CN216947206U - Chlorine treatment device in acid etching solution recovery process - Google Patents

Chlorine treatment device in acid etching solution recovery process Download PDF

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Publication number
CN216947206U
CN216947206U CN202123405758.8U CN202123405758U CN216947206U CN 216947206 U CN216947206 U CN 216947206U CN 202123405758 U CN202123405758 U CN 202123405758U CN 216947206 U CN216947206 U CN 216947206U
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main body
air
pipe
treatment device
chlorine treatment
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CN202123405758.8U
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李纠
谢彬
白坤生
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Dongguan Xiubo Electronic Material Co ltd
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Dongguan Xiubo Electronic Material Co ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling

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Abstract

The utility model discloses a chlorine treatment device in the recovery process of an acidic etching solution, which comprises a liquid storage tank, a cover body, a main body and a first spraying plate, wherein the liquid storage tank is fixed at one end of the main body, a metering pump is installed at one side of the liquid storage tank, and a gas guide pipe is fixed between the top end inside the main body and the bottom end inside the main body. According to the utility model, the main body, the air pressure sensor and the second air pump are installed, so that when the device is operated specifically, the air pressure sensor at the top end inside the main body can monitor the air pressure concentration in real time, the monitored data is sent to the corresponding PLC control cabinet, when the air pressure concentration is too high and exceeds a preset safety value, the control cabinet can control the second air pump to be closed, the first air pump is controlled to be opened, and the gas accumulated inside the main body is pumped into the bottom end inside the main body through the air guide tube, so that the gas flows circularly, further, accidents such as explosion and the like caused by gas accumulation are avoided, the gas is convenient to react fully, and the chlorine treatment effect is ensured.

