CN216597520U

CN216597520U - Precision cleaning processing equipment with cleaning liquid quantitative structure for semiconductor equipment

Info

Publication number: CN216597520U
Application number: CN202123199542.0U
Authority: CN
Inventors: 熊志红
Original assignee: Guangzhou Shishang Technology Co ltd
Current assignee: Guangzhou Shishang Technology Co ltd
Priority date: 2021-12-20
Filing date: 2021-12-20
Publication date: 2022-05-24
Anticipated expiration: 2031-12-20

Abstract

The utility model relates to the technical field of semiconductors, and discloses precision cleaning treatment equipment with a cleaning liquid quantifying structure for semiconductor equipment, which comprises a main box body, wherein a quantifying moving mechanism is arranged on the outer surface of the main box body, a fixing mechanism is arranged on the outer surface of the quantifying moving mechanism, when the quantitative capacity of cleaning liquid in the precision cleaning treatment equipment needs to be changed, a handle rod is moved to move in a first runway-shaped ring groove, the handle rod drives a vertical rod, an L-shaped rod, a convex block and a baffle cover to move, the baffle cover moves along a groove, when the baffle cover moves to a proper position, the handle rod stops moving, cleaning liquid can be injected into the main box body through a feed chute, when the cleaning liquid abuts against the feed chute, the feed chute is closed, and the cleaning liquid cannot enter the main box body through the feed chute.

Description

Precision cleaning processing equipment with cleaning liquid quantitative structure for semiconductor equipment

Technical Field

The utility model relates to the technical field of semiconductors, in particular to a precision cleaning treatment device with a cleaning liquid quantifying structure for a semiconductor device.

Background

The semiconductor refers to a material with electric conductivity between a conductor and an insulator at normal temperature, and is applied to the fields of integrated circuits, consumer electronics, communication systems, photovoltaic power generation, illumination, high-power conversion and the like, for example, a diode is a device manufactured by adopting the semiconductor, and the importance of the semiconductor is very great from the viewpoint of science and technology or economic development. Most electronic products, such as computers, mobile phones or digital audio recorders, have a core unit that is very closely related to a semiconductor.

In the case of a conventional semiconductor device, when a precise cleaning process is required, if a predetermined amount of cleaning liquid is not easily added, resources are easily wasted when the amount of cleaning liquid is too large, and if the amount of cleaning liquid is too small, the semiconductor device is not easily cleaned.

In view of the above problems, a precision cleaning apparatus for a semiconductor device having a cleaning liquid quantitative structure is proposed.

SUMMERY OF THE UTILITY MODEL

The utility model aims to provide a precision cleaning processing device with a cleaning liquid quantitative structure for a semiconductor device, thereby solving the problems that in the prior art, when the semiconductor device needs to perform precision cleaning processing on the semiconductor device, if the quantitative addition of the cleaning liquid is inconvenient, resources are easily wasted when the cleaning liquid is too much, the semiconductor device is inconvenient to clean when the cleaning liquid is too little, and if the adjustment device is inconvenient to fix when the required addition capacity of the cleaning liquid is adjusted, the constant volume of the device is easily deviated.

In order to achieve the purpose, the utility model provides the following technical scheme: the precision cleaning treatment equipment with the cleaning liquid quantitative structure for the semiconductor equipment comprises a main box body, wherein a quantitative moving mechanism is arranged on the outer surface of the main box body, and a fixing mechanism is arranged on the outer surface of the quantitative moving mechanism;

the quantitative moving mechanism comprises a groove arranged on the inner wall of the main box body, a first circular groove arranged at the upper end of the main box body and a baffle cover arranged inside the main box body.

Preferably, the upper end of the baffle cover penetrates through the feed chute, the outer surface of the baffle cover is provided with a convex block, and the convex block is connected with the groove.

Preferably, the upper end of the bump is fixedly provided with an L-shaped rod, the upper end of the L-shaped rod is arranged above the main box body, and one end of the L-shaped rod is fixedly provided with a vertical rod.

Preferably, the vertical rod is movably arranged inside the first circular groove, a handle rod is fixedly arranged on the outer surface of the vertical rod, and a first runway-shaped annular groove is formed in one side of the main box body.

Preferably, the first runway-shaped annular groove is communicated with the first circular groove, and the handle bar is arranged inside the first runway-shaped annular groove.

Preferably, the fixing mechanism comprises a second circular groove formed in the outer surface of the handle rod, a second runway-shaped annular groove formed in one end of the handle rod and a telescopic rod arranged on the inner wall of the second runway-shaped annular groove.

Preferably, the second circular groove is communicated with the second runway-shaped circular groove, a first circular rod is movably arranged inside the second circular groove, and a second circular rod is fixedly arranged on the outer surface of the first circular rod.

Preferably, the second round bar is movably arranged inside the second runway-shaped ring groove, a placing groove is formed in the inner wall of the first runway-shaped ring groove, an indicating marking line is arranged on one side of the main box body, and the placing groove corresponds to the indicating marking line.

