CN216947163U

CN216947163U - Point source evaporation device and co-evaporation coating layer point source evaporation structure

Info

Publication number: CN216947163U
Application number: CN202220135977.4U
Authority: CN
Inventors: 庄丹丹; 孙玉俊
Original assignee: Fujian Huajiacai Co Ltd
Current assignee: Fujian Huajiacai Co Ltd
Priority date: 2022-01-12
Filing date: 2022-01-12
Publication date: 2022-07-12
Anticipated expiration: 2032-01-12

Abstract

The utility model discloses a point source evaporation device and a co-evaporation coating layer point source evaporation structure, which comprise a point source system and a crystal oscillator system, wherein the point source system comprises a first point source slide rail, and at least two point sources are connected on the first point source slide rail in a sliding manner; the crystal oscillator system comprises a first crystal oscillator slide rail, and at least two crystal oscillators are connected on the first crystal oscillator slide rail in a sliding manner; the working position on the first point source slide rail and the working position on the first crystal oscillator slide rail are correspondingly arranged; when evaporation is carried out, one point source is pushed to the working position of the first point source sliding rail, and meanwhile, the matched crystal oscillator is pushed to the working position of the first crystal oscillator sliding rail. The utility model adopts the design of alternate point source evaporation, keeps the evaporation angle unchanged, can perfectly superimpose the parts with uniform film thickness together, reduces the difficulty of the evaporation compensation and adjustment of a fine metal mask plate, has uniform distribution of photoelectric properties in the same device or panel, reduces the damage risk of the device or panel, and improves the service life of the device or panel.

Description

Point source evaporation device and co-evaporation film layer point source evaporation structure

Technical Field

The utility model relates to the field of evaporation, in particular to a point source evaporation device and a co-evaporation coating layer point source evaporation structure.

Background

The organic light emitting diode OLED display has the characteristics of low power consumption, wide visual angle, wide color gamut, high response speed, ultra-light and thin period and the like, and is developed more and more rapidly as an autonomous light emitting device in a high-performance display area.

Adopt the coating by vaporization mode to prepare OLED device at present and become the OLED device preparation mode of present mainstream, evaporation equipment divide into source of the rays and point source again according to the kind of coating by vaporization source, wherein the source of the rays wide application is in large-scale coating by vaporization machine, the point source is used for middle-size and small-size coating by vaporization machine, but because the limitation of point source coating by vaporization angle change for it can produce serious membrane thickness inequality in the subpixel when the coating by vaporization luminescent layer, lead to device or panel to produce the phenomenon of the color rendering inequality at last, lead to the coating by vaporization yield to reduce.

When the size of the sub-pixel is close to the thickness of the mask (when the length or width of the sub-pixel is less than 3 times of the thickness of the mask), due to the change of an evaporation angle in the process of point source evaporation, the film thickness in the sub-pixel is not uniformly distributed, the film thickness of an evaporation source in each direction is not uniform, and the uniform part of the film thickness cannot be perfectly superposed together, so that the difficulty of evaporation compensation and adjustment of a fine metal mask plate is increased, the photoelectric performance in the same device or panel is not uniformly distributed, the damage risk of the device or panel is increased, and the service life of the device or panel is reduced.

Disclosure of Invention

In order to overcome the defects in the prior art, the utility model aims to provide a point source evaporation device and a point source evaporation structure of a co-evaporation coating layer, which can reduce the risk of uneven color development of devices or panels caused by uneven film thickness superposition and improve the yield of products.

In order to achieve the purpose, the utility model adopts the following technical scheme:

a point source evaporation device comprises a point source system and a crystal oscillator system, wherein the point source system comprises a first point source slide rail, a working position and a waiting position are formed on the first point source slide rail, and at least two point sources are connected on the first point source slide rail in a sliding manner; the crystal oscillator system comprises a first crystal oscillator slide rail, a working position and a waiting position are formed on the first crystal oscillator slide rail, and at least two crystal oscillators are connected to the first crystal oscillator slide rail in a sliding manner; the working position on the first point source slide rail and the working position on the first crystal oscillator slide rail are correspondingly arranged; when evaporation is carried out, one point source is pushed to the working position of the first point source sliding rail, and meanwhile, the matched crystal oscillator is pushed to the working position of the first crystal oscillator sliding rail.

Furthermore, the utility model also comprises evaporation partition plates arranged at two sides of the working position of the first point source slide rail, and the evaporation partition plates at two sides are driven to lift by a lifting driver.

The utility model provides a evaporation coating film layer point source coating by vaporization structure altogether, its includes two at least foretell point source coating by vaporization devices, and each point source coating by vaporization device's point source system sliding connection respectively is on second point source slide rail, and each point source coating by vaporization device's crystal oscillator system sliding connection respectively is on second crystal oscillator slide rail.

