CN216545103U - Facial mask cloth with S-shaped three-dimensional lines for promoting absorption - Google Patents
Facial mask cloth with S-shaped three-dimensional lines for promoting absorption Download PDFInfo
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- CN216545103U CN216545103U CN202123364066.3U CN202123364066U CN216545103U CN 216545103 U CN216545103 U CN 216545103U CN 202123364066 U CN202123364066 U CN 202123364066U CN 216545103 U CN216545103 U CN 216545103U
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- facial mask
- essence
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- cloth
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Abstract
The application discloses absorptive facial mask cloth of three-dimensional line of S type relates to facial mask technical field, including facial mask base cloth, one side of facial mask base cloth is fixed to be bonded has the moisturizing layer, one side that facial mask base cloth was kept away from on the moisturizing layer is fixed to be bonded has ventilative layer, one side that the moisturizing layer was kept away from on ventilative layer is fixed to be bonded has the permeable formation, the infiltration hole has been seted up on the surface of permeable formation, the lower extreme fixedly connected with anti-funnel of facial mask base cloth. Store the essence through the permeable formation, reduce the loss of essence, make the more even of essence distribution simultaneously, increase the moisturizing ability of facial mask through moisturizing layer, reduce volatilizing of essence, improve the air permeability of facial mask through ventilative layer, be favorable to the absorption of essence, collect through the essence that the leak protection fill surface flow down, reduce and drip, the three-dimensional decorative pattern of S type can promote skin extraction absorption essence, the drapability is better, closely laminate facial profile when applying ointment or plaster, promote the essence infiltration.
Description
Technical Field
The application relates to the technical field of facial masks, in particular to facial mask cloth with S-shaped three-dimensional grains for promoting absorption.
Background
The mask cloth is a carrier of mask essence substances and can be directly applied to the face; most of the current common mask cloth are non-woven fabric masks, silk masks, pure cotton masks and tencel masks.
Traditional facial mask surface is smooth, and when applying facial mask, the essence is easy to be the landing under the influence of gravity to cause the waste of essence.
SUMMERY OF THE UTILITY MODEL
In order to solve the easy problem of landing under the influence of gravity of essence, this application provides the quick absorptive facial mask cloth of S type three-dimensional line.
The application provides a facial mask cloth that three-dimensional line of S type absorbs is urged, adopts following technical scheme:
the utility model provides a short absorptive facial mask cloth of S type three-dimensional line, includes facial mask base cloth, one side of facial mask base cloth is fixed to bond has the moisturizing layer, one side that facial mask base cloth was kept away from to the moisturizing layer is fixed to bond has ventilative layer, one side that the moisturizing layer was kept away from to ventilative layer is fixed to bond has the permeable formation, the infiltration hole has been seted up on the surface of permeable formation, the lower extreme fixedly connected with anti-funnel of facial mask base cloth.
Optionally, the mask base cloth is made of plant fibers.
Optionally, the surface of the mask base cloth is provided with an S-shaped three-dimensional pattern.
Optionally, a protective film is arranged on the outer side of the mask base cloth.
Optionally, the upper end of the protective film is fixedly connected with a tearing tape.
Optionally, the upper end of one side of the mask base cloth is symmetrically provided with eye holes, the middle of one side of the mask base cloth is provided with nose holes, and the lower end of the mask base cloth is provided with mouth holes.
To sum up, the beneficial effect of this application is as follows:
store the essence through the permeable formation, reduce the loss of essence, make the more even of essence distribution simultaneously, increase the moisturizing ability of facial mask through moisturizing layer, reduce volatilizing of essence, improve the air permeability of facial mask through ventilative layer, be favorable to the absorption of essence, collect through the essence that the leak protection fill surface flow down, reduce and drip, the three-dimensional decorative pattern of S type can promote skin extraction absorption essence, the drapability is better, closely laminate facial profile when applying ointment or plaster, promote the essence infiltration.
Drawings
FIG. 1 is a schematic structural diagram of the present application;
FIG. 2 is a partial structural schematic of the present application;
FIG. 3 is a side cross-sectional view of the structure of the present application;
fig. 4 is an enlarged view of the structure at a in fig. 3.
Description of reference numerals: 1. a mask base cloth; 2. a protective film; 3. preventing a funnel; 4. a mouth hole; 5. a nasal orifice; 6. an eye hole; 7. tearing and sticking; 8. s-shaped three-dimensional patterns; 9. a permeable layer; 10. a breathable layer; 11. a moisture retention layer.
Detailed Description
The present application is described in further detail below with reference to figures 1-4.
Example (b):
referring to fig. 1 to 3, the embodiment of the application discloses an S-shaped three-dimensional texture absorption-promoting mask cloth, which comprises a mask base cloth 1, wherein the mask base cloth 1 is made of plant fibers, the plant fibers are made of cotton linter seed fibers and imported semi-blue tencel fibers, and are formed by high-pressure spunlace three-dimensional forming, the surface of the mask base cloth 1 is provided with an S-shaped three-dimensional pattern 8, the S-shaped three-dimensional pattern 8 can promote skin to extract and absorb essence, the drapability is better, the facial contour is tightly attached to the surface when the mask is applied, the essence permeation is promoted, meanwhile, the mask cloth is biodegradable, no damage is caused to the environment, the preparation process of the mask cloth is free of any emission, the whole life cycle is green and environment-friendly, the lower end of the mask base cloth 1 is fixedly connected with an anti-funnel 3, and the essence flowing down from the surface of the anti-funnel 3 is collected, so that the dripping is reduced.
