CN216947182U

CN216947182U - Diamond vapor deposition furnace

Info

Publication number: CN216947182U
Application number: CN202220411768.8U
Authority: CN
Inventors: 余斌; 余海粟; 朱轶方; 陆骁莹
Original assignee: Hangzhou Chaoran Diamond Co ltd
Current assignee: Hangzhou Chaoran Diamond Co ltd
Priority date: 2022-02-28
Filing date: 2022-02-28
Publication date: 2022-07-12
Anticipated expiration: 2032-02-28

Abstract

The utility model discloses a diamond vapor deposition furnace, which comprises an air inlet pipe, wherein the air inlet pipe comprises an air guide pipe and a flow rate control pipeline communicated with the air guide pipe and a precipitation reaction box, a conical inner groove is arranged in the flow rate control pipeline, a flow rate control piston is arranged in the conical inner groove, and the flow rate control piston comprises a fixed sleeve fixed at one end, a movable sleeve axially moving at the other end and a telescopic pipe connected with the fixed sleeve and the movable sleeve; if the gas flow rate is higher, the movable sleeve is pushed to slide to the minimum diameter position of the conical inner groove, and the gap between the movable sleeve and the conical inner groove is reduced, so that the gas flow rate is reduced; if the gas flow velocity is slow, the movable sleeve slides to the maximum diameter position of the conical inner groove under the elasticity of the telescopic pipe, and the gap between the movable sleeve and the conical inner groove is enlarged, so that the gas flow velocity is increased, and the flow control is realized.

Description

Diamond vapor deposition furnace

Technical Field

The utility model relates to diamond, in particular to a diamond vapor deposition furnace.

Background

Vapor deposition, which refers to a process in which chemical gases or vapors react to form coatings or nanomaterials on the surface of a substrate, is the most widely used technique in the semiconductor industry for depositing a variety of materials, including a wide range of insulating materials, most metallic materials and metal alloy materials. Theoretically, it is simple: introducing two or more gaseous starting materials into a reaction chamber, and then chemically reacting with each other to form a new material to be deposited on the wafer surface; and the diamond vapor deposition is to deposit a new material after reaction on the surface of the diamond by using a vapor deposition method.

However, in practice, the reaction in the reaction chamber is complicated, and the flow rate of the gas affects the rate at which the deposits are produced, and thus the thickness of the deposits on the diamond surface, and if the gas flow rate varies or the flow rate ratio of the gases is poorly controlled, the thickness of the insulating material on the outer side of the semiconductor produced may be uneven.

SUMMERY OF THE UTILITY MODEL

In order to solve at least one technical problem mentioned in the background, the utility model aims to provide a diamond vapor deposition furnace.

In order to achieve the purpose, the utility model provides the following technical scheme:

the utility model provides a diamond vapor deposition stove, includes intake pipe and precipitation reaction case, the intake pipe includes the air duct and communicates the air duct and the flow rate control pipeline of precipitation reaction case, be equipped with the toper inside groove in the flow rate control pipeline, be equipped with the flow rate control piston in the toper inside groove, the flow rate control piston includes fixed sleeve, other end axial motion's that one end is fixed movable sleeve and connects fixed sleeve and movable sleeve flexible pipe, movable sleeve's diameter is greater than the minimum diameter of toper inside groove, and is less than the maximum diameter of toper inside groove, movable sleeve keeps away from fixed sleeve's one end is equipped with the toper inclined plane, the toper inclined plane is kept away from fixed sleeve's terminal surface seals.

Compared with the prior art, the utility model has the beneficial effects that:

when the gas passes through the flow rate control pipeline, the gas firstly enters the flow rate control piston, and then flows out of the flow rate control pipeline through a gap between the movable sleeve and the conical inner groove; if the gas flow rate is higher, the movable sleeve is pushed to slide to the minimum diameter position of the conical inner groove, and the gap between the movable sleeve and the conical inner groove is reduced, so that the gas flow rate is reduced; if the gas flow velocity is slow, the movable sleeve slides to the maximum diameter position of the conical inner groove under the elasticity of the telescopic pipe, and the gap between the movable sleeve and the conical inner groove is enlarged, so that the gas flow velocity is increased, and the flow control is realized.

Preferably, a plurality of through holes are formed on the side wall of the inclined plane of the conical inclined plane.

Preferably, the smallest diameter of the tapered ramp surface is smaller than the smallest diameter of the tapered inner groove.

Preferably, the inner wall of the conical inner groove is provided with a plurality of sliding grooves, the outer wall of the movable sleeve is provided with sliding blocks which correspond to the sliding grooves one to one, and the sliding blocks are connected with the inner wall of the sliding grooves in a sliding mode.

Preferably, a baffle is fixedly arranged on one side of the conical inner groove with the larger diameter, a first air port communicated with the fixed sleeve is formed in the baffle, a plurality of second air ports surrounding the first air port are formed in the baffle, and the second air ports are located on the outer side of the fixed sleeve.