Description

Chlorine treatment device in acid etching solution recovery process
Technical Field
The utility model relates to the technical field of acid etching solution recovery treatment, in particular to a chlorine treatment device in the acid etching solution recovery process.
Background
The copper chloride acid etching solution has the characteristics of safety, stability, high etching rate and the like, and is widely applied to etching of printed circuit boards.
SUMMERY OF THE UTILITY MODEL
The utility model aims to provide a chlorine treatment device in the acid etching solution recovery process, which solves the problems of difficult adjustment of gas inlet flow, difficult adjustment of gas inlet amount, low safety performance, difficult full treatment and difficult assembly in the background technology.
In order to achieve the purpose, the utility model provides the following technical scheme: the utility model provides a chlorine processing apparatus in acid etching liquid recovery process, includes liquid reserve tank, lid, main part and the first board that sprays, the liquid reserve tank is fixed in the one end of main part, the measuring pump is installed to one side of liquid reserve tank, be fixed with the air duct between the inside top of main part and the inside bottom, just install first air pump on the air duct, the bottom that first air pump one side was kept away from to the main part is fixed with the collection material pipe, be fixed with the intake pipe in the main part of collection material pipe top, just install flow control valve in the intake pipe, the second air pump is installed at the top of intake pipe, the lid is installed in the top of main part, the first board that sprays welds in the inside of main part, the first main part internal weld that sprays the board below has the second to spray the board, baroceptor is installed on the inside top of main part.
Preferably, the inside wall of liquid reserve tank and main part all is provided with the nanometer ceramic inoxidizing coating, the anti-skidding base has all been welded to the bottom of liquid reserve tank and main part, the material of anti-skidding base is rubber, has promoted the shock attenuation antiskid effect of device.
Preferably, the liquid guide pipe is installed to the output of measuring pump, the input of measuring pump is linked together through the inside bottom of connecting pipe and liquid reserve tank, the inside that first spraying board and second sprayed the board all is linked together through the inside of connecting pipe and liquid guide pipe, and the chlorine fully reacts the processing of being convenient for.
Preferably, the bottom of the first spraying plate and the bottom of the second spraying plate are uniformly provided with spray heads which are arranged at equal intervals, so that the uniform spraying of the sodium hydroxide solution is facilitated.
Preferably, the top end inside the material collecting pipe is provided with an internal thread layer, and the material collecting pipe is provided with an electromagnetic valve, so that waste liquid can be conveniently collected.
Preferably, the input end of the second air pump is provided with an exhaust tube, and the exhaust tube is welded with a flange plate, so that chlorine gas can be automatically collected conveniently.
Compared with the prior art, the utility model has the beneficial effects that:
(1) the chlorine treatment device in the acid etching liquid recovery process optimizes the performance of the device by installing the exhaust pipe, the flow control valve and the second spray plate, when in use, on one hand, a user can assemble the flange plate on the exhaust pipe with the air outlet of corresponding acid etching liquid recovery electrolytic equipment, then the second air pump is started, chlorine is pumped into the bottom end inside the main body through the air inlet pipe, and the flow control valve is installed on the air inlet pipe, so that the user can conveniently regulate and control the air inlet flow, thereby facilitating the full reaction of the chlorine, on the other hand, the flow control valve is installed on the air inlet pipe, so that the user can conveniently regulate and control the air inlet flow, thereby facilitating the full reaction of the chlorine, simultaneously, the metering pump is started, and the sodium hydroxide solution inside the liquid storage tank can be guided into the first spray plate and the second spray plate through the action of the liquid guide pipe, then the reaction solution can be uniformly sprayed in the main body by the spray heads uniformly distributed at the bottoms of the first spray plate and the second spray plate, so that the chlorine gas is conveniently and fully reacted, and the dosage can be conveniently observed and adjusted by a user through the metering action of the metering pump, so that the waste of the sodium hydroxide solution is avoided;
(2) the chlorine treatment device in the acid etching liquid recovery process is provided with the main body, the air pressure sensor and the second air pump, so that when the device is specifically operated, the air pressure sensor at the top end inside the main body can monitor air pressure concentration in real time, monitored data are sent to the corresponding PLC control cabinet, when the air pressure concentration is too high and exceeds a preset safety value, the control cabinet can control the second air pump to be closed, the first air pump is controlled to be opened, and gas accumulated inside the main body is pumped into the bottom end inside the main body through the air guide tube, so that the gas flows circularly, accidents such as explosion and the like caused by gas accumulation are avoided, the gas can fully react, and the chlorine treatment effect is ensured;
(3) the chlorine treatment device in the acid etching liquid recovery process optimizes the structure of the device by installing the exhaust tube, the liquid storage tank and the main body, and when in use, on one hand, the anti-adhesion and anti-corrosion effects of the liquid storage tank and the main body are improved by arranging the nano ceramic protective layer on the liquid storage tank and the main body, and on the other hand, the shock absorption and anti-slip effects of the device are improved by welding the anti-slip bases made of rubber at the bottoms of the liquid storage tank and the main body, and on the other hand, a user can assemble corresponding material collecting equipment and a material collecting tube with an internal thread layer arranged at the bottom end inside the main body, and at the moment, the electromagnetic valve arranged on the material collecting tube is opened, so that sodium chloride solution and the like generated after the internal reaction of the main body can be collected, and the user can assemble the chlorine treatment device and the gas outlet of the corresponding acid etching liquid recovery electrolytic equipment by utilizing the flange plate on the exhaust tube, thereby facilitating the automatic collection of chlorine.
Drawings
FIG. 1 is a schematic front view of the present invention;