By adopting the technical scheme, the utility model has the following beneficial technical effects: the design of adopting the formula point source coating by vaporization of taking turns, can switch different coating by vaporization sources in same position during the coating by vaporization, when the different material of coating by vaporization or rete, keep the coating by vaporization angle unchangeable, the even part of membrane thickness can be laminated together perfectly, reduces the coating by vaporization of meticulous metal mask board and supplyes the adjustment degree of difficulty, and the photoelectric property in same device or panel distributes evenly, reduces the harm risk of device or panel, improves the life-span of device or panel.

Drawings

The utility model is described in further detail below with reference to the accompanying drawings and the detailed description;

FIG. 1 is a schematic view of a point source evaporation device according to the present invention;

fig. 2 is a schematic diagram of a point source evaporation structure of a co-evaporation film layer according to the present invention.

Detailed Description

Referring to fig. 1 and fig. 2, the point source evaporation device of the present invention includes a point source system 1 and a crystal oscillator system 2, where the point source system 1 includes a first point source slide rail 11, a working position and a waiting position are formed on the first point source slide rail 11, and at least two point sources 12 are slidably connected to the first point source slide rail 11; the crystal oscillator system 2 comprises a first crystal oscillator slide rail 21, a working position and a waiting position are formed on the first crystal oscillator slide rail 21, and at least two crystal oscillators 22 are connected to the first crystal oscillator slide rail 21 in a sliding manner; the working position on the first point source slide rail 11 and the working position on the first crystal oscillator slide rail 21 are correspondingly arranged and are both positioned in the middle; during vapor deposition, one of the point sources 12 is pushed to the working position of the first point source slide rail 11, and the matched crystal oscillator 22 is pushed to the working position of the first crystal oscillator slide rail 21.

The utility model also comprises evaporation spacing plates 3 arranged at two sides of the working position of the first point source slide rail 11, the evaporation spacing plates 3 at two sides are driven by a lifting driver (which can be an air cylinder) to lift, and the evaporation spacing plates 3 are put down for evaporation during evaporation, thereby avoiding the interference of external environment in the evaporation process, and being beneficial to keeping a fixed evaporation angle and stable evaporation material concentration.

The point source or the crystal oscillator related to the utility model can be transferred on the sliding rail by manual pushing or equipment pushing, for example, by using a cylinder, a motor and the like.

As shown in fig. 2, the film material to the codeposition needs the cooperation of a plurality of point source evaporation devices, so expand on the basis of point source evaporation device, can divide into the combination of two at least point source evaporation devices, second point source slide rail 4 and second crystal oscillator slide rail 5, the station divide into work position, wait for position and vacancy, point source system 1 of each point source evaporation device sliding connection respectively is on second point source slide rail 4, crystal oscillator system 2 of each point source evaporation device sliding connection respectively is on second crystal oscillator slide rail 5. Directly move the point source evaporation device to the working position during evaporation. In addition, the waiting position can also be used as a point source for normal evaporation.

While the utility model has been described in connection with the above embodiments, it is to be understood that the utility model is not limited to the disclosed embodiments, which are illustrative and not restrictive, and that those skilled in the art will understand that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; such modifications and substitutions do not depart from the spirit and scope of the present invention, and they should be construed as being included in the following claims and description.

Claims

1. A point source evaporation device is characterized in that: the point source system comprises a first point source sliding rail, a working position and a waiting position are formed on the first point source sliding rail, and at least two point sources are connected onto the first point source sliding rail in a sliding mode; the crystal oscillator system comprises a first crystal oscillator slide rail, a working position and a waiting position are formed on the first crystal oscillator slide rail, and at least two crystal oscillators are connected to the first crystal oscillator slide rail in a sliding manner; the working position on the first point source slide rail and the working position on the first crystal oscillator slide rail are correspondingly arranged; when evaporation is carried out, one point source is pushed to the working position of the first point source sliding rail, and meanwhile, the matched crystal oscillator is pushed to the working position of the first crystal oscillator sliding rail.

2. The point source evaporation device according to claim 1, wherein: the evaporation device also comprises evaporation partition plates arranged on two sides of the working position of the first point source slide rail, and the evaporation partition plates on the two sides are driven to lift by a lifting driver.

3. The utility model provides a coating film layer point source coating by vaporization structure altogether which characterized in that: the point source evaporation device comprises at least two point source evaporation devices as claimed in claim 1 or 2, wherein point source systems of each point source evaporation device are respectively connected onto a second point source slide rail in a sliding manner, and crystal oscillator systems of each point source evaporation device are respectively connected onto a second crystal oscillator slide rail in a sliding manner.