Preferably, the inner wall of the flow velocity control pipeline is provided with a drainage plate, the drainage plate is positioned on the side with the larger diameter of the conical inner groove, and the drainage plate is provided with a drainage through hole.

Preferably, the diameter of the drainage through hole is not greater than the diameter of the first tuyere.

Preferably, the air guide pipe abuts against the end face of the drainage plate.

Preferably, the device comprises a precipitation reaction box, an air inlet pipe and an air outlet pipe, wherein the air inlet pipe and the air outlet pipe are respectively arranged at two ends of the precipitation reaction box.

Preferably, the end of the conical inner tank with the smaller diameter is close to the precipitation reaction tank.

Drawings

FIG. 1 is a schematic view of the overall structure of the present invention;

FIG. 2 is an exploded view of the present invention;

FIG. 3 is a schematic structural view of an intake pipe 2 according to the present invention;

FIG. 4 is a cross-sectional view of FIG. 3;

fig. 5 is a sectional view of the flow rate control piston 25;

fig. 6 is a sectional view of the air tube 2 when the wind speed is high.

In the figure:

1. a precipitation reaction box; 2. an air inlet pipe; 21. a flow rate control conduit; 22. a conical inner groove; 221. a chute; 222. a slider; 23. a baffle plate; 231. a second tuyere; 232. a first tuyere; 24. a drainage plate; 25. a flow rate control piston; 251. a movable sleeve; 252. a telescopic pipe; 253. a tapered ramp; 254. a through hole; 255. fixing the sleeve; 3. an air duct; 4. and an air outlet pipe.

Detailed Description

The technical solutions in the embodiments of the present invention are clearly and completely described below, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

Referring to fig. 1-5, the present embodiment provides a diamond vapor deposition furnace, which includes a deposition reaction box 1, an air inlet pipe 2 and an air outlet pipe 4, wherein the air inlet pipe 2 and the air outlet pipe 4 are respectively installed at two ends of the deposition reaction box 1; gas enters the precipitation reaction box 1 from the gas inlet pipe 2 to react, and after precipitates are generated on the surface of diamond, the residual gas flows out through the gas outlet pipe 4.

The air inlet pipe 2 comprises an air guide pipe 3 and a flow rate control pipeline 21 communicating the air guide pipe 3 with the precipitation reaction box 1, a conical inner groove 22 is arranged in the flow rate control pipeline 21, a flow rate control piston 25 is arranged in the conical inner groove 22, the flow rate control piston 25 comprises a fixed sleeve 255 with one end fixed, a movable sleeve 251 with the other end moving axially, and an elastic extension pipe 252 connecting the fixed sleeve 255 and the movable sleeve 251, the diameter of the movable sleeve 251 is larger than the minimum diameter of the conical inner groove 22 and smaller than the maximum diameter of the conical inner groove 22; when the gas passes through the flow rate control pipeline 21, the gas firstly enters the flow rate control piston 25, and then the gas flows out of the flow rate control pipeline 21 through a gap between the movable sleeve 251 and the conical inner groove 22; if the gas flow rate is higher, the movable sleeve 251 is pushed to slide to the position with the minimum diameter of the conical inner groove 22, and the gap between the movable sleeve 251 and the conical inner groove 22 is reduced, so that the gas flow rate is reduced; if the gas flow rate is slow, the movable sleeve 251 slides to the maximum diameter position of the conical inner groove 22 under the elastic force of the extension tube 252, and the gap between the movable sleeve 251 and the conical inner groove 22 is enlarged, so that the gas flow rate is increased, and the flow control is realized.

Referring to fig. 4 and 6, in order to prevent the situation that when the movable sleeve 251 hits the tapered inner groove 22, the corner of the movable sleeve 251 hits the tapered inner groove 22, which may cause damage to the surface of one of the two, the end of the movable sleeve 251 far away from the fixed sleeve 255 is provided with a tapered inclined surface 253, and the inclined angle of the tapered inclined surface 253 is larger than that of the tapered inner groove 22; the tapered inclined surface 253 is provided with a plurality of through holes 254, so that when the air flow is too large, the tapered inclined surface 253 is pushed by the air flow to be abutted against the inner wall of the inner groove 22, the air cannot pass through, one reaction gas is lost in the precipitation reaction box 1, the reaction cannot be continued, in addition, the minimum diameter of the tapered inclined surface 253 is smaller than the minimum diameter of the tapered inner groove 22, when the tapered inclined surface 253 is abutted against the inner wall of the inner groove 22, the through holes 254 are positioned at the outer side of the inner groove 22, and the air can directly enter the precipitation reaction box 1 without passing through the inner groove 22.

In order to keep the movable sleeve 251 and the inner tapered groove 22 moving coaxially all the time, the inner wall of the inner tapered groove 22 is provided with a plurality of sliding grooves 221, the outer wall of the movable sleeve 251 is provided with sliding blocks 222 corresponding to the sliding grooves 221 one by one, and the sliding blocks 222 are connected with the inner wall of the sliding grooves 221 in a sliding manner.