FIG. 2 is a schematic front sectional view of the main body of the present invention;
FIG. 3 is a rear view of the intake manifold of the present invention;
FIG. 4 is a schematic side view of the material collecting pipe of the present invention.
In the figure: 1. a liquid storage tank; 2. a metering pump; 3. a cover body; 4. a first air pump; 5. a catheter; 6. an air duct; 7. a main body; 8. a first shower plate; 9. a second shower plate; 10. an air inlet pipe; 11. a material collecting pipe; 12. a spray head; 13. an air pressure sensor; 14. an exhaust pipe; 15. a flow control valve; 16. a second air pump; 17. an electromagnetic valve.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1-4, an embodiment of the present invention is shown: a chlorine treatment device in the recovery process of acidic etching solution comprises a liquid storage tank 1, a cover body 3, a main body 7 and a first spraying plate 8, wherein the liquid storage tank 1 is fixed at one end of the main body 7;
a metering pump 2 is arranged on one side of the liquid storage tank 1, an air guide pipe 6 is fixed between the top end of the interior of the main body 7 and the bottom end of the interior of the main body, and a first air pump 4 is arranged on the air guide pipe 6;
a material collecting pipe 11 is fixed at the bottom of one side of the main body 7, which is far away from the first air pump 4, an air inlet pipe 10 is fixed on the main body 7 above the material collecting pipe 11, and a flow control valve 15 is installed on the air inlet pipe 10;
the top of the air inlet pipe 10 is provided with a second air pump 16, the cover body 3 is arranged at the top of the main body 7, and the first spraying plate 8 is welded inside the main body 7;
a second spray plate 9 is welded in the main body 7 below the first spray plate 8, and an air pressure sensor 13 is installed at the top end in the main body 7;
the inner side walls of the liquid storage tank 1 and the main body 7 are both provided with a nano ceramic protective layer, the bottoms of the liquid storage tank 1 and the main body 7 are both welded with anti-skid bases, and the anti-skid bases are made of rubber;
when the anti-sticking and anti-corrosion device is used, the anti-sticking and anti-corrosion effects of the liquid storage tank 1 and the main body 7 are improved by arranging the nano ceramic protective layers on the liquid storage tank 1 and the main body 7, and the shock-absorbing and anti-skidding effects of the device are improved by welding the anti-skidding bases made of rubber at the bottoms of the liquid storage tank 1 and the main body 7;
the output end of the metering pump 2 is provided with a liquid guide pipe 5, the input end of the metering pump 2 is communicated with the bottom end inside the liquid storage tank 1 through a connecting pipe, and the insides of the first spraying plate 8 and the second spraying plate 9 are communicated with the inside of the liquid guide pipe 5 through the connecting pipe;
when the chlorine gas purification device is used, the metering pump 2 is started, the sodium hydroxide solution in the liquid storage tank 1 can be guided into the first spraying plate 8 and the second spraying plate 9 under the action of the liquid guide pipe 5, and then the reaction solution can be uniformly sprayed in the main body 7 through the spray heads 12 uniformly distributed at the bottoms of the first spraying plate 8 and the second spraying plate 9, so that the chlorine gas can be conveniently and fully reacted;
the bottoms of the first spray plate 8 and the second spray plate 9 are uniformly provided with spray heads 12 which are arranged at equal intervals;
the spraying structure is optimized, and the uniform spraying of the sodium hydroxide solution is convenient to realize;
an internal thread layer is arranged at the top end inside the material collecting pipe 11, and an electromagnetic valve 17 is installed on the material collecting pipe 11;
when the collecting device is used, a user can assemble corresponding collecting equipment with the collecting pipe 11 with the inner threaded layer, which is arranged at the bottom end inside the main body 7, and then open the electromagnetic valve 17 arranged on the collecting pipe 11, so that the collection of sodium chloride solution and the like generated after the reaction inside the main body 7 can be realized;
an air exhaust pipe 14 is installed at the input end of the second air pump 16, and a flange plate is welded on the air exhaust pipe 14;
when the chlorine collecting device is used, a user can assemble the flange plate on the exhaust pipe 14 with the air outlet of the corresponding electrolytic equipment for recycling the acid etching solution, so that the chlorine can be conveniently and automatically collected.
When the embodiment of the application is used: an external power supply, a user can utilize a flange plate on an exhaust pipe 14 to assemble the chlorine gas with the gas outlet of corresponding electrolytic equipment for acid etching solution recovery, then a second air pump 16 is started, the chlorine gas is pumped into the bottom end inside a main body 7 through an air inlet pipe 10, and a flow control valve 15 is installed on the air inlet pipe 10, so that the user can conveniently regulate and control the flow of the inlet gas, thereby the chlorine gas fully reacts, meanwhile, a metering pump 2 is started, through the action of a liquid guide pipe 5, the sodium hydroxide solution inside a liquid storage box 1 can be guided into a first spraying plate 8 and a second spraying plate 9, then spray heads 12 uniformly distributed at the bottoms of the first spraying plate 8 and the second spraying plate 9 can uniformly spray the reaction solution inside the main body 7, thereby the chlorine gas is conveniently and fully reacted, and through the metering action of the metering pump 2, the user can conveniently observe and adjust the dosage, the waste of sodium hydroxide solution is avoided, in addition, the air pressure sensor 13 at the top end inside the main body 7 can monitor the air pressure concentration in real time and send the monitored data to the corresponding PLC control cabinet, when the air pressure concentration is too high and exceeds a preset safety value, the control cabinet controls the second air pump 16 to be closed and controls the first air pump 4 to be opened, the gas accumulated in the main body 7 is pumped into the bottom end of the interior of the main body 7 through the gas guide tube 6, so that the gas circularly flows, thereby not only avoiding accidents such as explosion caused by gas accumulation, but also being convenient for gas to fully react, ensuring the chlorine treatment effect, meanwhile, the user can assemble the corresponding material collecting equipment with the material collecting pipe 11 with the internal thread layer arranged at the bottom end inside the main body 7, at this time, the electromagnetic valve 17 installed on the collecting pipe 11 is opened, so that the sodium chloride solution and the like generated after the reaction in the main body 7 can be collected.