Compared with the prior art, the utility model has the following beneficial effects:

1. the utility model provides a precision cleaning processing device with a cleaning liquid quantitative structure for semiconductor equipment, wherein a groove is arranged on the inner wall of a main box body, a first round groove is arranged at the upper end of the main box body, a baffle cover is arranged inside the main box body, a feeding groove is arranged at the upper end of the baffle cover in a penetrating way, a convex block is arranged on the outer surface of the baffle cover and is connected with the groove, an L-shaped rod is fixedly arranged at the upper end of the convex block, the upper end of the L-shaped rod is arranged above the main box body, a vertical rod is fixedly arranged at one end of the L-shaped rod and is movably arranged inside the first round groove, a handle rod is fixedly arranged on the outer surface of the vertical rod, a first runway type ring groove is arranged on one side of the main box body, the first runway type ring groove is communicated with the first round groove, the handle rod is arranged inside the first runway type ring groove, when the quantitative capacity of the cleaning liquid in the precision cleaning processing device needs to be changed, the handle rod is moved to move inside the first runway type ring groove, the handle pole drives montant, L type pole, lug and shelves lid this moment and removes, and the shelves lid removes along the recess this moment, and when the shelves lid moved to suitable position, the stop removed handle pole, accessible feed chute injected into the washing liquid to the inside of main tank this moment, when supporting to feed chute department, closed the feed chute, and the washing liquid can not rethread feed chute get into the inside of main tank this moment.

2. The utility model provides a precision cleaning processing device with a cleaning liquid quantitative structure for semiconductor equipment, wherein a second circular groove is arranged on the outer surface of a handle rod, a second runway-shaped ring groove is arranged at one end of the handle rod, a telescopic rod is arranged on the inner wall of the second runway-shaped ring groove, the second circular groove is communicated with the second runway-shaped ring groove, a first circular rod is movably arranged in the second circular groove, a second circular rod is fixedly arranged on the outer surface of the first circular rod, the second circular rod is movably arranged in the second runway-shaped ring groove, a placing groove is arranged on the inner wall of the first runway-shaped ring groove, an indicating mark line is arranged on one side of a main box body, the placing groove corresponds to the indicating mark line, when a baffle cover is required to be fixed, the second circular rod is moved in the second runway-shaped ring groove, the first circular rod extends out of the inner part of the second circular groove into the placing groove, and then the telescopic rod extends, at the moment, the telescopic rod blocks the second round rod to enable the first round rod not to be separated from the placing groove, so that the gear cover cannot move in the main box body, and the position of the gear cover can be judged due to the existence of the indication mark line.

Drawings

FIG. 1 is a schematic structural diagram of a main box body of the present invention;

FIG. 2 is a schematic view of a stopper cover according to the present invention;

FIG. 3 is a schematic view of the construction of the vertical bar and the handle bar of the present invention;

FIG. 4 is a schematic view of the structure of a first round bar and a second round bar according to the present invention;

fig. 5 is an enlarged view of the utility model at a in fig. 1.

In the figure: 1. a main box body; 2. a quantitative moving mechanism; 21. a groove; 22. a first circular groove; 23. a baffle cover; 231. a feed chute; 232. a bump; 2321. an L-shaped rod; 24. a vertical rod; 25. a handle bar; 26. a first race ring groove; 3. a fixing mechanism; 31. a second circular groove; 32. a second race ring groove; 33. a telescopic rod; 34. a first round bar; 35. a second round bar; 36. a placement groove; 37. and indicating marked lines.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

In order to solve the technical problem of how to change the quantitative volume of the cleaning liquid in the precision cleaning processing equipment, as shown in fig. 1-3 and 5, the following preferred technical solutions are provided:

the precision cleaning processing equipment with the cleaning liquid quantitative structure for the semiconductor equipment comprises a main box body 1, a quantitative moving mechanism 2 is arranged on the outer surface of the main box body 1, a fixing mechanism 3 is arranged on the outer surface of the quantitative moving mechanism 2, a groove 21 is arranged on the inner wall of the main box body 1, a first circular groove 22 is arranged at the upper end of the main box body 1, a baffle cover 23 is arranged in the main box body 1, a feeding groove 231 is arranged at the upper end of the baffle cover 23 in a penetrating manner, a convex block 232 is arranged on the outer surface of the baffle cover 23, the convex block 232 is connected with the groove 21, an L-shaped rod 2321 is fixedly arranged at the upper end of the convex block 232, the upper end of the L-shaped rod 2321 is arranged above the main box body 1, a vertical rod 24 is fixedly arranged at one end of the L-shaped rod 2321, the vertical rod 24 is movably arranged in the first circular groove 22, a handle rod 25 is fixedly arranged on the outer surface of the vertical rod 24, a first runway-shaped ring groove 26 is arranged at one side of the main box body 1, the first race ring groove 26 communicates with the first circular groove 22, and the handle bar 25 is disposed inside the first race ring groove 26.

