a heating device 8 is set to be 150 ℃;
impurities generated by the heated tail gas are filtered and adsorbed by a filter screen 33;
the flow rate of the tail gas in the secondary heating decomposition device 3 is 500 ml/min;
the tail gas flows into the secondary heating decomposition device 3, the temperature of the heating device 8 is set to be 170 ℃, and when the tail gas flows to the second gas outlet 6, the tail gas is pyrolyzed to obtain exhaust gas.
The decomposition rate of the gas discharged from the vacuum apparatus was 89.7%.
Test 2:
the flow rate of the tail gas in the first-stage heating decomposition device 2 is 800ml/min;
the tail gas flows into the first-stage heating decomposition device 2, and the temperature of a heating device 8 is set to be 180 ℃;
impurities generated by the heated tail gas are filtered and adsorbed by a filter screen 33;
the flow rate of the tail gas in the secondary heating decomposition device 3 is 200 ml/min;
the tail gas flows into the secondary heating decomposition device 3, the temperature of the heating device 8 is set to be 220 ℃, and when the tail gas flows to the second gas outlet 6, the tail gas is pyrolyzed to obtain exhaust gas.
The decomposition rate of the gas discharged from the vacuum apparatus was 96.5%.
Test 3:
the flow rate of the tail gas in the first-stage heating decomposition device 2 is 900ml/min;
the tail gas flows into the first-stage heating decomposition device 2, and the temperature of a heating device 8 is set to be 165 ℃;
impurities generated by the heated tail gas are filtered and adsorbed by a filter screen 33;
the flow rate of the tail gas in the secondary heating decomposition device 3 is 350 ml/min;
and the tail gas flows into the secondary heating decomposition device 3, the temperature of the heating device 8 is set to be 200 ℃, and when the tail gas flows to the second gas outlet 6, the tail gas is pyrolyzed to obtain exhaust gas.
The decomposition rate of the gas discharged from the vacuum apparatus was 92.9%.
Test 4:
the flow rate of the tail gas in the first-stage heating decomposition device 2 is 800ml/min;
the tail gas flows into the first-stage heating decomposition device 2, and the temperature of a heating device 8 is set to be 180 ℃;
impurities generated by the heated tail gas are filtered and adsorbed by a filter screen 33;
the flow rate of the tail gas in the secondary heating decomposition device 3 is 200 ml/min;
and tail gas flows into the secondary heating decomposition device 3, the temperature of the heating device 8 is set to be 170 ℃, and when the tail gas flows to the second gas outlet 6, the tail gas is pyrolyzed to obtain exhaust gas.
The decomposition rate of the gas discharged from the vacuum apparatus was 94.2%.
It is to be noted that, in the attached drawings or in the description, the implementation modes not shown or described are all the modes known by the ordinary skilled person in the field of technology, and are not described in detail. Furthermore, the above definitions of the various elements and methods are not limited to the specific structures, shapes, or configurations shown in the examples.
It is also noted that the examples provided herein include parameters of particular values, but these parameters need not be exactly equal to the corresponding values, but may be approximated to the corresponding values within acceptable error margins or design constraints. Directional phrases used in the embodiments, such as those referring to "upper", "lower", "front", "rear", "left", "right", "inner", "outer", etc., refer only to the orientation of the drawings and are not intended to limit the scope of the present application.
While the foregoing specification illustrates and describes the preferred embodiments of the present invention, it is to be understood that the invention is not limited to the forms disclosed herein, but is not to be construed as limited to the disclosed embodiments, and that modifications and environments may be resorted to, falling within the scope of the inventive concept as described herein, either as indicated by the above teachings or as modified by the skill or knowledge of the relevant art. But that modifications and variations may be effected by those skilled in the art without departing from the spirit and scope of the invention, which is to be limited only by the claims appended hereto.
Claims (6)
1. An ALD tail gas treatment device comprises a first gas inlet (1), and is characterized in that one end of the first gas inlet (1) is connected with a reaction chamber, the other end of the first gas inlet is connected with a primary decomposition device (2), one end, far away from the first gas inlet (1), of the primary decomposition device (2) is provided with a first gas outlet (4), and the first gas outlet (4) is fixedly connected with one end of a connecting pipe (7);
one end that first gas outlet (4) was kept away from in connecting pipe (7) is connected with second grade decomposition device (3), one side at second grade decomposition device (3) top is equipped with second air inlet (5), connecting pipe (7) communicate with each other through second air inlet (5) and second grade decomposition device (3), second grade decomposition device (3) are equipped with second gas outlet (6) at the downside of the one end of keeping away from second air inlet (5).
2. An ALD exhaust gas treatment device according to claim 1, characterized in that a plurality of first baffle plates (21) connected with the inner wall in the vertical direction are arranged in the primary decomposition device (2), and the first baffle plates (21) are alternately provided with ventilation openings at the upper and lower parts.
3. An ALD exhaust gas treatment device according to claim 1, characterized in that a plurality of second baffles (31) are arranged in the secondary decomposition device (3), and the second baffles (31) are horizontally connected with the inner wall, and are provided with a plurality of staggered air holes (32).
4. An ALD exhaust gas treatment device according to claim 1, characterized in that the secondary decomposition device (3) is provided with a filter screen (33) at the second gas inlet (5).
5. An ALD off-gas treatment device according to claim 1, characterized in that the outer surfaces of the primary decomposition device (2) and the secondary decomposition device (3) are provided with heating means (8).
6. An ALD exhaust gas treatment device according to any one of claims 1-3, characterized in that the primary decomposition device (2), the secondary decomposition device (3) and the connecting pipe (7) are provided with vacuum joints (9).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220760982.4U CN217188702U (en) | 2022-04-02 | 2022-04-02 | ALD tail gas treatment device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220760982.4U CN217188702U (en) | 2022-04-02 | 2022-04-02 | ALD tail gas treatment device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217188702U true CN217188702U (en) | 2022-08-16 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202220760982.4U Active CN217188702U (en) | 2022-04-02 | 2022-04-02 | ALD tail gas treatment device |
Country Status (1)
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| CN (1) | CN217188702U (en) |
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- 2022-04-02 CN CN202220760982.4U patent/CN217188702U/en active Active
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