Referring to fig. 4, in this embodiment, a baffle 23 is fixedly disposed on a larger side of the conical inner groove 22, a first air port 232 penetrating through the fixed sleeve 255 is formed in the baffle 23, the diameter of the first air port 232 is not greater than the diameter of the fixed sleeve 255, and the gas directly enters the flow rate control piston 25 through the first air port 232; since the amount of gas passing through the first ventilation opening 232 is limited, and the gas passing through the first ventilation opening 232 can only enter the precipitation reaction chamber 1 through the through hole 254, the baffle plate 23 is provided with a plurality of second ventilation openings 231 surrounding the first ventilation opening 232, the second ventilation openings 231 are located outside the fixed sleeve 255, the gas enters between the flow rate control piston 25 and the tapered inner groove 22 through the second ventilation openings 231, when the wind speed is low, the gas can simultaneously pass through the first ventilation opening 232 and the second ventilation openings 231, and the gas throughput is ensured to be sufficient.

In this embodiment, the inner wall of the flow rate control pipe 21 is provided with a drainage plate 24, the drainage plate 24 is located on the side of the conical inner groove 22 with the larger diameter, and the drainage plate 24 is provided with a drainage through hole; the diameter of the flow guide through hole is not greater than that of the first air opening 232, so that the gas firstly passes through the first air opening 232 under the inertia effect, and the rest of the gas enters the second air opening 231.

In this embodiment, the end of the tapered inner tank 22 with a smaller diameter is close to the precipitation reaction tank 1.

Referring to fig. 1-3, in this embodiment, the airway tube 3 abuts against the end face of the flow-guiding plate 24.

It will be evident to those skilled in the art that the utility model is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or essential attributes thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the utility model being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein.

Claims

1. A diamond vapor deposition furnace comprises an air inlet pipe (2) and a precipitation reaction box (1), and is characterized in that the air inlet pipe (2) comprises an air guide pipe (3) and a flow rate control pipeline (21) for communicating the air guide pipe (3) with the precipitation reaction box (1), a conical inner groove (22) is arranged in the flow rate control pipeline (21), a flow rate control piston (25) is arranged in the conical inner groove (22), the flow rate control piston (25) comprises a fixed sleeve (255) with one end fixed, a movable sleeve (251) with the other end moving axially and an elastic extension pipe (252) for connecting the fixed sleeve (255) and the movable sleeve (251), the diameter of the movable sleeve (251) is larger than the minimum diameter of the inner groove of the conical inner groove (22) and smaller than the maximum diameter of the conical inner groove (22), a conical inclined surface (253) is arranged at one end, far away from the fixed sleeve (255), of the movable sleeve (251), the conical bevel (253) is closed away from the end face of the fixing sleeve (255).

2. A diamond vapor deposition furnace as set forth in claim 1, wherein said tapered ramp (253) has a plurality of through holes (254) formed in the ramp sidewall.

3. A diamond vapor deposition furnace according to claim 2, wherein the smallest diameter of the tapered ramp (253) is smaller than the smallest diameter of the tapered inner groove (22).

4. A diamond vapor deposition furnace according to claim 1, wherein a plurality of sliding grooves (221) are formed on the inner wall of the conical inner groove (22), sliding blocks (222) corresponding to the sliding grooves (221) are arranged on the outer wall of the movable sleeve (251), and the sliding blocks (222) are connected with the inner wall of the sliding grooves (221) in a sliding mode.

5. A diamond vapor deposition furnace according to claim 1, wherein a baffle plate (23) is fixedly arranged on the side of the conical inner groove (22) with the larger diameter, a first tuyere (232) communicated with the fixed sleeve (255) is formed in the baffle plate (23), a plurality of second tuyeres (231) surrounding the first tuyere (232) are formed in the baffle plate (23), and the second tuyere (231) is positioned outside the fixed sleeve (255).

6. A diamond vapor deposition furnace according to claim 5, wherein the inner wall of the flow rate control pipe (21) is provided with a flow guide plate (24), the flow guide plate (24) is positioned on the side with the larger diameter of the conical inner groove (22), and the flow guide plate (24) is provided with a flow guide through hole.

7. A diamond vapour deposition furnace according to claim 6, wherein the diameter of the drainage through hole is not greater than the diameter of the first tuyere (232).

8. A diamond vapour deposition furnace according to claim 6, wherein the gas-guide tube (3) abuts against the end face of the flow-guide plate (24).

9. A diamond vapor deposition furnace according to claim 1, further comprising an outlet pipe (4), wherein the inlet pipe (2) and the outlet pipe (4) are respectively installed at two ends of the precipitation reaction box (1).

10. A diamond vapour deposition furnace according to claim 8, wherein the end of the conical inner groove (22) with the smaller diameter is close to the deposition reaction chamber (1).