Claims (6)

1. The chlorine treatment device in the acid etching liquid recovery process is characterized by comprising a liquid storage tank (1), a cover body (3), a main body (7) and a first spraying plate (8), wherein the liquid storage tank (1) is fixed at one end of the main body (7), a metering pump (2) is installed at one side of the liquid storage tank (1), an air guide pipe (6) is fixed between the top end inside the main body (7) and the bottom end inside the main body (7), a first air pump (4) is installed on the air guide pipe (6), a material collecting pipe (11) is fixed at the bottom of one side, away from the first air pump (4), of the main body (7), an air inlet pipe (10) is fixed on the main body (7) above the material collecting pipe (11), a flow control valve (15) is installed on the air inlet pipe (10), a second air pump (16) is installed at the top of the air inlet pipe (10), the cover body (3) is installed at the top of the main body (7), the first spraying plate (8) is welded inside the main body (7), the second spraying plate (9) is welded inside the main body (7) below the first spraying plate (8), and an air pressure sensor (13) is installed on the top end inside the main body (7).
2. The apparatus of claim 1, wherein the chlorine treatment device comprises: the inside wall of liquid reserve tank (1) and main part (7) all is provided with the nanometer ceramic inoxidizing coating, the anti-skidding base has all been welded to the bottom of liquid reserve tank (1) and main part (7), the material of anti-skidding base is rubber.
3. The apparatus of claim 1, wherein the chlorine treatment device comprises: catheter (5) are installed to the output of measuring pump (2), the input of measuring pump (2) is linked together through the inside bottom of connecting pipe and liquid reserve tank (1), first spraying board (8) and second spray the inside of board (9) and all be linked together through the inside of connecting pipe and catheter (5).
4. The apparatus of claim 1, wherein the chlorine treatment device comprises: and spray heads (12) which are arranged at equal intervals are uniformly arranged at the bottoms of the first spray plate (8) and the second spray plate (9).
5. The apparatus of claim 1, wherein the chlorine treatment device comprises: an internal thread layer is arranged at the top end inside the material collecting pipe (11), and an electromagnetic valve (17) is installed on the material collecting pipe (11).
6. The apparatus of claim 1, wherein the chlorine treatment device comprises: an air pumping pipe (14) is installed at the input end of the second air pump (16), and a flange plate is welded on the air pumping pipe (14).
CN202123405758.8U 2021-12-30 2021-12-30 Chlorine treatment device in acid etching solution recovery process Active CN216947206U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202123405758.8U CN216947206U (en) 2021-12-30 2021-12-30 Chlorine treatment device in acid etching solution recovery process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202123405758.8U CN216947206U (en) 2021-12-30 2021-12-30 Chlorine treatment device in acid etching solution recovery process

Publications (1)

Publication Number Publication Date
CN216947206U true CN216947206U (en) 2022-07-12

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ID=82312095

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202123405758.8U Active CN216947206U (en) 2021-12-30 2021-12-30 Chlorine treatment device in acid etching solution recovery process

Country Status (1)

Country Link
CN (1) CN216947206U (en)

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