Specifically, when the quantitative volume of the cleaning liquid in the precision cleaning processing equipment needs to be changed, the handle rod 25 is moved to move inside the first raceway-shaped ring groove 26, at this time, the handle rod 25 drives the vertical rod 24, the L-shaped rod 2321, the bump 232 and the stopper cover 23 to move, at this time, the stopper cover 23 moves along the groove 21, when the stopper cover 23 moves to a proper position, the handle rod 25 stops moving, at this time, the cleaning liquid can be injected into the main tank 1 through the feed chute 231, when the cleaning liquid abuts against the feed chute 231, the feed chute 231 is closed, and at this time, the cleaning liquid cannot enter the main tank 1 through the feed chute 231.

In order to solve the technical problem of how to fix the blocking cover 23, as shown in fig. 3-5, the following preferred technical solutions are provided:

precision cleaning processing equipment with cleaning fluid ration structure for semiconductor device, second circular slot 31 has been seted up on the surface including handle bar 25, second runway type annular 32 has been seted up to handle bar 25's one end, be provided with telescopic link 33 on the inner wall of second runway type annular 32, second circular slot 31 is linked together with second runway type annular 32, the inside activity of second circular slot 31 is provided with first circular rod 34, the fixed second circular rod 35 that is provided with on the surface of first circular rod 34, the activity of second circular rod 35 sets up in the inside of second runway type annular 32, standing groove 36 has been seted up on the inner wall of first runway type annular 26, one side of main tank 1 is provided with and instructs marking 37, standing groove 36 corresponds with instructing marking 37.

Specifically, when the stopper cover 23 needs to be fixed, the second round bar 35 is moved to move in the second runway type annular groove 32, at this time, the first round bar 34 protrudes from the inside of the second round groove 31 into the placement groove 36, then the telescopic bar 33 extends, at this time, the telescopic bar 33 blocks the second round bar 35 to prevent the first round bar 34 from being separated from the placement groove 36, so that the stopper cover 23 does not move in the inside of the main box 1, and the position of the stopper cover 23 can be determined due to the existence of the indication mark line 37.

It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the utility model, the scope of which is defined in the appended claims and their equivalents.

Claims

1. Semiconductor equipment is with precision washing processing apparatus who has washing liquid ration structure, including main tank body (1), its characterized in that: a quantitative moving mechanism (2) is arranged on the outer surface of the main box body (1), and a fixing mechanism (3) is arranged on the outer surface of the quantitative moving mechanism (2);

the quantitative moving mechanism (2) comprises a groove (21) formed in the inner wall of the main box body (1), a first circular groove (22) formed in the upper end of the main box body (1) and a blocking cover (23) arranged inside the main box body (1).

2. The precision cleaning processing apparatus having a cleaning liquid quantitative structure for a semiconductor device according to claim 1, characterized in that: the upper end of the baffle cover (23) penetrates through and is provided with a feeding groove (231), the outer surface of the baffle cover (23) is provided with a convex block (232), and the convex block (232) is connected with the groove (21).

3. The precision cleaning processing apparatus having a cleaning liquid quantitative structure for a semiconductor device according to claim 2, characterized in that: the upper end of the bump (232) is fixedly provided with an L-shaped rod (2321), the upper end of the L-shaped rod (2321) is arranged above the main box body (1), and one end of the L-shaped rod (2321) is fixedly provided with a vertical rod (24).

4. The precision cleaning processing apparatus having a cleaning liquid quantitative structure for a semiconductor device according to claim 3, characterized in that: the vertical rod (24) is movably arranged inside the first circular groove (22), a handle rod (25) is fixedly arranged on the outer surface of the vertical rod (24), and a first runway-shaped circular groove (26) is formed in one side of the main box body (1).

5. The precision cleaning processing apparatus having a cleaning liquid quantitative structure for a semiconductor device according to claim 4, characterized in that: the first race ring groove (26) is communicated with the first circular groove (22), and the handle rod (25) is arranged inside the first race ring groove (26).

6. The precision cleaning processing apparatus having a cleaning liquid quantitative structure for a semiconductor device according to claim 4, characterized in that: fixing mechanism (3) are including seting up second circular slot (31) on handle bar (25) surface, set up second runway type annular (32) and telescopic link (33) of setting on second runway type annular (32) inner wall at handle bar (25) one end.

7. The precision cleaning processing apparatus having a cleaning liquid quantitative structure for a semiconductor device according to claim 6, characterized in that: the second circular groove (31) is communicated with the second runway-shaped annular groove (32), a first circular rod (34) is movably arranged inside the second circular groove (31), and a second circular rod (35) is fixedly arranged on the outer surface of the first circular rod (34).

8. The precision cleaning processing apparatus having a cleaning liquid quantitative structure for a semiconductor device according to claim 7, characterized in that: the second round rod (35) is movably arranged inside the second runway type ring groove (32), a placing groove (36) is formed in the inner wall of the first runway type ring groove (26), an indicating marking line (37) is arranged on one side of the main box body (1), and the placing groove (36) corresponds to the indicating marking line (37).