Referring to fig. 4, a moisturizing layer 11 is fixedly bonded to one side of the mask base cloth 1, and the moisturizing capability of the mask is increased through the moisturizing layer 11, so that volatilization of essence is reduced; the side, away from the mask base cloth 1, of the moisturizing layer 11 is fixedly bonded with the breathable layer 10, and the breathable capacity of the mask is improved through the breathable layer 10, so that the absorption of essence is facilitated; ventilative layer 10 is kept away from one side of moisturizing layer 11 and is fixed to bond and has permeable formation 9, stores the essence through permeable formation 9, and the infiltration hole has been seted up on the surface of permeable formation 9, and the infiltration hole reduces the loss of essence, makes the more even of essence distribution simultaneously.
Referring to fig. 1, a protective film 2 is arranged on the outer side of a mask base cloth 1, a tearing tape 7 is fixedly connected to the upper end of the protective film 2, and the protective film 2 on the mask base cloth 1 is torn off through the tearing tape 7, so that a mask can be applied conveniently.
Referring to fig. 1 and 2, the upper end of one side of the mask base cloth 1 is symmetrically provided with eye holes 6, the middle of one side of the mask base cloth 1 is provided with nose holes 5, the lower end of the mask base cloth 1 is provided with mouth holes 4, the eye holes 6 on the mask base cloth 1 are aligned with the eyes, so that the eyes can be conveniently opened, the nose holes 5 on the mask base cloth 1 are aligned with the nose, and the mouth holes 4 on the mask base cloth 1 are aligned with the mouth, so that the attaching degree of the mask is improved.
The implementation principle of the facial mask cloth with the S-shaped three-dimensional texture absorption promoting function provided by the embodiment of the application is as follows:
in the use, tear 2 protection film on with facial mask base cloth 1 through tearing 7 and tear, thereby apply facial mask, eye hole 6 on the facial mask base cloth 1 aims at eyes, be convenient for open of eyes, nose hole 5 on the facial mask base cloth 1 aims at the nose, mouth hole 4 on the facial mask base cloth 1 aims at the mouth, store the essence through permeable formation 9, reduce the loss of essence, make simultaneously that the essence distributes more evenly, increase the moisturizing ability of facial mask through moisturizing layer 11, reduce volatilizing of essence, improve the air permeability of facial mask through ventilative layer 10, be favorable to the absorption of essence, collect through the essence that prevents 3 surperficial flows of funnel, reduce and drip.
The above embodiments are preferred embodiments of the present application, and the protection scope of the present application is not limited by the above embodiments, so: all equivalent changes made according to the structure, shape and principle of the present application shall be covered by the protection scope of the present application.
Claims (6)
1. The utility model provides a facial mask cloth that S type three-dimensional line is promoted to absorb, includes facial mask base cloth (1), its characterized in that: the anti-leakage mask is characterized in that a moisture-retention layer (11) is fixedly bonded on one side of the mask base cloth (1), a breathable layer (10) is fixedly bonded on one side, away from the mask base cloth (1), of the moisture-retention layer (11), a permeable layer (9) is fixedly bonded on one side, away from the moisture-retention layer (11), of the breathable layer (10), a permeable hole is formed in the surface of the permeable layer (9), and an anti-funnel (3) is fixedly connected to the lower end of the mask base cloth (1).
2. The facial mask cloth with the S-shaped three-dimensional texture and absorption promotion function according to claim 1, characterized in that: the mask base cloth (1) is made of plant fibers.
3. The facial mask cloth with the S-shaped three-dimensional texture and absorption promotion function according to claim 1, characterized in that: the surface of the mask base cloth (1) is provided with S-shaped three-dimensional patterns (8).
4. The facial mask cloth with the S-shaped three-dimensional texture and absorption promotion function according to claim 1, characterized in that: and a protective film (2) is arranged on the outer side of the mask base cloth (1).
5. The facial mask cloth with the S-shaped three-dimensional texture and absorption promotion function according to claim 4, wherein: the upper end of the protective film (2) is fixedly connected with a tearing sticker (7).
6. The facial mask cloth with the S-shaped three-dimensional texture and absorption promotion function according to claim 1, characterized in that: the mask is characterized in that eye holes (6) are symmetrically formed in the upper end of one side of the mask base cloth (1), nose holes (5) are formed in the middle of one side of the mask base cloth (1), and mouth holes (4) are formed in the lower end of the mask base cloth (1).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202123364066.3U CN216545103U (en) | 2021-12-28 | 2021-12-28 | Facial mask cloth with S-shaped three-dimensional lines for promoting absorption |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202123364066.3U CN216545103U (en) | 2021-12-28 | 2021-12-28 | Facial mask cloth with S-shaped three-dimensional lines for promoting absorption |
Publications (1)
Publication Number | Publication Date |
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CN216545103U true CN216545103U (en) | 2022-05-17 |
Family
ID=81558675
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN202123364066.3U Active CN216545103U (en) | 2021-12-28 | 2021-12-28 | Facial mask cloth with S-shaped three-dimensional lines for promoting absorption |
Country Status (1)
Country | Link |
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CN (1) | CN216545103U (en) |
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2021
- 2021-12-28 CN CN202123364066.3U patent/CN216545103U/en active Active
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